TWI265330B - Method for protection of adhesives used to secure optics from ultra-violet light - Google Patents
Method for protection of adhesives used to secure optics from ultra-violet lightInfo
- Publication number
- TWI265330B TWI265330B TW092126233A TW92126233A TWI265330B TW I265330 B TWI265330 B TW I265330B TW 092126233 A TW092126233 A TW 092126233A TW 92126233 A TW92126233 A TW 92126233A TW I265330 B TWI265330 B TW I265330B
- Authority
- TW
- Taiwan
- Prior art keywords
- ultra
- optical element
- violet light
- light
- organoxy
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/003—Light absorbing elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/025—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using glue
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lens Barrels (AREA)
- Optical Elements Other Than Lenses (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Surface Treatment Of Glass (AREA)
- Joining Of Glass To Other Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/253,655 US7081278B2 (en) | 2002-09-25 | 2002-09-25 | Method for protection of adhesives used to secure optics from ultra-violet light |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200407583A TW200407583A (en) | 2004-05-16 |
TWI265330B true TWI265330B (en) | 2006-11-01 |
Family
ID=31993199
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW092126233A TWI265330B (en) | 2002-09-25 | 2003-09-23 | Method for protection of adhesives used to secure optics from ultra-violet light |
Country Status (7)
Country | Link |
---|---|
US (3) | US7081278B2 (zh) |
EP (1) | EP1413907A1 (zh) |
JP (1) | JP2004126580A (zh) |
KR (1) | KR100657433B1 (zh) |
CN (1) | CN1261786C (zh) |
SG (1) | SG105011A1 (zh) |
TW (1) | TWI265330B (zh) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7081278B2 (en) * | 2002-09-25 | 2006-07-25 | Asml Holdings N.V. | Method for protection of adhesives used to secure optics from ultra-violet light |
US20050153064A1 (en) * | 2004-01-14 | 2005-07-14 | Asml Holding N.V. | Method of covering clear aperture of optic during deposition of glue protection layer |
JP5645406B2 (ja) * | 2006-09-12 | 2014-12-24 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 浸漬リソグラフィーのための疎水性被膜を有する光学的配置、ならびにそれを具える投影露光器機 |
JP2011065738A (ja) * | 2009-08-19 | 2011-03-31 | Panasonic Corp | 光ピックアップ装置 |
US8179944B2 (en) * | 2009-11-25 | 2012-05-15 | Corning Incorporated | Adhesive protective coating with supressed reflectivity |
US8335045B2 (en) * | 2010-02-24 | 2012-12-18 | Corning Incorporated | Extending the stability of UV curable adhesives in 193NM laser systems |
DE102010021539B4 (de) | 2010-05-19 | 2014-10-09 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Blenden |
US9158207B2 (en) | 2011-08-09 | 2015-10-13 | Carl Zeiss Smt Gmbh | Optical component comprising radiation protective layer |
DE102011080639A1 (de) * | 2011-08-09 | 2012-10-11 | Carl Zeiss Smt Gmbh | Optische Komponente mit Strahlungs-Schutzschicht |
US8492448B2 (en) | 2011-10-07 | 2013-07-23 | Corning Incorporated | Systems and methods for performing photoreactions using light-diffusing optical fiber |
CN102566002A (zh) * | 2011-12-14 | 2012-07-11 | 北京国科世纪激光技术有限公司 | 光学单元以及用于粘合光学元件的工装 |
KR101516358B1 (ko) | 2012-03-06 | 2015-05-04 | 삼성전자주식회사 | 발광 장치 |
US9753190B2 (en) | 2013-08-28 | 2017-09-05 | Corning Incorporated | Adhesive with embedded waveguides for curing |
US9958579B2 (en) * | 2013-09-06 | 2018-05-01 | Corning Incorporated | UV protective coating for lens assemblies having protective layer between light absorber and adhesive |
