TWI318933B - Manufacturing method for ink jet recording head chip, and manufacturing method for ink jet recording head - Google Patents
Manufacturing method for ink jet recording head chip, and manufacturing method for ink jet recording headInfo
- Publication number
- TWI318933B TWI318933B TW096107684A TW96107684A TWI318933B TW I318933 B TWI318933 B TW I318933B TW 096107684 A TW096107684 A TW 096107684A TW 96107684 A TW96107684 A TW 96107684A TW I318933 B TWI318933 B TW I318933B
- Authority
- TW
- Taiwan
- Prior art keywords
- manufacturing
- ink jet
- recording head
- jet recording
- head chip
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 2
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
- B41J2/1634—Manufacturing processes machining laser machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1635—Manufacturing processes dividing the wafer into individual chips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76898—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics formed through a semiconductor substrate
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006061166 | 2006-03-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200800622A TW200800622A (en) | 2008-01-01 |
TWI318933B true TWI318933B (en) | 2010-01-01 |
Family
ID=38479498
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096107684A TWI318933B (en) | 2006-03-07 | 2007-03-06 | Manufacturing method for ink jet recording head chip, and manufacturing method for ink jet recording head |
Country Status (4)
Country | Link |
---|---|
US (3) | US7824560B2 (zh) |
KR (1) | KR100944283B1 (zh) |
CN (1) | CN101032885B (zh) |
TW (1) | TWI318933B (zh) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4854336B2 (ja) * | 2006-03-07 | 2012-01-18 | キヤノン株式会社 | インクジェットヘッド用基板の製造方法 |
JP5495623B2 (ja) * | 2008-06-18 | 2014-05-21 | キヤノン株式会社 | 基板の加工方法、液体吐出ヘッド用基板の製造方法および液体吐出ヘッドの製造方法 |
JP5448581B2 (ja) * | 2008-06-19 | 2014-03-19 | キヤノン株式会社 | 液体吐出ヘッド用基板の製造方法及び基板の加工方法 |
US8173030B2 (en) * | 2008-09-30 | 2012-05-08 | Eastman Kodak Company | Liquid drop ejector having self-aligned hole |
JP5566130B2 (ja) * | 2009-02-26 | 2014-08-06 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
JP2010240869A (ja) * | 2009-04-01 | 2010-10-28 | Canon Inc | 液体吐出ヘッド用基板の製造方法 |
US20110020966A1 (en) * | 2009-07-23 | 2011-01-27 | Canon Kabushiki Kaisha | Method for processing silicon substrate and method for producing substrate for liquid ejecting head |
JP4659898B2 (ja) | 2009-09-02 | 2011-03-30 | キヤノン株式会社 | 液体吐出ヘッド用基板の製造方法 |
JP5574866B2 (ja) * | 2010-07-26 | 2014-08-20 | 浜松ホトニクス株式会社 | レーザ加工方法 |
WO2012014718A1 (ja) * | 2010-07-26 | 2012-02-02 | 浜松ホトニクス株式会社 | インターポーザの製造方法 |
JP2012121168A (ja) * | 2010-12-06 | 2012-06-28 | Canon Inc | 液体吐出ヘッド及びその製造方法 |
WO2013095430A1 (en) * | 2011-12-21 | 2013-06-27 | Hewlett Packard Development Company, L.P. | Fluid dispenser |
US9340023B2 (en) * | 2013-05-31 | 2016-05-17 | Stmicroelectronics, Inc. | Methods of making inkjet print heads using a sacrificial substrate layer |
JP2015168143A (ja) * | 2014-03-06 | 2015-09-28 | セイコーエプソン株式会社 | 貫通孔の形成方法、部材、インクジェットヘッド、インクジェットヘッドユニットおよびインクジェット式記録装置 |
JP6504939B2 (ja) * | 2015-06-26 | 2019-04-24 | キヤノン株式会社 | シリコン基板の加工方法及び液体吐出ヘッド用基板の製造方法 |
JP2018153978A (ja) * | 2017-03-16 | 2018-10-04 | キヤノン株式会社 | シリコン基板の加工方法および液体吐出ヘッドの製造方法 |
JP6562963B2 (ja) * | 2017-05-02 | 2019-08-21 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
JP7150569B2 (ja) * | 2018-11-08 | 2022-10-11 | キヤノン株式会社 | 基板と基板積層体と液体吐出ヘッドの製造方法 |
Family Cites Families (35)
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US4957592A (en) | 1989-12-27 | 1990-09-18 | Xerox Corporation | Method of using erodable masks to produce partially etched structures in ODE wafer structures |
JPH0577423A (ja) | 1991-09-24 | 1993-03-30 | Canon Inc | インクジエツト記録ヘツド |
JP3228028B2 (ja) | 1994-11-07 | 2001-11-12 | 富士ゼロックス株式会社 | インクジェット記録ヘッドの作製方法 |
JP3984689B2 (ja) | 1996-11-11 | 2007-10-03 | キヤノン株式会社 | インクジェットヘッドの製造方法 |
JPH111000A (ja) | 1997-04-15 | 1999-01-06 | Seiko Epson Corp | ノズルプレートの製造方法、インクジェットヘッド、ノズルプレート及びインクジェット記録装置 |
