TWD199478S - 半導體製造裝置用離子遮蔽板 - Google Patents

半導體製造裝置用離子遮蔽板

Info

Publication number
TWD199478S
TWD199478S TW108300478F TW108300478F TWD199478S TW D199478 S TWD199478 S TW D199478S TW 108300478 F TW108300478 F TW 108300478F TW 108300478 F TW108300478 F TW 108300478F TW D199478 S TWD199478 S TW D199478S
Authority
TW
Taiwan
Prior art keywords
semiconductor manufacturing
manufacturing equipment
ion shielding
shielding plates
article
Prior art date
Application number
TW108300478F
Other languages
English (en)
Chinese (zh)
Inventor
Yutaka Kouzuma
Michiaki Kobayashi
Kazuyuki Hirozane
Kohei Kawamura
Nobuya MIYOSHI
Hiroyuki Kobayashi
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Publication of TWD199478S publication Critical patent/TWD199478S/zh

Links

TW108300478F 2018-07-24 2019-01-24 半導體製造裝置用離子遮蔽板 TWD199478S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2018-16190F JP1624794S (enrdf_load_stackoverflow) 2018-07-24 2018-07-24

Publications (1)

Publication Number Publication Date
TWD199478S true TWD199478S (zh) 2019-09-01

Family

ID=65359165

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108300478F TWD199478S (zh) 2018-07-24 2019-01-24 半導體製造裝置用離子遮蔽板

Country Status (3)

Country Link
US (1) USD900760S1 (enrdf_load_stackoverflow)
JP (1) JP1624794S (enrdf_load_stackoverflow)
TW (1) TWD199478S (enrdf_load_stackoverflow)

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Also Published As

Publication number Publication date
USD900760S1 (en) 2020-11-03
JP1624794S (enrdf_load_stackoverflow) 2019-02-18

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