TW531867B - Circuit structure integrating the power distribution functions of circuits and leadframes into the chip surface - Google Patents
Circuit structure integrating the power distribution functions of circuits and leadframes into the chip surface Download PDFInfo
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- TW531867B TW531867B TW090125246A TW90125246A TW531867B TW 531867 B TW531867 B TW 531867B TW 090125246 A TW090125246 A TW 090125246A TW 90125246 A TW90125246 A TW 90125246A TW 531867 B TW531867 B TW 531867B
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Classifications
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- General Physics & Mathematics (AREA)
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Description
531867
五、發明説明(1 發明範疇 本發明通常相關半導體裝置 能整合導線框之配電功能至 相關技藝說明 及製程之範疇,更特別相關 晶片表面之積體電路。
裝 已發明之半導體導線框(美國申請號3,71β,764及 4,034,027)作爲事先裝配之低成本部分,以同時供應許多半 導體裝置及其操作之需求。首先,該導線框提供-穩定支 撑塾以固足半導體晶片,該半導體晶片通常係_積體電路 (1C)晶片。由於該導線框,包括該墊,均以電導電材料製 成,必要時孩墊可偏壓到任何電位,該電電位係涉及該半 導體裝置的網路所需,尤其是指接地電位。 訂
第二’該導線框提供複數個導電區段以將不同電導體引 入晶片附近。在該區段(内部)尖端與IC表面接合墊間之其 餘缝隙通常由薄金屬線橋接,各別地與Z C接觸墊及導線框 區段接合。此解決方案結果係,固定該區段,接合墊及連 .接線至相對位置,一旦該裝置設計完成定案,該接合墊就 不能爲方便某些1C再設計而重新安排。 第三’遠離該IC晶片(外部尖端)之導線區段'末端必須係 以電及機械性連接至其他部分或外界,例如至組合印刷電 路板,絕大部分電子產品皆使用焊接接合。 一般實作皆從薄(約120至250 μm)金屬片以製造單個導線 框。爲了方便製造,一般選取之起始金屬爲銅,銅合金, 鐵鎳合金(即所謂合金42)及不變鋼。該導線框之期待形狀 係由原始鮝屬薄片蚀刻或壓印而得,以此方式,該導線框 -4- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 531867 A7 ___B7 五、發明説明(2 ) 各別區段採用之薄金屬條紋形式具設計決定之特定幾何形 狀。爲大部分使用目的,一典型區段之長比寬大。 一般實作更著力於複數個區段用以攜帶電信號至指定晶 片輸入/輸出,並著力於另一複數個區段用以供應電流至指 定之晶片輸入/輸出。 兩個皆有長遠歷史之獨立半導體技術趨勢,突顯本發明 之迫切需要:第一個技術趨勢關心更多晶片信號,供電端 子及導線框區段之快速成長需求,也引進更精密區段尺寸 導線框,惟他們只是被晶片上越多且越密空間之接合墊更 快速成長需求所淹沒,這個趨勢引起對所有接合及線尺寸 更嚴格的限制,連帶地對附著球接合及缝接合焊接有更緊 密正確性之要求,這個趨勢已因技術可行性之限制而難推 進。 