TWD199478S - Ion shielding plates for semiconductor manufacturing equipment - Google Patents

Ion shielding plates for semiconductor manufacturing equipment

Info

Publication number
TWD199478S
TWD199478S TW108300478F TW108300478F TWD199478S TW D199478 S TWD199478 S TW D199478S TW 108300478 F TW108300478 F TW 108300478F TW 108300478 F TW108300478 F TW 108300478F TW D199478 S TWD199478 S TW D199478S
Authority
TW
Taiwan
Prior art keywords
semiconductor manufacturing
manufacturing equipment
ion shielding
shielding plates
article
Prior art date
Application number
TW108300478F
Other languages
Chinese (zh)
Inventor
Yutaka Kouzuma
Michiaki Kobayashi
Kazuyuki Hirozane
Kohei Kawamura
Nobuya MIYOSHI
Hiroyuki Kobayashi
Original Assignee
日商日立全球先端科技股份有限公司
Hitachi High-Technologies Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日立全球先端科技股份有限公司, Hitachi High-Technologies Corporation filed Critical 日商日立全球先端科技股份有限公司
Publication of TWD199478S publication Critical patent/TWD199478S/en

Links

Abstract

【物品用途】;本設計的物品是半導體製造裝置用離子遮蔽板，為一種應用於半導體製造裝置上，在真空室內被設置在氣體流路中的離子遮蔽板。本物品，係如「使用狀態及標示各部名稱之參考圖」所示，是被設置在電漿處理裝置之類的半導體製造裝置之氣體流路中來使用，用以遮蔽電漿中的離子，只可允許自由基(Radical) 通過。;【設計說明】;本物品由「前視圖」觀之，在靠近外周的位置設有多數的小圓形的貫通孔，藉此只可允許自由基在靠近外周的位置通過。[Use of article] The article of this design is an ion shielding plate for semiconductor manufacturing equipment. It is an ion shielding plate used in semiconductor manufacturing equipment and installed in the gas flow path in the vacuum chamber. This product, as shown in the "reference drawing showing the usage status and the names of each part", is installed in the gas flow path of semiconductor manufacturing equipment such as plasma processing equipment to shield ions in the plasma. Only radicals are allowed to pass. ;[Design Description];This item is viewed from the "front view". It is equipped with a plurality of small circular through-holes near the outer periphery, thereby only allowing free radicals to pass near the outer periphery.

TW108300478F 2018-07-24 2019-01-24 Ion shielding plates for semiconductor manufacturing equipment TWD199478S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2018-16190F JP1624794S (en) 2018-07-24 2018-07-24

Publications (1)

Publication Number Publication Date
TWD199478S true TWD199478S (en) 2019-09-01

Family

ID=65359165

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108300478F TWD199478S (en) 2018-07-24 2019-01-24 Ion shielding plates for semiconductor manufacturing equipment

Country Status (3)

Country Link
US (1) USD900760S1 (en)
JP (1) JP1624794S (en)
TW (1) TWD199478S (en)

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Also Published As

Publication number Publication date
JP1624794S (en) 2019-02-18
USD900760S1 (en) 2020-11-03

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