JP3416467B2 (ja) | 1997-06-20 | 2003-06-16 | キヤノン株式会社 | インクジェットヘッドの製造方法、インクジェットヘッドおよびインクジェットプリント装置 |
JP3416468B2 (ja) | 1997-06-20 | 2003-06-16 | キヤノン株式会社 | Si異方性エッチング方法、インクジェットヘッド、及びその製造方法 |
JP3957920B2 (ja) | 1998-06-11 | 2007-08-15 | キヤノン株式会社 | インクジェットヘッドの製造方法 |
JP2000015820A (ja) | 1998-06-30 | 2000-01-18 | Canon Inc | オリフィスプレートおよび液体吐出ヘッドの製造方法 |
US6563079B1 (en) * | 1999-02-25 | 2003-05-13 | Seiko Epson Corporation | Method for machining work by laser beam |
JP2000334952A (ja) | 1999-05-27 | 2000-12-05 | Canon Inc | 液体吐出ヘッド |
US6406636B1 (en) * | 1999-06-02 | 2002-06-18 | Megasense, Inc. | Methods for wafer to wafer bonding using microstructures |
US6675476B2 (en) | 2000-12-05 | 2004-01-13 | Hewlett-Packard Development Company, L.P. | Slotted substrates and techniques for forming same |
JP2002337347A (ja) | 2001-05-15 | 2002-11-27 | Canon Inc | 液体吐出ヘッドおよびその製造方法 |
US6805432B1 (en) | 2001-07-31 | 2004-10-19 | Hewlett-Packard Development Company, L.P. | Fluid ejecting device with fluid feed slot |
JP2003053700A (ja) | 2001-08-17 | 2003-02-26 | Fuji Xerox Co Ltd | シリコン結晶異方性エッチング方法、インク流路板製造方法、インク流路板、インクジェットプリントヘッドおよびインクジェットプリンタ |
TW520341B (en) * | 2001-11-20 | 2003-02-11 | Ind Tech Res Inst | A method for manufacturing a chamber of the thin film bulk acoustic wave resonator (FBAR) |
JP4298414B2 (ja) | 2002-07-10 | 2009-07-22 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
US6540337B1 (en) * | 2002-07-26 | 2003-04-01 | Hewlett-Packard Company | Slotted substrates and methods and systems for forming same |
JP4078295B2 (ja) | 2002-12-27 | 2008-04-23 | キヤノン株式会社 | インクジェットヘッド用基体およびこれを用いるインクジェットヘッドとその製造方法 |
JP3998254B2 (ja) | 2003-02-07 | 2007-10-24 | キヤノン株式会社 | インクジェットヘッドの製造方法 |
TW580436B (en) | 2003-06-27 | 2004-03-21 | Benq Corp | Ink-jet micro-injector device and fabrication method thereof |
JP4522086B2 (ja) | 2003-12-15 | 2010-08-11 | キヤノン株式会社 | 梁、梁の製造方法、梁を備えたインクジェット記録ヘッド、および該インクジェット記録ヘッドの製造方法 |
US7198353B2 (en) * | 2004-06-30 | 2007-04-03 | Lexmark International, Inc. | Integrated black and colored ink printheads |
US20060032841A1 (en) * | 2004-08-10 | 2006-02-16 | Tan Kee C | Forming features in printhead components |
JP4854336B2 (ja) | 2006-03-07 | 2012-01-18 | キヤノン株式会社 | インクジェットヘッド用基板の製造方法 |
JP5219439B2 (ja) * | 2007-09-06 | 2013-06-26 | キヤノン株式会社 | インクジェット記録ヘッド用基板の製造方法 |
JP4480182B2 (ja) * | 2007-09-06 | 2010-06-16 | キヤノン株式会社 | インクジェット記録ヘッド用基板及びインクジェット記録ヘッドの製造方法 |
JP5031493B2 (ja) * | 2007-09-06 | 2012-09-19 | キヤノン株式会社 | インクジェットヘッド用基板の製造方法 |
JP5566130B2 (ja) * | 2009-02-26 | 2014-08-06 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
US20110020966A1 (en) * | 2009-07-23 | 2011-01-27 | Canon Kabushiki Kaisha | Method for processing silicon substrate and method for producing substrate for liquid ejecting head |
JP4659898B2 (ja) * | 2009-09-02 | 2011-03-30 | キヤノン株式会社 | 液体吐出ヘッド用基板の製造方法 |
EP2355138B1 (en) * | 2010-01-28 | 2016-08-24 | Canon Kabushiki Kaisha | Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate |
JP2013028155A (ja) * | 2011-06-21 | 2013-02-07 | Canon Inc | 液体吐出ヘッド用基板の製造方法 |
JP6095320B2 (ja) * | 2011-12-02 | 2017-03-15 | キヤノン株式会社 | 液体吐出ヘッド用基板の製造方法 |
-
2007
- 2007-02-27 US US11/679,656 patent/US7824560B2/en not_active Ceased
- 2007-03-06 TW TW096107684A patent/TWI318933B/zh active
- 2007-03-07 KR KR1020070022312A patent/KR100944283B1/ko active IP Right Grant
- 2007-03-07 CN CN2007100800825A patent/CN101032885B/zh not_active Expired - Fee Related
-
2010
- 2010-09-09 US US12/878,339 patent/US8057017B2/en not_active Expired - Fee Related
-
2012
- 2012-11-01 US US13/666,287 patent/USRE44945E1/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20110102511A1 (en) | 2011-05-05 |
US7824560B2 (en) | 2010-11-02 |
KR20070092145A (ko) | 2007-09-12 |
US20070212890A1 (en) | 2007-09-13 |
USRE44945E1 (en) | 2014-06-17 |
CN101032885B (zh) | 2012-01-25 |
US8057017B2 (en) | 2011-11-15 |
KR100944283B1 (ko) | 2010-02-24 |
CN101032885A (zh) | 2007-09-12 |
TW200800622A (en) | 2008-01-01 |
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