第二個技術趨勢關於藉由保留半導體面積來節省製造成 本’爲了配合接合線球或烊接球,在碎I c上之典型接合塾 皆屬十足尺寸;它們通常45 X 45 μπι平方至15〇xi5〇从111平 方。因此,它們需要用到大約電路面積之1到2〇%,有時上 至45% ’端視接合塾及1C尺寸而定。爲了製造'及組裝理由 ’接合塾沿著電路週邊以列配置’通常沿著所有電路四邊 争0 直到如今,因爲接合製程中不可避免之機械力及冶金壓 力造成電路結構遭受破壞之高風險,所有製成半導體裝置 皆必須從用以設計實際電路圖案面積排除由接合塾覆蓋之 面積。顯然地,如果電路圖案可置於接合墊金屬之下,即 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 531867 A7 B7 ___ 五、發明説明(3 ) 可節省相當可觀之碎面積。產生主要致力於接合螯形態之 另一層級金屬係達到此特點方法之一。此層級在覆蓋活性 電路面積之防護外衣上建立。惟在現存技術中,只有筇貴 之聚亞胺特別壓力緩衝層應用於防護外衣及外部金屬層之 間,如 K · G · Heinen 等人所著的(’’Wire Bonds over Active Circuits’’,Proc. IEEE 44th Elect. Comp. Tech· Conf.,1994 ,pp. 922-928) 〇 現存技術中,在美國專利案60/092,961,申請日07/14/98 (Saran,"System and Method for Bonding Over Active Integrated Circuits)提出不同之方法:爲了使接合墊夠強能耐得住線 接合製程中所要求之機械力,説明在接合墊下之加強系統 中係利用實際IC特定部分作爲在接合墊下加強弱介電層之 方法。此法需要特定設計及1C重新設計,很難適用於常有 許多接合墊但相對只有較小電路面積之標準線形及邏輯1C。 在美國專利申請號08/959,410,申請曰1〇-28·1997,專利 申請號 〇9/611,623,申請日 07-07-2000(Shen 等人,’’Integrated
Circuit with Bonding Layer over Active Circuitry”)及專利申 請號60/221,051,申請日 07-27-2000 (Efland等人,' "Integrated Power Circuits with Distributed Bonding and Current Flow)中 説明另一種在活性電路部分上形成接合之方法,本發明與 其相關。至該電路頂層金屬層之通孔由種子金屬塗佈,再 鍍以連續金屬層,藉此填補該通孔並形成吸壓接合面用於 線接合或焊接球。 在美國專利申請號09/458,593,申請日12-10-1999 (Zuniga -6- 本紙張尺度適用中國國家標準(CNS) A4規格(21〇x 297公釐) 531867 A7 B7___ 五、發明説明(4 ) 等人 ’ ” System and Method for Bonding over Integrated Circuits”)説明另一在活性電路部分上形成接合之方法,本 發明與其相關。結合可接合及吸壓金屬層,及一機械性堅 固的電絕緣層分開一接合墊與置於該接合墊下之部分積體 電路。 這些在活性電路上形成接合之方法沒有對微導程接合墊 ,微導程導線框,嚴格限制接合可製造性及改進裝置執行 等矛盾問題提出基本解決方案,因此引起對下列事項之急 切需求:節省矽面積及較鬆之線球與焊接球接合製造所結 合之低成本且可靠結構與方法,I C設計自由連同IC特性的 重要改進等。即使該接觸墊位於超過至少一結構及機械之 弱介電層上,該系統應提供無壓力,簡單及無附加成本之 接觸塾以用於具彈性,容忍力之接合製程中。該系統及方 法應可應用至極寬之設計,材料及方法多樣性範園,達到 可觀地節省矽,以及改進裝置特性,可靠性及製程良率。 較佳地,這些革新應可使用已安裝之製程及設備基礎,俾 能不需再投資新製造機器。 發明總結 一種積體電路(1C)晶片,安裝在一導線框上,具有沈積 在該晶片表面之配電線網路,俾使這些線置於該I c主動元 件之上,藉由金屬填補通孔垂直連接至在該線之下選取之 主動元件,也藉導體連接至該導線框之段。 可接合線之沈積並印製好圖案之網路提供許多重要優點。 該網路蔣大部分習用配電互連從電路位準重新安置到新 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 裝 玎
