TWI266872B - Unevenness defect inspection method and device of pattern - Google Patents

Unevenness defect inspection method and device of pattern

Info

Publication number
TWI266872B
TWI266872B TW094109732A TW94109732A TWI266872B TW I266872 B TWI266872 B TW I266872B TW 094109732 A TW094109732 A TW 094109732A TW 94109732 A TW94109732 A TW 94109732A TW I266872 B TWI266872 B TW I266872B
Authority
TW
Taiwan
Prior art keywords
light
unevenness defect
repeated pattern
photomask
chip
Prior art date
Application number
TW094109732A
Other languages
English (en)
Other versions
TW200612089A (en
Inventor
Masaaki Kobayashi
Atsushi Hara
Noboru Yamaguchi
Yuudai Ishikawa
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200612089A publication Critical patent/TW200612089A/zh
Application granted granted Critical
Publication of TWI266872B publication Critical patent/TWI266872B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61H—PHYSICAL THERAPY APPARATUS, e.g. DEVICES FOR LOCATING OR STIMULATING REFLEX POINTS IN THE BODY; ARTIFICIAL RESPIRATION; MASSAGE; BATHING DEVICES FOR SPECIAL THERAPEUTIC OR HYGIENIC PURPOSES OR SPECIFIC PARTS OF THE BODY
    • A61H39/00—Devices for locating or stimulating specific reflex points of the body for physical therapy, e.g. acupuncture
    • A61H39/04—Devices for pressing such points, e.g. Shiatsu or Acupressure
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61H—PHYSICAL THERAPY APPARATUS, e.g. DEVICES FOR LOCATING OR STIMULATING REFLEX POINTS IN THE BODY; ARTIFICIAL RESPIRATION; MASSAGE; BATHING DEVICES FOR SPECIAL THERAPEUTIC OR HYGIENIC PURPOSES OR SPECIFIC PARTS OF THE BODY
    • A61H15/00—Massage by means of rollers, balls, e.g. inflatable, chains, or roller chains
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61H—PHYSICAL THERAPY APPARATUS, e.g. DEVICES FOR LOCATING OR STIMULATING REFLEX POINTS IN THE BODY; ARTIFICIAL RESPIRATION; MASSAGE; BATHING DEVICES FOR SPECIAL THERAPEUTIC OR HYGIENIC PURPOSES OR SPECIFIC PARTS OF THE BODY
    • A61H15/00—Massage by means of rollers, balls, e.g. inflatable, chains, or roller chains
    • A61H2015/0007—Massage by means of rollers, balls, e.g. inflatable, chains, or roller chains with balls or rollers rotating about their own axis
    • A61H2015/0014—Massage by means of rollers, balls, e.g. inflatable, chains, or roller chains with balls or rollers rotating about their own axis cylinder-like, i.e. rollers
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61H—PHYSICAL THERAPY APPARATUS, e.g. DEVICES FOR LOCATING OR STIMULATING REFLEX POINTS IN THE BODY; ARTIFICIAL RESPIRATION; MASSAGE; BATHING DEVICES FOR SPECIAL THERAPEUTIC OR HYGIENIC PURPOSES OR SPECIFIC PARTS OF THE BODY
    • A61H2201/00—Characteristics of apparatus not provided for in the preceding codes
    • A61H2201/01—Constructive details
    • A61H2201/0192—Specific means for adjusting dimensions
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61H—PHYSICAL THERAPY APPARATUS, e.g. DEVICES FOR LOCATING OR STIMULATING REFLEX POINTS IN THE BODY; ARTIFICIAL RESPIRATION; MASSAGE; BATHING DEVICES FOR SPECIAL THERAPEUTIC OR HYGIENIC PURPOSES OR SPECIFIC PARTS OF THE BODY
    • A61H2201/00—Characteristics of apparatus not provided for in the preceding codes
    • A61H2201/12—Driving means
    • A61H2201/1253—Driving means driven by a human being, e.g. hand driven
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61H—PHYSICAL THERAPY APPARATUS, e.g. DEVICES FOR LOCATING OR STIMULATING REFLEX POINTS IN THE BODY; ARTIFICIAL RESPIRATION; MASSAGE; BATHING DEVICES FOR SPECIAL THERAPEUTIC OR HYGIENIC PURPOSES OR SPECIFIC PARTS OF THE BODY
    • A61H2205/00—Devices for specific parts of the body
    • A61H2205/12—Feet
    • A61H2205/125—Foot reflex zones

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Rehabilitation Therapy (AREA)
  • Animal Behavior & Ethology (AREA)
  • Pathology (AREA)
  • Public Health (AREA)
  • Physical Education & Sports Medicine (AREA)
  • Epidemiology (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Veterinary Medicine (AREA)
  • Immunology (AREA)
  • Pain & Pain Management (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW094109732A 2004-03-31 2005-03-29 Unevenness defect inspection method and device of pattern TWI266872B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004106462A JP2005291874A (ja) 2004-03-31 2004-03-31 パターンのムラ欠陥検査方法及び装置

Publications (2)

Publication Number Publication Date
TW200612089A TW200612089A (en) 2006-04-16
TWI266872B true TWI266872B (en) 2006-11-21

Family

ID=35049734

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094109732A TWI266872B (en) 2004-03-31 2005-03-29 Unevenness defect inspection method and device of pattern

Country Status (5)

Country Link
US (1) US20050220330A1 (zh)
JP (1) JP2005291874A (zh)
KR (1) KR20060045078A (zh)
CN (1) CN100565195C (zh)
TW (1) TWI266872B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI450026B (zh) * 2007-07-12 2014-08-21 Applied Materials Israel Ltd 用以評估具有重複圖案之物體的方法與系統

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4583155B2 (ja) * 2004-12-13 2010-11-17 Ｈｏｙａ株式会社 欠陥検査方法及びシステム、並びにフォトマスクの製造方法
TWI354100B (en) * 2006-06-01 2011-12-11 Dainippon Screen Mfg Unevenness inspecting method, unevenness inspectin
JP4949928B2 (ja) * 2006-06-20 2012-06-13 Ｈｏｙａ株式会社 パターン欠陥検査方法、パターン欠陥検査装置、フォトマスク製品の製造方法、及び表示デバイス用基板の製造方法
KR101587176B1 (ko) * 2007-04-18 2016-01-20 마이크로닉 마이데이타 에이비 무라 검출 및 계측을 위한 방법 및 장치
US20090199152A1 (en) * 2008-02-06 2009-08-06 Micronic Laser Systems Ab Methods and apparatuses for reducing mura effects in generated patterns
JP5178561B2 (ja) * 2009-02-06 2013-04-10 Ｈｏｙａ株式会社 パターン検査方法、パターン検査装置、フォトマスク製造方法、およびパターン転写方法
CN101592812B (zh) * 2009-06-23 2012-05-23 友达光电（苏州）有限公司 显示面板及其像素缺陷检查方法
KR102253995B1 (ko) 2013-03-12 2021-05-18 마이크로닉 아베 기계적으로 생성된 정렬 표식 방법 및 정렬 시스템
WO2014140047A2 (en) 2013-03-12 2014-09-18 Micronic Mydata AB Method and device for writing photomasks with reduced mura errors
CN106536784B (zh) * 2014-06-06 2019-08-30 大日本印刷株式会社 蒸镀掩模及其前体、以及有机半导体元件的制造方法
CN104914133B (zh) * 2015-06-19 2017-12-22 合肥京东方光电科技有限公司 摩擦缺陷检测装置
CN105974731B (zh) * 2016-07-25 2020-01-03 京东方科技集团股份有限公司 一种压印板、检测方法及检测装置
CN107911602B (zh) * 2017-11-23 2020-05-05 武汉华星光电半导体显示技术有限公司 显示面板Mura的检测方法、检测装置及计算机可读存储介质
TWI672493B (zh) * 2018-03-07 2019-09-21 由田新技股份有限公司 用於檢測面板斑紋的光學檢測系統及其方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL100443A (en) * 1991-12-20 1995-03-30 Dotan Gideon Inspection system for detecting surface flaws
JP2001013085A (ja) * 1999-06-30 2001-01-19 Nidek Co Ltd 欠陥検査装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI450026B (zh) * 2007-07-12 2014-08-21 Applied Materials Israel Ltd 用以評估具有重複圖案之物體的方法與系統

Also Published As

Publication number Publication date
JP2005291874A (ja) 2005-10-20
CN100565195C (zh) 2009-12-02
CN1677097A (zh) 2005-10-05
KR20060045078A (ko) 2006-05-16
TW200612089A (en) 2006-04-16
US20050220330A1 (en) 2005-10-06

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees