TWI282580B - Manufacturing method of plasma display panel and transfer film for forming partition wall - Google Patents

Abstract

It is to provide a manufacturing method for a plasma display panel sufficiently reducing the number of process in the formation of a partition wall, having superior production efficiency, and capable of forming highly accurate partition wall compared with the conventional manufacturing method and to provide a transfer film for forming the partition wall suitably used for a new formation process of the partition wall. This partition wall formation method is provided with a process for forming a glass frit contained resin layer on a substrate by transferring the glass frit contained resin layer formed on a support film and forming a resist film on the glass frit contained resin layer, a process for forming a resist pattern on the glass frit contained resin layer by exposing and developing the resist film, a process forming a pattern of the glass frit contained resin layer corresponding to the resist pattern on the substrate by sand blasting the glass frit contained resin layer, and a process of backing the pattern of the glass frit contained resin layer.

Description

1282580 A7 B7 V. INSTRUCTIONS (!) TECHNICAL FIELD (Please read the precautions on the back side and fill out this page.) The present invention relates to a method of manufacturing a plasma display panel having a characteristic step of forming a cell surface separator. Advanced technology Plasma display panel (PDP), which is easy to manufacture large panels, has a wide field of view and high natural light display quality, and the related flat panel display technology has attracted attention. In particular, a color plasma display panel, a display device for a wall-mounted television of 20 inches or more is expected to become a mainstream in the future. The color-PDP emits ultraviolet light from a gas discharge to illuminate the phosphor to display color. In general, the color-PDP, the location of the fluorescent material for red light, the position of the fluorescent material printed by the Ministry of Economic Affairs, and the location of the fluorescent material for the blue light are formed on the substrate. The luminescence shows that the uniform composition of the cells exists in the whole. Specifically, as the surface of the substrate made of glass, a spacer of a so-called barrier formed of an insulating material is provided, whereby a plurality of display cells of the spacer are partitioned, and the inside of the display becomes a space for plasma action. Here, the height of the separator is usually from 100 to 200 // m. Therefore, the plasma working space can be set at the position of the phosphor, and the electrode of the plasma is disposed at the position of the phosphor to form each display. The plasma display panel of the display unit of the cell. In a method of forming a separator constituting such a plasma display panel, it is known that a transparent glass-containing resin layer is formed on a substrate, and a cover film for development is formed in a pattern of a photoresist film on the transparent glass-containing resin layer. The abrasive material is spray-etched with a transparent glassy resin layer, and a pattern containing a transparent glassy resin layer is left and baked to form a separator. This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) "' 1282580 A7 B7 V. Invention description (2) (Please read the back note first and then fill out this page) The formation of the transparent vitreous resin layer is usually formed by a screen printing method comprising a composition containing a transparent vitreous resin, and the film formed by one-time printing coating is about 10 to 20 // m to form a desired one. A height (for example, 100 to 200 // m) of the partition, usually has to be performed several times ~ dozens of multiple printing. Disclosure of the Invention (1) The operation of repeatedly coating a composition containing a transparent vitreous resin by a screen printing method (multiple printing) is troublesome and workability is poor. Further, when the composition containing the transparent sapphire resin is applied, it is necessary to confirm the dispersion state of the constituent components, and when dispersing failure such as precipitation of transparent glass is caused, it is necessary to carry out redispersion treatment. Therefore, the method for forming a transparent glass-containing resin layer which has been subjected to such a complicated coating step is problematic in terms of the production efficiency of the PDP, and the size of the display panel is particularly remarkable. Printing by the Intellectual Property Office of the Ministry of Economic Affairs, the Consumers' Cooperatives (2) When the transparent glassy resin layer is formed by multi-printing by screen printing, the pattern of the transparent glassy resin layer does not form a uniform separator height (for example, the tolerance is ± 5% to). Due to the multiple printing by the screen printing method, it is difficult to uniformly apply the transparent glass resin composition on the surface of the substrate, the larger the coating area (panel size), or the more the coating times, the film containing the transparent glass resin layer. The greater the difference in thickness. Therefore, in the panel material having the separator obtained by the multi-printing coating step, the difference in discharge characteristics is caused by the difference in the height of the separator, and the difference in discharge characteristics is the cause of the PDP display defect (luminance difference). . Therefore, a separator made of a transparent glassy resin layer having insufficient uniformity of film thickness is required to conform to the Chinese National Standard (CNS) A4 specification (210×297 mm) -5-1282580 A7 on the upper surface of the separator. ________ B7 _ V. INSTRUCTIONS (3) The grinding and grinding steps have become a problem for the work. (Please read the note on the back side and then fill out this page.) A first object of the present invention is to provide a method of manufacturing a plasma display panel having a novel method of forming a separator. A second object of the present invention is to provide a method of manufacturing a plasma display panel having a small number of substantial steps and forming a separator than a conventional manufacturing method. A third object of the present invention is to provide a manufacturing method capable of forming a high-precision-size separator plasma display panel. A fourth object of the present invention is to provide a transfer film for forming a separator which is suitable for use in a novel separator forming step. A method of producing a plasma display panel of the present invention is characterized by comprising a method of forming a separator in the steps (1) to (iv) below. (i) forming a transparent glass-containing resin layer on the substrate by transfer-forming the transparent glass-containing resin layer, and forming a photoresist film on the transparent glass-containing resin layer; (ii) light Film-exposure-developing process to form a photoresist pattern on a transparent glass-containing resin layer; Printed by the Ministry of Economic Affairs, Intellectual Property Office, Employees' Consumer Cooperative (iii) Corrosion-containing glass resin layer after sandblasting a step of patterning the transparent glassy resin layer on the substrate; (iv) a baking step comprising a pattern of a transparent glassy resin layer. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] shows a step of forming a separator relating to the manufacturing method of the present invention (the transfer paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) " ' -6 - 1282580 Α7 Β7 Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperatives, Printing, V. Invention, (4) Step - Step of forming a photoresist film - exposure step). Fig. 2 is a schematic cross-sectional view showing an example of a step of forming a separator (developing step - sand blasting step - baking step) relating to the production method of the present invention. [Description of Symbols] 11 Glass Substrate 12 Electrode. 20 Transfer Film 21 Contains Transparent Glass Resin Layer 22 Support Film 2 5 Transparent Glass Pattern 25A Resin Layer Remaining Portion 25B Resin Layer Removal Portion 31 Photoresist Film 35 Light Resistive pattern 35A photo-precursor film residual part 35B photoresist film removal part 40 spacer 50 panel material Μ exposure mask film 穿透 light penetration part MB shading part this & scale suitable for the country drunk county (ϋ^ Γ21〇Χ297 mm)- (Please read the notes on the back and fill out this page)

1282580 A7 B7 V. DESCRIPTION OF THE INVENTION (5) BEST MODE FOR CARRYING OUT THE INVENTION (Please read the precautions on the back side and then fill in the page.) A preferred embodiment of the manufacturing method of the present invention is as follows. (a) A photoresist film formed on the support film is transferred to form a photoresist film on the transparent glass-containing resin layer. (b) A photoresist film formed on the support film and a transparent glass-containing resin layer are transferred to form a transparent glass-containing resin layer and a photoresist film on the substrate. (c) A laminate of a plurality of transparent glass-containing resin layers is formed on the substrate by transfer. (d) The transparent glassy resin layer is an alkali-insoluble or poorly soluble resin component, and the photoresist film is an alkali-soluble resin component. (e) The photoresist film and/or the transparent glass-containing resin layer contains a black pigment. A preferred embodiment of the transfer film for forming a separator of the present invention is as follows. U) The photoresist film and the transparent glass-containing resin layer contain a black pigment. Printed by the Intellectual Property Office of the Ministry of Economic Affairs, the Consumers' Cooperatives (b) A laminated film made of a photoresist film, a transparent glass-containing resin layer containing black pigment, or a transparent glassy resin layer containing no black pigment. (c) a transfer film formed on the support film by a photoresist film or a transparent glass-containing resin layer, the transparent glass-containing resin layer of the transfer surface having a transparent glass content higher than that of the other respective transparent glass-containing resins The content of the layer transparent glass is small. [Function] This paper scale is applicable to the national standard (CNS) of the towel (21Gx297). One-to-one 1282580 A7 B7 V. Invention description (6) (Please read the note on the back and fill in this page) In the manufacturing method of the present invention, the transparent glass-containing resin layer is not formed by directly coating a transparent glassy paste (containing a transparent glassy resin composition) on a rigid support film, and is coated by a recyclable film. Formed on the support film. Therefore, the coating method of the paste composition is a coating method using a cylindrical coater, whereby a transparent glassy resin layer having a thick film thickness and uniform film thickness can be formed on the support film (for example) 100// m ± 5 // m). Further, the transparent glass-containing resin layer thus formed is transferred to the surface of the substrate in a simple transfer operation, and the transparent glass-containing resin layer can be surely formed on the substrate. Therefore, according to the production method of the present invention, the step of forming the transparent glass-containing resin layer can be improved (high efficiency), and the quality of the formed separator can be improved upward (thickness uniformity). The manufacturing method of the present invention will be described in detail below. The manufacturing method of the present invention comprises [1] a transfer step containing a transparent vitreous resin layer, [2] a step of forming a photoresist film, [3] an exposure step of a photoresist film, and [4] a development step of a photoresist film. [5] A blasting step containing a transparent glassy resin layer, and [6] a baking step of a pattern containing a transparent glassy resin layer to form a separator on the surface of the substrate. Ministry of Economic Affairs, Intellectual Property Office, Employees' Cooperatives, Printing <Transfer Step of Transparent Glass-Containing Resin Layer> FIG. 1 and FIG. 2 are schematic cross-sectional views showing an example of a step of forming a separator of the manufacturing method of the present invention. . Fig. 1 U), 11 glass substrate on which the electrodes 12 are arranged at equal intervals to generate plasma. The manufacturing method of the present invention uses a transfer film to transfer the surface of the substrate containing the transparent glassy resin layer constituting the transfer film to the fixed electrode. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 public). PCT) -9- 1282580 A7 B7 V. INSTRUCTIONS (7) (Please read the note on the back and fill out this page.) The transfer film consists of a support film and the above-mentioned support film. A protective layer is formed on the transparent glassy resin layer. The configuration of the transfer film will be described later. An example of the transfer step is shown below. After peeling off the protective layer film on the transfer film as necessary, as shown in FIG. 1(b), the surface of the glass substrate 11 is in overlapping contact with the surface of the transparent glassy resin layer 21 of the transfer film 20, and the transfer film is formed. After the thermocompression bonding of the heating cylinder, the support film 22 is peeled off by the transparent glass resin layer 21. The surface of the glass substrate 1 shown in Fig. (c) is in a state in which the transparent glassy resin layer 21 is adhered by transfer. Here, the relevant transfer conditions may be that the surface temperature of the heating cylinder is 50 to 200 ° C, the pressure of the heating cylinder is 0.5 to 30 kg / cm, and the moving speed of the heating cylinder is 〇.1 to 1 〇. .〇m/

minute. Moreover, the glass substrate 11 can be preheated first, and the preheating temperature is 5 〇 to 200 ° C. 〇 <Step of forming a photoresist film> The Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative prints this step, as shown in Fig. 1 (d As shown, the surface of the transferred transparent glass-containing resin layer 21 forms a photoresist film 31. The photoresist constituting the photoresist film may be either a positive photoresist or a negative photoresist, and specific compositions will be described later. The photoresist film 31 can be formed by applying a photoresist by various methods such as a screen printing method, a roll coating method, a spin coating method, a flow coating method, or the like, and then drying the coating film. The drying temperature of the coating film is usually about 50 to 15 (about TC. Further, the photoresist film formed on the support film can be transferred onto the surface of the transparent glass-containing resin layer (21) by a transfer film. Can reduce the size of the photoresist film. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -10- 1282580 Α7 Β7 5. The number of formation steps of the invention (8) is the film thickness of the obtained photoresist film. If the uniformity is excellent, (please read the precautions on the back and fill in this page) The development of the photoresist film and the etching of the separator forming material layer can be performed uniformly, and the height and shape of the separator formed are uniform. The film thickness of the photoresist film (31) is 0.1 to 100 / / m, preferably 1 to 50 / zm 〇 < Exposure step of the photoresist film > This step, as shown in Fig. 1 (e), is transparent The surface of the photoresist film 31 formed on the surface of the vitreous resin layer (21) is selectively irradiated (exposed) with radiation such as ultraviolet rays through the cover film M to form a latent image of the photoresist pattern. And MB are each a light-transmitting portion and a light-shielding portion of the cover film for exposure. There is no particular limitation on the ultraviolet light device used in the above-mentioned photo-uranium method, the exposure device used in the manufacture of the semiconductor and the liquid crystal display device, etc. The Ministry of Economic Affairs, the Intellectual Property Bureau, the employee consumption cooperative, and the photoresist film are transferred. At the time of printing, the support film on the photoresist film is exposed without being peeled off, and the support film may be peeled off after exposure. The exposure may be performed without peeling off the support film, and the exposure sensitivity may be improved, and the cover film for exposure may be prevented. (Contamination step of photoresist film) In this step, the photoresist film pattern (latent image) is developed by development processing of the exposed photoresist film. The development processing conditions here can be based on the photoresist film ( 31) The type of developer, the paper size is applicable to the Chinese National Standard (CNS) Α4 specification (210Χ297 mm) · -11 - 1282580 A7 B7 V. Invention description (9) Type, composition, concentration, development time, development Temperature, development method (such as dipping method, shaking method, shower method, spray method, surface tension method), developing device, etc. are appropriately selected. According to this development step, as shown in Fig. 2 (f) The photoresist pattern 35 (corresponding to the pattern of the exposure cover film )) formed by the photoresist residual portion 35A and the photoresist removal portion 35B is shown. The photoresist pattern 35 is in the next step. (Etching step) As a function of the blasting cap film, the constituent material of the remaining portion of the photoresist 35 必要 must be smaller than the blasting speed of the blasting of the constituent material containing the transparent vitreous resin layer. <Sand blasting containing a transparent vitreous resin layer Step> With respect to this step, after the transparent glass-containing resin layer is subjected to sandblasting, a pattern containing a transparent glassy resin layer is formed corresponding to the photoresist pattern, that is, as shown in Fig. 2(g), the transparent glass-containing resin layer 21 is contained. The corresponding portion of the photoresist removing portion of the photoresist pattern 35 is selectively removed by sandblasting. Here, Fig. 2(g) shows the state in the blasting treatment. Then, when the blasting treatment is further continued, as shown in FIG. 2(h), the portion around the electric 12 containing the transparent vitreous resin layer 21 is removed, and the resin layer remaining portion 25A is formed, and the resin layer removing portion 25B is formed. The transparent glass-containing resin layer pattern 25 is formed. As the honing agent to be used for the blasting treatment, various known honing agents can be used. For example, glass particles, SiC, Si〇2, Al2〇3, Zr〇, and the like have microparticles having a particle diameter of about 2 to 100 μm. This paper scale applies to China National Standard (CNS) A4 specification (210'〆297 mm) (please read the note on the back and fill out this page). The Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative prints -12-1282580 A7 ______ B7 _ V. Invention description ((Please read the precautions on the back and fill in the page again) Also, the photoresist pattern (35A) remaining after sand blasting can be burned off in the next baking step. Also, the blasting treatment is removed. In the subsequent photoresist pattern, the substrate may be immersed in a stripping solution under stirring at 50 to 80 ° C for 5 to 30 minutes, and peeled off. The peeling liquid used herein may, for example, be a fourth-order ammonium salt. And a mixed solution of a dimethyl subcode and water. <A calcination step of a pattern containing a transparent vitreous resin layer. In this step, the transparent glass-containing resin layer pattern 25 is fired to form a separator. Accordingly, the resin layer The organic substance in the residual portion 25A is burned off to form a separator. As shown in Fig. 2(i), the surface of the glass substrate 11 is formed into a separator 40 to obtain a panel