531867 A7 B7
產生之表面網路,因而節省大量矽面積,並使IC面積減少。 該網路藉由金屬填補通孔以電連接至所選取之主動元 ;由於能輕易重新設計這些通孔至其他位置,Ic設計= 得到新的設計自由度。 該網路將用於供電之大部分接合墊,從沿著晶片週邊之 習用對正,重新安置到新產生之可接合線,節省大量額外 矽面積,並使接合機器免去極緊湊之連接器放置及貼合規 則,而使接合程式更輕鬆。 該網路在晶圓製程中沈積並印製圖案作爲一系列金屬層 ,特別適於提供電流及接地電位。 , 作爲本發明之較佳實例,該網路線路以可接合外層表面 ,設計成該線路在便於接合線球或焊接球之位置形成墊。 本發明之一較佳實例中,該半導體裝置晶片在該第一晶 片表面(主動表面)裝配一積體電路;該電路包括主動元件 ,至少金屬層,及藉一機械性堅固又電絕緣之外衣保護 ’該外衣具有複數個金屬填補通孔以接觸該至少一金屬層 ’及複數個窗口以暴露電路接觸塾。該晶片更具有一堆疊 導電膜沈積在該外衣上;該膜在該主動元件之上印製線網 路並成實質垂直。該堆疊有一與該通孔接觸之底膜,至少 一吸壓膜及一非腐蝕性並冶金可接合之外膜,該網路印製 成分配電流及接地電位,該晶片第二(被動)表面與導線框 之安裝塾接合’該導線框也有第一複數個段提供電信號, 及第二複數個段提供電力及接地。電導體以該複數個段連 接晶片接_墊,電導體以該第二複數個段連接該網路線。 -8- 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐)
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531867 發明説明(6 概心係藉減少由電路配電 而減少1C晶片成本,以及藉 Η耗*^面積 太菸日U 4人 及猎由日口片接觸墊作爲電力連接。 本發明另一概念係藉由使至主、 :徑並無礙再設計,以增加電路採幾 本發明另-概念係藉鬆綁嚴格放置規則而改良組裝製造 力,孩規則係用在線接合及焊接合之球接合上。 ,=另-概念係藉由將大部分導線框配電功能委託位 於曰曰片表面〈新配電線網路’以減少用在輸入/輸出電力之 導線框段數目。 本發明另—概念係改進半導體探索之製程及操作可靠性 ,及藉由提供填充金屬層及絕緣層分開該接觸墊及電路之 線接合及焊接合组裝,該絕緣層在厚度上足以可靠地吸收 來自機械,溫度及緊密度之壓力。 本發明另一概念係消除在探測,線接合及 限制,因此即使非常易碎之電路介質遭受斷裂損害之風險 亦降至最低。 ϋ 本發明另一概念係提供彈性之設計,配置概念及製程方 法,俾便能應用於許多半導體1C產品家族,並且係通用俾 能應用於產品之許多代。 本發明另一概念係對裝配,測試及組裝提供一低成本及 高速之方法。 本發明另一概念係只使用在1C裝置裝配中最習用最被接 受之設計概念及方法,因此避免新資本投資成本,及可使 用已安裝之裝配設備基礎。 -9- 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) 裝 訂 線 531867 A7 B7____ 五、發明説明(7 ) 這些概念藉由敎導本發明有關設計概念及適用大量生產 之方法流程已達到目的。不同之修改亦成功地用於迎合不 同選取之產品幾何及材料。 由本發明所代表之技術進步,以及其目的,在同時考慮 連同附圖及附加之申請專利範圍中所陳述之新特點,將在 以下本發明較佳實例之詳細説明中更明朗。 附圖簡單説明 圖1係根據先前技藝的積體電路晶片一部分的簡化透視圖 ’該積體電路晶片具有接合線附著於接合墊上並連接至部 分導線框。 