TWI335254B - - Google Patents

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TWI335254B
TWI335254B TW093132594A TW93132594A TWI335254B TW I335254 B TWI335254 B TW I335254B TW 093132594 A TW093132594 A TW 093132594A TW 93132594 A TW93132594 A TW 93132594A TW I335254 B TWI335254 B TW I335254B
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Taiwan
Prior art keywords
vacuum chamber
substrate
lower holding
holding plate
end wall
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TW093132594A
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Chinese (zh)
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TW200518872A (en
Inventor
Akiyoshi Yokota
Ichiro Ishizaka
Hideki Oshima
Toshio Sekigawa
Noriyuki Takefushi
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Shinetsu Eng Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1341Filling or closing of cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Description

1335254 • · 九、發明說明: _ 【發明所屬之技術領域】 本發明係有關於一使用於如製造液晶顯示器(LCD)或電 聚顯示器(Plasma Display Panel)(PDP)等平板顯示器(flat panel display)過程中,將兩基板相對朝ΧΥΘ方向進行對位 (調整)後,將這些基板重疊固定,而後藉由上下兩基板内 外所產生的氣壓差來加壓兩基板間之間隔至規定距離的黏 合基板機的基板對位裝置。特別是關於可對大型基板進行 對位之基板對位裝置。 更進一步而言,係有關於一於真空室中,將相互貼合之 兩基板,各自將其可任意拆組保持於上下兩保持板,並使 其相對,將此兩基板於真空中相對地朝ΧΥΘ方向調整移 動,進行基板對位之基板對位裝置。 【先前技術】 習知,此種基板對位裝置,係於上下基板出入口開設於 側面之真空室之内部,設置上保持板(上方基台)與下保持 板(下方基台)、再藉由此真空室底端壁開設之貫穿孔(開孔 部分)使其下保持板的底座能貫通,藉由此底座,保持板 得以藉著ΧΥΘ座台支撐,而此ΧΥΘ座台是由藉著驅動馬達 可於ΧΥ方向移動之支撐ΧΥ座台,與於此ΧΥ座台内部經由 迴轉軸承及真空封緘而可藉由驅動馬達可對ΧΥ座台迴轉 之Θ座台所構成。這些下保持板之基座與真空室之貫通孔 係藉由呈蛇腹狀之彈性體等之彈性密封構件而氣密結合。 * (可參考如專利文獻1) 96986.doc 1335254 且’為了能任意移Λ或移出上下二基板,將在側面開設 有可任意閉合開口部之真空室内部,設置上保持板(上方 基台)與下保持板(下方基台),再於此真空室之底部開設的 複數貫通孔(第一開口部)上’各自穿插上轴(第-轴),兩 者間藉由呈蛇腹狀之彈性密封構件保持氣密接合,同時藉 著這些軸將下保持板與ΧΥΘ座台(移動基台)相連桿,此下 保持板可與兩基板之接合面呈平行地朝χγθ方向任意調整 移動而被支持。而上述真空室内’如達到所要求之真空麼 後,可藉由設於真空室外之ζ方向移動裝置,使上下兩保 持板相互接近,接著,再藉由上述χγθ座台之移動,透過 各軸以及下保持板,使兩基板相對地朝χγθ方向對位,之 後,將真空室還原成大氣壓,藉由大氣壓力於兩基板間之 作用,再更近一步加壓兩基板(可參考如專利文獻2)〇 [專利文獻1] 特開2001-305563號公報(第3·4頁、圖3、圖6、圖7) [專利文獻2] 特開2002-229042號公報(第3-6頁、圖1-圖5) 【發明内容】 [本發明欲解決之課題] 然而,此處所提及的習知基板對位裝置,係利用乂¥0座 台將兩基板朝ΧΥΘ方向移動加以對位。但,現今一般的 ΧΥΘ座台基本上是為了可朝χγθ方向以mm單位以上移動所 設計的,像調整基板位置這種不到幾百Mrn的些微移動 量’達不到旋轉軸承之轉動體的一次旋轉量,於每次調整 969S6.doc 1335254 各基板而重複移動不到幾百之作業之際,油耗盡時其 滑動部分會消耗磨損,就控制面之精密度而言,短時間上 會喪失其不可或缺的高流暢度反應,因此終究不具實用 性0 況且’近年來基板之尺寸有漸趨大型化的現象。甚至也 有單邊長度超過1000 mm的基板出現,但,即使基板尺寸 趨向大型化,由於對基板進行對位時所要求的精密度卻與 小型基板相同,即使是單邊長度達1000 mm以上之大型基 板,於對基板進行對位之時,其朝ΧΥΘ方向之移動量,也 不會超過幾百μιη。 也因此,欲將單邊長度達1〇〇〇 mm以上之大型基板朝 ΧΥΘ方向調整移動之裝置也隨著基板大小而變大,其裝置 也變大’而有在完成狀態下無法利用卡車裝載的情形發 生。 在此情況下,如果不分解機 運送費用變高,且出貨時必須經過分解^貨時又必須再 加以對位,造成對位之精準度降低,完成對位又需花費不 少時間’以上幾點均是選定裝置時致命的缺點。 而,因上述ΧΥΘ座台構造頗大,隨 台也變重,製造成太、 體變大’座 其板二=Γ送成本變高。又,近幾年來隨著 基板之趨向大型化,整個裝置本身也變大,、. 問題便日趨嚴重。 ,上述所提及的 且在真空室之底端壁及和貫穿其間之 有蛇腹狀之彈性體等之彈性密封構件構件間,裝設 Γ維持真空室内保 96986*doc 1335254 持真空狀態。其要保持真空除了需花費成本之外,也因為 了提高其㈣程度’若於真空密封之表面緊密連接上移動 構件,則其抵抗負荷增大而調整移動時需要相#的力,因 此有需要輸出大的位置調整用之驅動源,其移動型態存在 許多限制的問題。 再者’於此狀態下’如上所述,$ 了對兩基板進行對 位,得以微米單位(micron)或亞微米(submicr〇n)單位調整 移動上述可動構件時’其彈性密封構件雖會暫時變形,但 調整完後便回復原狀。也就是說,於調整階段中,即使兩 基板正確的對位了’也會因其彈性密封構件具備有可恢復 變形前形狀之彈性力關係’使兩基板之對位可能會發生問 通,無法正確的對位完成。 而且’因真空室之整體無法分割而開閉之故,不僅對真 空室内移入或移出基板很困難’對真空室内的維護更為困 於本發明中,申請專利範圍第i項中所記載之發明,係 為一能不需利用χΥΘ座台,便能精準對位對基板進行對位 之方法。 申請㈣範圍第2項中所記載之發明’除了中請專利範 圍第1項中所記載之目的外’係、對可移動式上下兩方 板之-方’藉由簡單的構造而可朝ΧΥΘ方向調整地加以平 面支標。 申請專利範圍第3項中所記載之發明,除了申請專利範 圍第1項中所記載之目的外,係對可移動式的上下保持板 96986.doc ^35254 之一方,藉由簡單的構造而可順暢地朝χγθ方向調整地加 以平面支樓。 申β專利靶圍第4項中所記載之發明,除了申請專利範 圍第1項中所記載之目的外,更除去真空貫通構件。 申請專利範圍第5項中所記載之發明,除了申請專利範 圍第1、2或第3項中所記載之目的外,更將真空室設計成 簡潔型。 申月專利圍第6項中所記載之發明,除了申請專利範 第 2 3、4或第5項中所記載之目的外,可不增設真 空貝通構而U-簡單構造,調整兩基板間最適合對位 之間隔。 [解決課題之方法] 為了達成上述目#,本發明最大的特色係:為了調整兩 基板,於真空室内上下兩可移動之保持板中可動之一者之 保持板係以一「搖動連桿導引裝置」來支撐。 ^搖動連#導引裝置」,如後述之例可明瞭,其係指 一如鞦韆般之搖動連桿裝置。其本質上為一圓弧運動’,於 一。範圍内’以近似的實用上無問題之精準度來實現二次 疋平面導引(受轴)。與先前ΧΥΘ各自單獨轉動為主體之導 引裝置相1其具有較優越的反應與控制性能。此同一裝 置’將鞦韆倒置,由下朝上站立的型態裝置亦可實施。、 又’「搖動連桿導引裝置」中,除上述之外,也包含連 干之-部分可作彈性變形處理而實現二次元平面導引者。 且’此保持板之移動,相對應於此二次元平面導引,以 96986.doc 1335254 一次7L之三點變位移動凸輪加以實施最為適宜。 亦即,本發明中申請專利範圍第丨項所記載之發明,其 特徵係為··將上述搖動連桿導引裝置裝設於真空室的上方 或下方。設置於真空室上方時,將其搖動連桿導引裝置由 真空室頂端壁垂吊的方式呈現;設置於真空室下方時,則 由真空室底端壁由直立裝設搖動連桿導引裝置。1335254 • · IX. Description of the invention: _ [Technical field of the invention] The present invention relates to a flat panel display such as a liquid crystal display (LCD) or a plasma display panel (PDP). In the process, after the two substrates are aligned (adjusted) with respect to the ΧΥΘ direction, the substrates are overlapped and fixed, and then the gap between the two substrates is pressed to a predetermined distance by the air pressure difference between the inside and the outside of the upper and lower substrates. Substrate alignment device of the substrate machine. In particular, it relates to a substrate alignment device that can align a large substrate. Furthermore, there is a method in which two substrates which are bonded to each other in a vacuum chamber are respectively detachably held in the upper and lower holding plates and opposed to each other, and the two substrates are relatively opposed in a vacuum. Adjust the movement in the direction of the yaw to perform the substrate alignment device for the substrate alignment. [Prior Art] Conventionally, such a substrate alignment device is disposed inside a vacuum chamber of a side surface of an upper and lower substrate inlet and outlet, and is provided with an upper holding plate (upper abutment) and a lower holding plate (lower abutment), The through hole (opening portion) of the bottom end wall of the vacuum chamber allows the base of the lower holding plate to pass through, whereby the holding plate can be supported by the sill table, and the sill table is driven by The support base that the motor can move in the ΧΥ direction is formed by the slewing seat and the vacuum seal, and the slewing table can be rotated by the drive motor by the drive motor. The pedestals of the lower holding plates and the through holes of the vacuum chamber are hermetically bonded by an elastic sealing member such as a bellows-like elastic body. * (Refer to Patent Document 1) 96986.doc 1335254 and 'In order to be able to move or remove the upper and lower substrates arbitrarily, a vacuum chamber inside the opening can be arbitrarily closed on the side, and an upper holding plate (upper abutment) is provided. And the lower holding plate (lower abutment), and the plurality of through holes (first opening portions) opened at the bottom of the vacuum chamber are respectively inserted into the upper shaft (the first axis), and the elasticity is in the form of a bellows The sealing member is kept in airtight engagement, and the lower holding plate is connected to the shank table (moving abutment) by the shafts, and the lower holding plate can be arbitrarily adjusted and moved in the direction of χγθ in parallel with the joint surface of the two substrates. Is supported. After the required vacuum is reached in the vacuum chamber, the upper and lower holding plates can be brought close to each other by the moving device disposed in the direction of the vacuum chamber, and then the respective axes are moved by the movement of the χγθ table. And the lower holding plate, the two substrates are oppositely aligned in the direction of χγθ, and then the vacuum chamber is reduced to atmospheric pressure, and the two substrates are further pressed by the action of atmospheric pressure between the two substrates (refer to the patent document) 2) [Patent Document 1] JP-A-2001-305563 (pages 3, 4, 3, 6, and 7) [Patent Document 2] JP-A-2002-229042 (pages 3-6, 1 to 5) [Problem to be Solved by the Invention] However, the conventional substrate alignment device mentioned herein uses a 乂¥0 table to move the two substrates in the ΧΥΘ direction to be aligned. . However, today's general squatting table is basically designed to move in units of mm or more in the direction of χθθ, such as adjusting the position of the substrate, such as a slight movement amount of less than several hundred Mrn, which does not reach the rotating body of the rotary bearing. The amount of one rotation, each time the 969S6.doc 1335254 substrate is adjusted and the movement is less than a few hundred, the sliding part consumes wear when the oil is exhausted, and the precision of the control surface is lost in a short time. Its indispensable high fluency response, so it is not practical after all, and 'the size of the substrate has become larger and larger in recent years. Even a substrate with a single side length of more than 1000 mm appears. However, even if the substrate size tends to be large, the precision required for aligning the substrate is the same as that of the small substrate, even if the length of one side is 1000 mm or more. When the substrate is aligned with respect to the substrate, the amount of movement in the direction of the ridge does not exceed several hundred μm. Therefore, the device for adjusting the movement of the large substrate having a length of 1 〇〇〇 mm or more in the ΧΥΘ direction becomes larger as the substrate size increases, and the device becomes larger, and the truck cannot be loaded in the completed state. The situation happened. Under this circumstance, if the cost of the disassembler is high, and it must be disassembled when it is shipped, the alignment accuracy must be reduced, and it takes a lot of time to complete the alignment. Some points are fatal shortcomings when selecting a device. However, due to the large structure of the above-mentioned squatting platform, the weight of the slab is also increased, and the manufacturing is too large, and the body becomes large. Moreover, in recent years, as the substrate has become larger, the entire device itself has become larger, and the problem has become increasingly serious. The above-mentioned elastic sealing member between the bottom end wall of the vacuum chamber and the elastic body such as the bellows-like elastic body interposed therebetween is installed to maintain the vacuum state of the vacuum chamber 96986*doc 1335254. In addition to the cost of maintaining the vacuum, it is also because of the increase in the degree of 'four'. If the surface of the vacuum seal is tightly connected to the moving member, the force against the load is increased and the force required to adjust the movement is required. There is a problem with many restrictions on the type of movement of the drive source for outputting large position adjustments. Furthermore, in this state, as described above, the two substrates are aligned, and when the movable member is moved in micron or submicron (submicr〇n) units, the elastic sealing member temporarily Deformed, but after the adjustment, it will return to its original state. That is to say, in the adjustment phase, even if the two substrates are correctly aligned, 'the elastic sealing member has the elastic force relationship with the shape before the deformation can be recovered', so that the alignment of the two substrates may be caused, and the alignment may not be possible. The correct alignment is done. Moreover, it is difficult to move or remove the substrate in the vacuum chamber because the whole of the vacuum chamber cannot be opened and closed. The maintenance of the vacuum chamber is more difficult in the present invention, and the invention described in the scope of claim patent i, It is a method that can accurately align the substrate to the substrate without using the pedestal table. The invention described in the second item of the scope of the application (4) is in addition to the purpose described in the first item of the patent scope, and the square of the movable upper and lower panels can be squatted by a simple structure. The plane is adjusted in the direction of the adjustment. The invention described in the third paragraph of the patent application, in addition to the object described in the first item of the patent application, is one of the movable upper and lower holding plates 96986.doc^35254, which can be constructed by a simple structure. The flat branch is smoothly adjusted in the direction of χθθ. In the invention described in the fourth item of the patent application of the patent, the vacuum penetration member is removed in addition to the object described in the first paragraph of the patent application. In the invention described in the fifth aspect of the patent application, in addition to the objects described in the first, second or third aspect of the patent application, the vacuum chamber is designed to be compact. The invention described in the sixth paragraph of the Shenyue Patent Enclosure, except for the purpose described in the Patent Model No. 2, 4, or 5, may be added without a vacuum shell structure and a U-simple structure to adjust the most between the two substrates. Suitable for the spacing of the alignment. [Means for Solving the Problem] In order to achieve the above-mentioned object #, the biggest feature of the present invention is that in order to adjust the two substrates, one of the movable holding plates in the movable chambers of the upper and lower movable chambers in the vacuum chamber is a "swinging link guide". Guide device" to support. ^Shaking the #导装置", as will be explained later, it refers to the swinging linkage device as a swing. It is essentially a circular arc motion, in one. Within the range, the secondary 疋 plane guidance (receiving axis) is achieved with an approximate practically problem-free accuracy. It has superior reaction and control performance with the guiding device 1 which has been individually rotated as the main body. This same device can be implemented by inverting the swing and standing from the bottom up. Further, in the "rocking link guide device", in addition to the above, the continuous-part portion can be elastically deformed to realize the secondary element plane guide. And the movement of the holding plate corresponds to the second element plane guiding, and it is most suitable to implement a 7L three-point displacement moving cam with 96986.doc 1335254. That is, the invention described in the ninth aspect of the invention is characterized in that the rocking link guide is mounted above or below the vacuum chamber. When disposed above the vacuum chamber, the rocking rod guiding device is suspended from the top wall of the vacuum chamber; when disposed under the vacuum chamber, the rocking rod guiding device is installed by the bottom end wall of the vacuum chamber .

更詳盡而言,此為將上下兩片保持板的一方相對於另一 方’於兩基板保持平行狀態,可支撑其可任意朝ΧΥΘ方向 “移動之裝置。由上下兩保持板之—方朝頂端壁或底端 壁,設置-搖動連桿導引裝置,此搖動連桿導引裝置藉由 χγθ方向移動裝置,而朝ΧΥΘ方向搖動,因而使其上下兩 保持板的-方可相對於另一方,朝ΧΥΘ方向移動調整。 如申印專利範圍第2項中所記載之發明,其特徵係 將複數個如申請專利範圍第丨 叫寻扪靶圍第1項中所記載之搖動連桿導引 f置裝設於真空室的外部,支樓上保持板與下保持板。裝More specifically, this means that one of the upper and lower holding plates is kept parallel with respect to the other of the two substrates, and the device can be supported to move in any direction in the direction of the cymbal. The wall or the bottom end wall is provided with a rocking link guiding device which is moved in the ΧΥΘ direction by the χγθ direction moving device, so that the upper and lower holding plates are opposite to each other In the direction of the ΧΥΘ 移动 移动 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明f is installed outside the vacuum chamber, and the upper and lower holding plates are supported on the branch.

設於真Μ上方時’由真空室頂端壁立起大致呈平行之連 桿構件來切保持板;裝設於真空室下方時,⑽真空室 之底端壁㈣大致呈平行之連桿構㈣件來支撐保持板。 坪細而言’係於申請專利範圍第1項中所記載之發明裝 f中,加入下列構成:其上述搖動連桿導引裝置是由真空 至内部朝外部複數裝設之。各 端壁呈垂直方向裝設之大=真空室頂端壁或底 =分之連桿構成,再《無法朝XYe方向㈣之轴連結: •才干構件Μ及上下保持板之_方以達成本發明之目標。 96986.doc ^35254 如申請專利範圍第3項中所記載之發明,其特徵係為: 將申請專利範圍第1項中所記載之搖動連桿導引裝置裝設 於較真空室頂端壁上方或較底端壁下方之處。裝設於真空 室上方時,由位於較真空室頂端壁上方之基架垂吊,來支 撐上保持板;裝設於真空室下方時,則由位於較真空室底 缒壁下方之基架立起支柱,來支撐下保持板。 詳細而言,於申請專利範圍第丨項中所記載之發明裝置 中,加入下列構成:上述搖動連桿導引裝置係包含由上下 兩保持板之一方起貫通與其相對的真空室頂端壁或底端 壁,而向基架分別垂直地裝設之大致呈平行的支柱,將此 些支柱構成為能任意朝ΧΥΘ方向移動。 ,申請專利範圍第4項中所記載之發明,係於申請專利 範圍第1、2或第3項中所記載的裝置中,加入下列構成: 於與上述真空室内側或真空室内部相同氣氛之空間内裝* 一™向移動裝置’使上下保持板的-方或與搖動連; 導引裝置作直接連接之構造。 伙如申請專利範圍第5項中所記載之發明,係於申請專利 I已圍第1、2或第3項中所今哉认壯Μ山 乐貝〒所5己载的裝置中,加人下列構成: :上述真空室之外側裝設一州方向移動裝[其特徵 係:透過搖動連桿導引裝置,將此朝謂 上下兩方保持板之一方間接連桿之構造。 與 如申請專利範圍第6項中所 \ 中所5己載之發明,係於申請專利 構成:於上述直空室内…。載裝置中,加入下列 一至内或包圍真空室之周壁内部或支柱 96986.doc 1335254 上,裝設一與上保持板連動之基板間隔調整裝置,藉由此 基板間隔調整裝置,上保持板相對於下保持板,可使其於 z方向平行移動。 [發明效果] 如同上述說明’本案之中請專利範圍第丨項所記載的發 . 明中,係將上下一保持板中之任一板,於對於另一方能保. 持兩基板平订之狀態下,能自由調整朝χγθ方向移動而支 持之裝f 一係於由上下保持板之一方起向真空室的頂端 壁或底端壁設-搖動連桿導引裝置,此搖動連桿導引裝置 # 藉由朝ΧΥΘ方向移動裝置,朝ΧΥΘ方向搖動之故,上下保 持板之-方對於另一方朝ΧΥΘ方向調整移動,此上基板與 下基板可相互朝ΧΥΘ方向移動進行對位。 因此,無需使用χΥΘ座台,亦能精準的對兩基板進行對 位。 結果’與利用ΧΥΘ心作為ΧΥΘ方向移動之f知處理方 法相比’因為不需要ΧΥΘ座台,較習知ΧΥΘ方向移動之裝 乃可力乂J型化,也因此,對於得反覆移動調整各基&amp; # 作業之際,可期待將不會再發生油耗盡時產生之滑動部分 之磨損,能提升其耐久性能效果,且不僅其製造成本可降 低真工至内之維護也變得容易許多,且,即使基板尺寸When it is placed above the real crucible, 'the substantially parallel connecting rod member is raised from the top wall of the vacuum chamber to cut the holding plate; when installed under the vacuum chamber, (10) the bottom end wall of the vacuum chamber (4) is substantially parallel to the connecting rod (four) pieces To support the retaining plate. In the invention package f described in the first item of the patent application, the following configuration is added: the above-mentioned rocking link guiding device is installed from a vacuum to an internal to the outside. The end walls are vertically arranged to be large = the top end of the vacuum chamber or the bottom=minute link, and then "cannot be connected to the axis of the XYe direction (4): • the member Μ and the upper and lower holding plates to achieve the invention The goal. 96986.doc </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> </ RTI> Below the bottom end wall. When installed above the vacuum chamber, the upper retaining plate is suspended by a base frame located above the top wall of the vacuum chamber; when installed under the vacuum chamber, the base frame is located below the bottom wall of the vacuum chamber. A pillar is provided to support the lower retaining plate. In detail, in the invention device described in the ninth application, the following configuration is adopted: the above-mentioned rocking link guiding device includes a vacuum chamber top wall or bottom which is opposed to one another by one of the upper and lower holding plates The end walls are substantially parallel pillars that are vertically mounted to the base frame, and the pillars are configured to be movable in any direction. The invention described in claim 4 is the apparatus described in the first, second or third aspect of the patent application, and the following constitution is added: the same atmosphere as the vacuum chamber interior or the vacuum chamber interior The space is filled with * a TM to the mobile device 'to make the upper and lower holding plates - or with the shaking; the guiding device is directly connected. The application of the invention described in item 5 of the patent application is based on the application of patent I, which has been included in the first, second or third item of this article. The following structure is as follows: The outer side of the vacuum chamber is provided with a state-direction moving device [characteristics: through the rocking link guiding device, the structure of the indirect connecting rod of one of the upper and lower holding plates is referred to. And the invention contained in the fifth paragraph of the scope of the patent application, is applied for the patent: in the above-mentioned direct space indoor... In the carrier device, the following one or the inner wall surrounding the vacuum chamber or the pillar 96986.doc 1335254 is added, and a substrate spacing adjusting device is connected with the upper holding plate, whereby the upper holding plate is opposite to the upper holding plate The lower holding plate allows it to move in parallel in the z direction. [Effect of the Invention] As described in the above description, in the case of the present invention, the one of the upper and lower holding plates can be secured to the other side. In the state, the support can be freely adjusted to move in the direction of χθθ, and the support f is attached to the top end wall or the bottom end wall of the vacuum chamber from one of the upper and lower holding plates, and the rocking link guide is guided. The device # moves the device in the direction of the cymbal, and shakes in the direction of the cymbal, so that the upper and lower holding plates are adjusted in the direction of the other side, and the upper substrate and the lower substrate are moved in the yaw direction to be aligned. Therefore, it is possible to accurately align the two substrates without using the cymbal stand. The result 'Compared with the f-processing method using the ΧΥΘ heart as the ΧΥΘ direction movement' because there is no need to squat the pedestal, the device that moves in the direction of the ΧΥΘ 乃 can be J-shaped, and therefore, for the repetitive movement adjustment At the time of the operation of the base &amp;#, it is expected that the wear of the sliding portion which is generated when the oil is exhausted will not occur again, and the durability effect can be improved, and the maintenance cost can be reduced, and the maintenance is also easy. And even if the substrate size

漸趨大型化,1奘菩敕胁L π W 〃、衷置整體也能趨於簡潔、小型化,其所設 置t空間變小’不僅運送成本可降低’更可有效率的免除 =貨時必須先分解,到貨時得再重新對位等等繁雜的作業 969S6.doc -13- 1335254 再者,伴隨基板之大型化,儘營 大&amp; m❹士 相對於真空室内之貨品 大d重增加,因對位之控制性能提升緣故,即使真空室 内的頂端壁或底端壁因大氣壓之荷重而變形,也不會影響 其對基板進行對位之精準度。 =申請專利範圍第2項之發明,除㈣請專利範圍第 所述之發明效果外,另由真空室内部朝外部裝設複數個, 各於真空室頂端壁或底端壁向垂直方向裝設大致呈平行的 連桿構件以及連結其各頂端部之連結構件所構成,再藉由 無法向ΧΥΘ方向變形的轴連結此連結構件與上下保持板之 H此即使可任意搖動的構件以及連桿構件朝抓方 向移動,也因轴本身具有之剛性,其上下兩方保持板之一 方與真空室之頂端壁及底端壁間的間隔乃可保持一定距 離’且’因為不互相碰觸所以不會發生抵抗滑動之情況。 。。因此’其可移動之上下兩保持板的一方,便可藉由此簡 單構造,於支撐平面上調整朝ΧΥΘ方向之移動。 其結果,因無任何伴隨調整朝ΧΥΘ方向之移動而摩擦接 觸的部分存在,不會因接觸摩擦產生灰塵;故,對兩基板 進行對位日夺,可防止因灰塵之發生而對兩基板產&amp;不良之 影響。 如申請專利範圍第3項之發明中,除如申請專利範圍第1 項中所備有的發明效果外,其搖動連桿導引裝置是由上下 保持板之一方起,貫通與其相對的真空室頂端壁或底端 壁,而向基架各於垂直方向裝設之大致呈平行的支柱所構 成。藉由設置此些支柱使其能任意朝χγθ方向移動其上 96986.doc 14 !335254 下保持板的一方以及真空室之頂端壁或底端壁,完全不受 大氣壓力之影響,也因其調整移動時不會碰觸到,因此不 會發生滑動抵抗。 、因此,可藉由此簡單構造,順暢的朝χγθ方向調整,而 以平面支持可移動之上下保持板的一方。 結果’除了可將朝χΥΘ方向移動之裝置移動能源小型化 之外,因無任何伴隨調整ΧΥΘ方向移動之摩擦接觸部分, 故不會發生因接觸摩擦所產生之灰塵,於對兩基板進行對 位時’可防止因灰塵之發生而對兩基板產生不良之影響。 如申請專利範圍第4項之發明中,除如申請專利範圍第1 項中所備有的發明效果之外,於真空室内側或與真空室内 部相同氣氛之空間内裝設一 χγθ方向移動裝置以及搖動連 桿導引裝置。藉由使此χΥΘ方向移動裝置與上下 一方或搖動連桿導引裝置直接連動,可藉著内部驅動,來 進行基板間對位之作業。 因此’可不需再使用真空貫穿構件。 其結果,與於真空室之底端壁及貫穿其之驅動構件之間 裝設有蛇腹狀之彈性體等之彈性密封構件而維持真空室内 真空狀態之習知構造相比較,因不需要彈性密封構件來封 閉貫穿真空構件,故除了可降低真空隔離所需花費成本, 也因為不需要調整移動所需之相當大的力量,其驅動型態 便無特別的限制。 ~ 且’為了對兩基板進行對位’即使僅以微米單位 (micron)或亞微米(submicron)單位調整移動,也不 調 96986.doc 15 1335254 .m ^14㈣構‘件變形而回復變形前形狀造成基板 對位之問題發生’可正確無誤的進行對位作業。 外如申請專利範圍第5項之發明中,❺了如巾請專利範圍 弟1、2或3中所備有的發明效果之外,於真空室之外側裝 置上ΧΥΘ方向移動裝置,透過搖動連桿導導引裝置,使 方向移動裝置與上下兩方保持板之__方間接連動起 來,藉著外部驅動源對基板進行對位。 因此,便可將真空室設計成簡潔小型。 如申請專㈣圍第6項中,除了如申請專利範圍第卜 2、3、4或第5項中所備有的發明效果之外,於真空室内或 包圍真空室之周壁内部或支柱上,裝設一與上保持板連動 之基板間隔調整裝置,#由此基板間隔調整裝置,可使上 保持板相對於下保持板朝z方向平行移動,藉此,可修正 隨著ΧΥΘ方向移動基板六與8間間隔稍微變化之份量。 也因此,不需再增設真空貫穿構件,只需簡單構造,便 可調整為基板對位時最適的間隔。 【實施方式】 本發明中,備有基板對位裝置D之基板貼合機,如圖1〜6 所示’於上保持板1及下保持板2的背後,橫向裝設上與其 大致呈平行之各可任意朝Z方向移動之相對頂端壁3及底端 壁4°藉由此頂端壁3及底端壁4之相對接近移動,兩者間 形成一可包圍上下兩保持板1,2之可自由於上下方向分割 之真空室S。此真空室S中之真空度達到所要求之一定程度 時’上述基板對位裝置D之ΧΥΘ方向移動裝置5開始動作, 96986.doc -16- 1335254 將兩枚玻璃製之基板A和B相對地向χγθ方向移動調整,依 序進行初步對位和精密對位作業來對(調整alignment)兩基 板A與B進行對位。 更詳盡而言’係於頂端壁3之下方外圍及底端壁4之上方 外圍各自一體成形或一體化設置環狀的周圍壁3&amp;與4a。由 此頂端壁3及周圍壁3a所圍繞而成的真空室s之内部上方, 架設一上保持板1,同時,也於底端壁4及其周圍牆壁乜所 圍繞而成的真空室S之内部下方,架設一下保持板2。藉由 起重器4構成之升降裝置11所進行之伸長作業,將這些頂 端壁3及周圍壁3a和底端壁4及其周圍壁4a拉離z方向,於 上下保持板1,2上裝配基板a與B後’再藉此升降裝置“ 之紐縮作動,頂端壁3朝下動而與上述圓環狀周圍壁“與 4a密接’進而形成一區隔的真空室s。 再利用吸氣裝置12之作用,將此真空室s内之空氣抽 出,達到所要求的真空度後,再藉由χγθ方向移動裝置 5,將上保持板1以及下保持板2之任一方相對於他方,朝 χυθ方向作調整移動。再依序對設置於此上保持板1之保 持面上可任意拆裝支撐的上基板Α與設' 保持面上可任意拆裝支撑之上基板B,進行初下:=板: 密對位作業。 對位元了後’再猎由上保持板1之彳早技品A ,— 。了双K保符面噴出氮氣氣 體,將該保持面與上基板A強制分離開來,瞬間愿上下美 板3上的圓環狀接著劑C,使兩方相密封接合。 土 其後,使。及氣裝置作動,同時並利用後述之吸著裝置 96986.doc 1335254 lb和2b之穿透孔,對真,空室S内供給空氣或氮氣,或是利 用任一方之作用,將該真空室S内的空氣回復至一般大氣 壓,藉由兩基板A,B之内外所產生的氣壓差來均等加 壓,液晶於封入之狀態,被壓擠至所需之間隔,完成所需 製品。 以下,藉由圖式來加以說明本發明之各實施例。 [實施例1 ] 於實施例1令,如圖丨及圖2所示,將上述真空室3之底端 壁4固定裝設於框狀之架台13a上,保持支撐固定’相對 的,再藉由上述升降裝置丨丨之伸縮作用,將頂端壁3朝2方 向來回移動(閉合動作),使其真空室s之内部除了裝設有 上述謂方向移動裝置5之凸輪5a之外,再將與此凸輪h 卡合的抵接部2e成凹狀設置於下保持板2底部。於密閉真 空室S内,T保持板2之底面抵接部分的2e,藉著凸輪^之 移動,朝ΧΥΘ水平方向調整移動(壓動),也因此,兩基板 八與3得以保持平行狀態,依序進行初步對位和精密對位 作業》Gradually increasing size, 1 奘 敕 敕 L L π 〃 〃 衷 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , It must be decomposed first, and the work must be re-aligned when it arrives. 969S6.doc -13- 1335254 Furthermore, with the enlargement of the substrate, the large &amp; m gentleman increases the weight of the goods relative to the vacuum chamber. Due to the improved control performance of the alignment, even if the top or bottom wall of the vacuum chamber is deformed due to the atmospheric pressure, it will not affect the accuracy of the alignment of the substrate. = Invented in the invention of claim 2, in addition to (4) the effect of the invention described in the scope of the patent, the vacuum chamber is provided with a plurality of externally facing portions, and each of the vacuum chambers is provided with a top wall or a bottom wall in a vertical direction. The substantially parallel connecting rod member and the connecting member connecting the respective distal end portions thereof are connected to the connecting member and the upper and lower holding plates by a shaft that cannot be deformed in the weir direction, and even the rocking member and the connecting rod member can be arbitrarily rocked. Moving in the direction of grasping, and because of the rigidity of the shaft itself, the distance between one of the upper and lower holding plates and the top wall and the bottom end wall of the vacuum chamber can be kept at a certain distance 'and' because they do not touch each other, so Resistance slippage occurs. . . Therefore, the one of the upper and lower holding plates can be moved, and the movement in the direction of the yaw can be adjusted on the support plane by the simple structure. As a result, there is no frictional contact with the movement of the yaw direction, and dust is not generated by the contact friction. Therefore, the alignment of the two substrates can prevent the occurrence of dust on both substrates. &amp; bad effects. In the invention of claim 3, in addition to the effects of the invention as set forth in claim 1, the rocking link guiding device is formed by one of the upper and lower holding plates and penetrates the vacuum chamber opposite thereto. The top or bottom end wall is formed by substantially parallel struts that are mounted in the vertical direction to the pedestal. By providing these pillars, it is possible to move the upper side of the holding plate of the 96986.doc 14 !335254 and the top or bottom end wall of the vacuum chamber in the direction of χγθ, completely unaffected by atmospheric pressure, and also adjusted by It does not touch when moving, so there is no sliding resistance. Therefore, with this simple configuration, it is possible to smoothly adjust the direction of the χθθ, and to support the side of the movable upper and lower holding plates in a plane. As a result, in addition to the miniaturization of the mobile energy source that can move the direction of the yaw, since there is no frictional contact portion that moves in the direction of the adjustment ,, dust generated by the contact friction does not occur, and the two substrates are aligned. At the time, it can prevent the adverse effects on the two substrates due to the occurrence of dust. In the invention of claim 4, in addition to the effects of the invention as set forth in the first item of the patent application, a χθθ direction moving device is installed in the space inside the vacuum chamber or in the same atmosphere as the inside of the vacuum chamber. And rocking the link guide. By directly interlocking the slanting direction moving device with the upper and lower sides or the rocking link guide device, the work between the substrates can be performed by internal driving. Therefore, it is no longer necessary to use a vacuum penetrating member. As a result, compared with the conventional structure in which the elastic sealing member such as the bellows-like elastic body is provided between the bottom end wall of the vacuum chamber and the driving member penetrating the same, and the vacuum state in the vacuum chamber is maintained, the elastic sealing is not required. The member is closed to penetrate the vacuum member, so that in addition to reducing the cost of vacuum isolation, and because there is no need to adjust the considerable force required for the movement, the drive type is not particularly limited. ~ and 'in order to align the two substrates' even if the movement is only adjusted in micron or submicron units, it does not adjust the shape of the 96986.doc 15 1335254 .m ^14 (four) structure to restore the deformation before deformation The problem of the substrate alignment occurs 'the correct operation can be performed correctly. In addition, as in the invention of claim 5, in addition to the invention effect provided in the patent scope range 1, 2 or 3, the device is moved in the direction of the device on the outside of the vacuum chamber, and the device is shaken. The rod guiding guide device indirectly aligns the direction moving device with the __ side of the upper and lower holding plates, and aligns the substrate by an external driving source. Therefore, the vacuum chamber can be designed to be compact and small. In the sixth item of the application (4), in addition to the effects of the invention provided in the scope of the patent application, paragraphs 2, 3, 4 or 5, in the vacuum chamber or in the inner wall or on the pillar surrounding the vacuum chamber, A substrate spacing adjusting device is provided for interlocking with the upper holding plate. The substrate spacing adjusting device can move the upper holding plate parallel to the lower holding plate in the z direction, thereby correcting the movement of the substrate with the ΧΥΘ direction. A small amount of variation from the interval between the eight. Therefore, it is not necessary to add a vacuum penetrating member, and the simple configuration can be adjusted to the optimum interval for the substrate alignment. [Embodiment] In the present invention, a substrate bonding machine having a substrate alignment device D is provided, as shown in Figs. 1 to 6, behind the upper holding plate 1 and the lower holding plate 2, and is laterally mounted substantially parallel thereto. The opposite end wall 3 and the bottom end wall 4 which can be arbitrarily moved in the Z direction are moved by the relative proximity of the top end wall 3 and the bottom end wall 4, and a pair of upper and lower holding plates 1 and 2 are formed therebetween. The vacuum chamber S can be freely divided in the up and down direction. When the degree of vacuum in the vacuum chamber S reaches a desired level, the moving device 5 of the substrate alignment device D starts to operate, and 96986.doc -16-1335254 is opposite to the substrates A and B made of two glass plates. The adjustment is moved in the direction of χγθ, and the preliminary alignment and the precision alignment operation are sequentially performed to align the two substrates A and B. More specifically, the peripheral walls 3&amp; and 4a are integrally formed or integrally formed on the outer periphery of the top end wall 3 and above the bottom end wall 4. Thereby, an upper holding plate 1 is placed above the inside of the vacuum chamber s surrounded by the top wall 3 and the surrounding wall 3a, and at the same time, the vacuum chamber S is also formed around the bottom end wall 4 and its surrounding wall. Below the inside, erect the holding plate 2. The top end wall 3 and the peripheral wall 3a and the bottom end wall 4 and the surrounding wall 4a thereof are pulled away from the z direction by the elongating operation by the lifting device 11 constituted by the jack 4, and are assembled on the upper and lower holding plates 1, 2 After the substrates a and B are rearwardly retracted by the lifting device, the top end wall 3 is moved downward to be in close contact with the annular peripheral wall "4a" to form a vacuum chamber s. Then, by using the function of the getter device 12, the air in the vacuum chamber s is extracted to reach the required degree of vacuum, and then the upper holding plate 1 and the lower holding plate 2 are opposed by the χγθ direction moving device 5. On the other side, make adjustment movements in the direction of χυθ. Further, the upper substrate Α and the holding surface which are arbitrarily detachably supported on the holding surface of the upper holding plate 1 are arbitrarily detachably supported and supported on the upper substrate B, and the initial substrate: = plate: dense alignment operation. After the bit has been re-hunted by the top of the board 1 early skill A, -. The double K-protection surface is sprayed with a nitrogen gas, and the holding surface is forcibly separated from the upper substrate A, and the annular adhesive C on the upper and lower plates 3 is instantaneously joined to seal the two sides. After that, make it. The gas device is actuated, and at the same time, the air or nitrogen gas is supplied to the true and empty chambers S by using the penetrating holes of the absorbing devices 96986.doc 1335254 lb and 2b, which will be described later, or the vacuum chamber S is utilized by either side. The air inside returns to the normal atmospheric pressure, and is uniformly pressurized by the difference in air pressure generated between the inside and the outside of the two substrates A and B. The liquid crystal is squeezed to a desired interval in a sealed state to complete the desired product. Hereinafter, various embodiments of the present invention will be described by way of the drawings. [Embodiment 1] In the first embodiment, as shown in Fig. 2 and Fig. 2, the bottom end wall 4 of the vacuum chamber 3 is fixedly mounted on the frame-like gantry 13a, and the support is fixed 'opposite, and then borrowed. The top end wall 3 is moved back and forth in the two directions by the expansion and contraction of the lifting device ( (closing operation), so that the inside of the vacuum chamber s is replaced by the cam 5a of the above-mentioned directional moving device 5 The abutting portion 2e to which the cam h is engaged is disposed in a concave shape at the bottom of the lower holding plate 2. In the sealed vacuum chamber S, the 2e of the bottom surface abutting portion of the T holding plate 2 is moved (pressed) in the horizontal direction by the movement of the cam, so that the two substrates 8 and 3 are kept in parallel. Perform preliminary alignment and precise alignment operations in sequence

