TWI302908B - Additives to prevent degradation of alkyl-hydrogen siloxanes - Google Patents
Additives to prevent degradation of alkyl-hydrogen siloxanes Download PDFInfo
- Publication number
- TWI302908B TWI302908B TW92125785A TW92125785A TWI302908B TW I302908 B TWI302908 B TW I302908B TW 92125785 A TW92125785 A TW 92125785A TW 92125785 A TW92125785 A TW 92125785A TW I302908 B TWI302908 B TW I302908B
- Authority
- TW
- Taiwan
- Prior art keywords
- linear
- methylphenyl
- methyl
- group
- decane
- Prior art date
Links
- 239000001257 hydrogen Substances 0.000 title claims description 29
- 229910052739 hydrogen Inorganic materials 0.000 title claims description 29
- 239000000654 additive Substances 0.000 title description 42
- 230000015556 catabolic process Effects 0.000 title description 4
- 238000006731 degradation reaction Methods 0.000 title description 4
- -1 ethyl hexaoxane Chemical compound 0.000 claims description 168
- 239000000203 mixture Substances 0.000 claims description 86
- 150000001875 compounds Chemical class 0.000 claims description 81
- 238000000034 method Methods 0.000 claims description 79
- 125000003545 alkoxy group Chemical group 0.000 claims description 70
- 125000003118 aryl group Chemical group 0.000 claims description 69
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 68
- 239000007789 gas Substances 0.000 claims description 63
- 239000001301 oxygen Substances 0.000 claims description 61
- 229910052760 oxygen Inorganic materials 0.000 claims description 61
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 57
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 51
- 239000000758 substrate Substances 0.000 claims description 46
- 125000004122 cyclic group Chemical group 0.000 claims description 43
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 42
- 239000003963 antioxidant agent Substances 0.000 claims description 42
- 230000003078 antioxidant effect Effects 0.000 claims description 40
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 40
- 125000000217 alkyl group Chemical group 0.000 claims description 36
- 239000000126 substance Substances 0.000 claims description 35
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 31
- 238000000354 decomposition reaction Methods 0.000 claims description 30
- 239000004575 stone Substances 0.000 claims description 30
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 26
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 26
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 25
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 24
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 21
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 20
- 230000008569 process Effects 0.000 claims description 19
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 claims description 18
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 claims description 18
- 239000004065 semiconductor Substances 0.000 claims description 17
- 150000002923 oximes Chemical class 0.000 claims description 16
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 15
- 125000003944 tolyl group Chemical group 0.000 claims description 15
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 12
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 12
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 claims description 12
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 11
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 claims description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 claims description 10
- LHGVFZTZFXWLCP-UHFFFAOYSA-N guaiacol Chemical compound COC1=CC=CC=C1O LHGVFZTZFXWLCP-UHFFFAOYSA-N 0.000 claims description 10
- IERFMOXUAANTKX-UHFFFAOYSA-N hexaoxane Chemical compound O1OOOOO1 IERFMOXUAANTKX-UHFFFAOYSA-N 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 9
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 9
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 9
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 claims description 9
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 7
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 7
- 150000002989 phenols Chemical class 0.000 claims description 7
- 229910052707 ruthenium Inorganic materials 0.000 claims description 7
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 claims description 6
- 239000001569 carbon dioxide Substances 0.000 claims description 6
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 6
- 239000012707 chemical precursor Substances 0.000 claims description 6
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 6
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 6
- 238000012360 testing method Methods 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 5
- 150000001924 cycloalkanes Chemical class 0.000 claims description 5
- 239000002019 doping agent Substances 0.000 claims description 5
- 229960001867 guaiacol Drugs 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000001307 helium Substances 0.000 claims description 5
- 229910052734 helium Inorganic materials 0.000 claims description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 5
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 claims description 5
- 239000008267 milk Substances 0.000 claims description 5
- 210000004080 milk Anatomy 0.000 claims description 5
- 235000013336 milk Nutrition 0.000 claims description 5
- TVWPTNSFXRWGKM-UHFFFAOYSA-N C(C)C(CCCCCCCCCOCCCC)(CC)CC Chemical compound C(C)C(CCCCCCCCCOCCCC)(CC)CC TVWPTNSFXRWGKM-UHFFFAOYSA-N 0.000 claims description 4
- XBUCAILUHNASOA-UHFFFAOYSA-N C(CC)C(CCCCCCCCCOCC)(CCC)CCC Chemical compound C(CC)C(CCCCCCCCCOCC)(CCC)CCC XBUCAILUHNASOA-UHFFFAOYSA-N 0.000 claims description 4
- LNEJJQMNHUGXDW-UHFFFAOYSA-N CC(C(OCC)(OCC)C)CCCCCCCC Chemical compound CC(C(OCC)(OCC)C)CCCCCCCC LNEJJQMNHUGXDW-UHFFFAOYSA-N 0.000 claims description 4
- JVNGBOZHOKVQOO-UHFFFAOYSA-N CC(CCCCCCCCCOCCC)(C)C Chemical compound CC(CCCCCCCCCOCCC)(C)C JVNGBOZHOKVQOO-UHFFFAOYSA-N 0.000 claims description 4
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims description 4
- 150000001412 amines Chemical class 0.000 claims description 4
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 150000002148 esters Chemical class 0.000 claims description 4
- 150000003254 radicals Chemical class 0.000 claims description 4
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 claims description 3
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 claims description 3
- MTRBGQDNZNNWEE-UHFFFAOYSA-N C(C)C(C(OC1=CC=CC=C1)(OC1=CC=CC=C1)CC)CCCCCCCC Chemical compound C(C)C(C(OC1=CC=CC=C1)(OC1=CC=CC=C1)CC)CCCCCCCC MTRBGQDNZNNWEE-UHFFFAOYSA-N 0.000 claims description 3
- XEPAKJGFUVCJOW-UHFFFAOYSA-N C(C)C(C(OCC)(OCC)CC)CCCCCCCC Chemical compound C(C)C(C(OCC)(OCC)CC)CCCCCCCC XEPAKJGFUVCJOW-UHFFFAOYSA-N 0.000 claims description 3
- UEYMLSDWUUKDND-UHFFFAOYSA-N C(C)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(C)C(C(OCC)(OCC)OCC)CCCCCCCC UEYMLSDWUUKDND-UHFFFAOYSA-N 0.000 claims description 3
- CGJVSZKVBJDURV-UHFFFAOYSA-N C(C)C(C(OCCCC)(OCCCC)OCCCC)CCCCCCCC Chemical compound C(C)C(C(OCCCC)(OCCCC)OCCCC)CCCCCCCC CGJVSZKVBJDURV-UHFFFAOYSA-N 0.000 claims description 3
- ZTQDAIKZKAWDNI-UHFFFAOYSA-N C(C)C(CCCCCCCCCOCC)(CC)CC Chemical compound C(C)C(CCCCCCCCCOCC)(CC)CC ZTQDAIKZKAWDNI-UHFFFAOYSA-N 0.000 claims description 3
- GBJCROSOSGPFAK-UHFFFAOYSA-N C(CC)C(C(OC1=CC=CC=C1)(OC1=CC=CC=C1)CCC)CCCCCCCC Chemical compound C(CC)C(C(OC1=CC=CC=C1)(OC1=CC=CC=C1)CCC)CCCCCCCC GBJCROSOSGPFAK-UHFFFAOYSA-N 0.000 claims description 3
- ZYICQNMJAGPXKS-UHFFFAOYSA-N C(CC)C(C(OCC)(OCC)CCC)CCCCCCCC Chemical compound C(CC)C(C(OCC)(OCC)CCC)CCCCCCCC ZYICQNMJAGPXKS-UHFFFAOYSA-N 0.000 claims description 3
- XRNDMACZMJPCRX-UHFFFAOYSA-N C(CC)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(CC)C(C(OCC)(OCC)OCC)CCCCCCCC XRNDMACZMJPCRX-UHFFFAOYSA-N 0.000 claims description 3
- RETPCMPWCJKZSG-UHFFFAOYSA-N C(CC)C(C(OCCCC)(OCCCC)CCC)CCCCCCCC Chemical compound C(CC)C(C(OCCCC)(OCCCC)CCC)CCCCCCCC RETPCMPWCJKZSG-UHFFFAOYSA-N 0.000 claims description 3
- AJSWWKNQWLPHLM-UHFFFAOYSA-N C(CC)C(C(OCCCC)(OCCCC)OCCCC)CCCCCCCC Chemical compound C(CC)C(C(OCCCC)(OCCCC)OCCCC)CCCCCCCC AJSWWKNQWLPHLM-UHFFFAOYSA-N 0.000 claims description 3
- QJOPEPAUAKFHRR-UHFFFAOYSA-N C(CC)C(CCCCCCCCCOCCCC)(CCC)CCC Chemical compound C(CC)C(CCCCCCCCCOCCCC)(CCC)CCC QJOPEPAUAKFHRR-UHFFFAOYSA-N 0.000 claims description 3
- KXEOJQGXZGUSRW-UHFFFAOYSA-N CC(C(OCCC)(OCCC)OCCC)CCCCCCCC Chemical compound CC(C(OCCC)(OCCC)OCCC)CCCCCCCC KXEOJQGXZGUSRW-UHFFFAOYSA-N 0.000 claims description 3
- SXZBOQZQPFHOMJ-UHFFFAOYSA-N CC(C(OCCCC)(OCCCC)C)CCCCCCCC Chemical compound CC(C(OCCCC)(OCCCC)C)CCCCCCCC SXZBOQZQPFHOMJ-UHFFFAOYSA-N 0.000 claims description 3
- DJUZRLZFAOOONK-UHFFFAOYSA-N CC(C(OCCCC)(OCCCC)OCCCC)CCCCCCCC Chemical compound CC(C(OCCCC)(OCCCC)OCCCC)CCCCCCCC DJUZRLZFAOOONK-UHFFFAOYSA-N 0.000 claims description 3
- ICLWANDVDRTPBG-UHFFFAOYSA-N CC(CCCCCCCCCOCC)(C)C Chemical compound CC(CCCCCCCCCOCC)(C)C ICLWANDVDRTPBG-UHFFFAOYSA-N 0.000 claims description 3
- GXZKJVLAJJCAHS-UHFFFAOYSA-N CCC(CC)(CC)CCCCCCCCCOC1=CC=CC=C1 Chemical compound CCC(CC)(CC)CCCCCCCCCOC1=CC=CC=C1 GXZKJVLAJJCAHS-UHFFFAOYSA-N 0.000 claims description 3
- DJWJFIATUMEUIG-UHFFFAOYSA-N CCCC(CCC)(CCC)CCCCCCCCCOC1=CC=CC=C1 Chemical compound CCCC(CCC)(CCC)CCCCCCCCCOC1=CC=CC=C1 DJWJFIATUMEUIG-UHFFFAOYSA-N 0.000 claims description 3
- RHJWTJJHGYMGIV-UHFFFAOYSA-N CCCCCCCCC(CCC)C(OC1=CC=C(C=C1)C)(OC2=CC=C(C=C2)C)OC3=CC=C(C=C3)C Chemical compound CCCCCCCCC(CCC)C(OC1=CC=C(C=C1)C)(OC2=CC=C(C=C2)C)OC3=CC=C(C=C3)C RHJWTJJHGYMGIV-UHFFFAOYSA-N 0.000 claims description 3
- VQBLSKGSYDIKTL-UHFFFAOYSA-N CCCCCCCCCCOCCCC(C1=CC=CC=C1)(C2=CC=CC=C2)C3=CC=CC=C3 Chemical compound CCCCCCCCCCOCCCC(C1=CC=CC=C1)(C2=CC=CC=C2)C3=CC=CC=C3 VQBLSKGSYDIKTL-UHFFFAOYSA-N 0.000 claims description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 3
- 150000001298 alcohols Chemical class 0.000 claims description 3
- 150000001336 alkenes Chemical class 0.000 claims description 3
- 229910021529 ammonia Inorganic materials 0.000 claims description 3
- 239000004305 biphenyl Substances 0.000 claims description 3
- 235000010290 biphenyl Nutrition 0.000 claims description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 3
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 claims description 3
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 claims description 3
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 claims description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 3
- 150000003003 phosphines Chemical class 0.000 claims description 3
- 239000011574 phosphorus Substances 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 229960004134 propofol Drugs 0.000 claims description 3
- 125000003107 substituted aryl group Chemical group 0.000 claims description 3
- 150000003527 tetrahydropyrans Chemical class 0.000 claims description 3
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 claims description 3
- UYVWNPAMKCDKRB-UHFFFAOYSA-N 1,2,4,5-tetraoxane Chemical compound C1OOCOO1 UYVWNPAMKCDKRB-UHFFFAOYSA-N 0.000 claims description 2
- ZXBRYWVACOKTTC-UHFFFAOYSA-N C(C)C(C(OCCCC)(OCCCC)CC)CCCCCCCC Chemical compound C(C)C(C(OCCCC)(OCCCC)CC)CCCCCCCC ZXBRYWVACOKTTC-UHFFFAOYSA-N 0.000 claims description 2
- IDRQCNMLBGDDJS-UHFFFAOYSA-N C(CC)C(C(OCCC)(OCCC)CCC)CCCCCCCC Chemical compound C(CC)C(C(OCCC)(OCCC)CCC)CCCCCCCC IDRQCNMLBGDDJS-UHFFFAOYSA-N 0.000 claims description 2
- GWOUNZIVHMBHPP-UHFFFAOYSA-N C(CC)C(CCCCCCCCCOCCC)(CCC)CCC Chemical compound C(CC)C(CCCCCCCCCOCCC)(CCC)CCC GWOUNZIVHMBHPP-UHFFFAOYSA-N 0.000 claims description 2
- RZWPLOCXEDFKLZ-UHFFFAOYSA-N C1(=CC=CC=C1)C(C(OCCCC)(OCCCC)C1=CC=CC=C1)CCCCCCCC Chemical compound C1(=CC=CC=C1)C(C(OCCCC)(OCCCC)C1=CC=CC=C1)CCCCCCCC RZWPLOCXEDFKLZ-UHFFFAOYSA-N 0.000 claims description 2
- SOKCRYXJCGOICF-UHFFFAOYSA-N C1(=CC=CC=C1)C(CCCCCCCCCOCC)(C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(CCCCCCCCCOCC)(C1=CC=CC=C1)C1=CC=CC=C1 SOKCRYXJCGOICF-UHFFFAOYSA-N 0.000 claims description 2
- COVOPBKUMWSKCM-UHFFFAOYSA-N CC(C(OC1=CC=CC=C1)(OC1=CC=CC=C1)C)CCCCCCCC Chemical compound CC(C(OC1=CC=CC=C1)(OC1=CC=CC=C1)C)CCCCCCCC COVOPBKUMWSKCM-UHFFFAOYSA-N 0.000 claims description 2
- AGXZVGXBNXCJMA-UHFFFAOYSA-N CC(C(OCCC)(OCCC)C)CCCCCCCC Chemical compound CC(C(OCCC)(OCCC)C)CCCCCCCC AGXZVGXBNXCJMA-UHFFFAOYSA-N 0.000 claims description 2
- ULUXRYBDOLTBFZ-UHFFFAOYSA-N CC(CCCCCCCCCOC1=CC=CC=C1)(C)C Chemical compound CC(CCCCCCCCCOC1=CC=CC=C1)(C)C ULUXRYBDOLTBFZ-UHFFFAOYSA-N 0.000 claims description 2
- MUYHWHXUCMTWGW-UHFFFAOYSA-N CC(CCCCCCCCCOCCCC)(C)C Chemical compound CC(CCCCCCCCCOCCCC)(C)C MUYHWHXUCMTWGW-UHFFFAOYSA-N 0.000 claims description 2
- HSRUHSNONKPCIC-UHFFFAOYSA-N CCCCCCCCC(C1=CC=C(C=C1)C)C(OCCC)(OCCC)OCCC Chemical compound CCCCCCCCC(C1=CC=C(C=C1)C)C(OCCC)(OCCC)OCCC HSRUHSNONKPCIC-UHFFFAOYSA-N 0.000 claims description 2
- TWDJIKFUVRYBJF-UHFFFAOYSA-N Cyanthoate Chemical compound CCOP(=O)(OCC)SCC(=O)NC(C)(C)C#N TWDJIKFUVRYBJF-UHFFFAOYSA-N 0.000 claims description 2
- 241000283070 Equus zebra Species 0.000 claims description 2
- 230000032683 aging Effects 0.000 claims description 2
- 150000001299 aldehydes Chemical class 0.000 claims description 2
- 150000001345 alkine derivatives Chemical class 0.000 claims description 2
- 150000004056 anthraquinones Chemical class 0.000 claims description 2
- 125000006267 biphenyl group Chemical group 0.000 claims description 2
- 150000001735 carboxylic acids Chemical class 0.000 claims description 2
- 150000002576 ketones Chemical class 0.000 claims description 2
- 239000001272 nitrous oxide Substances 0.000 claims description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 claims description 2
- 239000010454 slate Substances 0.000 claims description 2
- 150000003648 triterpenes Chemical class 0.000 claims description 2
- ASHGTJPOSUFTGB-UHFFFAOYSA-N 3-methoxyphenol Chemical compound COC1=CC=CC(O)=C1 ASHGTJPOSUFTGB-UHFFFAOYSA-N 0.000 claims 8
- LKVFCSWBKOVHAH-UHFFFAOYSA-N 4-Ethoxyphenol Chemical compound CCOC1=CC=C(O)C=C1 LKVFCSWBKOVHAH-UHFFFAOYSA-N 0.000 claims 8
- 239000007983 Tris buffer Substances 0.000 claims 7
- ICKWICRCANNIBI-UHFFFAOYSA-N 2,4-di-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C(C(C)(C)C)=C1 ICKWICRCANNIBI-UHFFFAOYSA-N 0.000 claims 6
- MBGGFXOXUIDRJD-UHFFFAOYSA-N 4-Butoxyphenol Chemical compound CCCCOC1=CC=C(O)C=C1 MBGGFXOXUIDRJD-UHFFFAOYSA-N 0.000 claims 6
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 claims 6
- UKMAUJQOZZNZCW-UHFFFAOYSA-N CC1=CC=C(C2OOOOO2)C=C1 Chemical compound CC1=CC=C(C2OOOOO2)C=C1 UKMAUJQOZZNZCW-UHFFFAOYSA-N 0.000 claims 6
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 claims 6
- 150000001923 cyclic compounds Chemical class 0.000 claims 6
- 235000010354 butylated hydroxytoluene Nutrition 0.000 claims 5
- JQMVGTOAKFLMOU-UHFFFAOYSA-N pentaoxane Chemical compound C1OOOOO1 JQMVGTOAKFLMOU-UHFFFAOYSA-N 0.000 claims 5
- VOYINLLVQMIKBT-NSCUHMNNSA-N 2-[(e)-but-2-enyl]phenol Chemical compound C\C=C\CC1=CC=CC=C1O VOYINLLVQMIKBT-NSCUHMNNSA-N 0.000 claims 4
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 claims 4
- CCZCXFHJMKINPE-UHFFFAOYSA-N 2-phenylmethoxyphenol Chemical compound OC1=CC=CC=C1OCC1=CC=CC=C1 CCZCXFHJMKINPE-UHFFFAOYSA-N 0.000 claims 4
- BKZXZGWHTRCFPX-UHFFFAOYSA-N 2-tert-butyl-6-methylphenol Chemical compound CC1=CC=CC(C(C)(C)C)=C1O BKZXZGWHTRCFPX-UHFFFAOYSA-N 0.000 claims 4
- VTCDZPUMZAZMSB-UHFFFAOYSA-N 3,4,5-trimethoxyphenol Chemical compound COC1=CC(O)=CC(OC)=C1OC VTCDZPUMZAZMSB-UHFFFAOYSA-N 0.000 claims 4
- GDEHXPCZWFXRKC-UHFFFAOYSA-N 4-(2-methylpropyl)phenol Chemical compound CC(C)CC1=CC=C(O)C=C1 GDEHXPCZWFXRKC-UHFFFAOYSA-N 0.000 claims 4
- KYRVKNUCHFCHEF-UHFFFAOYSA-N 3-ethoxy-4-methylphenol Chemical compound CCOC1=CC(O)=CC=C1C KYRVKNUCHFCHEF-UHFFFAOYSA-N 0.000 claims 3
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- C08K5/05—Alcohols; Metal alcoholates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4402—Reduction of impurities in the source gas
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/13—Phenols; Phenolates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Applications Claiming Priority (1)
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| US41165102P | 2002-09-18 | 2002-09-18 |
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| TWI302908B true TWI302908B (en) | 2008-11-11 |
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| TW92125785A TWI302908B (en) | 2002-09-18 | 2003-09-18 | Additives to prevent degradation of alkyl-hydrogen siloxanes |
Country Status (6)
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| EP2256123B1 (en) * | 2005-01-31 | 2013-08-14 | Tosoh Corporation | Cyclic siloxane compound, a material for forming Si-containing film, and its use |
| US8513448B2 (en) | 2005-01-31 | 2013-08-20 | Tosoh Corporation | Cyclic siloxane compound, a material for forming Si-containing film, and its use |
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| US20080141901A1 (en) * | 2006-12-18 | 2008-06-19 | American Air Liquide, Inc. | Additives to stabilize cyclotetrasiloxane and its derivatives |
| DE102006060355A1 (de) * | 2006-12-20 | 2008-06-26 | Wacker Chemie Ag | Verfahren zur Herstellung von Tetramethylcyclotetrasiloxan |
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| TWI490363B (zh) * | 2009-02-06 | 2015-07-01 | Nat Inst For Materials Science | 絕緣膜材料、使用該絕緣膜材料的成膜方法及絕緣膜 |
| WO2015157202A1 (en) | 2014-04-09 | 2015-10-15 | Corning Incorporated | Device modified substrate article and methods for making |
| US10543662B2 (en) | 2012-02-08 | 2020-01-28 | Corning Incorporated | Device modified substrate article and methods for making |
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| US11091370B2 (en) | 2013-05-02 | 2021-08-17 | Pallidus, Inc. | Polysilocarb based silicon carbide materials, applications and devices |
| US9657409B2 (en) | 2013-05-02 | 2017-05-23 | Melior Innovations, Inc. | High purity SiOC and SiC, methods compositions and applications |
| US9919972B2 (en) | 2013-05-02 | 2018-03-20 | Melior Innovations, Inc. | Pressed and self sintered polymer derived SiC materials, applications and devices |
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| KR102573207B1 (ko) | 2015-05-19 | 2023-08-31 | 코닝 인코포레이티드 | 시트와 캐리어의 결합을 위한 물품 및 방법 |
| CN107810168A (zh) | 2015-06-26 | 2018-03-16 | 康宁股份有限公司 | 包含板材和载体的方法和制品 |
| JP6621226B2 (ja) * | 2016-02-15 | 2019-12-18 | 国立研究開発法人産業技術総合研究所 | シロキサン及びその製造方法 |
| TW201825623A (zh) | 2016-08-30 | 2018-07-16 | 美商康寧公司 | 用於片材接合的矽氧烷電漿聚合物 |
| TWI810161B (zh) | 2016-08-31 | 2023-08-01 | 美商康寧公司 | 具以可控制式黏結的薄片之製品及製作其之方法 |
| WO2019118660A1 (en) | 2017-12-15 | 2019-06-20 | Corning Incorporated | Method for treating a substrate and method for making articles comprising bonded sheets |
| JP6875336B2 (ja) * | 2018-08-27 | 2021-05-26 | 信越化学工業株式会社 | 成膜方法 |
| CN113801155B (zh) * | 2020-06-15 | 2023-10-31 | 中国石油化工股份有限公司 | 适用于制备石英砂防吸附亲水涂层的化学剂及其制备和应用 |
| CN113030295B (zh) * | 2021-02-08 | 2023-02-03 | 广州海关技术中心 | 一种气相色谱-质谱/质谱法同时测定硅橡胶制品中21种硅氧烷类化合物的残留量的方法 |
| KR102567948B1 (ko) * | 2021-09-23 | 2023-08-21 | (주)제이아이테크 | 페놀 계열의 수소-규소 결합의 안정성 개선을 위한 첨가제 |
| CN116355007A (zh) * | 2023-03-31 | 2023-06-30 | 京东方科技集团股份有限公司 | 六元杂环结构的有机化合物、电致发光器件及显示装置 |
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| US3998865A (en) * | 1975-03-12 | 1976-12-21 | General Electric Company | Process for the stabilization of hexamethyl-cyclotrisiloxane and the stabilized compositions resulting therefrom |
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| EP0978539A4 (en) * | 1997-04-24 | 2000-04-12 | Kaneka Corp | IMPACT RESISTANT THERMOPLASTIC RESIN COMPOSITION |
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| AU2003228495A1 (en) * | 2002-04-11 | 2003-10-27 | Honeywell International Inc. | Thermally conductive coating compositions, methods of production and uses thereof |
| KR20040106396A (ko) * | 2002-04-30 | 2004-12-17 | 카네카 코포레이션 | 폴리오르가노실록산 함유 그래프트 공중합체 조성물 |
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2003
- 2003-09-18 JP JP2004537889A patent/JP2006516302A/ja active Pending
- 2003-09-18 TW TW92125785A patent/TWI302908B/zh not_active IP Right Cessation
- 2003-09-18 KR KR1020057004778A patent/KR20050089147A/ko not_active Application Discontinuation
- 2003-09-18 EP EP03752426A patent/EP1573086A4/en not_active Withdrawn
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- 2003-09-18 WO PCT/US2003/029183 patent/WO2004027110A2/en active Application Filing
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- 2006-07-31 US US11/496,135 patent/US7531590B2/en not_active Expired - Lifetime
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| EP1573086A4 (en) | 2012-10-03 |
| US7531590B2 (en) | 2009-05-12 |
| EP1573086A2 (en) | 2005-09-14 |
| TW200404769A (en) | 2004-04-01 |
| KR20050089147A (ko) | 2005-09-07 |
| WO2004027110A3 (en) | 2006-04-06 |
| US20040127070A1 (en) | 2004-07-01 |
| JP2006516302A (ja) | 2006-06-29 |
| US20060270787A1 (en) | 2006-11-30 |
| WO2004027110A2 (en) | 2004-04-01 |
| US20060159861A1 (en) | 2006-07-20 |
| US7129311B2 (en) | 2006-10-31 |
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