material 50. Thus, the panel material 50 is composed of the separator 40. Area space (resin layer removal The space from the portion 25B becomes the plasma working space. The temperature of the calcination treatment here must be such that the temperature of the organic substance in the resin residue (25A) can be burned off, usually 400 to 600 ° C. Further, the calcination The time is usually 10 to 60 minutes. Printed by the Intellectual Property Office of the Ministry of Economic Affairs, the consumer consortium <ideal embodiment> The manufacturing method of the present invention, the photoresist film and/or the transparent glassy resin layer containing black pigment Ideally, since the photoresist film and/or the transparent glass-containing resin layer contains black pigment, the top of the formed separator is black, and the display contrast of the plasma display panel can be improved. Further transparent glass resin layer contains In the case of a black pigment, among the laminates formed of the plurality of transparent glassy resin layers, only the layer forming the top of the separator (the contact with the photoresist film is applicable to the Chinese National Standard (CNS) A4 specification ( 210X297 mm) -13- 1282580 A7 B7 V. Inventive Note (彳)| (Please read the note on the back and fill out this page) Layer) It is ideal for black pigments. The layer contains black pigment, which can form a black top with only white partitions, which can improve the double contrast effect of the display contrast and luminous efficiency of the plasma display panel. Moreover, the manufacturing method of the present invention is performed by corresponding different sandblasting Preferably, a laminate comprising a transparent glassy resin layer is formed, whereby a separator having a desired cross-sectional shape can be formed. Here, a laminate of a plurality of transparent glass-containing resin layers is formed on the substrate. The above method is a method of transferring a transparent glassy resin layer (single layer) which has been formed on a support film by a plurality of times, and a laminate of a plurality of layers containing a transparent glassy resin layer. Any of the methods of the printing method may be a method of 2 in terms of the simplification of the transfer step. <Other Method of Forming Separator> The method of forming the separator relating to the method of manufacturing a plasma display panel of the present invention is not limited to the method shown in Figs. 1 and 2 . The method for forming the other separator may be a method of forming the steps (1) to (3) below. Printed by the Consumers' Cooperative of the Intellectual Property Office of the Ministry of Economic Affairs (1) After the photoresist film is formed on the support film, the photoresist film is laminated with a transparent glass resin layer. Here, when the photoresist film and the transparent glass-containing resin layer are formed, a roll coater or the like can be used, and a laminated film having a uniform film thickness can be formed on the support film. (2) The photoresist film and the transparent glass-containing resin layer formed on the support film are transferred to the substrate. Here, the transfer conditions are the same as those described in the above "Transfer step containing a transparent vitreous resin layer". This paper scale applies to Chinese National Standard (CNS) A4 specification (210X: 297 mm) ' — ^ -14 - 1282580 A7 B7 V. Invention description (d (please read the back note #:1 fill 3⁄41) (3) The above-mentioned "exposure step of the photoresist film", "development step of the photoresist film", "blasting step of the transparent glass-containing resin layer", and "baking step of the pattern containing the transparent glass resin layer" are performed in the same manner. According to the above method, the transparent glassy resin layer and the photoresist film are transferred onto the substrate, and the manufacturing efficiency can be further improved by the simplification of the steps. The separator formed by the manufacturing method of the present invention is generally a panel. The display cell (display unit) is divided in the horizontal direction. The size of the lateral interval of the display cell is 0.10 to 1.00 mm. The cross-sectional shape, the width, the height of the spacer, the size of the spacer, etc. According to the characteristics of the purpose of the plasma display panel, the appropriate selection is made. Specifically, the width of the bottom surface of the cross-sectional shape of the separator is 10 to 300 V in, and the degree of the separation is 10 to 500 / / m. For 50~1000// πί , The separator has a width of 50 to 500 // m. In a typical example, the cross-sectional shape of the separator has a bottom width of 50 // m and a height of 150/m, and the partition is separated. The distance is 300 // m, and the electrode array disposed between the partitions is 100 "m 〇 The following describes the materials used in the above steps, various conditions, etc. printed by the Ministry of Economic Affairs, Intellectual Property Bureau, and the Consumer Cooperatives. 〉 Electrode initiating electrodes are mostly arranged, and the substrate forming the separator, such as glass, tantalum, polycarbonate, polyester, aromatic polyamide, polyamidamine, polyimine, etc. A plate-like material made of insulating wood material. The surface of the plate material is treated with a decane coupling agent or the like as necessary; the plasma paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -15-1282580 A7 B7 5. Description of the Invention (Treatment; film formation treatment such as ion plating method, sputtering method, gas phase reaction method, vacuum vapor deposition method, etc., and appropriate pretreatment. Further, the substrate according to the present invention is heat-resistant to use. Glass is ideal. Ideal The glass substrate can be, for example, PD200 manufactured by Asahi Glass Co., Ltd.. [Transfer film] The transfer film used in the production method of the present invention is a support film and a transparent glass-containing resin layer which has been formed on the support film. The surface of the transparent glassy resin layer may be provided with a protective film layer. The Ministry of Economic Affairs, Intellectual Property Office, and the Consumer Cooperatives Co., Ltd. Printed, the transfer film for forming the separator of the present invention contains alkali-soluble from the support film. The resist film of the resin component and the resin film containing the alkali-insoluble or poorly soluble resin component containing the transparent glassy resin layer are formed. Further, the transfer film of the present invention is a photoresist film and/or a transparent glass-containing film. The resin layer containing black pigment 2 is formed on the support film by a photoresist film, a black pigment-containing transparent glassy resin layer or a black pigment-free laminated film containing a transparent glassy resin layer. a transfer film formed of a photoresist film or a transparent glass-containing resin layer, and the transparent glass-containing resin layer of the transfer surface has a transparent glass content higher than that of each of the other transparent glass-containing resin layers. Content is from small ones. Among them, the transfer film of the present invention, which is exemplified by three, has an excellent transfer film recyclability and transferability, and can be an ideal object. Further, these transfer films are particularly suitable for use in the production method of the present invention. (1) Support film: The support film constituting the transfer film is heat-resistant and solvent-resistant, and the paper scale is applicable to the Chinese National Standard (CNS) A4 specification (210×297 mm) -16 - 1282580 A 7 —__B7 V. DESCRIPTION OF THE INVENTION (j Please read the note of the back first and then 丨Φτ\ write; This page is ideal for a resinable resin film. Due to the wrapability of the support film, it can be coated with a roller coater or the like. The paste composition is stored and supplied in a form in which a transparent glassy resin layer is wound into a cylindrical shape. Examples of the resin formed on the support film include polyethylene terephthalic acid, polyester, polyethylene, polypropylene, and polyphenylene. a fluorine-containing resin such as ethylene, polyimine, polyvinyl alcohol, polyethylene, or polyvinyl fluoride, nylon, cellulose, etc. The thickness of the support film is 20 to 100 // m. (2) Transparent glass resin layer The transparent glass-containing resin layer constituting the transfer film is coated on the support film by a paste composition (containing a transparent glass resin composition) containing a transparent glass, a binder resin, and a solvent as essential components, and is coated. Film drying to remove one of the solvents (3) Transparent glass-containing resin composition: The transparent glass-containing resin composition used for the production of a transfer film is composed of (a) a low-melting point transparent glass, and (b) a binding resin. And a paste-like composition formed by a solvent. A specific example of a low-melting-point transparent glass material which comprises a transparent glassy resin composition printed by the Intellectual Property Office of the Ministry of Economic Affairs can be exemplified as 1 zinc oxide or boron oxide. a mixture of cerium oxide (Zn〇-B2〇3-Si〇2 system) 2 a mixture of lead oxide, boron oxide and cerium oxide (PbO-B2〇3-Si〇2 system) 3 lead oxide, boron oxide, cerium oxide , Alumina mixture (Pb〇- This paper scale applies to China National Standard (CNS) Α4 specification < 21〇Χ297 mm) 17 - 1282580 A7 B7 V. Invention description (y B2〇3-Si〇2-Al2〇 3 series) Please read m back: Note: Item: Re: Fill in page 4 Mixture of lead oxide, zinc oxide, boron oxide, cerium oxide "(10)-Zn〇-B2〇3-Si〇2 series) Further, in addition to the above, another composition suitable for forming a plasma display panel The softening point of the transparent vitreous, usually in the range of 400 to 600 ° C. When the softening point of the transparent vitreous is less than 400 c, the baking step of the method for producing a plasma display panel of the present invention, in the transparent glass-containing resin layer The transparent glassy material is melted at the stage where the organic substance such as the binder resin is not completely decomposed and removed. The formed separator has a tendency to retain a part of the organic substance, and the shape of the separator may not be maintained. On the other hand, when the softening point of the transparent glassy material is 600 ° C, in order to maintain the adhesion between the separator and the substrate, it is necessary to calcine at a temperature higher than 600 ° C, and the glass substrate is easily deformed. Printed by the Intellectual Property Office of the Ministry of Economic Affairs, the Consumer Cooperatives. The average particle size (median diameter) normally used for transparent glass is 0.1 to 10 // m, ideally 〇. 1~1〇 // m. When the average particle diameter of the transparent vitreous is less than 0.1/m, the transparent vitreous resin composition tends to cause transparent glassy agglomeration. When the average particle diameter of the transparent vitreous is more than 10 // m, there is a fear that the separator pattern accuracy is formed. The average particle size of the transparent glass is preferably from 0.35 to 3.0 // m. Here, "the average particle size of the transparent glass" is the enthalpy obtained by the particle diameter measured by the laser reflection scattering method. As the binder resin constituting the transparent glassy resin composition, various resins can be used, and an acrylic resin is preferable. Since the binder resin contains an acrylic resin, the ideal transfer film used in the production method of the present invention is one which has excellent (heating) adhesion to the substrate. Therefore, the paper grade containing transparent glassy resin is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -18-1282880 A7 B7 V. Inventive Note (d When coated on a support film to manufacture a transfer film The obtained transfer film is excellent in transferability (heat bonding property to the substrate) of the transparent glass-containing resin layer. (Please read the back of the game first and then fill in this page.) Composition containing transparent glass resin Acrylic resin is selected from (co)polymers which have moderate adhesion and can be combined with low-melting transparent glass and can be completely burned off by calcination (400, 600 ° C). In the case of an alkali-insoluble or poorly soluble resin, the term "alkali-insoluble or poorly soluble" means that, in the development condition of the photoresist film of the present invention, an acrylic resin coating film is used instead of the transparent glass-containing resin layer. The residual film thickness is 50% or more, and particularly preferably 90% or more after development. The related acrylic resin is a (meth) acrylate compound represented by the following general formula (1). Two or more kinds of copolymerization of a single polymer, a (meth) acrylate compound represented by the following general formula (1), and a (meth) acrylate compound and a copolymerizable monomer represented by the following general formula (1) Copolymer. R1

I H2 C = C —C〇〇R2 (1) Printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs [As shown in the formula, R1 is a hydrogen atom or a methyl group], and R2 is a monovalent organic group. Specific examples of the (meth) acrylate compound represented by the above general formula (1) include methyl (meth) acrylate, ethyl (meth) acrylate, (meth) acrylate, and (methyl). Propyl acrylate, isopropyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, amyl (meth)acrylate, (methyl) ) isoamyl acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, (meth) acrylate equivalent paper size applicable to China National Standard (CNS) A4 specification (210X297 PCT) -19- 1282580 A7 B7 V. Description of invention (d (please read the back*:, 5|Important^!#!4: write this page) octyl ester, ethyl (meth) acrylate, (A Ethyl acrylate, decyl (meth) acrylate, isodecyl (meth) acrylate, undecyl (meth) acrylate, dodecyl (meth) acrylate, (meth) acrylate Alkyl (meth) acrylate such as alkyl ester or isoheptadecyl (meth) acrylate ; hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 3-hydroxyl a hydroxyalkyl (meth) acrylate such as butyl (meth) acrylate or 4 hydroxybutyl (meth) acrylate; phenoxyethyl (meth) acrylate, 2-hydroxy-3- Phenoxyalkyl (meth) acrylate such as phenoxypropyl (meth) acrylate; 2-methoxyethyl (meth) acrylate, 2-ethoxyethyl (methyl) Alkoxylated alkane such as acrylate, 2-propoxyethyl (meth) acrylate, 2-butoxyethyl (meth) acrylate or 2-decyloxy butyl (meth) acrylate Base (meth) acrylate; Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed polyethylene glycol mono (meth) acrylate, ethoxy diethylene glycol methoxy (meth) acrylate, methoxy Polyethylene glycol (meth) acrylate, phenoxy polyethylene glycol (meth) acrylate, nonyl phenoxy polyethylene glycol (meth) propylene Acid ester, polypropylene glycol mono (meth) acrylate, methoxy polypropylene glycol (meth) acrylate, ethoxypolypropylene glycol (meth) acrylate, nonyl phenoxy polypropylene glycol (meth) acrylate Polyalkylene diol (mercapto) acrylate; cyclohexyl (meth) acrylate, 4-butylcyclohexyl (meth) acrylate, dicyclopentenyl (meth) acrylate, borneol a cycloalkyl (meth) acrylate such as a (meth) acrylate, an isobornyl (meth) acrylate or a tricyclodecenyl (meth) acrylate; the paper scale applies to the Chinese national standard (CNS) A4 size (210X297 mm) -20- 1282580 A7 B7 V. Description of the invention (d benzyl (meth) acrylate, tetrahydro sugar (meth) acrylate, etc. In the above general formula (1), the group represented by R2 is preferably an alkyl group-containing or alkoxyalkyl group, and particularly preferably, for example, as described in the following. (Meth) acrylates are butyl (meth) acrylate, ethyl hexyl (meth) acrylate, lauryl (meth) acrylate, isodecyl (meth) acrylate and 2-ethoxy B Base (meth) acrylate. Regarding the other copolymerizable monomer, the compound which can be copolymerized with the above (meth) acrylate compound is not particularly limited, and examples thereof include (meth)acrylic acid, vinyl benzoate, maleic acid, and vinyl phthalic acid. Unsaturated carboxylic acid such as formic acid; vinyl group-containing radical polymerization such as vinylbenzyl methyl ether, vinyl epoxypropyl ether, styrene, α-methylstyrene, butadiene, isoprene Sex compounds. The source of the copolymerization component of the (meth) acrylate compound represented by the above general formula (1) is usually 70% by mass or more, preferably 90% by mass or more, based on the acryl resin constituting the transparent glassy resin composition. Further, the base of the above formula (1) and R2 is a copolymerization component of a (meth) acrylate compound having an alkyl group or an alkoxy group, and is usually 50% by mass or more, particularly preferably 80% by mass. More than 100% acrylic resin is more desirable. Specific examples of the acrylic resin which is particularly desirable for printing by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs include polymethyl methacrylate, polybutyl methacrylate, polymethyl methacrylate-butyl methacrylate copolymer, and the like. . The molecular weight of the acrylic resin constituting the transparent glassy resin composition and the weight average molecular weight of the polystyrene according to GPC (hereinafter referred to as "

Mw" is called 4,000~300,000, ideally 〇〇〇~200,000. This paper scale applies to the Chinese National Standard (CNS) Α4 specification (210Χ297 mm) -21 1282580 Α7 Β7 V. Invention description (d (please read the back of the intentional goods industry to fill in the wood sheet) Related composition of transparent glass resin The content ratio of the binding resin of the material is preferably from 1 to 50 parts by mass, more preferably from 3 to 20 parts by mass, based on 100 parts by mass of the transparent glass of the melting point. When the ratio of the bonding resin is too small, the low melting point is not surely kept transparent. On the one hand, when the ratio is too large, it is difficult to remove the transparent glassy resin layer during blasting, or to remove the organic component during firing. The solvent constituting the transparent glassy resin composition is assigned The composition is not particularly limited as long as it forms a solvent containing a transparent glassy resin composition, and examples thereof include ethers, esters, ether esters, ketones, and vulcanization. Examples of the solvent, the code, the hydrocarbon, the halogenated hydrocarbon, etc. The specific example of the solvent associated with the printing of the employee's consumer cooperative of the Ministry of Economic Affairs may be, for example, tetrahydrofuran. Anisole, dioxane, ethylene glycol monoalkyl ether, diethylene glycol dialkyl ether, propylene glycol monoalkyl ether, propylene glycol dialkyl ether, acetate, hydroxyacetate, Alkoxyacetates, propionates, hydroxypropionates, alkoxypropionates, lactates, ethylene glycol monoalkyl ether acetates, propylene glycol monoalkyl ether acetates, Alkoxyacetates, cyclic ketones, acyclic ketones, acetamidine acetates, pyruvate esters, anthraquinone, fluorene-dialkylformamides, anthracene, fluorene-dialkyl Amidoxime, a fluorene-alkylpyrrolidone, a dialkyl sulfide, a dialkyl code, an onion alcohol, a hydrazine-methyl-2-pyrrolidone, etc., may be used alone or in combination of two or more. The solvent content ratio of the composition containing the transparent glassy resin is suitably selected within the range of obtaining good film formability (fluidity or plasticity). The paper size is applicable to the Chinese National Standard (CNS) Α4 specification (210X297 mm) - 22- 1282580 A7 __B7 V. INSTRUCTIONS (3) In addition to the above components, it contains a transparent glass resin composition. The ruthenium-containing alkyl compound may be contained in the following formula (2) for the purpose of improving the dispersion stability of the low-melting transparent glass. The sulfonyl-containing compound (containing a saturated alkyl group (alkyl group) is represented by the following formula (2). Alkoxydecane] is desirable.

CpH2p+1 十OCmH2m+1) a ( 2 ) (CnH2n+l) 3.a (wherein P is an integer of 3 to 20, an integer of ml~3, an integer of 1 to 3, and a is 1 to 3) The integer number of the saturated alkyl group represented by the above general formula (2) is an integer of 3 to 20, and is preferably an integer of 4 to 16. When P is less than 3, the (c) alkoxysilane having a saturated alkyl group is contained, and the obtained transparent glass-containing resin layer does not have sufficient recyclability. On the one hand, p 値 exceeds 20, and the decomposition temperature of the (alkyl) alkoxy decane containing a saturated alkyl group is too high. In the calcination step of the production method of the present invention, the organic substance (the above decane derivative) cannot be completely decomposed and removed, and is formed. A portion of the organic matter remains in the separator. Specific examples of the carboalkyl group-containing compound represented by the above general formula include, for example, η-propyldimethylmethoxydecane, η-butyldimethylfluorenylmethoxydecane, and n-fluorenyldimethylmethoxy group. Saturated courtyard dimethyl methoxy sands such as Ϊ 院 、, η -16 院 二 dimethyl methoxy 砂 院, η-廿 基 二 dimethyl methoxy Ϊ 院 院 (a = 1, m = 1, η = 1) li-propyl-ethyl methoxy sand, η-butyldiethyl methoxy sand, η·decyl diethyl methoxy decane, η- Cetyldiethyl methoxy decane, this paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) (please read the notes on the back and fill out this page), 11 Ministry of Economic Affairs Intellectual Property Office staff Consumer Cooperatives Printed -23- 1282580 A7 B7 V. INSTRUCTIONS (Saturated alkyldiethyl methoxy fluorenes such as η-decyldiethylmethoxydecane (a=l, m=l, η = 2) Please read the back of η first | Things: Item: η-butyldipropyl methoxy decane, η-mercaptodipropyl methoxy decane, η-hexadecyldipropyl Methoxy decane, η-decyl 2 A saturated alkyldipropyl methoxy decane such as methoxy methoxy oxane (a = l, m = 1, η = 3) η-propyldimethylethoxy decane, η-butyldimethyl a saturated alkyl dimethyl group such as ethoxy decane, η-mercaptodimethyl methoxy decane, η-hexadecyldimethyl ethoxy decane, η-decyl dimethyl ethoxy decane Ethyl ethoxy oxime (a = l, m = 2, η = 1) η-propyl diethyl ethoxy decane, η-butyl diethyl ethoxy decane, η-fluorenyl di Sodium ethoxy decane, η-hexadecyl diethyl ethoxy decane, η - 廿 基 - - - - - - - - - - - - - - - - a = 1, m = 2, η = 2) η-butyl dipropyl ethoxy decane, η-mercapto dipropyl ethoxy decane, η-hexadecyl dipropyl ethoxy decane, Saturated alkyldipropylethoxydecanes such as η-decyldipropylethoxysilane (a=l, m = 2, η = 3) Printed by the Intellectual Property Intelligence Bureau of the Ministry of Economic Affairs, η- Propyl dimethylpropoxydecane, η-butyldimethylpropoxydecane, η-mercaptodimethylpropoxydecane, η-ten Saturated alkyl dimethylpropoxy fluorenes such as hexaalkyl dimethyl propoxy decane and η-decyl dimethyl methoxy decane (a = l, m = 3, η = 1) Η-propyldiethylpropoxydecane, η-butyldiethylpropoxydecane, η-mercaptodiethylpropoxydecane, η-hexadecyldiethylpropoxydecane, Saturated alkyldiethylpropoxy fluorenes such as η-decyldiethylpropoxydecane (a=l, m = 3, η = 2) This paper scale uses Chinese National Standard (CNS) Α4 specifications (210X297 mm) -24- 1282580 Α7 Β7 V. Invention description (2) (Please read the note on the back ^^#:41^1^:1:) η-butyldipropylpropoxydecane a saturated alkyldipropylpropoxy group such as η-mercaptodipropylpropoxydecane, η-hexadecyldipropylpropoxydecane or η-decyldipropylpropoxydecane Hydranes (a = l, m = 3, η 2) η-propylmethyldimethoxydecane, η-butylmethyldimethoxydecane, η-mercaptomethyldimethoxydecane, η a saturated alkylmethyl group such as cetylmethyldimethoxydecane or η-decylmethyldimethoxydecane Oxygen oxime (a = 2, m = l, η = 1) η-propylethyldimethoxy oxime, η-butylethyldimethoxydecane, η-mercaptoethyl a saturated alkyl ethyl dimethoxy oxime family such as decyloxydecane, η-hexadecylethyldimethoxydecane, η-decylethyldimethoxydecane (a = 2, m=l,η = 2) η-butylpropyldimethoxydecane, η-mercaptopropyldimethoxydecane, η-hexadecylpropyldimethoxydecane, η-decane Saturated alkyl propyl dimethoxy decanes such as propyl dimethoxy decane (a = 2, m = l, η = 3) INT-propyl methyl group printed by the Ministry of Economic Affairs, Intellectual Property Office, Staff Consumer Cooperative Diethoxydecane, η-butylmethyldiethoxydecane, η-mercaptomethyldiethoxydecane, η-hexadecylmethyldiethoxydecane, η-decylalkylmethyl Saturated alkylmethyldiethoxyindoles such as ethoxy decane (a = 2, m = 2, η = 1) η-propylethyldiethoxydecane, η-butylethyl Ethoxy decane, η-mercaptoethyl diethoxy decane, η-hexadecylethyl diethoxy decane, η-nonylalkyl B Saturated alkylethyldiethoxy fluorenes such as bis-ethoxy decane (a = 2, m = 2, η = 2) η-butylpropyldiethoxydecane, η-mercaptopropyl Base diethoxy decane, η-hexadecylpropyl diethoxy decane, η-decyl propyl diethoxy decane This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) -25- 1282580 A7 B7 V. INSTRUCTIONS (Saturated alkyl propyl diethoxy decanes such as d (a = 2, m = 2, n = 3) Please read: Read the back 丨Further, fill in this page η-propylmethyldipropoxydecane, η-butylmercaptodipropoxydecane, η-mercaptomethyldipropoxydecane, η-hexadecyldecyl Saturated alkylmethyldipropoxy fluorenes such as propoxy decane, η-decylmethyldipropoxydecane (a = 2, m = 3, η = 1) η-propylethyl Dipropoxydecane, η-butylethyldipropoxydecane, η-mercaptoethyldipropoxydecane, η-hexadecylethyldipropoxydecane, η·廿alkyl Saturated alkylethyl dipropoxy fluorenes such as bis-propoxy decane (a = 2, m = 3, η = 2) η-butylpropyldipropoxydecane, η-mercaptopropyldipropoxydecane, η-hexadecylpropyldipropoxydecane a saturated alkylpropyldipropoxydecane such as η-decylpropyldipropoxydecane (a = 2, m = 3, η = 3) η-propyltrimethoxydecane, η- Saturated courtyard-based trimethoxy sand courts such as butyltrimethoxydecane, η-mercaptotrimethoxydecane, η-hexadecyltrimethoxydecane, η-decyltrimethoxyxanthine = 3,m = 1) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed η-propyl triethoxy decane, η-butyl triethoxy decane, η-mercapto triethoxy decane, η-ten a saturated alkyltriethoxynonane such as hexaalkyltriethoxydecane or η-decyltriethoxydecane (a = 3, m = 2) η-propyltripropoxydecane, η a saturated alkyl tripropoxy group such as butyltripropoxydecane, η-mercaptotripropoxydecane, η-hexadecyltripropoxydecane or η-decyltripropoxydecane Hydranes (a = 3, m = 3), etc., these may be used alone or in combination of two or moreIn this case, η-butyltrimethoxy decane, η-mercaptotrimethoxydecane, η-hexadecyltrimethoxynonane, η-mercaptodimethylmethoxydecane, paper scale Applicable to China National Standard (CNS) A4 specification (210X297 mm) -26- 1282580 Α7 Β7 V. Description of invention (η-hexadecyldimethyl methoxy decane, η-butyl triethoxy decane, η - mercaptotriethoxydecane, η-hexadecyltriethoxydecane, η-mercaptoethyldiethoxydecane, η-hexadecylethyldiethoxydecane, η_丁Particularly preferred is a bis-decyloxydecane, η-mercaptotripropoxydecane, η-hexadecyltripropoxydecane, etc. The content ratio of the fluorenyl group-containing compound containing the transparent glassy resin composition is 100 parts by mass of a low-melting point transparent glass, preferably 5 parts by mass or less, more preferably 1 part by mass or less. The content ratio of the fluorenyl group-containing compound is too large, and the viscosity of the obtained first transparent glass-containing resin composition is preserved. It rises as time passes, and the decyl-containing compound causes a reaction, which becomes a residual organic substance after calcination. Further, the transparent glassy resin composition may contain a plasticizer for the releasability and flammability of the transparent glass-containing resin layer, and the plasticizer may be in the following general formula (3) or (4). The plasticizer formed by the compound shown is ideal. (Please read the note on the back of the matter beforehand! Write this page) Printed by the Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperatives, R3—^0-

H 0 H • R^V〇—C-hC-

(wherein R' and R6 are each a same or different carbon number of 1 to 30, and each of R4 and R5 is the same or a different methylene group or a carbon number of 2 to 30 Support base, s is the number of 0~5, t is the number of 1~1〇.) The paper scale is applicable to China National Standard (CNS) A4 specification (210X297 mm) f -27- 1282580 Α7 Β7 V. Invention description ( y Η Η (4) H3C C—C—Ο—C-R7 (Please read the notes on the back and fill out this page) 0 (wherein, R7 shows an alkyl or alkenyl group with 1 to 30 carbon atoms. In particular, the plasticizer formed by the compound represented by the above general formula (3) or (4) is easily decomposed and removed by heat, and does not adversely affect the separator obtained by firing the transparent glass-containing resin layer. With respect to the above general formula (3), the alkyl group represented by R3 or R6, and the alkenyl group shown in the above, whether it is linear or branched, it is preferably a saturated group or an unsaturated group. And the alkyl group represented by R6 has a carbon number of 1 to 30, preferably 2 to 20, more preferably 4 to 10. When the carbon number of the alkyl group exceeds 30, the solubility of the plasticizer in a solvent is lowered, and a good Windable Specific examples of the compound represented by the above structural formula (3) which are printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs include, for example, dibutyl adipate, diisobutyl adipate, di-2-ethylhexyl. Adipate, di-2-ethylhexyl sebacate, dibutyl sebacate, dibutyl diethylene glycol adipate, etc. Preferably, the compound represented by η is 2 to 6. With respect to the compound of the above formula (4), R7 represents an alkyl group or an alkenyl group having 1 to 30 carbon atoms, whether it is linear or branched, and is preferably a saturated or unsaturated group. The alkyl group or alkenyl group represented by R7 has a carbon number of 1 to 30, preferably 2 to 20, more preferably 10 to 18. The paper scale is applicable to the Chinese National Standard (CNS) Α4 specification (21〇χ297 mm). -28- 1282580 A7 B7 V. DESCRIPTION OF THE INVENTION (g Specific examples of the compound represented by the above general formula (4) include propylene glycol monolaurate, propylene glycol monooleate, etc. Further, the transparent glass-containing resin layer may be used. An inclusion or white pigment containing ruthenium, alumina, titania, etc. Further, it may contain Ni, Ti, Cu as a black pigment. Metals such as Mn, Fe, Cr, Co, etc., composite metal oxides such as Cu-Cr, Cu-Fe-Mn, Cu-Cr-Mn, Co-Cr-Fe, Co-Fe-Fe, etc. The resin composition may contain, in addition to the above components, various additives such as an adhesive agent, a surface tension adjuster, a stabilizer, an antifoaming agent, and a dispersing agent of any component. The dispersing agent is preferably a fatty acid. In particular, a fatty acid having a carbon number of 8 to 30 is preferred. The above fatty acid is preferably desirably saturated with, for example, octanoic acid, i-alkanoic acid, lauric acid, myristic acid, palmitic acid, pentadecyl carbonate, stearic acid, arachidic acid or the like. Acid; unsaturated fatty acids such as oleic acid, oleic acid, linoleic acid, linseed oil, arachidonic acid, carboxypolycaprolactone (n = 2) monoacrylate, and the like. These may be used alone or in combination of two or more. The ratio of the content of the dispersant containing the transparent glassy resin composition printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs is 100 parts by mass of low melting point transparent glass, and preferably 5 parts by mass or less, more preferably 1 part by mass or less. . The transparent glassy resin composition is usually composed of the above (a) low-melting transparent glass, (b) a bonding resin, (c) a solvent, and other optional components, and a roll blender, a mixer, a homogenizer, or the like may be used. Sand mixing machine and other mixing-dispersing machine and mixing and modulation. The viscosity of the transparent glassy resin composition is preferably 500 to 50,000 m P a · s _1 . ^^^Using the Chinese National Standard (〇 secretion) 八4 specification (210/297 mm) -29- 1282580 A7 B7 V. Invention description (2) (Please read the note on the back and fill in the bundle page) The method of applying the resin composition to the support film is necessary to form a coating film having a uniform film thickness and a high film thickness (for example, 30 // m or more), specifically, a coating method of a roll mill, a plate An ideal method such as a coating method of a machine, a coating method of a film coater, a coating method of a curtain coater, a coating method of a wire coating machine, and the like. Further, it is preferable to apply a surface containing a support film of a transparent vitreous resin composition to give a release treatment. Thereby, the above-described transfer step can be easily performed by the peeling operation of the support film. The drying condition of the coating film is 50 to 150 ° C, and the residual ratio of the solvent containing the transparent glassy resin layer formed after drying is usually 2% by mass or less. The thickness of the transparent glass-containing resin layer formed on the support film as described above varies depending on the content of the glass powder, the type or size of the panel, and the like, for example, 10 to 500 // m, preferably 50 to 200 // m. Further, the protective film layer provided on the surface of the transparent glassy resin layer may, for example, be polyethylene terephthalate, a polyethylene film or a polyvinyl alcohol film. Printed by the Intellectual Property Office of the Ministry of Economic Affairs, the consumer consortium &lt;photoresist film (photoresist composition)&gt; The photoresist composition used for forming the photoresist film, for example, an alkaline development type radiation sensitive linear resist A material, an organic solvent-developable radiation-sensitive photoresist composition, an aqueous development-type radiation-sensitive photoresist composition, and the like, and an alkali-developable radiation-sensitive photoresist composition can be preferably used. In addition, "radiation-sensitive" includes visible light, ultraviolet light, far ultraviolet light, electron lines, and X-rays. This paper scale is applicable to China National Standard (CNS) A4 specification (210X297 mm) -30- 1282580 A7 B7 V. Invention Description (g Alkaline development type photoresist composition containing alkali-soluble resin and linear component It is an essential component. (Please read the precautions on the back side and fill out this page.) The alkali-soluble resin constituting the alkaline developing type resist composition may, for example, be a (meth)acrylic resin, a hydroxystyrene resin or a phenolic enamel paint. A resin such as a resin or a polyester resin. Among these alkali-soluble resins, a copolymer of the following monomers (a) and (b), and a monomer (a) and a monomer (c) are particularly preferable. And an acrylic resin such as a copolymer of monomer (d). Monomer (a): carboxyl group-containing acrylic acid, (meth)acrylic acid, maleic acid, fumaric acid, crotonic acid, methyl succinic acid , citraconic acid, mesaconic acid, cinnamic acid, succinic acid mono (2_(methyl) propylene glycol hydroxy ester, ω-carboxy-polycaprolactone (mono) (meth) acrylate, etc. monomer (c) : OH monomer-based Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed (meth) propylene a hydroxyl group-containing monomer such as 2-hydroxyethyl acid, 2-hydroxypropyl (meth)acrylate or 3-hydroxypropyl (meth)acrylate; hydrazine-hydroxystyrene, m hydroxystyrene, p-hydroxybenzene Monomer (d) such as phenol-containing hydroxy monomer such as ethylene: other monomers which may be copolymerized (methyl methacrylate, ethyl (meth) acrylate, butyl (meth) acrylate, Ethylhexyl (meth)acrylate, n-lauryl (meth)propionate, benzyl (meth)acrylate, glycidyl methacrylate, dicyclopentanyl (meth)acrylate, etc. (Meth) acrylates other than monomer (a); styrene, this paper scale is applicable to China National Standard (CNS) A4 specification (210X297 mm) 31 - 1282580 A7 B7 V. Invention description ((Please read the back first) Precautions and refill page t) ^ - Aromatic vinyl monomers such as methyl styrene, conjugated dienes such as butadiene, isoprene, etc.; polystyrene, poly(methyl) One end of a polymer chain of methyl acrylate, poly(ethyl) methacrylate, polybenzyl (meth) acrylate or the like has A macromonomer of a polymerizable unsaturated group such as a (meth) acrylonitrile group, or the like, or a copolymer of the above monomer (a) and monomer (b), or a monomer (a), a monomer (4), and a single The copolymer of the body (d) is alkali-soluble because the monomer (a) is present in the source of the copolymerization component, and the monomer (a) and the monomer (c) are used in view of the solubility of the alkali developer. And a copolymer of the monomer (d) is preferred. The source of the copolymerization component is preferably a monomer (a) in an amount of 5 to 60% by mass, more preferably 10 to 40% by mass, of a copolymerized component. The content of the monomer (b) is preferably from 1 to 50% by mass, more preferably from 5 to 30% by mass. The molecular weight Mw of the above alkali-soluble resin is preferably from 5,000 to 5,000,000, more preferably 1 0,0 0 0~3 0 0,0 0 0. The Intellectual Property Office of the Ministry of Economic Affairs, the Consumers' Cooperatives, prints components that constitute an alkaline developing resist composition, such as (a) a combination of a polyfunctional monomer and a photopolymerization initiator, (b) a trimeric nitrile resin, and radiation. An example in which a combination of a photoacid initiator which forms an acid is irradiated, (c) a compound which is alkali-soluble by irradiating an alkali-insoluble substance with radiation, and the like, wherein a combination of the above (a) is a polyfunctional (fluorenyl) acrylate and light. The combination of a polymerization initiator is particularly preferable. Specific examples of the polyfunctional (meth) acrylate include di(meth)acrylates of alkylene glycols such as ethylene glycol and propylene glycol; and polyethylene glycols; Poly(alkylene glycol) di(meth)acrylates such as polypropylene glycol; two-terminal hydroxyl polybutadiene, two-terminal hydroxypolyisoprene, and two terminal hydroxyl groups. (CNS) A4 size (21〇X297 mm) -32- 1282580 A7 B7 V. Invention description (33⁄4 (please read the back note first and then fill in this page) Two esters of hydroxylated polymer at the two ends of lactone ( Methacrylate Poly(meth)acrylates of trivalent or higher polyvalent alcohols such as glycerin, 1,2,4-butanetriol, trimethylol hydrocarbon, tetramethanol hydrocarbon, pentaerythritol, dipentaerythritol, etc.; Poly(meth)acrylates of polyalcoholic acid adducts of valent alcohols; poly(methyl) of cyclic polyalcohols such as 1,4-cyclohexylene glycol and 1,4-benzene monool Acrylates; polyester (meth) acrylate, epoxy (meth) acrylate, urethane (meth) acrylate, alkyd (meth) acrylate, oxime resin (meth) acrylate An oligomer (meth) acrylate such as a snail resin (meth) acrylate; or the like, which may be used alone or in combination of two or more. The Ministry of Economic Affairs, the Intellectual Property Bureau, the employee consumption cooperative, printed and constructed. Specific examples of the photoinitiator having a linear component include benzoin, benzophenone, camphorquinone, 2-cyano-2-methyl-1-phenylpropyl-1-one, and 1-hydroxyl group. Cyclohexyl phenyl ketone, 2,2-dihydroxy-2-morpholino-1-propanone, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl) a carbonyl compound such as a ketone or the like; an azo compound or an azide compound such as azoisobutyronitrile or 4-azidobenzaldehyde; an organic sulfide such as a sterol compound; a benzoquinone peroxide; Di-tert-butyl peroxide, tert-butyl hydroperoxide, cumene hydroperoxide, organic peroxide to methane hydroperoxide, etc.; 1,3-bis(trichloromethyl chloride) Phenyl)-1,3,5-triazine, 2-[2-(2-furyl)vinyl]-4,6-(trichloromethyl)-1,3,5-triazine, etc. Halogenated methane; 2,2 bis(2-chlorophenyl) 4,5,4',5^tetraphenyl 1,2'-diimidazole