JP1704608S - 半導体処理チャンバ用ガス分配プレート - Google Patents

半導体処理チャンバ用ガス分配プレート

Info

Publication number
JP1704608S
JP1704608S JP2021004329F JP2021004329F JP1704608S JP 1704608 S JP1704608 S JP 1704608S JP 2021004329 F JP2021004329 F JP 2021004329F JP 2021004329 F JP2021004329 F JP 2021004329F JP 1704608 S JP1704608 S JP 1704608S
Authority
JP
Japan
Prior art keywords
processing chamber
gas distribution
distribution plate
semiconductor processing
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021004329F
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Application granted granted Critical
Publication of JP1704608S publication Critical patent/JP1704608S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2021004329F 2020-09-02 2021-03-02 半導体処理チャンバ用ガス分配プレート Active JP1704608S (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US202029749079 2020-09-02

Publications (1)

Publication Number Publication Date
JP1704608S true JP1704608S (ja) 2022-01-13

Family

ID=80216979

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021022275F Active JP1708474S (ja) 2020-09-02 2021-03-02 半導体処理チャンバ用ガス分配プレート
JP2021004329F Active JP1704608S (ja) 2020-09-02 2021-03-02 半導体処理チャンバ用ガス分配プレート

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2021022275F Active JP1708474S (ja) 2020-09-02 2021-03-02 半導体処理チャンバ用ガス分配プレート

Country Status (2)

Country Link
JP (2) JP1708474S (ja)
TW (2) TWD217767S (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1030687S1 (en) 2022-05-31 2024-06-11 Asm Ip Holding B.V. Susceptor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD880437S1 (en) 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus

Also Published As

Publication number Publication date
JP1708474S (ja) 2022-02-25
TWD231180S (zh) 2024-05-11
TWD217767S (zh) 2022-03-21

Similar Documents

Publication Publication Date Title
EP3698395A4 (en) SOURCE OF NON-MATCHING PLASMA USED FOR THE MANUFACTURE OF SEMICONDUCTOR SLICES
CY1123561T1 (el) Ενωσεις χρησιμες ως αναστολεις κινασης
SG11202005583QA (en) Ex situ coating of chamber components for semiconductor processing
JP1704604S (ja) 半導体処理チャンバのための堆積リング
CY1124046T1 (el) Ενωσεις ν-((ετ)αρυλμεθυλ)-ετεροαρυλ-καρβοξαμιδιων ως αναστολεις καλλικρεϊνης πλασματος
CL2020001852A1 (es) Procesos de preparación de s-ketamina o clorhidrato de s-ketamina o productos derivados de éste. (divisional solicitud 201901066)
EA201891626A1 (ru) Ингибиторы тирозинкиназы брутона
TWI800665B (zh) 半導體晶圓的加工方法
SG11202112225QA (en) Process chamber and semiconductor processing device
SG11202112769WA (en) Substrate processing chamber
WO2014137905A3 (en) Method and apparatus for plasma dicing a semi-conductor wafer
SG11202103979UA (en) In situ protective coating of chamber components for semiconductor processing
KR20180084926A (ko) 웨이퍼들을 위한 웨이퍼 보트 및 플라즈마 처리 디바이스
SG10201901906YA (en) Atmospheric epitaxial deposition chamber
JP1708474S (ja) 半導体処理チャンバ用ガス分配プレート
SG11202110054TA (en) Plasma reactor for processing gas
SG11202010268QA (en) Apparatus for suppressing parasitic plasma in plasma enhanced chemical vapor deposition chamber
JP1716785S (ja) 処理チャンバコンポーネント用包装インサート
CL2022002112S1 (es) Sustrato
GB2587940B (en) Inline chamber metrology
IL289287A (en) Processes for making plasma kallikrein inhibitors
JP1733479S (ja) 基板処理チャンバ用基板支持体
JP1729478S (ja) ガス分配プレート
JP1729409S (ja) ガス分配プレート
JP1755805S (ja) ガス分配プレート