MY143652A - Polishing composition for glass substrate - Google Patents

Polishing composition for glass substrate

Info

Publication number
MY143652A
MY143652A MYPI20055822A MYPI20055822A MY143652A MY 143652 A MY143652 A MY 143652A MY PI20055822 A MYPI20055822 A MY PI20055822A MY PI20055822 A MYPI20055822 A MY PI20055822A MY 143652 A MY143652 A MY 143652A
Authority
MY
Malaysia
Prior art keywords
substrate
glass
polishing composition
glass substrate
polishing
Prior art date
Application number
MYPI20055822A
Inventor
Kazuhiko Nishimoto
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Publication of MY143652A publication Critical patent/MY143652A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

POLISHING COMPOSIT101N FOR GLASS SUBSTRATE THE PRESENT INVENTION PROVIDES A POLISHING COMPOSITION FOR A GLASS SUBSTRATE, CONLAININA A SJ)JCA HAVING AN AVERAGE PARTICLE SIZE OF PRIMARY PARTICLES 1@ OF FIOYU I TO 100 UIN: A POLVIUCI HAVINO A SULFONIC ACID GROUP, AND WATER: A PROCESS FOR MANUFACTURING A PLASS SUBSTRATE WILH THE POLISHING COMPOSITION FOR A 5 GLASS SUBSTRATE- AND A PROCESS FOR REDUCING SURFACE, STAINS OF A OLASS SUBSTRATE WITH THE POLISHING COMPOSITION FOR A GLASS SUBSTRATE. THE POLISHING COMPOSITION FOR A G-LASS SUBSTRATE CAN BE SUITABLY USED IN THE MANUFACTURE OF, FOR EXAMPLE, GLASS HARD DISKS, ALUMINOSILICALE GLASS FOR REINFORCED GLASS SUBSTRATES, AND GLASS CERAMIC SUBSTRATE (CRYSTALLIZED GLASS SUBSTRATE), AND THE LIKE. 10
MYPI20055822A 2004-12-13 2005-12-12 Polishing composition for glass substrate MY143652A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004359842A JP4667848B2 (en) 2004-12-13 2004-12-13 Polishing liquid composition for glass substrate

Publications (1)

Publication Number Publication Date
MY143652A true MY143652A (en) 2011-06-30

Family

ID=35735789

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20055822A MY143652A (en) 2004-12-13 2005-12-12 Polishing composition for glass substrate

Country Status (4)

Country Link
JP (1) JP4667848B2 (en)
CN (2) CN101892032A (en)
GB (1) GB2421955B (en)
MY (1) MY143652A (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102863943B (en) * 2005-08-30 2015-03-25 花王株式会社 Polishing composition for hard disk substrate, polishing method and manufacture method of substrate
CN1986612B (en) * 2005-12-22 2012-07-25 花王株式会社 Polishing composition for glass substrate
JP5283247B2 (en) * 2005-12-22 2013-09-04 花王株式会社 Polishing liquid composition for glass substrate
JP5008350B2 (en) * 2006-07-05 2012-08-22 花王株式会社 Polishing liquid composition for glass substrate
JP5606663B2 (en) * 2006-12-26 2014-10-15 花王株式会社 Polishing silica particle dispersion
JP5437571B2 (en) * 2006-12-26 2014-03-12 花王株式会社 Polishing fluid kit
KR101564922B1 (en) * 2008-05-09 2015-11-03 삼성디스플레이 주식회사 Method of treating soda-lime glass substrate and methode of manufacturing display substrate using the same
MY155495A (en) 2008-06-18 2015-10-30 Fujimi Inc Polishing composition and polishing method using the same
JP5251861B2 (en) * 2009-12-28 2013-07-31 信越化学工業株式会社 Method for producing synthetic quartz glass substrate
MY155732A (en) 2010-04-20 2015-11-17 Kao Corp Method for manufacturing an aluminosilicate glass substrate for hard disks
JP2013080530A (en) * 2011-09-30 2013-05-02 Hoya Corp Manufacturing method of glass substrate for magnetic disc and manufacturing method of magnetic disc
KR20140106532A (en) * 2011-12-02 2014-09-03 아사히 가라스 가부시키가이샤 Glass plate-polishing device
SG11201509991QA (en) * 2013-06-29 2016-01-28 Hoya Corp Method for manufacturing a glass substrate, method for manufacturing a magnetic disk, and polishing liquid composition for a glass substrate
JP6393231B2 (en) 2015-05-08 2018-09-19 信越化学工業株式会社 Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrate
JP6560155B2 (en) 2016-04-20 2019-08-14 信越化学工業株式会社 Polishing agent for synthetic quartz glass substrate and method for polishing synthetic quartz glass substrate
JP6694653B2 (en) 2017-04-10 2020-05-20 信越化学工業株式会社 Polishing agent for synthetic quartz glass substrate, manufacturing method thereof, and polishing method for synthetic quartz glass substrate
JP6985116B2 (en) 2017-11-17 2021-12-22 信越化学工業株式会社 Abrasive for synthetic quartz glass substrate and polishing method for synthetic quartz glass substrate
CN108148507B (en) * 2017-12-18 2020-12-04 清华大学 Polishing composition for fused quartz
JP2021183655A (en) 2020-05-21 2021-12-02 信越化学工業株式会社 Abrasive agent for polishing synthetic quartz glass substrate and manufacturing method abrasive agent, and polishing method of synthetic quartz glass substrate
CN113618497A (en) * 2021-07-09 2021-11-09 维达力实业（赤壁）有限公司 Polishing liquid for polishing microcrystalline ceramic and microcrystalline ceramic polishing method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0322721B1 (en) * 1987-12-29 1993-10-06 E.I. Du Pont De Nemours And Company Fine polishing composition for wafers
SG78405A1 (en) * 1998-11-17 2001-02-20 Fujimi Inc Polishing composition and rinsing composition
US6821897B2 (en) * 2001-12-05 2004-11-23 Cabot Microelectronics Corporation Method for copper CMP using polymeric complexing agents
JP4095833B2 (en) * 2002-05-30 2008-06-04 株式会社フジミインコーポレーテッド Polishing composition
US20060096179A1 (en) * 2004-11-05 2006-05-11 Cabot Microelectronics Corporation CMP composition containing surface-modified abrasive particles

Also Published As

Publication number Publication date
JP2006167817A (en) 2006-06-29
JP4667848B2 (en) 2011-04-13
CN101892032A (en) 2010-11-24
GB2421955A (en) 2006-07-12
CN1789366A (en) 2006-06-21
GB0525057D0 (en) 2006-01-18
GB2421955B (en) 2009-10-14

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