US9557516B2 (en) | 2013-10-07 | 2017-01-31 | Corning Incorporated | Optical systems exhibiting improved lifetime using beam shaping techniques |
US10611106B2 (en) * | 2015-02-15 | 2020-04-07 | Roger Wen Yi Hsu | Methods and systems for making an optical functional film |
US10459134B2 (en) * | 2015-08-18 | 2019-10-29 | Corning Incorporated | UV-blocking coating with capping layer in optical assembly having UV light source |
US10578785B2 (en) | 2015-08-18 | 2020-03-03 | Corning Incorporated | Blocking coating with adhesion layer for ultraviolet optics |
US10752790B2 (en) * | 2016-12-21 | 2020-08-25 | Corning Incorporated | UV blocking coatings for lens assemblies |
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US1507327A (en) * | 1922-08-11 | 1924-09-02 | American Optical Corp | Process of coating edges of lenses |
DE1011589B (de) | 1955-12-09 | 1957-07-04 | Detag | Duese zum Ziehen von Tafelglas |
US3851621A (en) * | 1972-02-09 | 1974-12-03 | D Shepard | Apparatus for etch resist coating of plated holes in printed circuit boards |
US3935367A (en) * | 1972-11-24 | 1976-01-27 | Arthur D. Little, Inc. | Method of rendering surfaces nonfogging and resulting articles |
US3953115A (en) * | 1973-03-16 | 1976-04-27 | Itek Corporation | Method for providing an abrasion resistant coating for plastic ophthalmic lenses and the resulting lenses |
FR2414071A1 (fr) * | 1978-01-05 | 1979-08-03 | Essilor Int | Materiau de polissage, notamment pour lentille ophtalmique en matiere organique |
JPS6075364A (ja) * | 1983-09-30 | 1985-04-27 | Matsushita Electric Ind Co Ltd | レンズ外周隠蔽塗料の塗装方法 |
US4824712A (en) * | 1984-07-16 | 1989-04-25 | Ppg Industries, Inc. | Treatment of glass to reduce venting during thermal treatment and a glass article made thereby |
JPH0614414B2 (ja) * | 1986-06-17 | 1994-02-23 | 共同印刷株式会社 | 転写型光記録媒体 |
ES2050105T3 (es) * | 1987-02-13 | 1994-05-16 | Toray Industries | Articulo optico anti-reflectante y procedimiento para su fabricacion. |
US4842941A (en) * | 1987-04-06 | 1989-06-27 | General Electric Company | Method for forming abrasion-resistant polycarbonate articles, and articles of manufacture produced thereby |
JPH0730689B2 (ja) | 1987-11-09 | 1995-04-10 | 三菱重工業株式会社 | デイーゼル機関のシリンダーライナー注油装置 |
US5115346A (en) * | 1988-02-12 | 1992-05-19 | Donnelly Corporation | Anti-scatter, ultraviolet protected, anti-misting, electro-optical rearview mirror |
JPH01242163A (ja) * | 1988-03-25 | 1989-09-27 | Jidosha Kiki Co Ltd | 塗膜シェルの外周剪断かしめ部のコーティング方法および装置 |
JPH04295810A (ja) * | 1991-03-25 | 1992-10-20 | Hitachi Cable Ltd | 高温用光ファイバ心線 |
DE69232874T2 (de) * | 1991-09-20 | 2003-09-25 | Hitachi Ltd | Anzeige mit Antireflektionsschicht, Kathodenstrahlröhre und Flüssigkristallanzeige |
JPH0687151A (ja) * | 1992-07-21 | 1994-03-29 | Mitsui Toatsu Chem Inc | ポリカーボネートシートの製造方法 |
JP3382999B2 (ja) * | 1993-04-16 | 2003-03-04 | オリンパス光学工業株式会社 | 光学素子およびその接着方法 |
DE69628126T2 (de) * | 1995-06-23 | 2003-11-27 | Kodak Polychrome Graphics Llc | Mit Laser bebilderbare lithographische Druckplatte |
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DE19733490C1 (de) | 1997-08-01 | 1999-02-25 | Zeiss Carl Fa | Optik-Fassung mit UV-Kleber und Schutzschicht |
FR2759464B1 (fr) * | 1997-02-10 | 1999-03-05 | Commissariat Energie Atomique | Procede de preparation d'un materiau optique multicouches avec reticulation-densification par insolation aux rayons ultraviolets et materiau optique ainsi prepare |
JPH1114876A (ja) * | 1997-06-19 | 1999-01-22 | Nikon Corp | 光学構造体、その光学構造体を組み込んだ投影露光用光学系及び投影露光装置 |
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US6394613B1 (en) * | 1997-08-07 | 2002-05-28 | Canon Kabushiki Kaisha | Anti-fogging and anti-reflection optical article |
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US6352747B1 (en) * | 1999-03-31 | 2002-03-05 | Ppg Industries Ohio, Inc. | Spin and spray coating process for curved surfaces |
US6309755B1 (en) * | 1999-06-22 | 2001-10-30 | Exatec, Llc. | Process and panel for providing fixed glazing for an automotive vehicle |
DE19929403A1 (de) * | 1999-06-26 | 2000-12-28 | Zeiss Carl Fa | Objektiv, insbesondere Objektiv für eine Halbleiter-Lithographie-Projektionsbelichtungsanlage und Herstellungverfahren |
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JP2002189082A (ja) * | 2000-12-22 | 2002-07-05 | Canon Inc | 放射線撮像装置 |
US6655946B2 (en) * | 2001-02-20 | 2003-12-02 | Q2100, Inc. | Apparatus for preparing an eyeglass lens having a controller for conveyor and curing units |
KR20020093954A (ko) | 2001-02-28 | 2002-12-16 | 니혼 이타가라스 가부시키가이샤 | 소정 표면형상을 갖는 물품 및 그 제조방법 |
WO2002091078A1 (en) * | 2001-05-07 | 2002-11-14 | Massachusetts Institute Of Technology | Methods and apparatus employing an index matching medium |
US7081278B2 (en) | 2002-09-25 | 2006-07-25 | Asml Holdings N.V. | Method for protection of adhesives used to secure optics from ultra-violet light |
CN100440432C (zh) * | 2003-08-26 | 2008-12-03 | 株式会社尼康 | 光学元件和曝光装置 |
US8149381B2 (en) * | 2003-08-26 | 2012-04-03 | Nikon Corporation | Optical element and exposure apparatus |
US6954256B2 (en) * | 2003-08-29 | 2005-10-11 | Asml Netherlands B.V. | Gradient immersion lithography |
US7924397B2 (en) * | 2003-11-06 | 2011-04-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Anti-corrosion layer on objective lens for liquid immersion lithography applications |
US7460206B2 (en) * | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
US7812926B2 (en) * | 2005-08-31 | 2010-10-12 | Nikon Corporation | Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice |
US7528387B2 (en) * | 2005-12-29 | 2009-05-05 | Interuniversitair Microelektronica Centrum (Imec) | Methods and systems for characterising and optimising immersion lithographic processing |
-
2002
- 2002-09-25 US US10/253,655 patent/US7081278B2/en not_active Expired - Lifetime
-
2003
- 2003-09-23 TW TW092126233A patent/TWI265330B/zh not_active IP Right Cessation
- 2003-09-23 SG SG200305614A patent/SG105011A1/en unknown
- 2003-09-25 CN CNB03159459XA patent/CN1261786C/zh not_active Expired - Lifetime
- 2003-09-25 KR KR1020030066478A patent/KR100657433B1/ko not_active IP Right Cessation
- 2003-09-25 EP EP03021738A patent/EP1413907A1/en not_active Withdrawn
- 2003-09-25 JP JP2003334005A patent/JP2004126580A/ja active Pending
-
2006
- 2006-06-23 US US11/473,068 patent/US7781029B2/en not_active Expired - Fee Related
-
2010
- 2010-07-13 US US12/834,996 patent/US9195148B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR100657433B1 (ko) | 2006-12-14 |
US20040058061A1 (en) | 2004-03-25 |
KR20040030310A (ko) | 2004-04-09 |
CN1497287A (zh) | 2004-05-19 |
US20100271605A1 (en) | 2010-10-28 |
US7781029B2 (en) | 2010-08-24 |
JP2004126580A (ja) | 2004-04-22 |
SG105011A1 (en) | 2004-07-30 |
US20060240365A1 (en) | 2006-10-26 |
US7081278B2 (en) | 2006-07-25 |
US9195148B2 (en) | 2015-11-24 |
TW200407583A (en) | 2004-05-16 |
EP1413907A1 (en) | 2004-04-28 |
CN1261786C (zh) | 2006-06-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |