TWI265330B - Method for protection of adhesives used to secure optics from ultra-violet light - Google Patents

Method for protection of adhesives used to secure optics from ultra-violet light

Info

Publication number
TWI265330B
TWI265330B TW092126233A TW92126233A TWI265330B TW I265330 B TWI265330 B TW I265330B TW 092126233 A TW092126233 A TW 092126233A TW 92126233 A TW92126233 A TW 92126233A TW I265330 B TWI265330 B TW I265330B
Authority
TW
Taiwan
Prior art keywords
ultra
optical element
violet light
light
organoxy
Prior art date
Application number
TW092126233A
Other languages
English (en)
Other versions
TW200407583A (en
Inventor
Matthew Lipson
Ronald A Wilklow
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of TW200407583A publication Critical patent/TW200407583A/zh
Application granted granted Critical
Publication of TWI265330B publication Critical patent/TWI265330B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70341Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82BNANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/003Light absorbing elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/025Mountings, adjusting means, or light-tight connections, for optical elements for lenses using glue
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Surface Treatment Of Glass (AREA)
  • Joining Of Glass To Other Materials (AREA)
TW092126233A 2002-09-25 2003-09-23 Method for protection of adhesives used to secure optics from ultra-violet light TWI265330B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/253,655 US7081278B2 (en) 2002-09-25 2002-09-25 Method for protection of adhesives used to secure optics from ultra-violet light

Publications (2)

Publication Number Publication Date
TW200407583A TW200407583A (en) 2004-05-16
TWI265330B true TWI265330B (en) 2006-11-01

Family

ID=31993199

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092126233A TWI265330B (en) 2002-09-25 2003-09-23 Method for protection of adhesives used to secure optics from ultra-violet light

Country Status (7)

Country Link
US (3) US7081278B2 (zh)
EP (1) EP1413907A1 (zh)
JP (1) JP2004126580A (zh)
KR (1) KR100657433B1 (zh)
CN (1) CN1261786C (zh)
SG (1) SG105011A1 (zh)
TW (1) TWI265330B (zh)

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US7081278B2 (en) * 2002-09-25 2006-07-25 Asml Holdings N.V. Method for protection of adhesives used to secure optics from ultra-violet light
US20050153064A1 (en) * 2004-01-14 2005-07-14 Asml Holding N.V. Method of covering clear aperture of optic during deposition of glue protection layer
JP5645406B2 (ja) * 2006-09-12 2014-12-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 浸漬リソグラフィーのための疎水性被膜を有する光学的配置、ならびにそれを具える投影露光器機
JP2011065738A (ja) * 2009-08-19 2011-03-31 Panasonic Corp 光ピックアップ装置
US8179944B2 (en) * 2009-11-25 2012-05-15 Corning Incorporated Adhesive protective coating with supressed reflectivity
US8335045B2 (en) * 2010-02-24 2012-12-18 Corning Incorporated Extending the stability of UV curable adhesives in 193NM laser systems
DE102010021539B4 (de) 2010-05-19 2014-10-09 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Blenden
US9158207B2 (en) 2011-08-09 2015-10-13 Carl Zeiss Smt Gmbh Optical component comprising radiation protective layer
DE102011080639A1 (de) * 2011-08-09 2012-10-11 Carl Zeiss Smt Gmbh Optische Komponente mit Strahlungs-Schutzschicht
US8492448B2 (en) 2011-10-07 2013-07-23 Corning Incorporated Systems and methods for performing photoreactions using light-diffusing optical fiber
CN102566002A (zh) * 2011-12-14 2012-07-11 北京国科世纪激光技术有限公司 光学单元以及用于粘合光学元件的工装
KR101516358B1 (ko) 2012-03-06 2015-05-04 삼성전자주식회사 발광 장치
US9753190B2 (en) 2013-08-28 2017-09-05 Corning Incorporated Adhesive with embedded waveguides for curing
US9958579B2 (en) * 2013-09-06 2018-05-01 Corning Incorporated UV protective coating for lens assemblies having protective layer between light absorber and adhesive
US9557516B2 (en) 2013-10-07 2017-01-31 Corning Incorporated Optical systems exhibiting improved lifetime using beam shaping techniques
US10611106B2 (en) * 2015-02-15 2020-04-07 Roger Wen Yi Hsu Methods and systems for making an optical functional film
US10459134B2 (en) * 2015-08-18 2019-10-29 Corning Incorporated UV-blocking coating with capping layer in optical assembly having UV light source
US10578785B2 (en) 2015-08-18 2020-03-03 Corning Incorporated Blocking coating with adhesion layer for ultraviolet optics
US10752790B2 (en) * 2016-12-21 2020-08-25 Corning Incorporated UV blocking coatings for lens assemblies

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Also Published As

Publication number Publication date
KR100657433B1 (ko) 2006-12-14
US20040058061A1 (en) 2004-03-25
KR20040030310A (ko) 2004-04-09
CN1497287A (zh) 2004-05-19
US20100271605A1 (en) 2010-10-28
US7781029B2 (en) 2010-08-24
JP2004126580A (ja) 2004-04-22
SG105011A1 (en) 2004-07-30
US20060240365A1 (en) 2006-10-26
US7081278B2 (en) 2006-07-25
US9195148B2 (en) 2015-11-24
TW200407583A (en) 2004-05-16
EP1413907A1 (en) 2004-04-28
CN1261786C (zh) 2006-06-28

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MM4A Annulment or lapse of patent due to non-payment of fees