TWD201038S - Sealing cover for semiconductor manufacturing equipment - Google Patents

Sealing cover for semiconductor manufacturing equipment

Info

Publication number
TWD201038S
TWD201038S TW107306363F TW107306363F TWD201038S TW D201038 S TWD201038 S TW D201038S TW 107306363 F TW107306363 F TW 107306363F TW 107306363 F TW107306363 F TW 107306363F TW D201038 S TWD201038 S TW D201038S
Authority
TW
Taiwan
Prior art keywords
sealing cover
semiconductor manufacturing
manufacturing equipment
article
design
Prior art date
Application number
TW107306363F
Other languages
Chinese (zh)
Inventor
Yusaku Okajima
Shuhei Saido
Hidenari Yoshida
Takafumi Sasaki
Original Assignee
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司
Publication of TWD201038S publication Critical patent/TWD201038S/en

Links

Abstract

【物品用途】;本設計的物品是半導體製造裝置用密封蓋護罩，該護罩是用來封閉半導體製造裝置之處理容器的開口的密封蓋，藉以保護密封蓋不會受到處理氣體的影響。;【設計說明】;(無)[Use of article] The article of this design is a sealing cover shield for semiconductor manufacturing equipment. The cover is a sealing cover used to close the opening of the processing container of the semiconductor manufacturing equipment, thereby protecting the sealing cover from being affected by the processing gas. ;[Design description];(none)

TW107306363F 2018-05-18 2018-10-29 Sealing cover for semiconductor manufacturing equipment TWD201038S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2018-10931F JP1624334S (en) 2018-05-18 2018-05-18

Publications (1)

Publication Number Publication Date
TWD201038S true TWD201038S (en) 2019-11-21

Family

ID=65269280

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107306363F TWD201038S (en) 2018-05-18 2018-10-29 Sealing cover for semiconductor manufacturing equipment

Country Status (3)

Country Link
US (1) USD916037S1 (en)
JP (1) JP1624334S (en)
TW (1) TWD201038S (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD230332S (en) 2021-04-12 2024-03-11 美商蘭姆研究公司 (美國) Pedestal for a substrate processing system

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11887878B2 (en) 2019-06-28 2024-01-30 Applied Materials, Inc. Detachable biasable electrostatic chuck for high temperature applications
USD947914S1 (en) * 2020-11-23 2022-04-05 Applied Materials, Inc. Base plate for a processing chamber substrate support
JP1700781S (en) * 2021-03-22 2021-11-29
USD980813S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD980814S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD616390S1 (en) * 2009-03-06 2010-05-25 Tokyo Electron Limited Quartz cover for manufacturing semiconductor wafers
USD654883S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD654884S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD797067S1 (en) * 2015-04-21 2017-09-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
JP1579504S (en) 2016-07-26 2017-06-19
USD813181S1 (en) * 2016-07-26 2018-03-20 Hitachi Kokusai Electric Inc. Cover of seal cap for reaction chamber of semiconductor
JP1598442S (en) 2017-08-09 2018-02-26
JP1620194S (en) * 2018-01-22 2018-12-10

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD230332S (en) 2021-04-12 2024-03-11 美商蘭姆研究公司 (美國) Pedestal for a substrate processing system
TWD232576S (en) 2021-04-12 2024-08-01 美商蘭姆研究公司 (美國) Pedestal for a substrate processing system

Also Published As

Publication number Publication date
USD916037S1 (en) 2021-04-13
JP1624334S (en) 2019-02-12

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