TWI304236B - Method for manufacturing stacked chip pakcage - Google Patents
Method for manufacturing stacked chip pakcage Download PDFInfo
- Publication number
- TWI304236B TWI304236B TW091135655A TW91135655A TWI304236B TW I304236 B TWI304236 B TW I304236B TW 091135655 A TW091135655 A TW 091135655A TW 91135655 A TW91135655 A TW 91135655A TW I304236 B TWI304236 B TW I304236B
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- Taiwan
- Prior art keywords
- substrate
- bonding
- semiconductor wafer
- manufacturing
- package
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 238000000034 method Methods 0.000 title claims description 18
- 235000012431 wafers Nutrition 0.000 claims description 59
- 239000004065 semiconductor Substances 0.000 claims description 49
- 239000000758 substrate Substances 0.000 claims description 41
- 229910000679 solder Inorganic materials 0.000 claims description 18
- 238000000465 moulding Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 229910052746 lanthanum Inorganic materials 0.000 claims 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims 1
- 238000007796 conventional method Methods 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 2
- 239000000306 component Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007596 consolidation process Methods 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Classifications
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- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
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- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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Description
1304236 _案號91135655_年月日__ 五、發明說明(1) 【本發明所屬之技術領域】 本發明係關於半導體封裝的製造方法,尤其是關於具 有多數疊層半導體構造的疊層晶片封裝的製造方法者。 【先前技術】 配合電子機器輕薄而短小化的趨勢,做為其核心元件 的封裝之高密度化與高結實化也漸成重要的因素。又在電 腦中,由於記憶容量之增加,雖然如大容量RAM及快閃記 憶體的晶片尺寸自然會增大,但以上述情形,封裝之小型 化傾向,乃成研究之對象。 於是,為了減小封裝尺寸而提出的各種方案例中,含 裝有複數的晶片或封裝的疊層晶片封裝(Mu 11 i Ch i p Package MCP),疊層晶片模組(Mult i Chip Module MCM) 等,主要皆屬於將半導體晶片及封裝平面排列於基板上而 包裝的方法,所以製作上有其限度。 為了克服這種限度,曾有將同一記憶容量的晶片整體 的以複數個疊層封裝方式的提議,通常稱為疊層晶片封裝 (Stacked Chip Package)0 目前前述疊層晶片封裝的技術已成為簡單化的過程, 故可減低疊層晶片封裝的製造成本,又有適於大量生產的 優點。但另一方面,卻有因晶片尺寸的增大而設計封裝内 部的引線時感覺空間不足的缺失。 第1圖為傳統技術疊層晶片封裝製造方法的剖面圖。 如第1圖所示,傳統技術的疊層晶片封裝1 0 0,其具有的構 造為利用基板1 1 0,將多數的半導體晶片1 2 0、1 3 0、1 4 0以 平面包裝成封裝者。
第7頁 1304236 案號 91135655 曰 修正 五、發明說明(2) 在該基板11 0頂面的包裝領域,以黏著劑11 4將各該半 導體晶片1 2 0、1 3 0、1 4 0黏貼,而在基板1 1 0黏著面的反 面,形成多數結合焊節點1 2 2、1 3 2、1 4 2的構造。此時, 以階梯狀疊層各該半導體晶片1 2 0、1 3 0、1 4 0。又該等結 合焊接點1 2 2、1 3 2、1 4 2則以多數個形成於各該半導體晶 片1 2 0、1 3 0、1 4 0頂面邊緣部份。 各該結合焊接點1 2 2、1 3 2、1 4 2各對應於在基板1 1 0頂 面形成的導電性圖案1 1 2,而以結合線1 2 4、1 3 4、1 4 4做電 氣上的連接。 於是為了保護半導體晶片1 2 0、1 3 0、1 4 0及在基板1 1 〇 頂面形成的電氣性連接部份,以環氧樹脂系的封止用樹脂 封止而形成封裝驅體1 5 〇。 基板1 1 0上的導電性圖案1丨2,係為一種互聯用配線 ,,用以電氣上連接半導體晶片1 2 0、1 3 0、1 4 0與焊接球 1 6 0者。 • 半導體晶片1 2 0、1 3 0、1 4 0可利用形成於基板1 1 0頂面 的電路圖案互相做電氣上的連接,亦可將導電性圖案丨i 2 與半導體晶片的焊接點i 2、2 2、3 2同與結合線1 2 4、1 3 4、 1 4 4結合’因而形成電氣上的連接。 但是以傳統技術疊層的半導體晶片尺寸互有不同,如 此則當結合焊節點只係面向上(f ace-up)疊層排列於邊緣 部份的半導體晶片時,遇到半導體晶片尺寸相同,或結合 焊節點排列於半導體晶片之中央部份的場合,傳統方法就 無法適用。 又’在傳統技術上無法增加疊層半導體晶片的引線
1304236 _案號91135655_年月曰 修正_ 五、發明說明(3) 數,只好將頂部的半導體晶片與底部半導體晶片的CS腳針 (chip select pin)予以割裂為二,一根連接於CS腳針, 另一根連接於NC針來使用,因此須要NC針的存在。 【本發明之内容】 本發明乃為了解決上述傳統問題而開發者,本發明之 目的在提供一種疊層晶片封裝的製造方法,其能在中心部 份個別形成結合焊接點,而以面向上(face up)及面向下 (face down)方式疊積同一尺寸的半導體晶片者。 為了達成上述目的,本發明之製造疊層晶片封裝之方 法,其包含的步驟為:1.在中心部位排列有多數第一結合 焊接點的第一半導體晶片上,貼附具有第一中心窗的第一 基板;2.形成第一結合線以連接該第一半導體晶片與該第 一基板;3.在中心部位排列有多數第二結合焊接點的第二 半導體晶片上9貼附具有第二中心窗的苐二基板,4.形成 第二結合線以連接該第二半導體晶片與該第二基板;5 ·互 相貼著所得第一與第二半導體晶片的背面;6.形成第三結 合線以連接該第一與第二基板;7.塑造一成形體以覆蓋於 該第一、第二與第三結合線;及8.黏貼一導電性球於該第 一基板,為其特徵。 【本發明之實施方式】 本發明之目的,其他特徵及優點,可參照文後附圖詳 讀本發明具體實施例的詳細描述,即可瞭解。 第2A圖至第2F圖為說明本發明疊層晶片封裝製造方法 第一實施例的流程剖面圖。 如第2A圖所示,首先在排列有多數個第一結合焊接點
1304236 _案號91135655_年月曰 修正_ 五、發明說明(4) (未圖示)於中央部位的第一半導體晶片1 0上,貼附形成有 第一中央窗口 1 3的第一基板1 2,接著利用第1結合線1 4連 接第一結合焊接點與第一基板1 2。 其次如第2B圖所示,在排列有多數個第二結合焊接點 (未圖示)於中央部位的第二半導體晶片2 0上,貼附形成有 第二中央窗口 2 3的第二基板2 2。之後利用第二結合線2 4連 接第二結合焊接點與第二基板2 2。此時第一與第二半導體 晶片1 0與2 0之尺寸相同。 其次如第2C圖所示,將以前流程中所得第一與第二半 導體晶片相結合。此時該結合流程中係將第一與第二半導 體晶片的背面(即形成有電路之面之背面)互相接合。 其次,如第2D圖所示,利用第三結合線30連接第一與 第二基板1 2與2 2。此時所用第一、第二及第三結合線1 4、 2 4、3 0之材質為鋁或金。 此後,如第2 E圖所示,對所得之物進行成形工程而形 成覆蓋各第一、第二及第三結合線14、24、3 0的成形體 32° 接著如第2F圖所示,貼附導電性焊球34於第一基板1 2 底面的焊球埠(未圖示)上。焊球琿的直徑有1 5 0〜 1 7 0 // m。又導電性焊球3 4直徑有1 0 0 // m〜1 m m。焊球3 4的 主成份為Sn,再加上Pb、In、Bi、Au、Zn、Cu或Sb中之任 何一個而形成者。 第3A至3E圖為說明本發明疊層晶片封裝製造方法第二 實施例的流程剖面圖。 如第3A圖所示,該製造方法係利用如膠帶(未圖示)等
第10頁 f ty 1304236 __案號91135655_年月曰 絛正__ 五、發明說明(5) 在中心部位排列有多數個第一結合焊接點(未圖示)的第一 半導體晶片1 0 0上貼附形成有中心窗口 1 0 3的第一基板 102° 接著貼附第一堰1 0 6於第一基板1 0 2上後,以結合工程 形成連接第一結合焊接點與第一基板1 0 2用之第一結合線 1 0 4。此時第一堰1 0 6扮演防止此後之封裝成形流程中傾斜 或曝露第一半導體晶片100之角色。 其次,如第3B圖所示,利用如膠帶等在中心部位排列 有多數個第二結合焊接點(未圖示)的第二半導體晶片2 0 0 上貼附形成有第二中心窗口 2 0 3的第二基板2 0 2。此後貼附 第二堰2 0 6於第二基板2 0 2上後,以結合工程形成連接第二 結合焊接點與第二基板2 0 2用之第二結合線2 0 4。此時第二 堰2 0 6扮演防止此後之封裝成形流程中第二半導體2 〇 〇產生 模製溢料(mold flash)之角色。又第一與第二堰1〇 6與206 係利用抗焊或絕緣物質形成,此時該第一與第二堰1 〇 6、 2 0 6之厚度維持在2 0 // m〜1匪,以防止在接下去之流程中 成形混合物之流失。 接下去如第3 C圖所示,將已完成成形的第一及第二半 導體晶片1 〇 0、2 0 0的背面互相貼著後,利用結合工程形成 連接第二與第一基板2 0 2與1 0 2用的第三結合線2 3 0。 其次如第3E圖所示,將以前流程中所得物施以成形工 程形成成形體2 5 0以覆蓋各第一及第二半導體晶片1 〇 〇、 200、弟一、第二及第三結合線104、204、230。此時該成 形工程中如弟3D圖所示,須防止起因於上、下模子262、 26 0表面與第一與第二堰106、20 6之接觸而在面向上之方
第11頁 1304236 -案号虎 91挪咖 车月日 修正 五、發明說明(6) ' ' " 向因不受歡迎之成形料流移而引起第一及第二半導體晶片 1 0 0、2 0 0之傾斜或曝露,並抑制面向上方向的模製溢料 產生。 下模2 6 0與第二堰2 0 2間的空隙應保持很小,而以膠帶 貼著於第二半導體晶片方向而使該晶片免受損傷並防止模 製溢料之產生。 、 此後貼著導電性焊球2 5 2於第二基板之焊球埠(未圖 示)上。焊球埠之直徑在丄5 〇〜7 〇 〇// m之間。又導電性焊球 2 5 2之直色 追加Pb、In、Bi、Au、Zn、Cu或Sb中之一而形成者了 ^ 在本發明的第一與第二實施例中,將在中心部位 有多數個結合焊接點而具同一尺寸的第一與第二半導雕曰 片之背面互相貼著’然後進行結合線工程及成形工程。曰曰 •如上揭說明,將在中心部位形成有結合焊接球的 尺寸之各半導體晶片背面互相接著並形成多數個疊厣, 此可得以最小面積擴大記憶體密度。 9 本發明在不脫離其要旨的範圍内可做多種變更而每 大& 〇 果 以上業已舉實施例做了 並未被上揭實施例所限定, 屬具有普通的知識者,均可 做修飾與變更。 本發明的詳細描述。但本發明 在本發明所屬技術領域内)凡 在不脫離本發明構想與精神而
1304236 _案號91135655_年月曰 修正_ 圖式簡單說明 第1圖為說明以傳統技術製造疊層晶片封裝之方法的 剖 面圖 ; 第2A至2F圖為說明本發明疊層晶片封裝製造方法第一 實施例的流程剖面圖; 第3A至3E圖為說明本發明疊層晶片封裝製造方法第二 實施例的流程剖面圖。 【圖中元件編號與名稱對照表】
1 0、2 0 :半導體晶片 1 2、2 2 :基板 1 0 0、2 0 0 :第一半導體晶片 1 0 2 :第一基板
103 、2 0 3 :中心窗口 104 ^ 2 0 4、2 3 0 : 結合 線 106 :第一堰 110 :基板 112 :導電性圖案 114 :黏貼劑 120 、130、 140: 半導 體晶 片 122 、132、 142: 結合 焊節 點 124 > 134〜144: 結合 線 13: 中心窗口 14 : 結合線
第13頁 C S. 1 1304236 _案號91135655_年月日_修正 圖式簡單說明
第14頁 150 : 封裝驅體 160 : 焊接球 20 : 半導體晶片 2 0 2 : 第二堰 2 0 6 : 第二堰 23 : 中心窗 24 : 結合線 252 導電性焊球 260 下模子 262 上模子 30 : 結合線 32 : 成形體 34 : 導電性焊球
Claims (1)
1304236 _案號91135655_年月日__ 六、申請專利範圍 1 . 一種製造疊層晶片封裝之方法,其步驟為: 在中心部位排列有多數第一結合焊接點的第一半導體 晶片上5貼附具有弟一中心窗的弟一基板, 形成第一結合線以連接該第一半導體晶片與該第一基 板; 在中心部位排列有多數第二結合焊接點的第二半導體 晶片上’貼附具有苐二中心窗的第二基板; 形成第二結合線以連接該第二半導體晶片與該第二基 板; 互相貼著所得第一與第二半導體晶片的背面; 形成第三結合線以連接該第一與第二基板; 塑造一成形體以覆蓋於該第一、第二與第三結合線; 及 黏貼一導電性球於該第一基板; 其中,該方法更包含在形成有該第一及第二中心窗的 第一及第二基板背面分別形成第一及第二位置固定用堰之 步驟。 2 .如申請專利範圍第1項之製造疊層晶片封裝之方 法,其中所述第一及第二位置固定用堰係利用抗焊物質 者。 3.如申請專利範圍第1項之製造疊層晶片封裝之方 法,其中所述第一及第二位置固定用堰的厚度為20/z m〜 1 mm °
第15頁 3 1304236
-^左圖 代表符號簡單說明: 12: 基 板 14: 結 合 線 22 : 基 板 24: 結 合 線 32 : 成 形 體 五、(一)、本案代表圖為··農 (二)、本案代表圖之元件 1 〇:半導體晶片 1 3 :中心窗 2 〇 =半導體晶片 2 3 ·中心窗 3 0 :結合線 3 4 :導電性焊球 五、英文發明摘要(發明名稱:METHOD FOR MANUFACTURING STACKED CHIP PACKAGE) the i nput/output block unit and the bottom serial/parallei shifter unit is connected between the bottom memory bank unit and the input/output block unit. The interface logic circuit unit generates a signal for selecting the top or the bottom memory bank unit according to read or write command received from the external. The DLL unit generates a clock signal according to the signal
第3頁 1304236 _案號91135655_年月日_ 六、指定代表圖 第5頁
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US (1) | US6818474B2 (zh) |
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Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6531335B1 (en) * | 2000-04-28 | 2003-03-11 | Micron Technology, Inc. | Interposers including upwardly protruding dams, semiconductor device assemblies including the interposers, and methods |
US7254226B1 (en) | 2001-05-08 | 2007-08-07 | At&T Intellectual Property, Inc. | Call waiting priority alert |
DE10127009A1 (de) * | 2001-06-05 | 2002-12-12 | Infineon Technologies Ag | Kunststoffgehäuse mit mehreren Halbleiterchips und einer Umverdrahtungsplatte sowie ein Verfahren zur Herstellung des Kunststoffgehäuses in einer Spritzgußform |
US7085358B2 (en) | 2001-06-25 | 2006-08-01 | Bellsouth Intellectual Property Corporation | Visual caller identification |
US7315614B2 (en) | 2001-08-14 | 2008-01-01 | At&T Delaware Intellectual Property, Inc. | Remote notification of communications |
US7269249B2 (en) | 2001-09-28 | 2007-09-11 | At&T Bls Intellectual Property, Inc. | Systems and methods for providing user profile information in conjunction with an enhanced caller information system |
US7315618B1 (en) | 2001-12-27 | 2008-01-01 | At&T Bls Intellectual Property, Inc. | Voice caller ID |
US7139374B1 (en) | 2002-07-23 | 2006-11-21 | Bellsouth Intellectual Property Corp. | System and method for gathering information related to a geographical location of a callee in a public switched telephone network |
US7623645B1 (en) | 2002-07-23 | 2009-11-24 | At&T Intellectual Property, I, L.P. | System and method for gathering information related to a geographical location of a caller in a public switched telephone network |
US7978833B2 (en) | 2003-04-18 | 2011-07-12 | At&T Intellectual Property I, L.P. | Private caller ID messaging |
US7443964B2 (en) | 2003-04-18 | 2008-10-28 | At&T Intellectual Property, I,L.P. | Caller ID messaging |
US7061121B2 (en) * | 2003-11-12 | 2006-06-13 | Tessera, Inc. | Stacked microelectronic assemblies with central contacts |
US7623849B2 (en) | 2003-11-13 | 2009-11-24 | At&T Intellectual Property, I, L.P. | Method, system, and storage medium for providing comprehensive originator identification services |
US7672444B2 (en) | 2003-12-24 | 2010-03-02 | At&T Intellectual Property, I, L.P. | Client survey systems and methods using caller identification information |
CN100386876C (zh) * | 2004-03-26 | 2008-05-07 | 乾坤科技股份有限公司 | 多层基板堆叠封装结构 |
US8195136B2 (en) | 2004-07-15 | 2012-06-05 | At&T Intellectual Property I, L.P. | Methods of providing caller identification information and related registries and radiotelephone networks |
KR100771860B1 (ko) * | 2004-12-28 | 2007-11-01 | 삼성전자주식회사 | 솔더볼을 사용하지 않는 반도체 패키지 모듈 및 그 제조방법 |
SG130055A1 (en) | 2005-08-19 | 2007-03-20 | Micron Technology Inc | Microelectronic devices, stacked microelectronic devices, and methods for manufacturing microelectronic devices |
DE102005039786A1 (de) * | 2005-08-22 | 2007-03-15 | Infineon Technologies Ag | Dual-Die-FBGA |
SG130066A1 (en) * | 2005-08-26 | 2007-03-20 | Micron Technology Inc | Microelectronic device packages, stacked microelectronic device packages, and methods for manufacturing microelectronic devices |
KR100791576B1 (ko) * | 2005-10-13 | 2008-01-03 | 삼성전자주식회사 | 볼 그리드 어레이 유형의 적층 패키지 |
US20070268660A1 (en) * | 2006-05-17 | 2007-11-22 | Stats Chippac Ltd. | Spacerless semiconductor package chip stacking system |
US7696629B2 (en) * | 2007-04-30 | 2010-04-13 | Chipmos Technology Inc. | Chip-stacked package structure |
JP2009038142A (ja) * | 2007-07-31 | 2009-02-19 | Elpida Memory Inc | 半導体積層パッケージ |
US8243909B2 (en) | 2007-08-22 | 2012-08-14 | At&T Intellectual Property I, L.P. | Programmable caller ID |
US8160226B2 (en) | 2007-08-22 | 2012-04-17 | At&T Intellectual Property I, L.P. | Key word programmable caller ID |
US8247894B2 (en) * | 2008-03-24 | 2012-08-21 | Stats Chippac Ltd. | Integrated circuit package system with step mold recess |
US8102666B2 (en) * | 2008-08-19 | 2012-01-24 | Stats Chippac Ltd. | Integrated circuit package system |
KR101026488B1 (ko) * | 2009-08-10 | 2011-04-01 | 주식회사 하이닉스반도체 | 반도체 패키지 |
US8553420B2 (en) | 2010-10-19 | 2013-10-08 | Tessera, Inc. | Enhanced stacked microelectronic assemblies with central contacts and improved thermal characteristics |
KR101116731B1 (ko) * | 2010-10-27 | 2012-02-22 | 주식회사 하이닉스반도체 | 듀얼 다이 패키지 |
US8378478B2 (en) | 2010-11-24 | 2013-02-19 | Tessera, Inc. | Enhanced stacked microelectronic assemblies with central contacts and vias connected to the central contacts |
US8952516B2 (en) | 2011-04-21 | 2015-02-10 | Tessera, Inc. | Multiple die stacking for two or more die |
US8304881B1 (en) | 2011-04-21 | 2012-11-06 | Tessera, Inc. | Flip-chip, face-up and face-down wirebond combination package |
US8633576B2 (en) | 2011-04-21 | 2014-01-21 | Tessera, Inc. | Stacked chip-on-board module with edge connector |
US9013033B2 (en) | 2011-04-21 | 2015-04-21 | Tessera, Inc. | Multiple die face-down stacking for two or more die |
US8928153B2 (en) | 2011-04-21 | 2015-01-06 | Tessera, Inc. | Flip-chip, face-up and face-down centerbond memory wirebond assemblies |
US8970028B2 (en) | 2011-12-29 | 2015-03-03 | Invensas Corporation | Embedded heat spreader for package with multiple microelectronic elements and face-down connection |
US8338963B2 (en) | 2011-04-21 | 2012-12-25 | Tessera, Inc. | Multiple die face-down stacking for two or more die |
RU2678321C2 (ru) | 2013-09-02 | 2019-01-28 | Филипс Лайтинг Холдинг Б.В. | Прозрачная вычислительная конструкция |
JP6504401B2 (ja) * | 2015-11-05 | 2019-04-24 | パナソニックIpマネジメント株式会社 | はんだ合金およびそれを用いた実装構造体 |
US10672696B2 (en) * | 2017-11-22 | 2020-06-02 | Advanced Semiconductor Engineering, Inc. | Semiconductor device package |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5814881A (en) * | 1996-12-20 | 1998-09-29 | Lsi Logic Corporation | Stacked integrated chip package and method of making same |
US6072233A (en) * | 1998-05-04 | 2000-06-06 | Micron Technology, Inc. | Stackable ball grid array package |
US6020629A (en) * | 1998-06-05 | 2000-02-01 | Micron Technology, Inc. | Stacked semiconductor package and method of fabrication |
KR100293815B1 (ko) * | 1998-06-30 | 2001-07-12 | 박종섭 | 스택형 패키지 |
US6515355B1 (en) * | 1998-09-02 | 2003-02-04 | Micron Technology, Inc. | Passivation layer for packaged integrated circuits |
KR100304959B1 (ko) | 1998-10-21 | 2001-09-24 | 김영환 | 칩 적층형 반도체 패키지 및 그 제조방법 |
US6118176A (en) * | 1999-04-26 | 2000-09-12 | Advanced Semiconductor Engineering, Inc. | Stacked chip assembly utilizing a lead frame |
KR100297451B1 (ko) | 1999-07-06 | 2001-11-01 | 윤종용 | 반도체 패키지 및 그의 제조 방법 |
TW415056B (en) * | 1999-08-05 | 2000-12-11 | Siliconware Precision Industries Co Ltd | Multi-chip packaging structure |
KR20010027266A (ko) * | 1999-09-13 | 2001-04-06 | 윤종용 | 적층 패키지 |
JP2001085604A (ja) * | 1999-09-14 | 2001-03-30 | Toshiba Corp | 半導体装置 |
US6322903B1 (en) | 1999-12-06 | 2001-11-27 | Tru-Si Technologies, Inc. | Package of integrated circuits and vertical integration |
US6376904B1 (en) * | 1999-12-23 | 2002-04-23 | Rambus Inc. | Redistributed bond pads in stacked integrated circuit die package |
KR20010060875A (ko) * | 1999-12-28 | 2001-07-07 | 윤종용 | 듀얼 다이 패키지 |
US6605875B2 (en) * | 1999-12-30 | 2003-08-12 | Intel Corporation | Integrated circuit die having bond pads near adjacent sides to allow stacking of dice without regard to dice size |
KR100639556B1 (ko) * | 2000-01-06 | 2006-10-31 | 삼성전자주식회사 | 칩 스케일 적층 패키지와 그 제조 방법 |
US6344401B1 (en) | 2000-03-09 | 2002-02-05 | Atmel Corporation | Method of forming a stacked-die integrated circuit chip package on a water level |
DE10023823A1 (de) * | 2000-05-15 | 2001-12-06 | Infineon Technologies Ag | Multichip-Gehäuse |
KR100379600B1 (ko) | 2000-08-14 | 2003-04-10 | 삼성전자주식회사 | 듀얼 칩 패키지의 제조 방법 |
US7273769B1 (en) * | 2000-08-16 | 2007-09-25 | Micron Technology, Inc. | Method and apparatus for removing encapsulating material from a packaged microelectronic device |
US20020043709A1 (en) * | 2000-10-13 | 2002-04-18 | Yeh Nai Hua | Stackable integrated circuit |
US6451626B1 (en) | 2001-07-27 | 2002-09-17 | Charles W.C. Lin | Three-dimensional stacked semiconductor package |
US20030134451A1 (en) * | 2002-01-14 | 2003-07-17 | Picta Technology, Inc. | Structure and process for packaging back-to-back chips |
US6472736B1 (en) * | 2002-03-13 | 2002-10-29 | Kingpak Technology Inc. | Stacked structure for memory chips |
KR100460063B1 (ko) * | 2002-05-03 | 2004-12-04 | 주식회사 하이닉스반도체 | 센터 패드 칩 적층 볼 그리드 어레이 패키지 및 그 제조방법 |
-
2001
- 2001-12-29 KR KR10-2001-0088327A patent/KR100480909B1/ko not_active IP Right Cessation
-
2002
- 2002-12-10 TW TW091135655A patent/TWI304236B/zh not_active IP Right Cessation
- 2002-12-11 DE DE10257707A patent/DE10257707B4/de not_active Expired - Fee Related
- 2002-12-11 US US10/316,647 patent/US6818474B2/en not_active Expired - Fee Related
- 2002-12-19 CN CNB021578087A patent/CN1188906C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100480909B1 (ko) | 2005-04-07 |
TW200410346A (en) | 2004-06-16 |
CN1188906C (zh) | 2005-02-09 |
KR20030059464A (ko) | 2003-07-10 |
DE10257707B4 (de) | 2010-04-08 |
DE10257707A1 (de) | 2005-01-13 |
US20030124766A1 (en) | 2003-07-03 |
CN1430251A (zh) | 2003-07-16 |
US6818474B2 (en) | 2004-11-16 |
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