TWI323290B - - Google Patents

Description

IX. Description of the Invention: The present invention relates to a moving mechanism of a reticle holder and a film forming apparatus, and more particularly to a reticle clip used in a film forming apparatus for manufacturing an organic EL element. The mobile organization that holds it. [Prior Art] For the film forming apparatus manufactured by an organic electroluminescence (EL) element, for example, a vacuum evaporation apparatus is used. Fig. 8 is an explanatory view of the upper portion of the vacuum evaporation apparatus. An evaporation source (not shown) of an organic material is provided on the bottom of the vacuum evaporation apparatus, and a chuck 2 is provided on the upper portion of the apparatus opposite to the evaporation source. The chuck 2 is a flat plate that maintains the glass substrate 3 in a flat shape, and is rotatable by a swing mechanism provided outside the apparatus body. Further, around the chuck 2, the mask holder 4 supporting the mask is provided so as to be movable up and down. Further, an opening = a case in which a pattern (pixel) of the organic EL element is formed on the surface of the glass substrate 3 is formed. The upper end portion of the mask holder 4 protrudes outside the apparatus body, and a connection member is disposed at the end of the bowl j. Below the connection member 5, for example, a pair of cylinders 6 are provided, and the lower end is placed at the upper portion of the apparatus body. Connected, on the ί component 7 is connected. The plate member 7 is connectable to the connecting member

The ta is placed on the member 7 in accordance with the vertical movement of the slab 7 in accordance with the expansion and contraction operation of the shovel 6, and the connecting member 5 is moved up and down. Zhuo Clamp 2189-7758-PF 1323290 Further, it is not known to disclose the movement of the reticle holder up and down by the expansion and contraction of the cylinder. The upper limit of the range of movement of the mask holder 4 is such that the mask holder 4 is supported by a photomask (not shown) in contact with the glass substrate 3 supported by the chuck 2... the lower limit is not It is inserted at a position where the substrate transfer mechanism (not shown) is in contact between the head 2 and the mask holder. This substrate transfer mechanism inserts the glass substrate from the outside of the vacuum evaporation apparatus, and removes the glass substrate on which the pattern is formed while the substrate is placed on the substrate holder. Therefore, since the reticle holder and the substrate/mechanism are not in contact, the stroke of the visor holder moving up and down must be 0, but the 'glass substrate is inserted into the device' is mounted on the chuck After the fixing, in order to form a pattern of the organic EL element at the shout position of the glass substrate, the alignment between the photomask and the glass substrate is performed. This alignment is the distance that the photomask and the glass substrate that are carried on the alignment ann are not in contact with each other, that is, because even if there is a little distance, as long as there is no space, only I is empty. The distance is carried out. In this alignment, the reticle holder of the fixed reticle is conventionally utilized with cylinders that cannot adjust the stroke. Therefore, since the mask holder 4 cannot be moved in two stages, the mask holder 4 is positioned at the lower limit of the movement range, and when it starts to rise after the alignment is completed, the mask is fixed to the glass substrate and becomes a long moving distance. Therefore, due to the long distance moving, more time is required and the manufacturing speed is slower.

Manufacturing efficiency is low. Further, the glass substrate is rotated in the horizontal direction in order to make the thickness of the organic thin film 2189-7758-PF 6 1323290 formed on the glass substrate uniform in the substrate surface. Therefore, in order to rotate the glass substrate, it is necessary to arrange the slewing mechanism in the upper portion of the vacuum evaporation apparatus because the chuck, the light ray, the reticle holder, and the like must be rotated. However, in the vacuum evaporation apparatus, since the ingredients for driving the respective mechanisms provided in the apparatus are complicatedly connected, the mechanism of the fine rotation mechanism is provided on the shaft of the fine rotation mechanism to divide and lower the mask holder in plural stages. Sleepy

SUMMARY OF THE INVENTION The present invention provides a moving mechanism for moving a mask holder of a reticle holder for the purpose of film formation of a moving mechanism for dividing a plurality of optical components. Further, the present invention has an object of providing a photomask holding device. In order to achieve the above object, the moving mechanism of the reticle holder according to the present invention is a moving mechanism of the reticle holder that allows the reticle disposed on the front surface of the substrate on which the organic EL element is formed to advance and retreat toward the substrate. The moving mechanism has a telescopic device that allows the reticle holder that supports the reticle to move in a plurality of stages. The expansion/contraction apparatus may include a first expansion/contraction device provided in a film formation apparatus body that forms a film of the organic EL element on the substrate, and a first expansion/contraction device mounted on the same as the reticle holder card The second telescopic device is constructed in the same manner. In this case, the first telescopic device and the second telescopic device may be retractable independently of each other. Further, the first telescopic device and the upper 2189-775 8-PF 7 2 second telescopic device may be made of gas red or oil. Further, the telescopic device can be constructed using a plurality of cylinders. Du You, Qian Zhiming's dissimilar device material in the substrate manufacturing organic EU: film forming device 'includes: chuck, and the supply of organic materials = cover holder, support the above four (four) components two sides of the W, expansion and contraction The apparatus advances and retreats the plurality of stages to the substrate via the holder; and the swing mechanism is disposed on the main body to rotate the chuck, the mask holder, and the expansion/contraction device in a horizontal direction. feature. Further, the expansion/contraction device includes a first telescopic device provided in the main body of the device, and a first telescopic nightmare reclining device that is attached to the first telescopic device and that engages with the photomask holder. A second telescopic device that can be independently extended and contracted is characterized. When the telescopic device of the moving mechanism of the reticle holder is telescoped in multiple stages, the reticle holder connected here is in a plurality of stages, that is, when the telescopic device is constituted by the first telescopic device and the second telescopic device When at least one of the first device and the second telescopic device is moved and contracted, the mask holder is moved up and down along with this operation. Therefore, if the telescopic movement of each telescopic skirt is independently controlled, the stage of the reticle holder can be divided. Further, the expansion and contraction of the first and second telescopic devices can be performed by expanding and contracting the cylinder rods provided in the cylinders and the hydraulic cylinders. Further, at the time of manufacture of the organic EL element, in the position of the photomask and the substrate, the first retracting device is made in a state where the second telescopic device is shortened.

2189-7758-PF 8 ^23290 Elongation, when the first telescopic device and the second telescopic device are extended after the above position is determined, the movement amount of the reticle holder after the position is determined to be shorter becomes shorter. The manufacturing time of components is shortened. [Embodiment] Hereinafter, a preferred embodiment of a moving mechanism and a film forming apparatus of a mask holder according to the present invention will be described. Further, a mode in which a vacuum evaporation device is used as a film forming apparatus will be described below. Fig. 1 is an explanatory view of a vacuum evaporation apparatus according to an embodiment. Fig. 2 is a schematic plan view of a reticle holder of the embodiment. In these figures, the vacuum evaporation apparatus 10 is provided with an evaporation source 14 (sublimation source) of the organic material 12 at the bottom of the apparatus main body u, and a chuck 16 and a substrate holder 18 on the upper portion of the apparatus main body u. The first mask holder 2, the telescopic device 22, and the second mask holder 28 are configured. Specifically, t' organic material 12 & evaporation source 14 is provided with a crucible 14a for allowing the organic material 12 to enter, and a heater Hbe for heating/evaporating (sublimating) the organic material 12 on the outside of the crucible 14a, and in the apparatus body The chuck 16 provided on the inner upper portion of the inner side is disposed opposite to the crucible 14a, and is a flat plate that is disposed along the horizontal direction. Further, the collet 16 is attached to the face of the 坩埚ua and supports the glass substrate 32. Further, the chuck 16 is horizontally rotatable by a swing mechanism 3 provided on the outer upper portion of the apparatus body 11. The lower end of the substrate holder 18 is inserted into the apparatus main body 11 through the upper portion of the apparatus main body u, and the lower end portion 18a is a hook shape that is bent toward the chuck 16 side (the center side of the vacuum evaporation apparatus 10). Along the head

The side edges of the 2189-7758-PF 9 16 are arranged in plural. These substrate holders 18 are set such that the front end portions 18a (bend portions) of the glass substrate 32 support the front end portions 18 & of the same height (in the same plane). Further, the substrate holding member 18 is not shown in the upper portion of the apparatus body 上部, and each of the rigid end portions 18a is maintained in the same plane, and the substrate is clamped by %. The 18-series is brought into contact with the chuck 16 by raising it, so that it can be held in a planar shape. The lower end of the reticle holder 20 is inserted into the upper portion of the apparatus main body u and inserted into the apparatus main body u, and the lower end portion of the lower end portion is directed to the side of the inflammatory head 16 (the center side of the vacuum evaporation lining 4 1 )) The tortuous fishing shape is arranged along the side edges of the clip: 16. This first reticle holder 2 is provided. In order to support the edge portion of the mask 34 at the lower end portion 20a (bend portion), the lower end portions 2a are set to have the same height (in the same plane). Further, the light mask 2 includes a mask film 34a in which the opening pattern of the respective elements of the element is multiplexed, and a mask frame 34b that supports the peripheral portion of the mask film. (Refer to FIG. 2) . The upper end portion 20b of the gripping member 20 is protruded from the outside of the apparatus body 11, and the upper end portions 20b are connected to the connecting member 20c. Further, the end portion 20b of the ancient Λ Λ ^ 和 and the connecting member 20c are formed as the base end 嫂 of the first reticle holder 2 嫂. By moving the connecting member 20c up and down, the first mask holders 20, which are connected by the distal members at the connecting members 2c, are moved up and down. Therefore, each of the front end portions 20a provided under the first 氺 + 4 4 4 央 央 央 央 央 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持 维持One side becomes

2189-7758-PF 132329〇 Further, a telescopic device 22 for lifting and lowering the connecting member 20c is provided below the connecting member 20c. Also, the 20 λ ^ of the 20 20c is raised and lowered, that is, the connecting member 2 〇 c and the telescopic mounting 22 are arranged opposite each other. The expansion device '22 is in the embodiment, and the supply-retraction device 24 and the second expansion device 2_ are provided with second expansion devices 26#, n & In addition, if a brake such as a gas J or a hydraulic cylinder is used, and J is used, the plurality of tubes are placed in the case of the embodiment, and each tube is connected (t° - the extension is connected. More specifically, The slab member 23 is slid along the rotation of the collet 16 in the direction in which the telescopic device 24 (cylinder body) s is turned, and the upper portion of the device body 11 is equipped with 6's. a Yishan 侓 Μ ^ The structure of the plate member 23 is connected. Further, it is moved. The slab member 23 is attached to the upper and lower sides of the plate member 23 via the frame provided at the lower end of the plate member, the first expansion device 2 6 You·*·«· # # -r -a ^ . 0 is sighed. The rod 26a of the second telescopic device 26 passes through the plate member 2 3, pinching 9 β ο ΛΑ sp sp button 26a has a front end at the connecting member 2〇c is engaged, "the body of the second expansion device 26 (cylinder body) is broken on the lower side of the plate member 23, ττ彳日丨, + ^ 仟d, the rod 26a (second rod The hole portion (not shown) of the cymbal member 23 extends upward, and the front end 邛 is connected to the connecting member 2〇c, the 叱 connection or the contact. The device 26 and the first telescopic device 24 are independently expandable and contractible. With at least one of the expansion and contraction operations, the connecting member 2〇c is moved up and down. 22 is held by the clamp 18, the first mask holder 2° and telescopic device, slewing mechanism provided on the outer upper portion of the body 11

2189-7758-PF 11 1323290 30' becomes rotatable with the collet 16. The first mask holder 28 is interposed between the head loss 16 and the evaporation source 14, and the lower portion is bent inside, and is disposed opposite to the chuck 16, and has a configuration with the edge of the mask 34 (light) The cover frame 34b) corresponds to the extended portion 28a extending from the side of the mask 34, and the fitting pin 28b provided at the front end portion of the extended portion 28a. More specifically, the extended portion 28a supports the edge portion ' of the photomask 34 along the side edge of the collet 16 at the position where the cover dislocation holder 20 is disposed and is formed along the hook shape. The end of the first mask holder 20 extends from the outside of the mask 34 to the edge of the aperture 34. A fitting pin 28b that is in contact with the fitting hole 34c of the mask 34 is provided at the front end portion of the extending portion 28a. Further, in the embodiment, a fitting hole may be provided at the tip end portion of the extending portion 28 & and a fitting pin may be provided in the mask 34. Further, the base end portions of the respective extending portions 28a which are disposed so as to be sandwiched between the two first mask holders 2 are connected to each other. Also, in Figure 2

In the case of the non-type, the extension portion 28a is extended from the outer side of the light source 2 like the corner portions of the first cover 34. And 'the second reticle holder is based on the reference position 0QK ^ A of the vacuum evaporation device 1 A and the σ hole 34c and the fitting pin 2 are embedded & When the cover loss is carried on the holder 28, the photomask 34 is positioned at the position of the vacuum evaporation device 10. Next, the operation of the moving mechanism of the first mask holder 2〇 will be described: the operation of the vacuum evaporation apparatus 1〇. Further, in the following, the substrate _ 18, the first reticle holder 2 〇, and the 28th are referred to as the device upper mechanism. Figure 3 is a diagram of the construction: at the reference position. The 4th organization 4 brother 4 is to make the glass substrate and the mask pair

2189-7758-PF 12 1323290 Description of the upper mechanism of the device. Figure 5 is an illustration of the upper mechanism of the device after the glass substrate and the reticle are aligned.

A photomask 34 is disposed in advance on the second mask holder 28. At this time, since the second mask holder 28 is positioned at the reference position to the vacuum evaporation device 1', the fitting pin 28b and the fitting hole 34c are fitted to each other, and the mask 34 is broken, the mask is The 34-series position is determined for the vacuum evaporation apparatus 1〇. Further, the glass substrate 32 is inserted into the inside of the apparatus body 11 by the substrate transfer mechanism, and is inserted between the chuck 16 and the mask 34. Further, the glass substrate 32 is moved downward along with the lowering operation of the substrate transfer mechanism, and is carried on the substrate holder 18. Thereafter, the photomask 34 is moved upward by moving the second mask holder 28 upward, and the glass substrate 32 is carried on the mask 34. Further, the second mask holder 28 is continuously raised until the glass substrate is in contact with the surface (cooling surface). Further, when the glass substrate 32 is carried on the photomask 34, the fresh glass 34 is horizontal, and the - surface is maintained in this horizontal state, and is abutted against the chuck 16. Thereafter, the substrate holder 18 is raised until it contacts the glass substrate. Thereby, the glass substrate 32 is held in the folder 16 by the substrate (4) having the 18-plane maintained horizontally. Further, the second mask is held and 28 is lowered, and ... 34 is moved downward. Further, since the first expansion/contraction device 24 and the second expansion/contraction device 26 are shortened, the front end of the T-clamp of the first mask holder 20 is not transferred to the mask "and the above-mentioned board. Institutional contact. "slanting mark of soil' and afterwards 'utilization is set on glass substrate 32

2189-7758-PF 13 1323290 The alignment mark of the photomask 34 is set to align the glass substrate 32 and the photomask 34. Fig. 6 is an explanatory view of alignment of a glass substrate and a photomask. Further, Fig. 6(A) is a view showing the arrangement of a camera, a glass substrate, and a photomask. Further, the sixth picture (B) is an image taken by the camera, and shows an illustration when a positional deviation occurs. Further, the sixth (C) diagram is an image taken by the camera, and indicates a circular representation when the position is matched. Specifically, in the case of the glass substrate 32, the alignment marks 42 are provided at at least two places. The alignment mark 42 provided on the glass substrate 32 is, for example, > disposed at a diagonal corner of the glass substrate 32, and the electrode film of the EL unit is formed on the glass substrate, and The electrodes are formed of the same material. Further, the shape of the alignment mark 42 provided on the glass substrate 32 may be, for example, a circle, a dot, or a cross. Further, the alignment mark 44 provided in the photomask 34 is provided at a position corresponding to the alignment mark 42 on which the glass substrate 32 is provided, and the shape thereof may be a circle, a dot, or a cross, etc., and When the alignment mark 42 of the glass substrate 32 is a circle, the alignment mark 44 of the mask 34 can be used as a dot. When the alignment mark 42 of the glass substrate 32 is used as a dot, the alignment of the mask 34 can be made. The mark 44 may be a circle having a different size or a different shape. Further, in the case of the vacuum evaporation apparatus 1 , the camera 40 that images the alignment mark 42 provided on the glass substrate 32 and the alignment mark 44 provided on the mask 34 can be provided (refer to Fig. 6 (Α)). . Further, while the captured image is confirmed by the camera 4, the dot of the alignment mark 44 (42) enters the circle of the alignment mark 42 (44), and the light is 34 (the second mask holder) 28) χ (vertical), γ (horizontal), 0 (swing) direction adjustment

2189-7758-PF In the whole, the alignment between the glass substrate 32 and the reticle 34 is completed (refer to the sixth (B), (C), and the glass substrate 32 and the reticle 34 are aligned because the reticle 34 is for the vacuum. The steaming device 1 is determined to be positioned in the field of view of the camera 4 by the alignment mark 44 of the position mask 34. The position between the mask 34 and the glass substrate 32 is determined to be performed during the first stretch. Device 24 is elongated 'to make the first mask holder 2

l (refer to Figure 4). Thereby, the front end portion of the lower portion of the first mask holder 2 is raised. Further, the lower end portion of the first stretchable device 24 when it is extended is positioned below the mask 34 where the position determining operation is performed.

Thereafter, the second telescopic device 26 is extended to raise the first reticle holder 20 (refer to Fig. 5). Specifically, when the front end portion 20a of the lower portion of the first mask holder μ is raised, the mask 34 is loaded from the second mask holder 28 to the first mask holder 2, and When the lower end portion is continuously raised, the photomask 34 is covered on the glass substrate 32. When the mask 34 is covered on the glass substrate 32, the lower end portion 2〇a rises, that is, the elongation of the second telescopic device 26 stops. Further, the upper limit position of the lower end portion 2〇a when the second expansion device 26 is extended is positioned above the distance from the chuck face 16 when the photomask 34 covers the glass substrate 32 to the lower surface of the mask. (At least a few minutes). Thereafter, the glass substrate 32 and the reticle 34 are rotated by the operation of the slewing mechanism 30, and the organic material 12 is heated and sublimated by the heater Ub to form a pattern of the organic EL element on the glass substrate 32. Thereafter, the first telescopic device 24 and the second telescopic device 26 are shortened, and the first mask holder 20 is lowered. At this time, the mask 34 is attached to the first mask

2189-7758-PF 15 1323290 The lowering of the clamp 20 while being moved downwards toward the lower position of the first cover under the head loss 16 is replaced. Further, in the middle of the movement of the substrate loss-retaining cover holder 28, the member 18 is also lowered to move the glass base. Thereafter, the apparatus is placed so as to face the lower body 11, and the substrate transfer apparatus recovers the glass substrate 32. With the movement of the scorpion M &&& 曰, the organic R component according to the first-class 此类 clothing h # hood grip 20 moving mechanism and true * 蒗The device 1Q' is set as the extension of the first pomelo gripping movement by moving the first mask holder 2〇 up and down.

The shrinking device 24 and the second telescopic device 26 are independently stretched and contracted by the flute, and the reticle holder 20 becomes a two-stage up and down movement. - The reticle holder (10) is in two stages. Therefore, the heart-mask holder of the reticle 34 and the glass substrate 32 rises in a 20-stage manner, so that the mask 吏: the lower front end of the hood 20 is clamped so that The first...the last name, after the completion of the alignment, the 20th is also raised for a further period. If the light glass substrate 32 is used, the needle position n can be re-twisted in the glass ^ ^ the first light after the alignment = (4) of the cover holder 20 becomes shorter, and the reticle 34 and the glass substrate 32 are aligned, and the first cover holder 2 is used. The rise is simultaneously carried out, which shortens the manufacturing time of 70 pieces and increases the manufacturing speed. Further, the manufacturing efficiency of the organic EL element can be improved. The same as the organic device, the telescopic device 22 is connected to the plate member 23 at the other end 24a of the first telescopic device 24, and the second member (four) is disposed in the plate member 23, so that it is not separate from the device body U. The wirings for driving, such as the respective mechanisms (the upper mechanism of the device), interfere with each other. Therefore, by the first stretching device 24 and the second telescopic device 4 26, on the shaft of the twisting mechanism 30,

2189-7758-PF lifts the first reticle holder 20 in two stages. Further, the first-mask holder 20 shortens the first expansion device 24 and the second expansion device 26 until it is lowered to the lowest point when the glass substrate 32 is inserted and recovered and the mask 34 is exchanged. At other times, in a state in which the first telescopic device 24 is extended, the second telescopic device 26 may be expanded and contracted and moved up and down. Further, in the present embodiment, the first telescopic device 24 and the second telescopic device 26 are connected to each other via the plate member 23, and as another embodiment, the plate member is further connected to the other end 26a of the second telescopic device 26. The third telescopic device is disposed on the plate member as a configuration in which the other end of the third telescopic device is engaged (connected or contacted) with the connecting member 20c. That is, the first retractor, the second telescopic device, and the third telescopic device are connected to each other via the plate member, and the first reticle holder 20 can be divided into three stages. Further, when the retractable device is repeatedly connected to the upper and lower sides via the plate member, the first mask holder 20 can be divided and raised in a plurality of stages to be raised and lowered. Further, in the above-described embodiment, the description will be made regarding the configuration of the first expansion device 24 and the second expansion device 26 as the expansion/contraction device for lifting and lowering the first mask holder 20, using hydraulic pressure or hydraulic pressure. Multi-stage cylinders are also available. Further, in the present embodiment, the camera system for aligning the glass substrate and the photomask is provided in two types, but the invention is not limited thereto. That is, the camera system can be set as shown in Fig. 7(A), and four can be set as shown in Fig. 7(B).

Further, in the present embodiment, although the moving mechanism of the photomask is used to form the vacuum evaporation apparatus 10, the moving mechanism of the photomask is not limited to 2189-7758^PF 17 1323290 used in the vacuum evaporation apparatus 10. It can also be used in other film forming apparatuses such as a sputtering apparatus and a vapor phase growth apparatus. Further, the substrate is not limited to the glass substrate 32, and may be a substrate made of a material other than glass. The present invention is applicable to a film forming apparatus or the like which forms a thin film by evaporation and sputtering on a substrate such as glass or semiconductor. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is an explanatory view of a vacuum evaporation apparatus;

2 is a schematic plan view of the reticle holder; FIG. 3 is an explanatory view when the upper mechanism of the device is at the reference position; and FIG. 4 is a view of the upper mechanism of the device when the glass substrate and the reticle are aligned; Fig. 5 is an explanatory view of the device after aligning the glass substrate and the reticle; Fig. 6(A) to (C) are diagrams for aligning the glass substrate and the reticle; KA), (B) The figure is for explaining the arrangement position of the camera, and the figure 8 is an explanatory view of the upper portion of the vacuum evaporation device. [Description of main component symbols] 10 vacuum evaporation device, 11 device body, 16 chuck, 18 substrate holder,

2189-7758-PF 18 1323290 First reticle holder, connecting member, telescopic device, plate member, first telescopic device, second telescopic device, second reticle holder, glass substrate, photomask, camera.

2189-7758-PF

Claims (1)

1323290 No. 095105912 Chinese patent application scope Amendment date: 99.2.4 11 «~·-«·----- III MM, X. Patent scope: Year ~! Repair clothing 1. A reticle holder The moving mechanism can move the reticle disposed on the front surface of the substrate on which the organic EL element is formed to the substrate, and the moving mechanism includes the reticle holder for holding the reticle. a telescopic device that moves in a plurality of stages, wherein the telescopic device includes: a first telescopic device that is formed on a film forming device body that forms a film of the organic EL element on the substrate; and a second telescopic device that is in the first telescopic device The device is mounted while the reticle holder is engaged. 2. The mobile device of the reticle holder according to claim 1, wherein the first telescopic device and the second telescopic device are independent of each other and are expandable and contractible. 3. Translating the reticle clamp as described in claim 1 or 2 The moving mechanism, wherein the first telescopic device 'the second telescopic device can be a cylinder or a hydraulic cylinder. 4. A film forming apparatus for manufacturing an organic component on a substrate, comprising: a head 'opposite a supply source of an organic material to support the substrate; and a cover holder 'supporting a pattern of the organic ELS member The formed optical device causes the reticle to advance and retreat with respect to the telescopic device through the optical piano substrate in a plurality of stages; and 2189-7758-PF1 20 d厶j厶y\j slewing mechanism at the device body λ A # JL σ l· '+'. Further, the chuck, the light holding, and the stretching device are rotated in a horizontal direction; wherein the stretching device comprises: a first stretching device 'in the film forming device body of the organic substrate; and (4) a film forming The first telescopic device is a film forming device according to the fourth aspect of the invention, and the retractable device includes: The telescopic device is disposed on the device body; and the second telescopic device is attached to the first telescopic device, and can be independently extended and contracted with the first telescopic device that engages the mask holder. 2189-7758-PF1 21