上述上保持板1以及下保持板2,係為如金屬或陶瓷等剛 度高’不易歪曲(彎曲)變形之厚度之呈平板狀之穩定盤狀 物。於其相對面上,各裝設有可保持兩基板八㈣固定不 ^之靜電吸者板1&amp;與23裝置’再增設於大氣中可輔助保持 '、吸著力之吸著裝置1b與2卜甚至,為了與搬送基板之機 盗人(無圖示)的搬運作業能更順暢,複數裝架上反覆朝Z 向移動,保持吸著力之升降機槽裝置(lift pin)le、2。更 ^6986.dot -18- χ335254 保持板1,可將下保持,板2定位於不朝χγθ方向移動之位 置,將此作為一單位’於下保持板2與其底端壁4之分離位 置上’裝設複數個。 本發明之實施例中,上述搖動連桿導引裝置6各包含由 真空室S底端壁4起分別朝垂直方向(ζ方向)垂吊之大致平 仃連桿構件6b,與連結其各端部之連結構件6c,以無法朝 ΧΥΘ方向變形之朝向垂直向擁有強大剛性之軸以將此連結 構件6c與下保持板2連結起來。利用上述朝χγθ方向移動 裝置5 ’將此連桿構件6b朝ΧΥΘ方向移動,且保持其搖動 之角度。 於圖式例中,上述軸6a,係以貫通由下保持板2底端壁4 之通孔4b朝ΧΥΘ方向移動之垂吊裝置;而上述連桿構件 6b,則是由底端壁4之通孔4b的周圍下面起包圍該軸以之 裝置,例如可架設4支,將這些連桿構件6b各自朝其軸方 向分割,相互利用如球型接頭(ball j〇int)等彎曲部6(j相結 合’使之可朝ΧΥΘ方向變形移動。 亦即’將由軸構成之軸6a ’透過可朝χγθ方向搖動之連 桿構件6b以及圓板狀之連桿構件心,可如鞦韆般任意搖動 支撐著。 且,上述底端壁4中開設之通孔4b與軸6a間之空隙,藉 由例如敵皮膜(bellows)等蛇腹狀之彈性體等所構成之彈性 密封構件6e加以覆蓋,將可朝χΥΘ方向移動之條件下貫通 密封之,或利用上述搖動連桿導引裝置6之周圍作為 壁(無圖示),各自附加於真空室S之内部以及和其相同之 96986.doc 1335254 空間内的話’就不需使用彈性密封構件6e來密封了。 另外,關於上述搖動連桿導引裝置6,也可與上述之構 造相反,可將中心軸6a形成為可朝χγθ方向自由搖動,或 將連接構件6b形成為Ζ方向剛性強且不偏向χγθ方向。作 為可任意朝謂方向搖動之構造,係不使用球節等f曲部 6a’而使用如可彈性㈣的柱子或金屬線㈣性構件,或 將軸6a或連桿6b之一部分或整體以可彈性變形之材料來製 作’將連桿構件6b整體以可彈性變形之材料製成圓筒狀, 也可配置圖式例中以外的構造。 且,例如將上述搖動連桿導引裝置6,如圖2所示,於下 保持板2以及底端壁4之四角落各配置一組,總計架設4 組。伴隨基板大小之漸趨大型化,只要不妨礙到上述朝 ΧΥΘ方向移動裝置5或升降機槽(lift pin)2c之配置,也可架 設5組以上。 另一方面,並設置與上述上下保持板1,2至少一方連 動,一邊保持真空室S内之真空狀態,一邊使其上下保持 板1,2相對地朝Z方向平行移動之基板間隔調整裝置7。 圖式例中,於由各搖動連桿導引裝置6之軸所構成的中 心構件6a之上下途中,各自裝設朝z方向伸縮移動之基板 間隔調整裝置7。利用這些基板間隔調整裝置7,將下保持 板2相對於其底端壁4,朝z方向平行移動。 各基板間隔調整裝置7,係為裝設於中心構件6a之中間 位置’例如線性促動器(actuat〇r)或伸縮汽缸等之驅動體。 於設定兩基板A與B前,考慮兩基板a,3之厚度平衡等變 96986.doc -22- 1335254 化因素,藉由將各驅動,體分別拉長,而設定使 1,2保持平行之狀態。 卜保持板 隨著進行初步對位及精密對位作業之進行,盆 _間隔改變,且搖動連桿導引裝置6之周圍構件^ = :朝州方向移動,下保持板2及底端壁4之間的間隔僅; ^長變短之部分’而維持下保持板2與其底端壁4之 設定的間隔。 s坏The upper holding plate 1 and the lower holding plate 2 are stable flat plates having a flat plate shape such as a metal or ceramic having a high rigidity and a thickness which is not easily bent (bent). On the opposite side, each of the electrostatic absorbing panels 1 &amp; and 23 devices that can hold the two substrates eight (four) are fixed, and the absorbing device 1b and 2 absorbing the suction force in the atmosphere In addition, in order to make the handling work of the pirate (not shown) moving the substrate smoother, the plurality of mounts are repeatedly moved in the Z direction, and the lift pins l and 2 are held by the suction force. More ^6986.dot -18- χ335254 Hold the plate 1, which can be held down, and the plate 2 is positioned at a position that does not move in the direction of χγθ, which is taken as a unit 'on the separation position of the lower holding plate 2 from the bottom end wall 4 thereof. 'Install a plurality. In the embodiment of the present invention, the rocking link guiding devices 6 each include a substantially flat connecting rod member 6b which is suspended from the bottom end wall 4 of the vacuum chamber S in a vertical direction (ζ direction), and is connected to each end thereof. The connecting member 6c of the portion is connected to the lower holding plate 2 by a shaft having a strong rigidity so as not to be deformed in the direction of the weir. The link member 6b is moved in the ΧΥΘ direction by the above-described χ θ θ direction moving means 5', and the angle at which it is shaken is maintained. In the illustrated example, the shaft 6a is a hanging device that passes through the through hole 4b of the bottom end wall 4 of the lower holding plate 2 in the direction of the weir; and the link member 6b is formed by the bottom end wall 4 The lower side of the through hole 4b serves as a means for surrounding the shaft. For example, four rods can be erected, and the link members 6b are respectively divided in the axial direction thereof, and the curved portion 6 such as a ball joint is used for each other ( j is combined with 'to make it move in the direction of the 。. That is, 'the shaft 6a' composed of the shaft can be arbitrarily shaken like a swing through the link member 6b which can rock in the direction of χγθ and the member of the disk-shaped link member Further, the gap between the through hole 4b and the shaft 6a formed in the bottom end wall 4 is covered by an elastic sealing member 6e made of, for example, a bellows-like elastic body such as a bellows. Passing through the seal under the condition of moving in the direction of the yaw, or using the periphery of the oscillating connecting rod guide 6 as a wall (not shown), each of which is attached to the inside of the vacuum chamber S and the same 96986.doc 1335254 space. If you don't need to use a flexible seal Further, with respect to the above-described rocking link guide device 6, the central axis 6a may be formed to be freely rockable in the direction of χγθ, or the connecting member 6b may be formed to be rigid in the Ζ direction, as opposed to the above-described configuration. Strong and unbiased χγθ direction. As a structure that can be arbitrarily oscillated in the forward direction, a column or metal wire (four) member such as an elastic (four) or a shaft 6a or a connecting rod is used without using the f-curved portion 6a' such as a ball joint. One part or the whole of 6b is made of an elastically deformable material. 'The entire link member 6b is made of a material that is elastically deformable in a cylindrical shape, and a configuration other than that in the drawings can be arranged. And, for example, the above-mentioned shaking connection As shown in FIG. 2, the rod guiding device 6 is disposed in each of four corners of the lower holding plate 2 and the bottom end wall 4, and a total of four sets are arranged. As the size of the substrate is gradually increased, as long as the above-mentioned The arrangement of the slanting direction moving device 5 or the lift pin 2c may be set to five or more. On the other hand, the vacuum state in the vacuum chamber S is maintained while being interlocked with at least one of the upper and lower holding plates 1 and 2 The substrate spacing adjusting device 7 that moves the upper and lower holding plates 1 and 2 in parallel in the Z direction. In the illustrated example, on the lower side of the center member 6a formed by the shafts of the respective rocking link guiding devices 6, The substrate spacing adjusting device 7 that is telescopically moved in the z direction is attached to each other. The lower holding plate 2 is moved in parallel with respect to the bottom end wall 4 in the z direction by the substrate spacing adjusting device 7. Each of the substrate spacing adjusting devices 7 is It is a driving body installed in the middle position of the center member 6a, such as a linear actuator or a telescopic cylinder. Before setting the two substrates A and B, consider the thickness balance of the two substrates a, 3, etc. 96986 .doc -22- 1335254 The factor is set to keep 1, 2 in parallel by elongating each drive and body. After the preliminary alignment and precision alignment work is performed, the basin_interval changes, and the surrounding members of the rocking link guiding device 6 are moved in the direction of the state, and the lower holding plate 2 and the bottom end wall 4 are moved. The interval between them is only "the length of the shorter portion" while maintaining the set spacing of the lower holding plate 2 and its bottom end wall 4. s bad

友二丞板八興13間之間隔加以詳細說明,從真空室S中將 现:王抽出下’上基板八與下基板B上之圓環狀接著劑C 液晶保持完全不接觸,之間的間隔大約為1 mm〜2 : 初步對位作業前’其最小值大約為保持上基板A不盘圓; ^妾著劑C接觸之約為〇‘5 mm為理想;而於精密對位作&lt; ?其最小值大約為保持上基板A可與圓環狀接著劑 圓周方向°卩分接觸,而不與下基板B接觸之約〇 mm〜0.2 mm距離程度為較佳者。 再者’就此基板對位裝置的動作加以說明。The interval between the 13th and the 8th floor of the friend's second board is described in detail. From the vacuum chamber S, the king will draw out the upper substrate eight and the annular adhesive C liquid crystal on the lower substrate B remains completely out of contact with each other. The interval is about 1 mm~2: Before the initial alignment operation, the minimum value is about keeping the upper substrate A not rounded; ^ the contact of the sputum C is about 〇'5 mm is ideal; and the precision alignment is for &lt; The minimum value is about to keep the upper substrate A in contact with the circumferential direction of the annular adhesive, and the distance from the lower substrate B is preferably about 〜 mm to 0.2 mm. Furthermore, the operation of the substrate alignment device will be described.

-首^ ’密f才1之真空室S達到所需之真空程度後,如圖… 示,藉由基板間隔調整裝置7之動作,將下保持板2升高, 設定其上下基板A,B間之間隔’於初步對位作業時最小 約接近至0.5 mm程度,而於精密對位時,則更縮小至〇^ mm〜0·2 mm程度’於此初步及精密對位作業階段兩基板 A與B所顯示之記號,以由顯微鏡及照相機所構成之檢測 器(無圖示)測定而輸出資料,再據此個別地使複數之χγθ 方向移動裝置5動作。 96986.doc -23· 1335254 各ΧΥΘ方向移動裝置·5,藉由其對位驅動源5b之迴轉作 •用以X方向凸輪5a以及y方向凸輪5&amp;,將下保持板2之底 •面之抵接部2e相對於上保持板丨,朝ΧΥΘ方向調整移動(壓 動)藉此兩基板Α與Β可依序進行初步對位和精密對位 作業。 八、.。果基板對位裝置之整體XY不僅可小型簡潔化, 亦可微細地作確實調整,精度準確的施行對位作業。 再者’於本發明實施例中’藉由將下保持板2之抵接部- After the first vacuum chamber S reaches the required vacuum level, as shown in the figure, the lower holding plate 2 is raised by the operation of the substrate spacing adjusting device 7, and the upper and lower substrates A, B are set. The interval between the two is approximately 0.5 mm in the initial alignment operation, and is reduced to 〇^ mm~0·2 mm in the precision alignment. Two substrates in this preliminary and precision alignment stage The symbols displayed by A and B are measured by a detector (not shown) composed of a microscope and a camera, and data is output, and the plural χ θ θ direction moving device 5 is individually operated accordingly. 96986.doc -23· 1335254 Each of the ΧΥΘ direction moving devices·5, by the rotation of the aligning drive source 5b, for the X-direction cam 5a and the y-direction cam 5&amp;, the bottom plate of the lower holding plate 2 The abutting portion 2e is moved (pressed) in the ΧΥΘ direction with respect to the upper holding plate 借此, whereby the two substrates Α and Β can be sequentially aligned and precisely aligned. Eight,.. The overall XY of the substrate alignment device can be compacted and succinct, and can be finely adjusted and accurately aligned. Further, in the embodiment of the present invention, by abutting the lower holding plate 2

2e及凸輪5a裝置於密閉真空室⑽,伴隨對基板a,b進行 對位之ΧΥΘ方向調整移動作業於真空室S内施行之故, 聊方向之移㈣置5不需貫穿真空以,也能流暢的進行 調整移動作業。The 2e and the cam 5a are installed in the sealed vacuum chamber (10), and the movement of the substrate a and b in the alignment direction is performed in the vacuum chamber S, and the movement of the direction (4) is not required to penetrate the vacuum. Smoothly adjust the movements.

又,於施行上述初步及精密對位作業的同時,若將上左 下保持板2相對於其底端壁4朝χγθ方向調整移動,則其名 搖動連#導引裝置6之周圍構件6b雖朝同方向變形移動, 仁因各中心構件6&amp;具有朝垂直方向之剛性,故可邊 保持板2的重量,邊保持下保持板2與其底端壁*之間的保 隔:不會接觸,故不會因χγθ方向之移動調整而產生滑截 抵抗。 、-果,可提供朝ΧΥΘ方向之調整移動滑順,且耐久性 南之播動連桿導引裝置6。 更進一步而纟,因藉由基板間隔調整裝置7,可將下 :板2相對於其底端壁4似方向平行移動之故,伴隨著; 板與B之對位,兩者間的距離可變更,各搖動連桿^ 96986.doc -24- 襄置6之周圍構件6b隨其朝ΧΥΘ方向變形移動,直上下大 小會稍微縮短’基板Α與Β間之間隔少許變寬的同時,下 处'寺板2及其底%壁4間的間隔會變小,但即使如此,依然 此修正上述之變化部分,維持所訂定的—定間隔空間。 、結果’以簡潔的構造,不僅可以良好精度對機板A、 叫仃對位,且同時可修正伴隨此對位所發生之z方向微小 誤差。 [實施例2] 於貫施例2中,如圖3及圖4所示,將與上述χγθ方向移 動裝置5之X方向凸輪5&amp;以及¥方向凸輪5請別卡合之抵接 部2e’,以突起方式由下保持板2之底面朝底端壁々裝設,將 此下保持板2之底面抵接部2e,,藉由χ方向凸輪“以及丫方 向凸輪5a之驅動,朝χγθ(水平)方向調整移動,藉此,其 兩基板Α與Β在保持平行狀態下,依序進行初步及精密對 位作業。此構成與上述圖1及圖2所示之實施例1不同其 他構成則與上述圖1及圖2所示實施例相同。 圖例中,將上述真空室8之底端壁4固定裝設於板狀架台 13b上,將此板狀架台nb以數根圓柱狀架台1仏支撐該底 端壁4保持固定不動,相對於此’再藉用上述之升降裝置 11之伸縮動作’使頂端壁3朝Z方向作往復運動(開閉運 動)。 再者,將上述抵接部2e_製成棒狀,穿透過設於底端壁4 之貫穿孔4c ’使其能任意朝ΧΥΘ方向移動,再突出於真空 至S外側’利用如皺皮膜(bellows)所構成之蛇腹狀之彈性 96986.doc -25- 1335254 體所構成之彈性密封構#2f各自密合上述棒狀接合部2e,與 貫穿孔4c之間空隙,從各抵接部2e,起至上述χγθ方向移動 裝置5之X方向凸輪&amp;以及y方向凸輪架設從動子w各 朝X方向或Y方向可任意移動,藉由如彈簧等彈性體5e, 透過各抵接部2e,,將下保持板2拉引至X及γ方向,同時常 時性地使各凸輪5a與從動子5d相互抵接。 接著,藉由此朝ΧΥΘ方向移動裝置5之對位移動來源5b 的運動,將各迴轉移動藉由各凸輪53轉變成朝乂及丫方向 之往復運動。同時,各反覆之運動傳達至各從動子5d上, 抵抗各彈性體5e,而使各抵接部2e,及下保持板2間接地朝 ΧΥΘ方向調整移動。 且,就上述之抵接部2ei、ΧΥΘ方向移動裝置5之乂方向 凸輪5a以及y方向凸輪&amp;、對位用移動動源讣、從動構件 (f〇ll〇Wer)5d以及彈性體5e之配置或構造,除了圖示例子中 的構造外,例如與圖丨及圖2所示之實施例丨相同,不將該 抵接部2e’突出設於真空室以卜側,而置於内側與X方向凸 輪5a以及Y方向凸輪5&amp;相卡合,或只要不妨礙上述升降樞 2c的裝設,不需從動子5d而使該抵接部“,與凸輪“直接卡 合等,只要能將各抵接部2〆透過凸輪50^χγθ方向調整移 動’其他的配置或構造均可施行。 因此,圖3與圖4所顯示之配置,與上述圖丨及圖2令所示 之實施例1乃具有相同效果。 且如上述ΧΥΘ方向移動裝置5與上述搖動連桿導引裝 置6接近,兩者之配置困難之情形,例如圖式所示對^ 96986.doc -26- 1335254 複數個穿馨於底端壁4圓環狀突起4a之橫向孔4d,將突出 設置於下保持板2之外周的複數個支撐樑柱2g各以游嵌狀 態插入,不僅可任意朝ΧΥΘ方向或Z方向調整移動地支撐 住,也可於其支撐樑柱2f之下方連接搖動連桿導引裝置6 之中心構件6a之頂端部。 [實施例3] 實施例3如圖5及圖6所示,作為上述下保持板2之支撐裝 置的搖動連桿導引裝置6,包含由下保持板2底部朝真空室 S之底端壁4貫穿此基座(朝向13d之各呈垂直狀設置的大致 平行支柱6f,將這些支柱6f以及/或下保持板2利用上述 ΧΥΘ方向移動裝置5之動作,朝χγθ(水平)方向移動藉由 將該支柱6f之大致整體或一部分朝χγθ方向搖動,其基板 A,Β可於保持平行狀態下依序進行初步對位和精密對位 作業。此構成與上述圖丨及圖2所示之實施例丨或圖3及圖4 所示之實施例2不同,而其他之構成則與實施例丨或實施例 2相同。 詳細而言,上述搖動連桿導引裝置6之支柱6f,係為了 將下保持板2可任意朝χγθ方向移動所設置的可任意朝 ΧΥΘ方向搖動之搖動構件。藉此,下保持板2被支持如上 下逆向之鞦韆而可任意搖動,利用上述ΧΥΘ方向移動裝置 5,將此支柱6f朝ΧΥΘ方向搖動,且保持其搖動之角度。 圖例中,將上述真空室3之底端壁4固定裝設於板狀架台 13b上,將此板狀架台13b以數根圓柱狀架台支撐該底 端壁4保持其不能移動,相對於此,再藉用上述之升降裝 969S6.doc -27- 1335254 置11之伸縮動作,將頂端壁3朝 知、、 朝z方向在復運動(開閉運 動)°這些圓柱狀架台13之 &lt; 各由固定住之基架13d上 面朝真空室S之底端壁4貫穿,橫跨i 再下保持板2底面,將 上述搖動連桿導引裝置6之支柱紆呈 入^ 主水千方向,等間隔地 設置4根或4根以上。 其各支柱6f,可各自季月其軸方向分割,相互利用如球狀 接點等彎曲部6d相結合,或是將整體或一部分以可彈性變Further, while performing the above preliminary and precise alignment operation, if the upper left lower holding plate 2 is moved in the direction of χγθ with respect to the bottom end wall 4 thereof, the name of the surrounding member 6b of the guiding device 6 is The deformation and movement in the same direction, the core members 6&amp; have rigidity in the vertical direction, so that the weight of the plate 2 can be maintained while maintaining the separation between the lower holding plate 2 and its bottom end wall*: no contact, so Sliding resistance is not generated due to the movement adjustment of the χγθ direction. -, fruit, can provide adjustment of the direction of the squat, smooth and durable, south of the broadcast link guide 6. Further, the substrate spacing adjustment device 7 can move the lower plate 2 in parallel with respect to the bottom end wall 4 thereof, and the distance between the plate and B can be Change, each rocking rod ^ 96986.doc -24- The surrounding member 6b of the cymbal 6 is deformed and moved in the direction of the cymbal, and the vertical up and down size will be slightly shortened while the interval between the cymbal and the cymbal is slightly widened. The interval between the temple plate 2 and the bottom wall 4 thereof becomes small, but even so, the above-described change portion is corrected, and the predetermined space is maintained. The result is a simple structure that not only corrects the alignment of the board A and the cymbal, but also corrects the small error in the z direction accompanying the alignment. [Embodiment 2] In the second embodiment, as shown in Figs. 3 and 4, the abutting portion 2e' of the X-direction cam 5&amp; and the direction-direction cam 5 of the χγθ-direction moving device 5 is not engaged. The bottom surface of the lower holding plate 2 is attached to the bottom end wall by a projection, and the bottom surface abutting portion 2e of the lower holding plate 2 is driven by the χ direction cam "and the 丫 direction cam 5a" toward the χ θ θ ( The horizontal direction is adjusted and moved, whereby the two substrates Α and Β are kept in parallel, and preliminary and precise alignment operations are sequentially performed. This configuration is different from the first embodiment shown in FIGS. 1 and 2; The same as the embodiment shown in Fig. 1 and Fig. 2. In the embodiment, the bottom end wall 4 of the vacuum chamber 8 is fixedly mounted on the plate-shaped gantry 13b, and the plate-shaped gantry nb is arranged in a plurality of cylindrical frames. The bottom end wall 4 is held stationary, and the top end wall 3 is reciprocated in the Z direction (opening and closing motion) by the above-described "retracting operation of the lifting device 11 described above." Further, the abutting portion 2e is provided. _ made into a rod shape, penetrating through the through hole 4c' provided in the bottom end wall 4 to make it arbitrarily The Θ direction moves, and then protrudes from the vacuum to the outside of the S. The elastic sealing structure #2f composed of the bellows-like elastic 96986.doc -25-1335254 formed by the bellows is closely adhered to the above-mentioned rod-shaped joint. 2e, the gap between the through hole 4c, the X-direction cam &amp; and the y-direction cam mounting follower w from the respective abutting portions 2e to the χγθ direction moving device 5 can be arbitrarily moved in the X direction or the Y direction. By the elastic body 5e such as a spring, the lower holding plate 2 is pulled to the X and γ directions by the respective abutting portions 2e, and the cams 5a and the followers 5d are constantly abutted against each other. By the movement of the aligning movement source 5b of the moving device 5 in the yaw direction, the respective slewing movements are converted into reciprocating motions in the 乂 and 丫 directions by the respective cams 53. At the same time, the respective repetitive motions are transmitted to the respective slaves. In the case of 5d, the respective abutting portions 2e and the lower holding plate 2 are indirectly moved in the squat direction against the respective elastic bodies 5e. Further, the abutting portion 2ei, the 乂 direction moving device 5, the 乂 direction cam 5a And the y-direction cam &amp; The arrangement or structure of the driven member (f〇ll〇Wer) 5d and the elastic body 5e is the same as that of the embodiment shown in the figure, and is not the same as the embodiment shown in FIG. The portion 2e' is protruded from the vacuum chamber to the side of the vacuum chamber, and is placed on the inner side in engagement with the X-direction cam 5a and the Y-direction cam 5&amp; or as long as the attachment of the lift shaft 2c is not hindered, the mover 5d is not required. The abutting portion "can be directly engaged with the cam" or the like, and any other arrangement or structure can be performed as long as the respective abutting portions 2 〆 can be moved in the direction of the cam 50 χ γθ. Therefore, FIG. 3 and FIG. 4 The configuration of the display has the same effect as that of the first embodiment shown in the above drawings and FIG. And as the above-mentioned ΧΥΘ direction moving device 5 is close to the above-mentioned rocking link guiding device 6, the arrangement of the two is difficult, for example, as shown in the figure, ^96986.doc -26- 1335254 is plurally worn on the bottom end wall 4 The lateral holes 4d of the annular projections 4a are inserted into the plurality of support beams 2g protruding from the outer periphery of the lower holding plate 2 in a state of being fitted, and are not only arbitrarily supported in the z-direction or the Z-direction, but also supported. The tip end portion of the center member 6a of the rocking link guide 6 may be connected below the support beam 2f. [Embodiment 3] Embodiment 3 As shown in Figs. 5 and 6, the rocking link guiding device 6 as the supporting means of the lower holding plate 2 includes the bottom end wall of the lower holding plate 2 toward the bottom of the vacuum chamber S. 4. The pedestal 6f and/or the lower holding plate 2 are moved in the χγθ (horizontal) direction by the operation of the slanting direction moving device 5 so as to extend through the pedestal (the substantially parallel struts 6f which are vertically arranged toward the 13d). The substantially whole or a part of the pillar 6f is rocked in the direction of χγθ, and the substrate A and the substrate can be sequentially aligned and precisely aligned in a state of being kept parallel. This configuration is implemented as shown in the above figure and FIG. The example is different from the embodiment 2 shown in FIG. 3 and FIG. 4, and the other configurations are the same as those of the embodiment or the embodiment 2. In detail, the pillar 6f of the rocking link guiding device 6 is for The lower holding plate 2 is arbitrarily movable in the direction of χγθ to move the rocking member which can be arbitrarily turned in the direction of the yaw. Thereby, the lower holding plate 2 is supported by the swing in the reverse direction as described above, and can be arbitrarily rocked by the above-described ΧΥΘ direction moving device 5, This pillar 6f Shaking in the direction of the yaw and maintaining the angle of its shaking. In the illustration, the bottom end wall 4 of the vacuum chamber 3 is fixedly mounted on the plate-shaped gantry 13b, and the plate-shaped gantry 13b is supported by the plurality of cylindrical gantry The end wall 4 keeps it from moving. On the other hand, the top wall 3 is moved in the z direction (opening and closing motion) by using the above-mentioned lifting and lowering movement 969S6.doc -27-1335254. °The above-mentioned cylindrical pedestals 13 are respectively penetrated from the upper surface of the fixed base frame 13d toward the bottom end wall 4 of the vacuum chamber S, and traverse the i and lower the bottom surface of the holding plate 2, and the struts of the above-mentioned rocking link guiding device 6纡 is placed in the direction of the main water, and four or more are provided at equal intervals. Each of the pillars 6f can be divided in the axial direction of each season, and can be combined with each other by a curved portion 6d such as a spherical joint, or Change the whole or part of the elasticity

:之材料來製作’藉此至少使與上述下保持板2之底面連 結之上方部分能朝ΧΥΘ方向搖動變形。 再者,於此支柱6f之搖動側的上方部分,相互與上述連 絡構件6g連接,各成一體化,使此連接構件6g與上述ΧΥΘ 方向移動裝置5連動。The material is made so that at least the upper portion joined to the bottom surface of the lower holding plate 2 can be shaken and deformed in the ΧΥΘ direction. Further, the upper portion of the rocking side of the stay 6f is connected to the connecting member 6g, and is integrated with each other, and the connecting member 6g is interlocked with the above-described 方向 direction moving device 5.

各支柱6 f之上方部分,將穿設於上述真空室s底端 土 4以及於上述板狀架台Ub上之貫通孔4e朝ΧΥΘ方向以任 意移動狀態貫通真空室s内外,此穿通部分與貫通孔耗間 之間隙’可利用貼上如皺皮膜(bell〇ws)等蛇腹狀之彈性體 所構成之彈性密封構件6h ’將朝ΧΥΘ方向移動可加以密 閉’為一氣密狀下使其貫通之;或者對於各支柱6f及連絡 構件6g與上述ΧΥΘ方向移動裝置5的周圍以隔間壁(無圖示) 覆蓋’而使其成為與真空室S内部相同氣氛之空間内,則 無需使用彈性密封構件6h加以密封。 圖式中,於上述支柱6f上端,將不朝ΧΥΘ方向變形之轴 6ι相連接使其一體化,並使其於下保持板2底面使其連 結。於此軸6i與上述底端壁4之貫通孔4e之間隙,設置_ 96986.doc •28· 丄如254 彈性达、封構件6h,同時·藉此使這些軸6i相互綿延而連結 - 狀連絡構件6g。 〜 * 上述連桿構件6g與上述ΧΥΘ方向移動裝置5之乂方向凸輪 5a以及¥方向凸輪5&amp;間,裝置可任意朝X及γ方向移動從動 子5f,藉由彈簧等彈性體5g,透過連絡構件6g、軸以及 支柱6f,將其下保持板2朝X及Y方向拉引,同時_直保持 使各凸輪5a與從動子5f抵接。 亦即,這些連桿構件6§、軸6丨以及支柱6f’係為與χγθ 方向移動裝置5之Χ方向凸輪5a以及Υ方向凸輪53各自抵接 之抵接部2e,,。 ' 且,藉由各ΧΥΘ方向移動裝置5之對位用移動動源讣的 ^作,透過X方向凸輪“以及γ方向凸輪5&amp;將各迴轉驅動 變換成各自朝X及γ方向之往復運動,同時,各往復運動 作用傳達至各從動子5fUl,相抗衡於各彈性體化,藉著移 動連桿構件6g,同時透過軸6i及支柱6f,將下保持板2間接 朝XΥΘ方向調整移動。 又,上述ΧΥΘ方向移動裝置5之x方向凸輪53以及γ方向 凸輪5a、對位用移動動源5b、從動子5f、彈性體5g以及支 柱6f、連絡構件6g以及軸6i之配置或構造,除了圖示例子 中的構造外,例如可不藉由軸6i而直接將支柱紆之上端部 與下保持板2之底面相接合,或是與圖丨及圖2所示之實施 例1相同,於真空室s内側,使支柱6f及連絡構件6g與X方 向凸輪5a以及y方向凸輪53相卡合等,只要能藉由χ方向凸 輪5a以及Υ方向凸輪5a,將支柱6£朝乂¥0方向調整移動, 96986.doc -29· 1335254 則其他的配置或構造均可施行。 因此,圖5及圖6所示之配置,不僅和上述圖丨及圖2所示 之實紅例I或圖3及圖4所示之實施例2擁有相同效果,且, 與實施例1及2中所示之包含由下保持板2底面及真空室§底 端壁4各垂直地吊置之大致呈平行的連接構件讣與連結其 下端之連絡構件6c之搖動連桿導引裝置6相比,僅以簡單 之構造便旎平面支撐住下保持板2,使其能朝χγθ方向調 整移動,藉此,隨著基板尺寸漸趨大型化,即使對真空室 S之大氣壓荷重增大,其對位之控制性能亦能提高,且真 空室S之底端壁4就算因大氣壓之荷重導致變形,也不會影 響其對位作業之精準度。 / 且,為了施行上述基板Α與Β之初步和精密對位作業, 而將與上下兩保持板1,2至少一方連動,一邊保持真空室 s内之真空狀態,一邊將上下兩保持板丨,2相對朝z方向平 行移動之間隔基板調整裝置7,設置於圍繞真空室s之周壁 3a,蝴部。#,除了圖示例構造之外,亦可將此基板間 隔調整裴置7設置於真空室S内側或支柱紆之上下途中也可 行。 藉此,即使各支柱6f隨著朝ΧΥΘ方向變形移動,上下之 尺寸會小幅縮短,基板A與B間的間隔稍稍變寬,其下保 持板2及底端壁4間的距離稍微變小,亦可修正其朝2方向 之微小誤差部份’維持所要求之間隔。 其結果,不需再另外增設貫穿真空室3之構件,只要以 簡單的裝置構&amp; ’便能對基板入和3進行對位,調整至最 96986.doc 1335254 適當的間隔。 . 又’前面所提及之實施例中,將真空室3之底端壁4裝置 於13a,13b,13c,13d之上而支撐固定住。對此,藉由升 降裝置11的伸縮動作使頂端壁3朝Z方向開閉動作,但並非 僅限定於此,也可相反的,將頂端壁3不動地支撐,將底 端壁4朝Z方向開閉動作,而藉此將真空室s分隔(開閉)成 上下方向》 再者,雖然藉由上述ΧΥΘ方向移動裝置5以僅調整移動 下保持板2朝ΧΥΘ*向移動,而進行下基板3與無法朝χγθ 方向移動之上保持板丨之上基板Α之對位,但並非僅限定於 此,和前者相反,亦可以藉由ΧΥΘ方向移動裝置5以僅調 整移動上保持板丨朝又丫㊀方向移動,而進行下基板Α與無法 朝ΧΥΘ方向移動之下保持板2之下基板B之對位。 此時,該上保持板丨之支撐裝置的搖動連桿導引裝置, 係由上保持板1朝真空室S之頂端壁3方向架設之。 ;且,雖然顯巾了利用各謂方向移動裝置5之凸輪^來 調,上下保持板卜2之—方朝χγθ方向移動,但,並非僅 限定於此’亦可利用促動器(論咖)等其他驅動源代替凸 輪5a進行朝ΧΥΘ方向作調整移動。 【圖式簡單說明】 圖 視圖 1係表示本發明之實施例1中之基板對位裝 置之縱剖前 以及ΧΥΘ方向移動裝置放大時之 圖2係顯示將下保持板 橫剖俯視圖。 96986.doc 山:)254 、圖3係顯示本發明之實施例2中之基板對位裝置之縱剖前 視圖。 圖4係顯示將下保持板以及χγθ方向移動裝置放大時之 橫剖俯視圖。 圖5係顯示本發明之實施例3中,基板對位裝置之 視圖。 圖ό係顯示圖5沿(6)-(6)方向部分之放大橫剖仰視圖。 【主要元件符號說明】 1 上保持板 2 下保持板 2e, 2e', 2e&quot; 抵接部分 3 頂端壁 3a 周圍壁 4 底端壁 4a 周圍壁 4b 通孔 4c 貫通孔 4d 橫孔 4e 貫通孔 5 ΧΥΘ方向移動裝置 5b 對位用移動動源 5c 彈性物體 5d 從動構件(follower) 5 e 彈性物體The upper portion of each of the pillars 6 f penetrates the bottom hole 4 of the vacuum chamber s and the through hole 4e of the plate-shaped frame Ub so as to penetrate the inside and the outside of the vacuum chamber s in an arbitrary movement state in the direction of the sill. The gap between the hole plenums can be closed by the elastic sealing member 6h' which is formed by an elastic body such as a bellows-like elastic body such as a bellows (w), which can be sealed in an airtight manner. Or, if each of the pillars 6f and the contact member 6g and the periphery of the above-described ΧΥΘ-direction moving device 5 are covered by a partition wall (not shown) so as to be in the same atmosphere as the inside of the vacuum chamber S, it is not necessary to use an elastic seal. The member 6h is sealed. In the drawing, at the upper end of the support post 6f, the shaft 6ι which is not deformed in the weir direction is connected and integrated, and is joined to the bottom surface of the lower holding plate 2 to be joined. The gap between the shaft 6i and the through hole 4e of the bottom end wall 4 is set to _96986.doc • 28·, for example, 254 elastic reaching, sealing member 6h, and at the same time, the shafts 6i are stretched and connected to each other. Member 6g. 〜 Between the link member 6g and the 乂 direction cam 5a and the directional cam 5&amp; of the ΧΥΘ direction moving device 5, the device can move the follower 5f in the X and γ directions arbitrarily, and pass through the elastic body 5g such as a spring. The contact member 6g, the shaft, and the support 6f pull the lower holding plate 2 in the X and Y directions, and hold the cam 5a and the follower 5f abutting. In other words, the link member 611, the shaft 6丨, and the support 6f' are abutting portions 2e that abut against the Χ θ direction moving device 5 and the Υ direction cam 53 and the Υ direction cam 53. Further, by the movement of the moving direction of the moving device 5 in each of the directions, the X-direction cams and the γ-direction cams 5&amp; are converted into reciprocating motions in the X and γ directions. At the same time, each reciprocating motion is transmitted to each of the followers 5fU1, and the respective elastic bodies are made to move, and by moving the link member 6g, the lower holding plate 2 is indirectly moved in the X-direction by the shaft 6i and the strut 6f. Further, the arrangement or structure of the x-direction cam 53 and the γ-direction cam 5a, the aligning movement source 5b, the follower 5f, the elastic body 5g, the support 6f, the contact member 6g, and the shaft 6i of the ΧΥΘ direction moving device 5 are In addition to the configuration in the illustrated example, for example, the upper end of the strut 纡 can be directly joined to the bottom surface of the lower retaining plate 2 by the shaft 6i, or the same as in the embodiment 1 shown in FIG. In the inside of the vacuum chamber s, the support 6f and the contact member 6g are engaged with the X-direction cam 5a and the y-direction cam 53, and the support 6 can be tilted toward the 乂¥0 direction by the χ direction cam 5a and the Υ direction cam 5a. Adjusting the movement, 96986.doc -29· 133 5254, other configurations or configurations can be performed. Therefore, the configurations shown in FIG. 5 and FIG. 6 are not only the actual red example shown in FIG. 2 and FIG. 2 or the embodiment 2 shown in FIG. 3 and FIG. Having the same effect, and connecting with the substantially parallel connecting member 吊 which is vertically suspended from the bottom surface of the lower holding plate 2 and the bottom end wall 4 of the vacuum chamber as shown in Embodiments 1 and 2, and the connection of the lower end thereof Compared with the rocking link guiding device 6 of the member 6c, the lower holding plate 2 is supported by the simple planar structure so that it can be moved in the direction of χγθ, whereby the size of the substrate becomes larger, even if When the atmospheric pressure load of the vacuum chamber S is increased, the controllability of the alignment can be improved, and the bottom end wall 4 of the vacuum chamber S is deformed due to the load of the atmospheric pressure, and the accuracy of the alignment operation is not affected. Further, in order to perform the preliminary and precise alignment work of the substrate Α and Β, at least one of the upper and lower holding plates 1 and 2 is interlocked, and the upper and lower holding plates are held while maintaining the vacuum state in the vacuum chamber s. a spacer substrate that moves parallel to the z direction The whole device 7 is disposed on the peripheral wall 3a surrounding the vacuum chamber s, the butterfly portion. In addition to the configuration of the example, the substrate spacing adjustment device 7 may be disposed on the inner side of the vacuum chamber S or on the lower side of the pillar 纡. Therefore, even if the pillars 6f are deformed and moved in the direction of the yaw, the size of the upper and lower sides is slightly shortened, the interval between the substrates A and B is slightly widened, and the distance between the lower holding plate 2 and the bottom end wall 4 is slightly changed. Small, it is also possible to correct the small error portion in the 2 direction to maintain the required interval. As a result, it is not necessary to additionally add a member that penetrates the vacuum chamber 3, and the substrate can be inserted in a simple device structure. Align with 3 and adjust to the most appropriate interval of 96986.doc 1335254. Further, in the above-mentioned embodiment, the bottom end wall 4 of the vacuum chamber 3 is placed above the 13a, 13b, 13c, 13d to be supported and fixed. On the other hand, the distal end wall 3 is opened and closed in the Z direction by the expansion and contraction operation of the lifting device 11, but the invention is not limited thereto, and the distal end wall 3 may be supported in a stationary manner, and the bottom end wall 4 may be opened and closed in the Z direction. By operating, the vacuum chamber s is divided (opened and closed) in the up and down direction. Further, the lower substrate 3 and the lower substrate 3 are not moved by the above-described ΧΥΘ direction moving device 5 by merely moving the lower holding plate 2 toward the ΧΥΘ* direction. Moving in the direction of χθθ to maintain the alignment of the substrate 丨 above the plate ,, but not limited thereto, as opposed to the former, it is also possible to adjust the moving plate to the other direction by the ΧΥΘ direction moving device 5 Moving, while the lower substrate Α is moved and cannot move in the ΧΥΘ direction, the alignment of the substrate B under the plate 2 is maintained. At this time, the rocking link guiding means of the supporting means for holding the upper plate is erected by the upper holding plate 1 toward the top end wall 3 of the vacuum chamber S. Moreover, although the display is moved by the cam of each of the forward-direction moving devices 5, the upper and lower holding plates are moved in the direction of γ θθ, but it is not limited to this and the actuator can also be used. Other driving sources are used to adjust the movement in the direction of the cymbal instead of the cam 5a. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a front cross-sectional view showing a substrate aligning apparatus according to a first embodiment of the present invention and an enlarged view of a slanting direction moving device. Fig. 2 is a plan view showing a lower holding plate. 96986.doc Mountain: 254, Fig. 3 is a longitudinal sectional front view showing the substrate alignment device in the second embodiment of the present invention. Fig. 4 is a cross-sectional plan view showing a state in which the lower holding plate and the χγθ direction moving device are enlarged. Fig. 5 is a view showing the substrate alignment device in the third embodiment of the present invention. The figure shows an enlarged cross-sectional view of the portion along the direction of (6)-(6) of Fig. 5. [Main component symbol description] 1 upper holding plate 2 lower holding plate 2e, 2e', 2e&quot; abutting portion 3 top wall 3a surrounding wall 4 bottom end wall 4a surrounding wall 4b through hole 4c through hole 4d transverse hole 4e through hole 5 ΧΥΘ Directional moving device 5b Alignment moving source 5c Elastic object 5d Follower member 5 e Elastic object

96986.doc -32* 1335254 5f 從動構件(follower) 5g 彈性物體 6 支持裝置(搖動連桿導引 6a 軸 6b 連接構件 6c 連桿構件 6e 蛇腹狀之彈性密封構件 6f 支柱 6g 連絡構件 6h 蛇腹狀之彈性密封構件 6i 軸 7 間隔基板之調整裝置 11 升降裝置 12 吸氣裝置 13d 基架 A 基板(上基板) B 基板(下基板) C 圓環狀接著劑 D 基板對位裝置 S 真空室96986.doc -32* 1335254 5f follower member (fllower) 5g elastic body 6 supporting device (shaking connecting rod guide 6a shaft 6b connecting member 6c connecting rod member 6e bellows-like elastic sealing member 6f strut 6g connecting member 6h bellows Elastomeric sealing member 6i Shaft 7 Spacer adjustment device 11 Lifting device 12 Suction device 13d Base frame A Substrate (upper substrate) B Substrate (lower substrate) C Ring-shaped adhesive D Substrate aligning device S Vacuum chamber

96986.doc -33 -96986.doc -33 -

Claims (1)

1335254 r—--- 第〇93132594號專利申請案%年今月)日修(¾)正替換頁 · · 中文申請專利範圍替換本(99 ‘ 9’月)—二__ 十、申請專利範圍:. 1. 一種基板對位裝置,係於真空室(S)内,將相互貼合的兩 片基板(A,B)可任意拆裝地保持於上下之保持板(1,2)並 使其呈對向狀態,將這兩個基板(A,B)相對地向ΧΥΘ方 向調整移動,而對基板(A,B)進行對位基板對位,其特 徵係: 作為將上述上下保持板(1,2)對於另一方可於保持兩基 板(A,B)平行之狀態下任意調整向ΧΥΘ方向之移動之支 持手段,係從上下保持板(1,2)之一方起向真空室(S)的 頂端壁(3)或底端壁(4)裝設一搖動連桿導引裝置(6),連 桿藉由ΧΥΘ方向移動裝置(5)向ΧΥΘ方向搖動此搖動連桿 導引裝置(6),可將上下保持板(1,2)中之一方對於另一 方向ΧΥΘ方向調整移動。 2. 如請求項1所述之基板對位裝置,其中上述搖動連桿導 引裝置(6)係從真空室(S)之内部向真空室(S)外面設置複 數個,其各包含於真空室(S)之頂端壁(3)與底端壁(4)呈 垂直方向設置之大致呈平行之連桿構件(6b),以及連結 其各頂端部分之連結構件(6c);此連結構件(6c)與上下二 保持板(1,2)之一方以於xy0方向不能變形的軸(6a)連 .結。 3. 如請求項1所述之基板對位裝置,其中上述搖動連桿導 引裝置(6)係包含從上下保持板(1,2)之一方起貫通至與 其對向之真空室(S)的頂端壁(3)或底端壁(4)且面向基架 (13d)之各呈垂直方向設置的大致呈平行之支柱(6f);此 96986-990903.doc 1335254 ----—— 今解月彡曰修(¾正替顧 -. 些支柱(6f)為可任意向ΧΥΘ方向搖動。 4·如請求項1所述之基板對位裝置,其中於上述真空室(s) 之内部或與該真空室(S)内部相同氣氛之空間内,設置 ΧΥΘ方向移動裝置(5)以及搖動連桿導引裝置(6),使此 ΧΥΘ方向移動裝置(5)與上下保持板(1,2)之一方或與搖 動連桿導引裝置(6)直接連動。 5·如請求項1、2或3所述之基板對位裝置,其中於上述真 Ί 空室(s)之外側裝設一ΧΥΘ方向移動裝置(5),此χγθ方向 一 移動之裝置(5)透過搖動連桿導引裝置(6)與上下保持板 (1 ’ 2)之一方間接連動。 6.如晴求項1、2、3、或4所述之基板對位裝置,其中於上 述真空室⑻的内部或包圍真空室⑻的周圍壁(3a,乜)或 支柱(6a ’ 6f)上’設置與上保持板⑴連動之間隔基板調 整褒置⑺,藉由此間隔基板調整裝置⑺,使上保持板 (1)相對於下保持板(2)向Z方向平行移動。 -)7.如請求項5所述之基板對位裝置,其中於上述真空室 的内部或包圍真空室⑻的周圍壁(3a’4a)或支枝(6a’ 6〇J\,設置與上保持板⑴連動之間隔基板調整裝置 由此間隔基板調整裝置⑺,使上保持板⑴相對 :下保持板(2)向Z方向平行移動。 96986-990903.d〇i 1335254 ^月今曰修(¾正替换頁 第093132594號專利申請案 中文圖式替換本(99年9月) ^--、圖式:1335254 r—--- Patent application No. 93,132,594, % of the year and month of the year) (3⁄4) is replacing the page · · Chinese patent application area replacement (99 ' 9' month) - two __ ten, the scope of application for patent: 1. A substrate alignment device in a vacuum chamber (S), wherein two substrates (A, B) bonded to each other are detachably held by upper and lower holding plates (1, 2) and In the opposite state, the two substrates (A, B) are relatively moved in the ΧΥΘ direction, and the substrate (A, B) is aligned with the alignment substrate, and the feature is as follows: 2) The support means for arbitrarily adjusting the movement in the direction of the weir in the state in which the two substrates (A, B) are kept in parallel, from one of the upper and lower holding plates (1, 2) to the vacuum chamber (S) The top end wall (3) or the bottom end wall (4) is provided with a rocking link guiding device (6), and the connecting rod is rocked in the weir direction by the ΧΥΘ direction moving device (5) (6) ), one of the upper and lower holding plates (1, 2) can be adjusted to move in the other direction. 2. The substrate alignment device according to claim 1, wherein the rocking link guiding device (6) is provided from the inside of the vacuum chamber (S) to the outside of the vacuum chamber (S), each of which is contained in a vacuum a substantially parallel link member (6b) disposed at a top end wall (3) of the chamber (S) and a bottom end wall (4), and a joint member (6c) connecting the top end portions thereof; the joint member ( 6c) Connect one of the upper and lower holding plates (1, 2) to the shaft (6a) which is not deformable in the xy0 direction. 3. The substrate alignment device according to claim 1, wherein the rocking link guiding device (6) comprises a vacuum chamber (S) extending from one of the upper and lower holding plates (1, 2) to the opposite side thereof. The top wall (3) or the bottom end wall (4) and facing the base frame (13d) are substantially parallel pillars (6f) arranged in a vertical direction; this 96986-990903.doc 1335254 ----- The struts (6f) are arbitrarily swayed in the direction of the squat. The substrate aligning device according to claim 1, wherein the vacuum chamber (s) is inside or In the space of the same atmosphere as the inside of the vacuum chamber (S), a ΧΥΘ direction moving device (5) and a rocking link guiding device (6) are provided to make the ΧΥΘ direction moving device (5) and the upper and lower holding plates (1, 2) One of the sides is directly connected to the rocking rod guiding device (6). The substrate aligning device according to claim 1, 2 or 3, wherein one of the outer sides of the above-mentioned true empty chamber (s) is installed The ΧΥΘ direction moving device (5), the χ θ θ direction moving device (5) through the rocking link guiding device (6) and the upper and lower holding plate (1) 6. A substrate alignment device according to the above item 1, 2, 3, or 4, wherein the inside of the vacuum chamber (8) or the surrounding wall surrounding the vacuum chamber (8) (3a, 乜Or the pillars (6a'6f) are provided with a spacer substrate adjustment device (7) that is interlocked with the upper holding plate (1), whereby the upper holding plate (1) is oriented relative to the lower holding plate (2) by the spacer substrate adjusting device (7) The Z direction is parallel. - 7. The substrate alignment device according to claim 5, wherein the inside of the vacuum chamber or the surrounding wall (3a'4a) or branch (6a' 6〇J surrounding the vacuum chamber (8) \, the substrate adjustment device is arranged to be spaced apart from the upper holding plate (1), thereby spacing the substrate adjusting device (7) such that the upper holding plate (1) is opposed to the lower holding plate (2) moving in parallel in the Z direction. 96986-990903.d〇i 1335254月修曰 (3⁄4正换页Page 093132594 Patent Application Replacement of Chinese Drawings (September 99) ^--, Schema: 96986-990903.doc 1335254 ------ 9每?月知修(¾正替換頁 0) cm ^^96986-990903.doc 1335254 ------ 9 per? Yuezhi repair (3⁄4 positive replacement page 0) cm ^^ 96986-990903.doc 2- 1335254 月》R修(¾正替換頁96986-990903.doc 2- 1335254 Month R repair (3⁄4 positive replacement page a) to -Q Ο Ό CD CO CO ζ〇 C〇 &lt;〇a) to -Q Ο Ό CD CO CO ζ〇 C〇 &lt;〇 96986-990903.doc 1335254 月知修(¾)正替換頁96986-990903.doc 1335254 Yuezhi repair (3⁄4) is replacing page 〇'N、hN'N、辦hN\N、r&lt;^i二 者' \ \ I/-P9 ί;®csl 丨—ll®10〇'N, hN'N, do hN\N, r&lt;^i two' \ \ I/-P9 ί;®csl 丨-ll®10 &lt;.......&lt;....... *0·— ί ps--f-ΦΊ fj*0·— ί ps--f-ΦΊ fj Ί 96986-990903.docΊ 96986-990903.doc 1335254 科年7月 &gt; 日修(¾正替換頁1335254 July of the Year &gt; Daily Repair (3⁄4 positive replacement page 96986-990903.doc 1335254 衫年7月3日修隐)正替換頁96986-990903.doc 1335254 The shirt is retired on July 3) 96986-990903.doc96986-990903.doc
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CN108398814B (en) * 2018-03-22 2021-09-24 京东方科技集团股份有限公司 Processing device for display equipment
CN108761855B (en) * 2018-05-04 2021-07-20 芜湖良匠机械制造有限公司 Correcting device for correcting position of glass substrate
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US11552060B2 (en) 2020-11-24 2023-01-10 Micron Technology, Inc. Stacked light emitting diode (LED) display

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