dimer, etc. These may be used alone or in combination of two or more. The content of the radiation-sensitive component of the alkali-developable resist composition is usually from 1 to 200 parts by weight, preferably from 5 to 100 parts by weight, per 100 parts by weight of the alkali-soluble resin. This paper scale applies to China National Standard (CNS) A4 specification (210X297 mm) -33- 1282580 A7 B7 V. Invention description ((Please read the note on the back to fill out this page) Also, about alkaline development type radioactivity The photoresist composition contains a suitable solvent to impart good film formability, and examples of the solvent include a solvent exemplified as a composition containing a transparent glassy resin. The optional component of the photoresist composition used in the present invention The black pigment, the development accelerator, the bonding aid, the halo preventing agent, the storage stabilizer, the antifoaming agent, the antioxidant, the ultraviolet absorber, the chelating agent, and the like, which are exemplified as the transparent glass-containing resin composition described above, may be contained. Various additives such as phosphors, pigments, dyes, etc. &lt;Exposure cover film&gt; The exposure pattern of the exposure cover film (M) used in the exposure step of the photoresist film is formed as desired in the plasma working space. The viewpoint is ideal with a stripe of 30 to 500 // m, and a typical example is a strip of 70 // m. <Development Liquid> Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperative, Printed Photoresist Film The developing solution used in the developing step is appropriately selected depending on the type of the light-shielding film (photoresist composition). Specifically, the resistive film of the alkali-developing type radiation-sensitive photoresist composition can be an alkaline developing solution. The organic solvent-type developer may be used as the photoresist film of the organic solvent-developable radiation-sensitive photoresist composition, and the aqueous developer may be used as the photoresist film of the aqueous development-type radiation-sensitive photoresist composition. Examples of the component include lithium hydroxide, sodium hydroxide, potassium hydroxide, sodium hydrogen phosphate, diammonium hydrogen phosphate, dipotassium hydrogen phosphate, disodium hydrogen phosphate, ammonium dihydrogen phosphate, potassium dihydrogen phosphate, and sodium dihydrogen phosphate.矽 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 210 210 210 210 210 210 210 210 210 210 , an inorganic basic compound such as sodium citrate, potassium citrate, lithium carbonate, sodium carbonate, potassium carbonate, lithium borate, sodium borate, potassium borate, ammonia, etc.; tetramethylammonium hydroxide, trimethylhydroxyethylammonium Hydroxide, single An organic basic compound such as a monoamine, a dimethylamine, a tridecylamine, a monoethylamine or a diethylamine; a triethylamine, a monoisopropylamine, a diisopropylamine or an ethanolamine. The developer used in the development step of the resist film may be prepared by dissolving one or more of the above basic compounds in water or the like. Here, the relevant concentration of the alkaline developer is usually 0.001 to 10% by mass, preferably 〇.〇1 to 5 wt%. Further, after developing the length of the alkaline developing solution, the water washing treatment is usually applied. EXAMPLES Hereinafter, the examples of the present invention will be described, but the present invention is not limited to the examples. Each of the "parts" and "%" are shown as "parts by weight" and "% by weight". The Ministry of Economic Affairs' Intellectual Property Office staff consumption cooperative prints and the weight average molecular weight (Mw) is based on the Permeable Chromatography (GPC) "HLC". -802A" (made by Nippon Tosoh Corporation) The average molecular weight in terms of polystyrene. [Synthesis Example 1] In a reaction vessel equipped with a stirrer, 5·5 parts of tolylene diisocyanate, 42.0 parts of a ring-opening copolymer of tetrahydrofuran and methyltetrahydrofuran (number average molecular weight: 2000), and 0.01 part of an additive as an additive were charged. The inhibitor 2,6-di-tert-butyl-p-cresol. The mixture was iced while stirring to a temperature of 1 Torr.适用Applicable to the Chinese National Standard (CNS) A4 specification (210X 297 mm) -35- 1282580 A7 B7 on the paper scale. 5.Inventive Note (g Please read the back: έ: meaning 丨m again: 4: bottom. Liquid temperature When it falls below 10 ° C, 0.04 parts of di tin dilaurate is added, and the temperature of the control liquid is stirred at 20 to 30 ° C for 2 hours. Thereafter, 2.5 parts of hydroxyethyl acrylate is added at a liquid temperature of 50 to 60 ° C. Stirring was continued for 4 hours, and the residual isocyanate was terminated at 0.01% or less to synthesize a carbamate diacrylate (A) 〇 &lt;Example 1&gt; (1) Preparation of a composition containing a transparent vitreous resin: 100 parts as (a Low-melting point transparent glassy PbO-B2〇3-Si〇2 system transparent glass (softening point 570 ° C, average particle size 1.5 / zm), 7 parts as (b) binding resin η-butyl methacrylic acid Ester/methacrylate/2-hydroxypropyl methacrylate=60% by mass/30% by mass/10% by mass of copolymer (weight average molecular weight: 100,000), 20 parts of propylene glycol monomethyl as (c) solvent Base ether, 20 parts of aluminum powder as a chelating agent and 1 part of propylene glycol monooleate as a plasticizer, used The machine is mixed with a transparent glass resin composition (1) with a viscosity of 1 〇, 〇〇〇mPa ·, and is printed by the Ministry of Economic Affairs, Intellectual Property Bureau, and the Consumer Cooperatives. -36-1282580 A7 B7 V. 3) Propylene glycol monomethyl ether acetate is prepared by kneading into an alkali-developable radiation sensitive linear resist composition (1) (hereinafter referred to as "photoresist composition (1)"). (Please read the back first.) (3) The manufacture of the transfer film: The transparent glassy resin composition (1) prepared by the above (1) is supported by the PET film previously removed. The film (web 200 mm, length 30 m, thickness 38 // m) was coated with a roller coater, and the film was completely removed by drying the solvent at 10 (TC for 15 minutes, forming a thickness of 200 // m on the support film. The glassy resin layer (hereinafter referred to as "transfer film (1)"). Similarly, the photoresist composition (1) prepared by the above (2) is supported by a PET film previously treated with a release film. The film (web 200 mm, length 30 m, thickness 38 //m) was coated on a roller coater, and the film was dried at 100 ° C for 15 minutes to completely remove the solvent. A light film with a thickness of 30 // m is formed on the film (hereinafter referred to as "transfer film (2)"). Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed 1282580 A7 __B7 V. Invention description (surface of hot light wheel The temperature is 100 °c, the wheel pressure is 5 kg/cm, and the moving speed of the heating roller is 〇.5m/min. (Please read the note on the back and fill out this page) (5) Exposure steps of the photoresist film: The photoresist film formed on the transparent glass-containing resin layer is irradiated with an ultraviolet ray at a wavelength of 265 nm by an ultrahigh pressure mercury lamp on the support film through a cover film for exposure (a stripe pattern of 70 k m width). ). The irradiation amount is 4〇〇mJi/cm2 (6) Development step of the photoresist film: After the support film is peeled off by the photoresist film, the exposed photoresist film is treated with 0.6% by mass of sodium carbonate solution (30 ° C) The developing process of the shower method and the rinsing treatment of the ultrapure water are carried out as a developing solution, whereby the uncured photoresist film which is not irradiated with ultraviolet rays is removed, and a resist pattern is obtained on the transparent glass-containing resin layer. (7) Sandblasting step of transparent glassy resin layer The Ministry of Economy, Intellectual Property Office, and the Consumer Cooperatives Co., Ltd. printed a pattern containing a transparent glassy resin layer treated with Weiying as a cover film, and alumina was used as a transparent glassy resin layer. The honing agent was subjected to sand blasting at a blasting pressure of 3 kg/cm 2 to remove the transparent glass-containing resin layer corresponding to the photoresist film-removed portion, thereby obtaining a pattern containing a transparent glassy resin layer. (8) Calcination step: Form a glass substrate containing a transparent glassy resin layer pattern, and the scale of the baked paper at 590 °C applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) -38- A7 1282580 B7 V. Description of the invention (- (Please read the precautions on the back and fill out this page). The baking treatment is carried out for 30 minutes in the temperature environment of the furnace. Thereby, the photoresist film pattern and the organic component in the transparent glass-containing resin layer pattern are removed. The surface of the glass substrate is a panel material of a spacer having a pattern width of 7 〇# m and a height of 50 μm. <Example 2> In the first embodiment, (2) modulation of the alkali-developing type radiation resist composition, In addition to adding 10 parts of Cr-Cu composite oxide (average particle size 1.0 // m) as a black pigment and 5 parts of transparent glassy Pb〇-B2〇3-Si〇2 system transparent glass as a low melting point ( The alkali-developing type radiation resist composition (2) was prepared in the same manner as in Example 1 except that the softening point was 570 t: and the average particle diameter was 1.5 // m. (The following is called "photoresist composition (2)". (3) The production of the transfer film in the related embodiment 1 is as described in the above (2) The photoresist composition (1) was coated on a support film (web 200 mm, length 30 m, thickness 38//m) formed by pre-stripping PET film using a reverse roll coater, and the film was coated. 10CTC was dried for 5 minutes to completely remove the solvent, and a photoresist film having a thickness of 30/m was formed on the support film. The Ministry of Economic Affairs, Intellectual Property Office, and the Consumer Cooperatives printed the second, and the transparent glass-containing resin composition prepared in Example 1 (1) It is coated on the photoresist film by a plate coating machine, and the solvent is completely removed by drying at 100 ° C for 15 minutes, and a transparent glassy resin layer having a thickness of 200 // m is formed on the photoresist film (hereinafter referred to as "transfer The film (3) is referred to as the film. In the first embodiment, regarding the film transfer step, the transfer film (3) and the surface containing the transparent glass resin layer are superposed on the surface of the glass substrate for the 6-inch panel. Immediately after, the transfer film (3) is hot pressed by a heated roller, and the pressing condition is the heating roller. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210×297 mm)~&quot; -39 - 1282580 A7 B7 , invention description (the surface temperature of the wheel is 150 ° C, the wheel pressure is 1 〇 kg / cm, the moving speed of the heating roller is 0.5 m / (Please read the precautions on the back side and fill in this page.) In the same manner as in the first embodiment, the exposure and development steps of the photoresist film, the blasting step and the baking step of the transparent glass-containing resin layer are performed. The surface of the panel is a panel material of a spacer having a black top 70/zm and a height of 50 // m. &lt;Example 3&gt; In Example 1 (1) Modification of a composition containing a transparent vitreous resin, except for addition A transparent glass-containing resin composition (2) was prepared in the same manner as in Example 1 except that 40 parts of a Cr-Cu composite oxide (average particle diameter: 1.0 / m) was used as the black pigment. In the first embodiment (1), regarding the preparation of the composition containing a transparent vitreous resin, 14 parts of η-butyl methacrylate/methyl methacrylate/2-hydroxypropyl methacrylic acid as (b) binding resin was used. A transparent glass-containing resin composition (3) was prepared in the same manner as in Example 1 except that the ester was 60% by mass/30 /10 of a copolymer (weight average molecular weight: 100,000). The Ministry of Economic Affairs, Intellectual Property Office, and the Consumer Cooperatives, printed in the related embodiment 1, (3) the production of the transfer film, the photoresist composition (1) prepared by the above (2), formed by the pre-release film of the PET film. The support film (web 200 mm, length 30 m, thickness 38//m) was coated with a reverse roller coater, and the film was completely dried at 100 ° C for 5 minutes to completely remove the solvent to form a thickness of 30/m on the support film. Photoresist film. Next, the transparent glass-containing resin composition (2) is coated on the photoresist film by a roller coater, and dried at 100 ° C for 5 minutes to completely remove the solvent, and the Chinese national standard (CNS) is applied to the paper scale. A4 size (21〇&gt;&lt;297 mm) &quot;&quot; -40- 1282580 A7 B7 V. Inventive Note (The transparent glass resin layer with a thickness of 30 // m is formed on the photoresist film. The transparent glass-containing resin composition (1) prepared in the first embodiment and the transparent glass-containing resin composition (3) were coated with a plate coating machine in this order, and dried to obtain a photoresist on the support film. The transfer film (4) of the present invention (hereinafter referred to as "transfer film (4)") of a film and a laminated film comprising a transparent glassy resin layer. Here, the transparent glass resin composition is contained. (1) The solvent was completely removed by drying at 100 ° C for 15 minutes to form a thickness of 150 / / m, and the coating film containing the transparent glassy resin composition (3) was dried at 1 ° C for 5 minutes to completely remove the solvent to form 3 0. // m thickness. In the first embodiment, the step of the (4) film is applied to the surface of the glass substrate for the 6 吋 panel. The overlapping transfer film (4) is in close contact with the surface of the transparent glass-containing resin layer, and the transfer film (4) is hot-pressed by a heating roller, and the pressing condition is that the surface temperature of the heating roller is 120 ° C, and the wheel pressure is The moving speed of the heating roller was 5 m/cm, and the moving speed of the heating roller was 0.5 m/min. In the same manner as in Example 1, the exposure and development steps of the resist film, the blasting step and the baking step of the transparent glass-containing resin layer were carried out. The surface of the glass substrate was obtained to form a panel material of a separator having a black top 70*m and a height of 50/m. The commercial use field has the following effects according to the manufacturing method of the present invention. (1) With the past Compared with the manufacturing method, the number of forming steps of the separator is small, and the manufacturing efficiency of the plasma display panel can be improved. (2) The paper size of the plasma display panel obtained by the manufacturing method of the present invention is applicable to the Chinese national standard. (CNS) A4 size (210X297 mm) ' -41 - (Please read the notes on the back and fill out this page) i^w.

1T Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1282580 A7 B7 V. Invention Description (33⁄4 board with high dimensional accuracy. (3) Compartment of the plasma display panel obtained by the manufacturing method of the present invention, showing contrast And the luminous efficiency is high. (4) The transfer film for forming a separator of the present invention is suitable for use in the separator forming step of the manufacturing method of the present invention. (Please read the back note and then fill in the page.) The property bureau employee consumption cooperative printed this paper scale applicable to China National Standard (CNS) A4 specification (210X297 mm) -42-

Claims (1)

Positive feedback, please entrust the party to change - change the original substance content of the Ministry of Economic Affairs, intellectual property bureau, consumer cooperation, printing A8 B8 C8 D8 VI. Application for patent scope 1 Attachment 2: Chinese application for patent application No. 9 1 1 1 6904 Patent scope revision. Amendment of February 17, 1993. 1. A method of manufacturing a plasma display panel, characterized by the method of forming a separator comprising the following steps (i) to (iv): (i) supporting film The transparent glass-containing resin layer containing the alkali-insoluble or poor-soluble resin component formed thereon is transferred onto the substrate to form a transparent glass-containing resin layer containing an alkali-soluble resin component. a step of forming a photoresist film; (ii) exposing the photoresist film to a step of forming a photoresist pattern on the transparent glass-containing resin layer after the development process; (iii) after blasting the transparent glass-containing resin layer Step 9 of forming a pattern containing a transparent glassy resin layer corresponding to the photoresist pattern on the substrate (iv) a step of baking the pattern containing the transparent glassy resin layer. 2. The method of manufacturing a plasma display panel according to the first aspect of the invention, wherein the photoresist film formed on the support film is formed by transferring onto the transparent slab-containing resin layer to form a photoresist film. 3. The method of manufacturing a plasma display panel according to the first aspect of the invention, wherein the photoresist film formed on the support film and the laminated film containing the transparent glass resin layer are formed on the substrate to form a transparent glass. A laminated film of a resin layer and a photoresist film. 4. The method of manufacturing a plasma display panel according to claim 1, wherein the laminate comprising a plurality of layers comprising a transparent glassy resin layer is I·--L.------- ( Please read the precautions on the back and fill out this page.) The paper size is applicable to the Chinese National Standard (CNS) A4 specification (2) 0X297 mm) -1 - 1282580 A8 B8 C8 D8 VI. Patent application scope 2, transfer formed on On the substrate. The method for manufacturing a plasma display panel according to the first aspect of the invention, wherein the photoresist film and/or the transparent glass-containing resin layer contains a black pigment. 6. A transfer film for forming a separator, characterized in that a resist film containing an alkali-soluble resin component and a resin component containing an alkali-soluble or poorly soluble resin component are formed on a support film. The laminated film is composed of. 7. The transfer film for forming a separator according to claim 6, wherein the photoresist film and/or the transparent glass-containing resin layer is a black pigment. ',' 8. The transfer film for forming a separator according to claim 6 of the patent application, wherein a resist film, a transparent glass-containing resin layer containing a black pigment, and a transparent glass containing no black pigment are formed on the support film. A laminated film of a resin layer is formed. Printed by the Intellectual Property Office of the Ministry of Economic Affairs, the Consumers' Cooperatives. 9. The transfer film for forming a separator according to item 6 of the patent application is formed on the support film to form a laminate containing a photoresist film and a plurality of transparent glass-containing resin layers. The transfer film formed by the film has a transparent glassy content of the transparent glassy resin layer on the transfer surface lower than that of the remaining transparent glassy resin layer. This paper scale is applicable to China National Standard (CNS) A4 (2) 0X297 mm)