TWD191628S - Air supply nozzle for substrate processing apparatus - Google Patents

Air supply nozzle for substrate processing apparatus

Info

Publication number
TWD191628S
TWD191628S TW106306048F TW106306048F TWD191628S TW D191628 S TWD191628 S TW D191628S TW 106306048 F TW106306048 F TW 106306048F TW 106306048 F TW106306048 F TW 106306048F TW D191628 S TWD191628 S TW D191628S
Authority
TW
Taiwan
Prior art keywords
processing apparatus
gas
substrate processing
supply nozzle
air supply
Prior art date
Application number
TW106306048F
Other languages
English (en)
Chinese (zh)
Inventor
吉田秀成
史
西堂周平
Original Assignee
日立國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立國際電氣股份有限公司 filed Critical 日立國際電氣股份有限公司
Publication of TWD191628S publication Critical patent/TWD191628S/zh

Links

TW106306048F 2017-04-14 2017-10-13 Air supply nozzle for substrate processing apparatus TWD191628S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2017-8113F JP1589673S (cs) 2017-04-14 2017-04-14
JP2017-008113 2017-04-14

Publications (1)

Publication Number Publication Date
TWD191628S true TWD191628S (zh) 2018-07-11

Family

ID=60162854

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106306048F TWD191628S (zh) 2017-04-14 2017-10-13 Air supply nozzle for substrate processing apparatus

Country Status (3)

Country Link
US (1) USD847301S1 (cs)
JP (1) JP1589673S (cs)
TW (1) TWD191628S (cs)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1605945S (cs) 2017-12-27 2018-06-04
USD893673S1 (en) * 2018-05-11 2020-08-18 Tianjin Tianchuang Best Pure Environmental Science And Technology Co., Ltd. Water filter
USD888196S1 (en) * 2018-07-05 2020-06-23 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
JP1644261S (cs) * 2019-03-20 2019-10-28
USD910809S1 (en) * 2019-04-26 2021-02-16 Next Century Spirits Llc Alcohol distillation apparatus
JP1684258S (cs) * 2020-07-27 2021-04-26
JP1731676S (cs) * 2022-05-30 2022-12-08

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW573562U (en) 2003-01-03 2004-01-21 Applied Materials Inc Gas nozzle for substrate processing chamber
TWI324806B (en) 2005-08-05 2010-05-11 Hitachi Int Electric Inc Substrate processing apparatus, cooling gas feed nozzle and method for manufacturing semiconductor device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3387877A (en) * 1967-05-15 1968-06-11 Constantines Christodolu Retrieving tool
FR2871395B1 (fr) * 2004-06-11 2006-09-15 David Weill Dispositif simplifie de nettoyage et remplissage
WO2010023306A2 (en) * 2008-09-01 2010-03-04 Shell Internationale Research Maatschappij B.V. Self cleaning arrangement
US9067246B2 (en) * 2012-09-14 2015-06-30 R 2 Solutions LLC Water service line repair
JP1520999S (cs) * 2014-09-02 2015-04-06
JP1521275S (cs) * 2014-09-10 2015-04-13
JP1534651S (cs) * 2015-01-28 2015-10-05
USD783785S1 (en) * 2015-01-30 2017-04-11 Criser, S.A. De C.V. Drain hose

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW573562U (en) 2003-01-03 2004-01-21 Applied Materials Inc Gas nozzle for substrate processing chamber
TWI324806B (en) 2005-08-05 2010-05-11 Hitachi Int Electric Inc Substrate processing apparatus, cooling gas feed nozzle and method for manufacturing semiconductor device

Also Published As

Publication number Publication date
USD847301S1 (en) 2019-04-30
JP1589673S (cs) 2017-10-30

Similar Documents

Publication Publication Date Title
TWD191628S (zh) Air supply nozzle for substrate processing apparatus
TWD176076S (zh) 基板處理裝置用氣體供給噴嘴
TWD203444S (zh) 基板處理裝置用氣體導入管
TWD180125S (zh) 反應管之部分
EP3707746A4 (en) HIGH PRESSURE TREATMENT CHAMBER GAS DISTRIBUTION SYSTEM
MX2017007760A (es) Un sistema generador de aerosol que usa el efecto venturi para suministrar sustrato a un elemento de calentamiento.
JP1740694S (ja) ガス供給チューブ用コネクタ
SG11201912787RA (en) Gas delivery system for high pressure processing chamber
EA201791506A1 (ru) Устройство для направления аэрозоля и система для генерирования аэрозоля, содержащая указанное устройство для направления аэрозоля
TWD175119S (zh) 反應管
JP2017168496A5 (cs)
PH12016502470B1 (en) Treatment for plant seeds
EP4360681A3 (en) Respiratory gas therapy
EP4353290A3 (en) Usability features for respiratory humidification system
TW200701345A (en) Film-forming apparatus and film-forming method
JP2017512379A5 (cs)
TWD183003S (zh) 基板處理裝置用氣體供給噴嘴之部分
TWD197467S (zh) 基板處理裝置用氣體導入管
AU2015373505A8 (en) Spray nozzle apparatus for spray-drying applications
TWD171078S (zh) 基板處理裝置用氣體供給噴嘴之部分
JP2017157678A5 (cs)
TWD167985S (zh) 反應管之部分
TWD215215S (zh) 基板處理裝置用氣體供給噴嘴
TWD198069S (zh) 基板處理裝置用氣體供給噴嘴
TWD177999S (zh) 基板處理裝置用隔熱具