圖2係根據本發明的積體電路晶片一部分的簡化透視圖, 該積體電路晶片具有一整合電路及導線框配電功能的表面 結構。 較佳實例詳細説明 本發明相關美國專利申請號08/959,410,申請日1 0-28-1997,申請號 〇9/611,623,申請日 07-07-2000(Shen 等人, "Integrated Circuit with Bonding Layer over Active Circuitry”), 及申請號 60/221,051,申請日 07-27-2000(Efland 等人, "Integrated Power Circuits with Distributed Bonding and Current Flow”),在此併作參考。 藉由強調已知技術的缺失即能很容易察覺本發明的影響 ,圖1説明一積體電路(1〇晶片一部分的簡化透視圖,通 常以100表示,具有先前技藝的設計及裝配特點。半導體基 板101(常是矽,厚度約介於225至475 μπι之間)具有第一(主 -10- 本紙張尺度適用中國國家標準(CNS) Α4規格(210 X 297公釐) 531867 A7 B7 五、發明説明(8 ) 動)表面1〇1&及第二(被動)表面1〇11)。該第二表面1〇1^附著 於預先裝配導線框(通常爲銅,銅合金或鐵鎳合金,厚度約 介於100至300 μπι之間)之晶片安裝墊(圖1中未示)。圖1中 只指出該導線框複數個導線(通常是1 4個至超過600個)中的 一些内部導線端點120a,120b,··.,它們用在行使電力供 應。 在該晶片第一表面10 la嵌入的是複數個1C主動元件(在現 代1C中,主動元件的數目很大,常超過1〇〇萬個,但以平行 及垂直小型化)。在表面10 la中更包括至少一金屬層(通常 是銘的純金屬或合金,厚度介於0.4及1.5 μιη之間;在某些 IC中,甚至有超過六階金屬層)。該金屬印刷線路以連接該 主動,被動元件及IC接觸墊,作爲傳導電力的金屬線,該 線寬度通常介於約20至250 μιη之間。圖1中圖示的是該金 屬的一小部分,在主動元件與接觸墊間印製設計圖案用作 迁迴配電線。 . 爲説明目的,圖1中之主動元件分成兩個分開的電迴路群 組。一迴路包括標明102&至1〇2η的主動元件;另一迴路包 括l〇3a至1〇3η的主動元件。互連電線1〇4及1〇5各別用來組 織該兩迴路。迴路1〇4有兩個終端i〇6a及i〇6b,該終端裝配 成接觸墊適合電導體用以連接該接觸墊與導線框的導線尖 端11〇。端視最常生產形式的裝置而定,每一晶片的接觸墊 數目可從14至超過600不等。圖1中,選擇線接合(通常是 金線’直徑約在2 0至28 μιη之間)作爲電互連的方法。球 l〇8a及l〇8b各別附著於接觸墊106a& 1〇6b,而缝11〇a& -11 - 本紙張尺度適用中國國家標準(CNS) A4規格(210 x 297公釐) 裝 訂
531867 A7 ___ B7 五、發明説明(9 ) 110b各別附著於導線尖端i2〇a及120b。類似地,迴路1〇5有 兩個終端107a及l〇7b,該終端也裝配成接觸墊以用在線球 接合。球109a及l〇9b各別附著於接觸墊1〇7a及l〇7b,而缝 111&及1111)各別附著於導線尖端12〇(:及12〇(1。爲了避免線 鬆弛或線掃除的問題,線距最好保持小於2 $ min。 如圖1指明,該半導體基板101的第一表面101a_致地由 保護外衣130所覆蓋。在此外衣中,接觸墊1〇6a,1〇6b等均 打開成爲窗口。通常該外衣的厚度介於〇 8至丨2 μιη之間, 既是機械性堅固又是電絕緣,並常是防溼不透水;最好以 包括氮化矽及氧氮化矽的材料製成。 爲了操作該1C的信號輸入/輸出,需要在保護外衣中有額 外的窗口以暴露底下的接觸墊金屬物。這些窗口及其各別 的線接合在圖1中未示。 從圖1中可推論,用於1C設計,導線框及裝置設計,裝配 製程及產品製造的已知技術存在許多問題及限制。 .龟力輸入/輸出終端置於晶片週邊而須面臨的目前困難 -藉由長電線以互連主動元件; -待補償沿配電線不可避免的電壓落差; -須接受無彈性的主動元件放置設計規則;及 -須接受珍貴碎面積的損失。 -圍繞晶片週邊放置高數量的接合墊消耗珍貴的矽面積。 -圍繞晶片週邊放置高數量的接合墊而須面臨的目前趨勢 •縮小接合塾面積; -縮J、接合墊導程; -12- ---- 本紙張尺度適用中國國家標準(CNS) Α4規格(210X 297公釐) 531867 A7 B7 五、發明説明(1〇) -縮小線球俾能適合放入減小的接合塾面積;及 -將自動化接合器程式變得緊迫,以使球正確地置於 塾面積中央。 -一直增加導線數目的預先裝配導線框引起目前的困難 -縮小内部導線的寬度; -縮小内部導線點;及 -在小型化的内部導線上放置缝接合。 圖2總結本發明用以補救上述既往技術缺失的革新部分。 圖2係一 1C晶片一部分的簡化透視圖,通常以200標明,具 有本發明所揭示的設計及裝配特點。半導體基板2〇1具有第 一(主動)表面20 la及第二(被動)表面20 lb。第二表面附著 於預先裝配好導線框(通常是銅,銅合金,鐵-鎳合金,不 變鋼或鋁,厚度約在100至3 00 μιη之間)的晶片安裝塾(圖2 未示)。圖2只描述屬於複數個導線(常由14至超過6 00不等 )的一些導線框段頂點220a及220b,其行使電力供應並位於 IC晶片附近。 嵌在晶片第一表面20la中的是複數個1C的主動元件(在現 代1C中,主動元件的數目很大,常超過1〇〇萬個,但以平面 或垂直面小型化)。根據本發明,組織圖2所示2〇2&至2〇211 及203a至203η的主動元件是根據它們所共享的電力供應, 也依照該Ic功能所能允許的程度。所有主動元件2〇2a至 202η共享一電流終端(例如輸入終端),所有主動元件2〇3 & 至203η共旱另一終端(例如輸出終端)。圖2中,電流從元件 202a流至元件203a,··,及從元件2〇2η流至2〇3η。圖2中互 -13-
531867 A7 _____ B7 五、發明説明(11 ) 連線由短線所描述,例如從主動元件2〇2a至主動元件2〇h 的互連以204a標出;·,;從主動元件2〇2n至元件2〇3n的互 連以204η標出。 如圖2所説明,該半導體基板2〇1的第一表面2〇u,該⑴ 即敗在此表面中’是一致性地由保護外衣23〇所覆蓋。較佳 地,茲外衣厚度約在〇.4至丨5 μπι之間,機械性堅固,電絕 緣且能防溼。較佳的材料包括氮化矽,氧氮化矽,矽碳合 金及藉此形成之夾層膜。在某些應用中可使用聚亞胺層。 對本發明極重要的是配電線網路係在該保護外衣23〇的暴 露表面沈積,直接並實質垂直地位於該丨c的主動元件之上 。圖2中所示其中一配電線以25丨標出,另一配電線以252標 出。其材料結構及組合,以及裝配方法在以下説明。 而且’對本發明有重大重要性的是在配電線下所選取的 主動元件是傳導並垂直地連接至電線。較佳地,此連接由 金屬填補通孔260所提供,該通孔聯絡主動元件金屬部分及 •配電線。藉由使用標準微影技術印製圖案及蝕刻該外衣23〇 而形成該通孔260。以金屬連同以下所説明的電線金屬部分 沈積填補該通孔。 該沈積線251及252之外層金屬係從可接合的(及可焊接的 ’見以下説明)材料所選取。電導體連接此外層金屬與該導 線框的導線尖端。圖2中選擇線接合(該線最好是直徑約20 至30 μπι的金,銅或鋁純金屬或合金)以作爲電互連吟較佳 技術。球208及209各別附著至線251及252,而缝210及211 各別附著至導線尖端220a及22〇b。本發明之重要部分是最 -14- 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 531867 A7 B7 五、發明説明(12 ) 近在線接合方面技術進步如今允許緊密控制線迴路及迴路 形狀的形式。舉例來説,圖2所示迴路240比迴路241長。今 日的接合器可達成7.5 mm甚至更多的線長。例如此項進步 可在由美國賓州,Willow Grove,Kulicke & Soffa公司的電 腦化接合器8020,或美國德州達拉斯市的德州儀器公司的 ABACUS SA中所發現。透過空氣以預設及電腦控制方式移 動毛細管將產生正確界定形狀,例如可形成圓形,梯形, 線形及慣用的迴路。 用在線25 1及252的沈積配電金屬物的較佳結構組成如下 :一種子金屬層附著至該保護外衣230及該通孔260底部, 接著沈積第一較薄的吸I金屬層,第二較薄的吸壓層,最 後是一最外部可接合金屬層。最好該種子金屬層由以下群 組中所選取,包括鎢,歛,氮化鈥,细,路,及其合金。 該種子金屬層是電導性的,對該1C主動元件金屬物及該保 護外衣皆提供附著力,其上表面暴露部分可電鍍,並防止 後續吸磬金屬移往該元件金屬層。種子金屬層的厚度介於 100至500 nm之間。或者,該種子金屬層也可以兩金屬層組 成;一例中第二金屬是銅,因銅提供表面適合後續的電鍍。 應指出本發明中,單一種子金屬層最好以再製金屬製成 ,其具有夠大厚度以可靠地作爲吸壓緩衝,介於200至500 nm的厚度最令人滿意,最好是約300 nm。優吸壓厚度不僅 視所選取的金屬而定,也依選取的沈積技術,沈積比及沈 積期間矽基板溫度而定,因爲這些變數決定該沈積層的微 結晶。例如,已發現當使用鎢濺擊沈積時,最好以每秒4至 -15- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 531867 A7 B7 五、發明説明(13 ) 5 nm的比率執行形成層至♦基板,當達到至少約300 nm厚 度時周圍溫度增加到7 0 °C左右。該鎢微結晶因此產生具有 平均尺寸及分配致使它們可在組裝的線接合製程中作爲可 靠的吸壓”彈簧”。 爲了沈積該吸壓層,使用電鍍方法是有利的。該第一吸 壓金屬層的一例是銅,2至35 μπι範圍内的厚度使其成爲機 械性堅固的支撑層以用在後續如接合線等連接導體的附著 。該第二吸壓金屬層的一例是鎳,其厚度約在1至5 μπι的 範圍。 最外層是冶金可接合及/或可焊接。如果所選取的連接方 法疋線接合(如圖2所示)及該最外層應可接合,最好選擇包 括鋁,金,鈀及銀的純金屬或其合金。如果所選取的連接 方法是焊接及該最外層應可焊接,最好選擇包括鈀,金, 銀及鉑等金屬。兩種情形中,該厚度皆在5〇〇至2800 範圍内。可以了解爲了適合特定裝置需求,層數目,層厚 •度及材料選擇以及沈積方法可有所不同。 該網路或分配線的電鍍圖案可形成任何想要的設計。如 圖2例子中可見連接器線圖可以是延長或線形形式,惟其功 能是透過該通孔垂直延伸至該元件金屬物。不然,例如它 可在該通孔直接面積外幾何性延伸及擴大至更寬部分以提 供足夠表面積以方便超大直徑的接合線或焊接球。那些附 著"塾”然後可同樣極適合用在附著楔接合或缝接合。 如上所指出,可選取最外線層俾使能焊接,焊接球然後 可藉由標单回流技術附著其上,惟以上所引述美國專利申 -16- 本紙張尺度適用中國國家標準(CNS) Α4規格(21〇 X 297公釐) 531867 A7 B7 五、發明説明(14 ) 請號09/611,623及60/221,051的説明中建議利用一額外焊接 光罩或聚亞胺層對每一焊接球皆具一開口,以使該覆晶隆 起物在形成隆起及後續附著至外部封裝或板期間保持在界 定面積及形狀内。 應提及可利用該配線的位置改良消散由該IC主動元件所 釋出之熱能,這在使用焊接隆起物作爲與外面世界的連接 方法,並將散熱用的熱路徑及熱電阻減至最小時更顯得特 別眞確。 爲了執行該1C的信號輸入/輸出,需要在保護外衣中有額 外的窗口以暴露以下的接觸墊金屬物。線接合或焊接球便 可固足至這些接觸窗口。這些窗口及其各別線接合並未在 圖2中描述。 須進一步提及至少沈積在該保護外衣上之一些線路及部 分分配網路可印製圖案,並致力提供接地電位的分配。 其他實例 •當本發明參考説明性實例加以説明時,此説明並非試圖 爲限制性詮釋。該説明性實例以及本發明的其他實例的不 同修改及結合對熟於此技藝的人在參考本説明時將很明顯。 舉例來説,本發明涵蓋以矽,鍺化矽,砷化鎵或任何其 他用於積體電路製造的半導體材料的基板製成的積體電路。 另一例,本發明通常涵蓋一半導體積體電路,其包括一 電路結構將電路配電功能以及用以連接至其他零件感外界 的工具整合至該1C晶片表面。該選取的配電線位置使其能 提供至該主動元件的電流控制及配置,較佳是在該配電線 -17- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 531867 A7 B7 五、發明説明(15 ) 下垂直。 因此後附之申請專利範圍試圖包含任何此類修改或實例。 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)
