TWI340984B - Thick film conductor paste compositions for ltcc tape in microwave applications - Google Patents

Thick film conductor paste compositions for ltcc tape in microwave applications

Info

Publication number
TWI340984B
TWI340984B TW095114633A TW95114633A TWI340984B TW I340984 B TWI340984 B TW I340984B TW 095114633 A TW095114633 A TW 095114633A TW 95114633 A TW95114633 A TW 95114633A TW I340984 B TWI340984 B TW I340984B
Authority
TW
Taiwan
Prior art keywords
thick film
conductor paste
film conductor
paste compositions
microwave applications
Prior art date
Application number
TW095114633A
Other languages
English (en)
Chinese (zh)
Other versions
TW200703370A (en
Inventor
Patricia J Ollivier
Kenneth Warren Hang
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of TW200703370A publication Critical patent/TW200703370A/zh
Application granted granted Critical
Publication of TWI340984B publication Critical patent/TWI340984B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
    • C03C3/112—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine
    • C03C3/115—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine containing boron
    • C03C3/118—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/06—Frit compositions, i.e. in a powdered or comminuted form containing halogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C03C8/18—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions containing free metals
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092—Dispersed materials, e.g. conductive pastes or inks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/66—Conductive materials thereof
    • H10W70/666—Organic materials or pastes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • H05K3/4629—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24893—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including particulate material
    • Y10T428/24909—Free metal or mineral containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Conductive Materials (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
TW095114633A 2005-04-25 2006-04-25 Thick film conductor paste compositions for ltcc tape in microwave applications TWI340984B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US67443405P 2005-04-25 2005-04-25
US11/398,141 US7326367B2 (en) 2005-04-25 2006-04-05 Thick film conductor paste compositions for LTCC tape in microwave applications

Publications (2)

Publication Number Publication Date
TW200703370A TW200703370A (en) 2007-01-16
TWI340984B true TWI340984B (en) 2011-04-21

Family

ID=36647821

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095114633A TWI340984B (en) 2005-04-25 2006-04-25 Thick film conductor paste compositions for ltcc tape in microwave applications

Country Status (6)

Country Link
US (1) US7326367B2 (enExample)
EP (1) EP1717858A1 (enExample)
JP (1) JP5180443B2 (enExample)
KR (2) KR100791208B1 (enExample)
CN (1) CN1873837B (enExample)
TW (1) TWI340984B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105957642A (zh) * 2016-06-08 2016-09-21 天津大学 一种用于ltcc基板的二氧化硅包覆铜电子浆料的制备方法

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* Cited by examiner, † Cited by third party
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US7326367B2 (en) 2005-04-25 2008-02-05 E.I. Du Pont De Nemours And Company Thick film conductor paste compositions for LTCC tape in microwave applications
US7731868B2 (en) * 2007-04-12 2010-06-08 E.I. Du Pont De Nemours And Company Thick film conductive composition and process for use in the manufacture of semiconductor device
JP2011517117A (ja) * 2008-04-09 2011-05-26 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 伝導性組成物、および半導体デバイスの製造における使用方法
JP2012502274A (ja) * 2008-09-05 2012-01-26 トップ・エンジニアリング・カンパニー・リミテッド Ｍｅｍｓプローブ用カード及びその製造方法
SG178931A1 (en) * 2009-09-04 2012-04-27 Basf Se Composition for printing electrodes
WO2011082213A1 (en) * 2009-12-31 2011-07-07 E.I. Du Pont De Nemours And Company Mixed-metal system conductors for use in low-temperature co-fired ceramic circuits and devices
JP4868079B1 (ja) * 2010-01-25 2012-02-01 日立化成工業株式会社 ｎ型拡散層形成組成物、ｎ型拡散層の製造方法、及び太陽電池セルの製造方法
US20110256658A1 (en) * 2010-02-05 2011-10-20 Hitachi Chemical Company, Ltd. Method for producing photovoltaic cell
US20110195540A1 (en) * 2010-02-05 2011-08-11 Hitachi Chemical Company, Ltd. Composition for forming p-type diffusion layer, method for forming p-type diffusion layer, and method for producing photovoltaic cell
CN102030471B (zh) * 2010-10-18 2012-12-19 南京工业大学 一种低温共烧玻璃和陶瓷多层微电路基片及其制备方法
KR20140019473A (ko) * 2011-07-05 2014-02-14 히타치가세이가부시끼가이샤 n 형 확산층 형성 조성물, n 형 확산층의 제조 방법 및 태양 전지 소자의 제조 방법
WO2013011986A1 (ja) * 2011-07-19 2013-01-24 日立化成工業株式会社 ｎ型拡散層形成組成物、ｎ型拡散層の製造方法、及び太陽電池素子の製造方法
CN104157326B (zh) * 2014-08-05 2017-09-05 上海蓝沛新材料科技股份有限公司 一种应用于低温共烧陶瓷的内电极导电金浆及其制备方法
CN108053915A (zh) * 2017-12-18 2018-05-18 西安宏星电子浆料科技有限责任公司 丝网印刷用金基导体浆料及其制备方法
EP4235773A3 (en) * 2018-09-07 2023-10-04 Ferro Corporation Conductive thick film paste for silicon nitride and other substrates
CN110544550B (zh) * 2019-09-12 2021-01-19 西安宏星电子浆料科技股份有限公司 一种高温共烧填孔浆料
CN113506648B (zh) * 2021-09-10 2021-12-21 西安宏星电子浆料科技股份有限公司 一种Ca-B-Si体系LTCC用内层金导体浆料
CN117564263B (zh) * 2023-11-16 2026-07-17 中国兵器工业集团第二一四研究所苏州研发中心 一种用于低温共烧陶瓷体系的填孔浆料及填孔方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105957642A (zh) * 2016-06-08 2016-09-21 天津大学 一种用于ltcc基板的二氧化硅包覆铜电子浆料的制备方法

Also Published As

Publication number Publication date
US7326367B2 (en) 2008-02-05
EP1717858A1 (en) 2006-11-02
CN1873837A (zh) 2006-12-06
CN1873837B (zh) 2011-08-24
US20070295939A1 (en) 2007-12-27
KR20070105296A (ko) 2007-10-30
KR20060112613A (ko) 2006-11-01
KR100791208B1 (ko) 2008-01-02
JP2006344582A (ja) 2006-12-21
TW200703370A (en) 2007-01-16
KR100798263B1 (ko) 2008-01-24
JP5180443B2 (ja) 2013-04-10

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