TWI264795B - Wafer pre-alignment apparatus and method - Google Patents

Wafer pre-alignment apparatus and method

Info

Publication number
TWI264795B
TWI264795B TW092113507A TW92113507A TWI264795B TW I264795 B TWI264795 B TW I264795B TW 092113507 A TW092113507 A TW 092113507A TW 92113507 A TW92113507 A TW 92113507A TW I264795 B TWI264795 B TW I264795B
Authority
TW
Taiwan
Prior art keywords
measurement
rotation
wafer
followings
detecting
Prior art date
Application number
TW092113507A
Other languages
English (en)
Other versions
TW200404348A (en
Inventor
Masamichi Inenaga
Shinichi Katsuda
Yuji Arinaga
Original Assignee
Yaskawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yaskawa Electric Corp filed Critical Yaskawa Electric Corp
Publication of TW200404348A publication Critical patent/TW200404348A/zh
Application granted granted Critical
Publication of TWI264795B publication Critical patent/TWI264795B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544—Marks applied to semiconductor devices or parts
    • H01L2223/54493—Peripheral marks on wafers, e.g. orientation flats, notches, lot number
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW092113507A 2002-06-06 2003-05-19 Wafer pre-alignment apparatus and method TWI264795B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002165250A JP4258828B2 (ja) 2002-06-06 2002-06-06 ウエハプリアライメント装置および方法

Publications (2)

Publication Number Publication Date
TW200404348A TW200404348A (en) 2004-03-16
TWI264795B true TWI264795B (en) 2006-10-21

Family

ID=29727586

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092113507A TWI264795B (en) 2002-06-06 2003-05-19 Wafer pre-alignment apparatus and method

Country Status (6)

Country Link
US (1) US7436513B2 (zh)
JP (1) JP4258828B2 (zh)
KR (1) KR100792086B1 (zh)
CN (1) CN1319143C (zh)
TW (1) TWI264795B (zh)
WO (1) WO2003105217A1 (zh)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2006025386A1 (ja) * 2004-08-31 2008-05-08 株式会社ニコン 位置合わせ方法、処理システム、基板の投入再現性計測方法、位置計測方法、露光方法、基板処理装置、計測方法及び計測装置
JP4596144B2 (ja) * 2005-04-21 2010-12-08 株式会社東京精密 ウェーハ搬送方法及びウェーハ搬送装置
TWI259933B (en) * 2005-05-19 2006-08-11 Benq Corp Apparatus and method thereof for actuating object
CN100355055C (zh) * 2005-10-28 2007-12-12 清华大学 硅晶圆预对准控制方法
KR101006915B1 (ko) * 2005-12-12 2011-01-13 주식회사 만도 조향각 센서의 에러검출장치
US7942847B2 (en) * 2005-12-16 2011-05-17 Interface Associates, Inc. Multi-layer balloons for medical applications and methods for manufacturing the same
US8027021B2 (en) * 2006-02-21 2011-09-27 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
CN100411132C (zh) * 2006-10-13 2008-08-13 大连理工大学 一种硅片预对准装置
CN101383311B (zh) * 2007-09-04 2010-12-08 北京北方微电子基地设备工艺研究中心有限责任公司 晶片传输系统
CN102157421B (zh) * 2010-02-11 2013-01-16 上海微电子装备有限公司 一种硅片预对准装置及预对准方法
CN102402127B (zh) * 2010-09-17 2014-01-22 上海微电子装备有限公司 一种硅片预对准装置及方法
WO2012074280A2 (ko) * 2010-11-29 2012-06-07 (주)루트로닉 광학 어셈블리
CN102809903B (zh) * 2011-05-31 2014-12-17 上海微电子装备有限公司 二次预对准装置及对准方法
CN103681426B (zh) * 2012-09-10 2016-09-28 上海微电子装备有限公司 大翘曲硅片预对准装置及方法
CN103811387B (zh) * 2012-11-08 2016-12-21 沈阳新松机器人自动化股份有限公司 晶圆预对准方法及装置
CN103869630B (zh) * 2012-12-14 2015-09-23 北大方正集团有限公司 一种预对位调试方法
CN103964233A (zh) * 2013-02-05 2014-08-06 北大方正集团有限公司 一种晶片传送控制方法及装置
CN106104382B (zh) * 2014-03-12 2018-06-26 Asml荷兰有限公司 传感器系统、衬底输送系统和光刻设备
CN105988305B (zh) * 2015-02-28 2018-03-02 上海微电子装备（集团）股份有限公司 硅片预对准方法
CN104900574A (zh) * 2015-06-10 2015-09-09 苏州均华精密机械有限公司 一种晶圆加工的定位装置及其定位方法
CN106597812B (zh) * 2016-11-29 2018-03-30 苏州晋宇达实业股份有限公司 一种光刻机的硅片进料校准装置及其进料校准方法
US10867822B1 (en) 2019-07-26 2020-12-15 Yaskawa America, Inc. Wafer pre-alignment apparatus and method
CN113467202B (zh) * 2020-03-30 2023-02-07 上海微电子装备（集团）股份有限公司 光刻设备及硅片预对准方法
CN113721428B (zh) * 2021-07-12 2024-02-06 长鑫存储技术有限公司 半导体处理装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5289263A (en) 1989-04-28 1994-02-22 Dainippon Screen Mfg. Co., Ltd. Apparatus for exposing periphery of an object
JPH05160245A (ja) 1991-12-06 1993-06-25 Nikon Corp 円形基板の位置決め装置
JP2798112B2 (ja) * 1994-03-25 1998-09-17 信越半導体株式会社 ウェーハノッチ寸法測定装置及び方法
TW316322B (zh) * 1995-10-02 1997-09-21 Ushio Electric Inc
JP3237522B2 (ja) * 1996-02-05 2001-12-10 ウシオ電機株式会社 ウエハ周辺露光方法および装置
KR100257279B1 (ko) * 1996-06-06 2000-06-01 이시다 아키라 주변노광장치 및 방법

Also Published As

Publication number Publication date
US7436513B2 (en) 2008-10-14
TW200404348A (en) 2004-03-16
US20050231721A1 (en) 2005-10-20
CN1659695A (zh) 2005-08-24
WO2003105217A1 (ja) 2003-12-18
JP2004014736A (ja) 2004-01-15
CN1319143C (zh) 2007-05-30
KR100792086B1 (ko) 2008-01-04
KR20050006288A (ko) 2005-01-15
JP4258828B2 (ja) 2009-04-30

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees