TW571366B - Cleaning gas for semiconductor production equipment and cleaning method using the gas - Google Patents

Cleaning gas for semiconductor production equipment and cleaning method using the gas Download PDF

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Publication number
TW571366B
TW571366B TW091136000A TW91136000A TW571366B TW 571366 B TW571366 B TW 571366B TW 091136000 A TW091136000 A TW 091136000A TW 91136000 A TW91136000 A TW 91136000A TW 571366 B TW571366 B TW 571366B
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TW
Taiwan
Prior art keywords
gas
scope
patent application
oxygen
cleaning
Prior art date
Application number
TW091136000A
Other languages
English (en)
Chinese (zh)
Other versions
TW200301932A (en
Inventor
Hiromoto Ohno
Toshio Ohi
Original Assignee
Showa Denko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko Kk filed Critical Showa Denko Kk
Publication of TW200301932A publication Critical patent/TW200301932A/zh
Application granted granted Critical
Publication of TW571366B publication Critical patent/TW571366B/zh

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  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
TW091136000A 2001-12-13 2002-12-12 Cleaning gas for semiconductor production equipment and cleaning method using the gas TW571366B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001379401A JP2003178986A (ja) 2001-12-13 2001-12-13 半導体製造装置のクリーニングガスおよびクリーニング方法

Publications (2)

Publication Number Publication Date
TW200301932A TW200301932A (en) 2003-07-16
TW571366B true TW571366B (en) 2004-01-11

Family

ID=19186793

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091136000A TW571366B (en) 2001-12-13 2002-12-12 Cleaning gas for semiconductor production equipment and cleaning method using the gas

Country Status (3)

Country Link
JP (1) JP2003178986A (enExample)
CN (1) CN1592798A (enExample)
TW (1) TW571366B (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4686157B2 (ja) * 2004-09-29 2011-05-18 株式会社東芝 成膜装置のクリーニング方法
CN101466873B (zh) * 2006-04-10 2012-09-26 苏威氟有限公司 蚀刻方法
US20100012153A1 (en) * 2006-07-27 2010-01-21 Takamitsu Shigemoto Method of cleaning film forming apparatus and film forming apparatus
US9627180B2 (en) 2009-10-01 2017-04-18 Praxair Technology, Inc. Method for ion source component cleaning
KR20120098751A (ko) * 2009-10-26 2012-09-05 솔베이 플루오르 게엠베하 Ｔｆｔ 매트릭스 제조를 위한 식각 공정
JP5751895B2 (ja) * 2010-06-08 2015-07-22 株式会社日立国際電気 半導体装置の製造方法、クリーニング方法および基板処理装置
JP6097192B2 (ja) * 2013-04-19 2017-03-15 東京エレクトロン株式会社 エッチング方法
CN105537207B (zh) * 2015-12-11 2018-09-25 上海交通大学 一种高温用石英管的清洗方法
CN106637133A (zh) * 2016-12-26 2017-05-10 苏州工业园区纳米产业技术研究院有限公司 一种pecvd反应腔体的清洁方法及清洁气体
JP7276343B2 (ja) * 2018-08-30 2023-05-18 三菱ケミカル株式会社 洗浄液、洗浄方法及び半導体ウェハの製造方法

Also Published As

Publication number Publication date
JP2003178986A (ja) 2003-06-27
CN1592798A (zh) 2005-03-09
TW200301932A (en) 2003-07-16

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