CN101048228B - 光催化过程 - Google Patents

光催化过程 Download PDF

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Publication number
CN101048228B
CN101048228B CN200580037173XA CN200580037173A CN101048228B CN 101048228 B CN101048228 B CN 101048228B CN 200580037173X A CN200580037173X A CN 200580037173XA CN 200580037173 A CN200580037173 A CN 200580037173A CN 101048228 B CN101048228 B CN 101048228B
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CN
China
Prior art keywords
field
anode
phosphor
photocatalytic
carbon
Prior art date
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Expired - Fee Related
Application number
CN200580037173XA
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English (en)
Chinese (zh)
Other versions
CN101048228A (zh
Inventor
Z·雅尼弗
R·L·芬克
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Nano Propietary Inc
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Nano Propietary Inc
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Filing date
Publication date
Application filed by Nano Propietary Inc filed Critical Nano Propietary Inc
Publication of CN101048228A publication Critical patent/CN101048228A/zh
Application granted granted Critical
Publication of CN101048228B publication Critical patent/CN101048228B/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/40—Mixed oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/80—Type of catalytic reaction
    • B01D2255/802—Photocatalytic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39—Photocatalytic properties
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/322—Lamp arrangement
    • C02F2201/3222—Units using UV-light emitting diodes [LED]
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00—Use of specific compounds during water treatment
    • C02F2305/10—Photocatalysts

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Organic Chemistry (AREA)
  • Water Supply & Treatment (AREA)
  • Environmental & Geological Engineering (AREA)
  • Hydrology & Water Resources (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Toxicology (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
  • Catalysts (AREA)
  • Physical Water Treatments (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
CN200580037173XA 2004-11-03 2005-11-03 光催化过程 Expired - Fee Related CN101048228B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US62472404P 2004-11-03 2004-11-03
US60/624,724 2004-11-03
US11/263,638 2005-10-31
US11/263,638 US7300634B2 (en) 2004-11-03 2005-10-31 Photocatalytic process
PCT/US2005/039733 WO2006060103A2 (en) 2004-11-03 2005-11-03 Photocatalytic process

Publications (2)

Publication Number Publication Date
CN101048228A CN101048228A (zh) 2007-10-03
CN101048228B true CN101048228B (zh) 2012-02-01

Family

ID=36260538

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200580037173XA Expired - Fee Related CN101048228B (zh) 2004-11-03 2005-11-03 光催化过程

Country Status (5)

Country Link
US (1) US7300634B2 (enExample)
JP (1) JP5064228B2 (enExample)
CN (1) CN101048228B (enExample)
TW (1) TWI344384B (enExample)
WO (1) WO2006060103A2 (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE377580T1 (de) 2004-07-12 2007-11-15 Cardinal Cg Co Wartungsarme beschichtungen
JP2006082287A (ja) * 2004-09-14 2006-03-30 Fuji Xerox Co Ltd インクジェット記録装置
US20100189223A1 (en) * 2006-02-16 2010-07-29 Steller Micro Devices Digitally addressed flat panel x-ray sources
US20070189459A1 (en) * 2006-02-16 2007-08-16 Stellar Micro Devices, Inc. Compact radiation source
US20100189222A1 (en) * 2006-02-16 2010-07-29 Steller Micro Devices Panoramic irradiation system using flat panel x-ray sources
US9324535B2 (en) * 2006-02-16 2016-04-26 Stellarray, Incorporaated Self contained irradiation system using flat panel X-ray sources
CN100561657C (zh) * 2006-03-31 2009-11-18 清华大学 场发射灯管及其制造方法
WO2007121215A1 (en) * 2006-04-11 2007-10-25 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
WO2009036284A1 (en) 2007-09-14 2009-03-19 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
US7824626B2 (en) 2007-09-27 2010-11-02 Applied Nanotech Holdings, Inc. Air handler and purifier
US8440467B2 (en) * 2007-09-28 2013-05-14 William Marsh Rice University Electronic switching, memory, and sensor devices from a discontinuous graphene and/or graphite carbon layer on dielectric materials
CN101465254B (zh) * 2007-12-19 2010-12-08 北京富纳特创新科技有限公司 热发射电子源及其制备方法
CN101556888B (zh) * 2008-04-11 2011-01-05 鸿富锦精密工业（深圳）有限公司 热发射电子源的制备方法
JP5468079B2 (ja) * 2009-09-07 2014-04-09 国立大学法人 名古屋工業大学 真空紫外発光デバイス
US9242019B2 (en) 2014-03-13 2016-01-26 Stellarray, Incorporated UV pipe
GB201516253D0 (en) * 2015-09-14 2015-10-28 Univ Montfort Rotating contactor reactor
GB2537196B (en) * 2015-10-02 2017-05-10 Mario Michan Juan Apparatus and method for electron irradiation scrubbing
CN106348384A (zh) * 2016-10-18 2017-01-25 兰州交通大学 一种光催化反应装置
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology
EP3658030A4 (en) * 2017-07-26 2021-06-30 Shenzhen Xpectvision Technology Co., Ltd. INTEGRATED X-RAY SOURCE
DE102020113351A1 (de) * 2020-05-18 2021-11-18 Dbt Gmbh Elektronenemitterstruktur, Äußerer-Photoeffekt-Emitter, Partikelsammelvorrichtung Tunnel- Flächenemitter halbleiterbasierter Direktemitter, und Flüssigkeitsionisator mit derselben, Verfahren zum Erzeugen von freien Elektronen und Verfahren zum Sammeln von Partikeln
CN114917737A (zh) * 2022-05-18 2022-08-19 中国科学院大学 一种用于二噁英处理的低温等离子体装置
CN119972041A (zh) * 2025-04-14 2025-05-13 河南师范大学 一种TiO2/碳毡光热-催化材料、制备方法及其应用的光热界面蒸发净化装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1291783A (zh) * 1999-10-12 2001-04-18 葛世潮 场发射等离子体放电发光装置及显示器
CN1310633A (zh) * 1999-09-14 2001-08-29 大金工业株式会社 空气清净器

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5659224A (en) * 1992-03-16 1997-08-19 Microelectronics And Computer Technology Corporation Cold cathode display device
JPH09253637A (ja) * 1996-03-21 1997-09-30 Matsushita Electric Ind Co Ltd 流体処理装置
WO2001019515A1 (en) * 1999-09-09 2001-03-22 Hitachi Zosen Corporation Catalyst with discharge electrode or carrier
US20020070648A1 (en) * 2000-12-08 2002-06-13 Gunnar Forsberg Field emitting cathode and a light source using a field emitting cathode
JP4034083B2 (ja) * 2002-02-18 2008-01-16 有限会社水野建築設計事務所 集合住宅
JP4723786B2 (ja) * 2002-05-23 2011-07-13 株式会社日鮮 生鮮物保存庫内の空気浄化装置
JP2005261988A (ja) 2002-09-20 2005-09-29 Andes Denki Kk 光触媒材料とその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1310633A (zh) * 1999-09-14 2001-08-29 大金工业株式会社 空气清净器
CN1291783A (zh) * 1999-10-12 2001-04-18 葛世潮 场发射等离子体放电发光装置及显示器

Also Published As

Publication number Publication date
CN101048228A (zh) 2007-10-03
WO2006060103A2 (en) 2006-06-08
JP5064228B2 (ja) 2012-10-31
US20060090996A1 (en) 2006-05-04
TWI344384B (en) 2011-07-01
WO2006060103A3 (en) 2007-03-29
US7300634B2 (en) 2007-11-27
JP2008518759A (ja) 2008-06-05
TW200630149A (en) 2006-09-01

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