TWI262905B - Quartz glass parts, ceramic parts and process of producing those - Google Patents

Quartz glass parts, ceramic parts and process of producing those

Info

Publication number
TWI262905B
TWI262905B TW091132506A TW91132506A TWI262905B TW I262905 B TWI262905 B TW I262905B TW 091132506 A TW091132506 A TW 091132506A TW 91132506 A TW91132506 A TW 91132506A TW I262905 B TWI262905 B TW I262905B
Authority
TW
Taiwan
Prior art keywords
parts
sprayed coating
ceramic
thermal sprayed
film
Prior art date
Application number
TW091132506A
Other languages
English (en)
Other versions
TW200300132A (en
Inventor
Koyata Takahashi
Michio Okamoto
Masanori Abe
Original Assignee
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp filed Critical Tosoh Corp
Publication of TW200300132A publication Critical patent/TW200300132A/zh
Application granted granted Critical
Publication of TWI262905B publication Critical patent/TWI262905B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
    • C04B41/4523—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied from the molten state ; Thermal spraying, e.g. plasma spraying
    • C04B41/4527—Plasma spraying
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/214—Al2O3
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/22—ZrO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/77—Coatings having a rough surface
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31—Surface property or characteristic of web, sheet or block
    • Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Structural Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Dispersion Chemistry (AREA)
  • Composite Materials (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Surface Treatment Of Glass (AREA)
  • Drying Of Semiconductors (AREA)
TW091132506A 2001-11-13 2002-11-04 Quartz glass parts, ceramic parts and process of producing those TWI262905B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001347240 2001-11-13
JP2001347239 2001-11-13

Publications (2)

Publication Number Publication Date
TW200300132A TW200300132A (en) 2003-05-16
TWI262905B true TWI262905B (en) 2006-10-01

Family

ID=26624495

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091132506A TWI262905B (en) 2001-11-13 2002-11-04 Quartz glass parts, ceramic parts and process of producing those

Country Status (4)

Country Link
US (1) US6902814B2 (zh)
EP (1) EP1310466A3 (zh)
KR (1) KR100851833B1 (zh)
TW (1) TWI262905B (zh)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080264564A1 (en) 2007-04-27 2008-10-30 Applied Materials, Inc. Method of reducing the erosion rate of semiconductor processing apparatus exposed to halogen-containing plasmas
US7338699B2 (en) * 2002-10-31 2008-03-04 Tosoh Corporation Island projection-modified part, method for producing the same, and apparatus comprising the same
US7091132B2 (en) * 2003-07-24 2006-08-15 Applied Materials, Inc. Ultrasonic assisted etch using corrosive liquids
US7045072B2 (en) * 2003-07-24 2006-05-16 Tan Samantha S H Cleaning process and apparatus for silicate materials
WO2005038079A1 (en) * 2003-09-25 2005-04-28 Honeywell International Inc. Pvd component and coil refurbishing methods
US20070077456A1 (en) * 2005-09-30 2007-04-05 Junya Kitamura Thermal spray coating
ES2331663T3 (es) * 2007-04-19 2010-01-12 Straumann Holding Ag Proceso para proporcionar una topografia a la superficie de un implante dental.
US10622194B2 (en) 2007-04-27 2020-04-14 Applied Materials, Inc. Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance
US10242888B2 (en) 2007-04-27 2019-03-26 Applied Materials, Inc. Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance
TWI562205B (en) * 2007-04-27 2016-12-11 Applied Materials Inc Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
EP2252558A4 (en) * 2008-02-08 2014-08-27 Corning Inc DAMAGING RESISTANT, CHEMICALLY PREVENTED PROTECTIVE GLASS
US20090214825A1 (en) * 2008-02-26 2009-08-27 Applied Materials, Inc. Ceramic coating comprising yttrium which is resistant to a reducing plasma
JP4524354B2 (ja) * 2008-02-28 2010-08-18 国立大学法人東北大学 マイクロ波プラズマ処理装置、それに用いる誘電体窓部材および誘電体窓部材の製造方法
US20090261065A1 (en) * 2008-04-18 2009-10-22 Lam Research Corporation Components for use in a plasma chamber having reduced particle generation and method of making
US8546284B2 (en) * 2008-05-07 2013-10-01 Council Of Scientific & Industrial Research Process for the production of plasma sprayable yttria stabilized zirconia (YSZ) and plasma sprayable YSZ powder produced thereby
TWI578854B (zh) 2008-08-04 2017-04-11 Ａｇｃ北美平面玻璃公司 使用電漿增強化學氣相沉積以形成塗層之方法
JP2012507630A (ja) * 2008-11-04 2012-03-29 プラクスエア・テクノロジー・インコーポレイテッド 半導体用途用の熱スプレーコーティング
EP2316374A1 (en) * 2009-11-02 2011-05-04 Straumann Holding AG Process for preparing a ceramic body having a surface roughness
BE1020692A3 (fr) * 2012-05-16 2014-03-04 Prayon Sa Procede de fabrication d'un materiau composite.
US8944003B2 (en) * 2012-11-16 2015-02-03 Taiwan Semiconductor Manufacturing Company, Ltd. Remote plasma system and method
SG11201508512PA (en) * 2013-05-23 2015-12-30 Applied Materials Inc A coated liner assembly for a semiconductor processing chamber
US9865434B2 (en) 2013-06-05 2018-01-09 Applied Materials, Inc. Rare-earth oxide based erosion resistant coatings for semiconductor application
KR102148336B1 (ko) 2013-11-26 2020-08-27 삼성전자주식회사 표면 처리 방법, 반도체 제조 방법 및 이에 의해 제조된 반도체 장치
CA2949990C (en) * 2014-05-30 2020-12-15 Eaton Corporation Integrated pressure plate and port plate for pump
MX2017007356A (es) 2014-12-05 2018-04-11 Agc Flat Glass Europe S A Fuente de plasma del catodo hueco.
MX2017007357A (es) 2014-12-05 2018-04-24 Agc Flat Glass Na Inc Fuente de plasma utilizando un revestimiento de reduccion de macro-particulas y metodo de uso de una fuente de plasma utilizando un revestimiento de reduccion de macro-particulas para la deposicion de revestimientos de pelicula delgada y modificacion de superficies.
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
US10364176B1 (en) 2016-10-03 2019-07-30 Owens-Brockway Glass Container Inc. Glass precursor gel and methods to treat with microwave energy
US10427970B1 (en) 2016-10-03 2019-10-01 Owens-Brockway Glass Container Inc. Glass coatings and methods to deposit same
US10479717B1 (en) 2016-10-03 2019-11-19 Owens-Brockway Glass Container Inc. Glass foam
KR20230047477A (ko) * 2017-05-31 2023-04-07 어플라이드 머티어리얼스, 인코포레이티드 원격 플라즈마 산화 챔버
US11014853B2 (en) 2018-03-07 2021-05-25 Applied Materials, Inc. Y2O3—ZrO2 erosion resistant material for chamber components in plasma environments
US11139151B1 (en) * 2018-03-15 2021-10-05 Intel Corporation Micro-surface morphological matching for reactor components
KR102411792B1 (ko) 2019-07-22 2022-06-22 한국재료연구원 복합 소결체를 포함하는 반도체 제조용 플라즈마 식각 장치 부품 및 그 제조방법
CN111574233B (zh) * 2020-05-26 2022-04-12 中钢洛耐科技股份有限公司 一种陶瓷耐磨热喷补料及制备方法
CN115974589A (zh) * 2022-11-30 2023-04-18 歌尔股份有限公司 复合承烧板及其制备方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60120515A (ja) 1983-12-05 1985-06-28 Hitachi Ltd 薄膜形成装置
JPS61275184A (ja) * 1985-05-30 1986-12-05 高信頼度舶用推進プラント技術研究組合 セラミツクス部材への溶射方法
JPS6313333A (ja) 1986-07-04 1988-01-20 Hitachi Ltd ドライエツチング装置
JPH01249666A (ja) * 1988-03-31 1989-10-04 Nippon Steel Corp 溶射によるセラミックの接合方法
JP2907401B2 (ja) 1991-02-21 1999-06-21 キヤノン株式会社 スパッタ成膜装置
JP2642556B2 (ja) * 1992-02-05 1997-08-20 新日本製鐵株式会社 溶射皮膜形成方法
JPH06313333A (ja) 1993-04-28 1994-11-08 Haseko Corp 梁用の埋設型枠構造
US5460689A (en) 1994-02-28 1995-10-24 Applied Materials, Inc. High pressure plasma treatment method and apparatus
JPH0869970A (ja) 1994-08-29 1996-03-12 Souzou Kagaku:Kk 半導体基板のプラズマ処理用ベルジャー
JP3473917B2 (ja) 1994-09-30 2003-12-08 信越石英株式会社 粗い表面を有するシリカガラスおよびその製造方法
JPH08339895A (ja) 1995-06-12 1996-12-24 Tokyo Electron Ltd プラズマ処理装置
TW323387B (zh) * 1995-06-07 1997-12-21 Tokyo Electron Co Ltd
JPH10267562A (ja) * 1997-03-28 1998-10-09 Toshiba Ceramics Co Ltd 焼成用道具材
JP3985243B2 (ja) * 1998-12-01 2007-10-03 信越石英株式会社 表面に大きな凹凸を有する石英ガラス治具およびその製造方法
JP2000169974A (ja) * 1998-12-03 2000-06-20 Taiheiyo Cement Corp 耐食性部材
KR20010062209A (ko) 1999-12-10 2001-07-07 히가시 데쓰로 고내식성 막이 내부에 형성된 챔버를 구비하는 처리 장치
JP3280367B2 (ja) 2000-06-05 2002-05-13 日東電工株式会社 溶剤含有物除去用クリーニングシート、及び溶剤含有物の除去方法
JP3778777B2 (ja) 2000-06-07 2006-05-24 アマノ株式会社 気吹き作業用集塵装置
US6379789B1 (en) * 2000-10-04 2002-04-30 Creare Inc. Thermally-sprayed composite selective emitter
AU2001288566A1 (en) * 2000-11-15 2002-05-27 Gt Equipment Technologies Inc. A protective layer for quartz crucibles used for silicon crystallization
US6319842B1 (en) 2001-01-02 2001-11-20 Novellus Systems Incorporated Method of cleansing vias in semiconductor wafer having metal conductive layer
US6596397B2 (en) * 2001-04-06 2003-07-22 Shin-Etsu Chemical Co., Ltd. Thermal spray particles and sprayed components
US6777045B2 (en) * 2001-06-27 2004-08-17 Applied Materials Inc. Chamber components having textured surfaces and method of manufacture

Also Published As

Publication number Publication date
US20030091835A1 (en) 2003-05-15
TW200300132A (en) 2003-05-16
EP1310466A3 (en) 2003-10-22
KR20030040115A (ko) 2003-05-22
KR100851833B1 (ko) 2008-08-13
US6902814B2 (en) 2005-06-07
EP1310466A2 (en) 2003-05-14

Similar Documents

Publication Publication Date Title
TWI262905B (en) Quartz glass parts, ceramic parts and process of producing those
AR016922A1 (es) Proceso para la produccion de un abrasivo estructurado revestido y abrasivo estructurado revestido que se obtiene
DK0576402T3 (da) Elektroder med forlænget brugslevetid.
BR0014366A (pt) Grão abrasivo sinterizado baseado em alfa alumina, artigo abrasivo, métodos para fabricar grão abrasivo cerâmico baseado em alfa alumina, para fabricar um artigo abrasivo, e, de abrasão de uma superfìcie
DE69917454D1 (de) Sanitäre tonkeramikprodukte und verfahren zur herstellung derselben
JP2004523894A5 (zh)
MXPA03011185A (es) Componentes beneficiosos en sustratos desviados a la parte superior.
ATE496388T1 (de) Penningentladungsplasmaquelle
TW200516166A (en) Methods, devices and compositions for depositing and orienting nanostructures
HUP0203433A2 (en) Process for the production of photocatalytic coatings on substrates
JP2010199596A5 (zh)
PT1507751E (pt) Corpo moldado em ceramica com revestimento com actividade fotocatalitica e processo para a prepraracao do mesmo
TW200715456A (en) Substrate mounting base, method for manufacturing the same and substrate processing apparatus
MY143652A (en) Polishing composition for glass substrate
EP1314797A3 (en) Chemical removal of a chromium oxide coating from an article
TW200710195A (en) Pressure-sensitive adhesive sheet, production method thereof and method of processing articles
MY130468A (en) Paste, displays member, and process for production of display member
MXPA03008983A (es) Produccion de superficies abrasivas revestidas y con un patron.
IL164300A0 (en) Method for coating metal surfaces and substrate having a coated metal surface
MX9102511A (es) Substrato de morfolia superficial mejorado por rociadura de plasma.
AU2003258515A8 (en) Radiation-curable paint systems having a lower layer with low-temperature elasticity
ATE538489T1 (de) Verfahren zur herstellung magnetron- sputterbeschichteter substrate und anlage hierfür
EP1604960A4 (en) METHOD OF MANUFACTURING A GLASS WIRE COATED WITH A TITANIUM OXIDE THIN FILM
AU2001265978A1 (en) Coated substrate with metallic surface impression, method for adhesively coatingsubstrates with corrosive optical layers and use of said coated substrate and p roducts obtained from a method for adhesively coating with corrosive optical layers
TW200631114A (en) Yttrium-containing ceramic coated material and method of manufacturing the same

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees