JP2008518759A - 光触媒プロセス - Google Patents
光触媒プロセス Download PDFInfo
- Publication number
- JP2008518759A JP2008518759A JP2007539335A JP2007539335A JP2008518759A JP 2008518759 A JP2008518759 A JP 2008518759A JP 2007539335 A JP2007539335 A JP 2007539335A JP 2007539335 A JP2007539335 A JP 2007539335A JP 2008518759 A JP2008518759 A JP 2008518759A
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- JP
- Japan
- Prior art keywords
- photocatalytic
- cathode
- anode
- lamp
- field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001699 photocatalysis Effects 0.000 title claims abstract description 32
- 238000000034 method Methods 0.000 title claims description 15
- 239000000463 material Substances 0.000 claims abstract description 38
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 33
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 15
- 239000002041 carbon nanotube Substances 0.000 claims abstract description 12
- 230000005684 electric field Effects 0.000 claims abstract description 12
- 229910021393 carbon nanotube Inorganic materials 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 239000011941 photocatalyst Substances 0.000 claims abstract description 7
- 230000003213 activating effect Effects 0.000 claims 2
- 239000012530 fluid Substances 0.000 claims 2
- 238000004140 cleaning Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 description 23
- 229910010413 TiO 2 Inorganic materials 0.000 description 19
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 239000004020 conductor Substances 0.000 description 13
- 239000004744 fabric Substances 0.000 description 11
- 229920000049 Carbon (fiber) Polymers 0.000 description 8
- 239000004917 carbon fiber Substances 0.000 description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 7
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 239000010406 cathode material Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229910016066 BaSi Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 238000004887 air purification Methods 0.000 description 2
- 239000005352 borofloat Substances 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 239000002238 carbon nanotube film Substances 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000011152 fibreglass Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001875 compounds Chemical group 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005202 decontamination Methods 0.000 description 1
- 230000003588 decontaminative effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 238000004050 hot filament vapor deposition Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 239000002048 multi walled nanotube Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002109 single walled nanotube Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000000475 sunscreen effect Effects 0.000 description 1
- 239000000516 sunscreening agent Substances 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 230000003612 virological effect Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/40—Mixed oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/80—Type of catalytic reaction
- B01D2255/802—Photocatalytic
-
- B01J35/39—
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3222—Units using UV-light emitting diodes [LED]
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2305/00—Use of specific compounds during water treatment
- C02F2305/10—Photocatalysts
Abstract
Description
1.水銀を含まない、
2.即時にONになる、
3.高効率で高い紫外光強度を発生させ、かつ
4.長寿命である(20,000時間以上)。
Claims (17)
- 空気または水用の光触媒クリーナーであって、以下:
光触媒材料コーティング基板;
陽極であって、該基板から所定の距離に位置し、電子による衝撃に応じて紫外光を発する、陽極;および
電界陰極であって、該陽極から所定の距離に位置し、電界に応じて電子を発することができる、陰極、
を備える、光触媒クリーナー。 - 前記電界陰極が、前記電子を発するための、カーボンを基にした電界発光材料をさらに備える、請求項1に記載の光触媒クリーナー。
- 前記カーボンを基にした電界発光材料が、カーボンナノチューブを備える、請求項2に記載の光触媒クリーナー。
- 前記電界陰極および陽極は、互いに対して、二極ランプ配置で位置する、請求項3に記載の光触媒クリーナー。
- 前記電界陰極および陽極が、互いに対して、三極ランプ配置で位置する、請求項3に記載の光触媒クリーナー。
- 前記二極ランプ配置が、長方形形状のランプをもたらす、請求項4に記載の光触媒クリーナー。
- 前記二極ランプ配置が、円柱形状のランプをもたらす、請求項4に記載の光触媒クリーナー。
- 光触媒装置であって、以下:
光触媒材料;
蛍りん光体を含む、該光触媒材料から所定の距離に位置した、陰極;
該陰極から所定の距離に位置し、該蛍りん光体に対する電界に応じて電子を放出することができる、電界陽極、
を備える、光触媒装置。 - 前記電界陽極は、前記電子を発するための、カーボンを基にした電界放出材料をさらに備える、請求項8に記載の光触媒装置。
- 前記カーボンを基にした電界放出材料は、カーボンナノチューブをさらに備える、請求項9に記載の光触媒装置。
- 前記電界陰極および陽極が、互いに対して、二極ランプ配置で位置する、請求項8に記載の光触媒装置。
- 前記電界陰極および陽極が、互いに対して、三極ランプ配置で位置する、請求項8に記載の光触媒装置。
- 前記三極ランプ配置が、長方形形状のランプをもたらす、請求項12に記載の光触媒装置。
- 前記三極ランプ配置が、円柱形状のランプをもたらす、請求項12に記載の光触媒装置。
- 流体を清浄化するための方法であって、以下:
電界エミッターが蛍りん光体に対して電子を放出するように、該電界エミッターを活性化する工程;
電界エミッターにより発せられる電子による衝撃に応じて、該蛍りん光体が紫外光を発する工程;
該蛍りん光体によって発せられる紫外光による衝撃によって、光触媒材料が活性化される工程;および
該流体を、該光触媒材料と接触させて通過させる工程、
を包含する、方法。 - 前記電界エミッターは、カーボンを基にした電界エミッターを備える、請求項15に記載の方法。
- 前記カーボンを基にした電界エミッターは、カーボンナノチューブをさらに備える、請求項16に記載の方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US62472404P | 2004-11-03 | 2004-11-03 | |
US60/624,724 | 2004-11-03 | ||
US11/263,638 | 2005-10-31 | ||
US11/263,638 US7300634B2 (en) | 2004-11-03 | 2005-10-31 | Photocatalytic process |
PCT/US2005/039733 WO2006060103A2 (en) | 2004-11-03 | 2005-11-03 | Photocatalytic process |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008518759A true JP2008518759A (ja) | 2008-06-05 |
JP2008518759A5 JP2008518759A5 (ja) | 2012-07-05 |
JP5064228B2 JP5064228B2 (ja) | 2012-10-31 |
Family
ID=36260538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007539335A Expired - Fee Related JP5064228B2 (ja) | 2004-11-03 | 2005-11-03 | 光触媒プロセス |
Country Status (5)
Country | Link |
---|---|
US (1) | US7300634B2 (ja) |
JP (1) | JP5064228B2 (ja) |
CN (1) | CN101048228B (ja) |
TW (1) | TWI344384B (ja) |
WO (1) | WO2006060103A2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018530426A (ja) * | 2015-09-14 | 2018-10-18 | デ モントフォート ユニバーシティ | 回転接触式リアクタ |
JP2019501022A (ja) * | 2015-10-02 | 2019-01-17 | ダフネ テクノロジー ソシエテ アノニム | 電子照射による浄化のための装置及び方法 |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE602005003234T2 (de) | 2004-07-12 | 2008-08-28 | Cardinal Cg Co., Eden Prairie | Wartungsarme beschichtungen |
JP2006082287A (ja) * | 2004-09-14 | 2006-03-30 | Fuji Xerox Co Ltd | インクジェット記録装置 |
US9324535B2 (en) * | 2006-02-16 | 2016-04-26 | Stellarray, Incorporaated | Self contained irradiation system using flat panel X-ray sources |
US20070189459A1 (en) * | 2006-02-16 | 2007-08-16 | Stellar Micro Devices, Inc. | Compact radiation source |
US20100189222A1 (en) * | 2006-02-16 | 2010-07-29 | Steller Micro Devices | Panoramic irradiation system using flat panel x-ray sources |
US20100189223A1 (en) * | 2006-02-16 | 2010-07-29 | Steller Micro Devices | Digitally addressed flat panel x-ray sources |
CN100561657C (zh) * | 2006-03-31 | 2009-11-18 | 清华大学 | 场发射灯管及其制造方法 |
EP2013150B1 (en) * | 2006-04-11 | 2018-02-28 | Cardinal CG Company | Photocatalytic coatings having improved low-maintenance properties |
US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
KR101512166B1 (ko) | 2007-09-14 | 2015-04-14 | 카디날 씨지 컴퍼니 | 관리가 용이한 코팅 기술 |
US7824626B2 (en) | 2007-09-27 | 2010-11-02 | Applied Nanotech Holdings, Inc. | Air handler and purifier |
US8440467B2 (en) * | 2007-09-28 | 2013-05-14 | William Marsh Rice University | Electronic switching, memory, and sensor devices from a discontinuous graphene and/or graphite carbon layer on dielectric materials |
CN101465254B (zh) * | 2007-12-19 | 2010-12-08 | 北京富纳特创新科技有限公司 | 热发射电子源及其制备方法 |
CN101556888B (zh) * | 2008-04-11 | 2011-01-05 | 鸿富锦精密工业(深圳)有限公司 | 热发射电子源的制备方法 |
EP2477210A1 (en) * | 2009-09-07 | 2012-07-18 | National University Corporation Nagoya Institute of Technology | Device for emitting vacuum ultraviolet light |
US9242019B2 (en) | 2014-03-13 | 2016-01-26 | Stellarray, Incorporated | UV pipe |
CN106348384A (zh) * | 2016-10-18 | 2017-01-25 | 兰州交通大学 | 一种光催化反应装置 |
WO2018093985A1 (en) | 2016-11-17 | 2018-05-24 | Cardinal Cg Company | Static-dissipative coating technology |
WO2019019042A1 (en) * | 2017-07-26 | 2019-01-31 | Shenzhen Xpectvision Technology Co., Ltd. | INTEGRATED X-RAY SOURCE |
DE102020113351A1 (de) * | 2020-05-18 | 2021-11-18 | Dbt Gmbh | Elektronenemitterstruktur, Äußerer-Photoeffekt-Emitter, Partikelsammelvorrichtung Tunnel- Flächenemitter halbleiterbasierter Direktemitter, und Flüssigkeitsionisator mit derselben, Verfahren zum Erzeugen von freien Elektronen und Verfahren zum Sammeln von Partikeln |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09253637A (ja) * | 1996-03-21 | 1997-09-30 | Matsushita Electric Ind Co Ltd | 流体処理装置 |
WO2001019515A1 (fr) * | 1999-09-09 | 2001-03-22 | Hitachi Zosen Corporation | Catalyseur a electrode de decharge ou support de catalyseur |
JP2001079071A (ja) * | 1999-09-14 | 2001-03-27 | Daikin Ind Ltd | 空気清浄装置 |
JP2003239551A (ja) * | 2002-02-18 | 2003-08-27 | Mizuno Kenchiku Sekkei Jimusho:Kk | 集合住宅 |
JP2003339312A (ja) * | 2002-05-23 | 2003-12-02 | Nissen:Kk | 生鮮物保存庫内の空気浄化方法及びその装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5659224A (en) * | 1992-03-16 | 1997-08-19 | Microelectronics And Computer Technology Corporation | Cold cathode display device |
CN1112719C (zh) * | 1999-10-12 | 2003-06-25 | 葛世潮 | 场发射等离子体放电发光装置及显示器 |
US20020070648A1 (en) * | 2000-12-08 | 2002-06-13 | Gunnar Forsberg | Field emitting cathode and a light source using a field emitting cathode |
JP2005261988A (ja) | 2002-09-20 | 2005-09-29 | Andes Denki Kk | 光触媒材料とその製造方法 |
-
2005
- 2005-10-31 US US11/263,638 patent/US7300634B2/en not_active Expired - Fee Related
- 2005-11-02 TW TW094138436A patent/TWI344384B/zh not_active IP Right Cessation
- 2005-11-03 CN CN200580037173XA patent/CN101048228B/zh not_active Expired - Fee Related
- 2005-11-03 JP JP2007539335A patent/JP5064228B2/ja not_active Expired - Fee Related
- 2005-11-03 WO PCT/US2005/039733 patent/WO2006060103A2/en active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09253637A (ja) * | 1996-03-21 | 1997-09-30 | Matsushita Electric Ind Co Ltd | 流体処理装置 |
WO2001019515A1 (fr) * | 1999-09-09 | 2001-03-22 | Hitachi Zosen Corporation | Catalyseur a electrode de decharge ou support de catalyseur |
JP2001079071A (ja) * | 1999-09-14 | 2001-03-27 | Daikin Ind Ltd | 空気清浄装置 |
JP2003239551A (ja) * | 2002-02-18 | 2003-08-27 | Mizuno Kenchiku Sekkei Jimusho:Kk | 集合住宅 |
JP2003339312A (ja) * | 2002-05-23 | 2003-12-02 | Nissen:Kk | 生鮮物保存庫内の空気浄化方法及びその装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018530426A (ja) * | 2015-09-14 | 2018-10-18 | デ モントフォート ユニバーシティ | 回転接触式リアクタ |
JP2019501022A (ja) * | 2015-10-02 | 2019-01-17 | ダフネ テクノロジー ソシエテ アノニム | 電子照射による浄化のための装置及び方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2006060103A3 (en) | 2007-03-29 |
CN101048228B (zh) | 2012-02-01 |
US20060090996A1 (en) | 2006-05-04 |
TW200630149A (en) | 2006-09-01 |
TWI344384B (en) | 2011-07-01 |
WO2006060103A2 (en) | 2006-06-08 |
CN101048228A (zh) | 2007-10-03 |
JP5064228B2 (ja) | 2012-10-31 |
US7300634B2 (en) | 2007-11-27 |
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