Claims (1)
- D8 六、申請專利範園 一種安裝在導線框上之積體電路晶片,包括: 一配電線網路沈積在該晶片表面,位於該電路主動元 件正上方;及 該線路於其下方可傳導及垂直地連接至選取之主動元 件,並藉導體連接至該導線框之段,藉此省掉電路配電 線及導體塾所消耗之矽面積,增加電路設計彈性及組裝 製造力’並減少該段之輸入/輸出數目。 一種半導體裝置’在該晶片表面具有額外導體網路,其 中該積體電路之配電網路與該導線框之配電網路結合, 包括: 一半導體晶片’具有第一及第二表面; 一積體電路,建造在該第一表面,該電路具有主動元 件’至少有一金屬層,並由機械性堅固及對電絕緣之外 衣所保護,該外衣具有複數個金屬填補通孔以接觸該至 少一金屬層,並具有複數個窗口暴露電路接觸墊; 在該外衣上沈積並印製線路網路圖案之電導薄膜在該 主動元件上方實質垂直,該薄膜接觸該通孔並具有至少 一吸壓薄膜及一非腐蝕性並可附著金屬之外膜; 該網路定圖案以分配電流及接地電位; 一導線框,具有晶片安裝墊,第一複數段提供電信號 ,及第二複數個段提供電力及接地; \ 該第二晶片表面附著於該晶片安裝墊; 電導體以該第一複數段連接該晶片接觸墊;及 電導'體以該第二複數段連接該網路線路。 -19- 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 531867 A B c D 六、申請專利範圍 3 ·如申請專利範圍第2項之裝置,其中該晶片由以下群組 .中所選取,包括矽,鍺化矽,砷化鎵,及其他習用於電 子裝置製造上之半導體材料。 4 .如申請專利範圍第2項之裝置,其中該電路包括複數個 主動及被動電子元件,以平行及垂直方式安排。 5·如申請專利範圍第2項之裝置,其中該積體電路包括多 層金屬,該多層金屬至少有一層由銅,鋁,鎳或耐火金 屬之純金屬或合金所製成。 6 ·如申請專利範圍第2項之裝置,其中該外衣包括由以下 群組中所選取之材料,包括氫化碎,氧氮化梦,梦碳合 金,聚亞胺,及由此產生之夹層膜。 7 ·如申請專利範圍第2項之裝置,其中該導線框由一薄板 狀材料所先製’該材料由以下群組中選取,包括銅,銅 合金,鋁,鐵鎳合金或不變鋼。 8 ·如申請專利範圍第2項之裝置,更包括一容器以封裝該 • 09片,日口片士裝塾,電導體及至少部分之該導線框段。 9. 如申請專利範圍第8項之裝置,包括該容器包括在轉換 模製製程中製造之聚合物合成。 10. 如申請專利範圍第8項之裝置,其中不包括在該容器内 (導線框段部分形狀如鉛條或針腳,可與外部零件焊接。 1 1 ·如申凊專利^圍第2項之裝置’其中該線路及接觸塾係 由焊接球與外部零件接合。 、 12.如申請專利制第2項之裝置,其中該冶金接合包括線 球及缝接合,帶接合及焊接。 -20- 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 531867 A8 B8 C8 D8 、申請專利範圍 13.如申請專利範圍第2項之裝置,其中該電導薄膜包括至 •少一吸壓金屬層,該金屬層由以下群組中選取,包括銅 ,鎳,鋁,鎢,鈦,鉬,鉻及其合金。 1 4 ·如申請專利範圍第2項之裝置,其中該最外金屬層由以 下群組中選取,包括金,鈀,銀,鉑,鋁之純金屬或合 金。 1 5 ·如申請專利範圍第2項之裝置,其中該導體係接合線, 接合帶或焊接球。 1 6 ·如申請專利範圍第1 5項之裝置,其中該接合線由以下群 組中選取,包括金,銅及鋁之純金屬或合金。 1 7 ·如申請專利範圍第1 5項之裝置,其中該焊接球由以下群 組中選取,包括純鍚及錫合金,錫合金包括錫/銅,錫/ 鋼,錫/銀,錫/鉍,錫/鉛,及電導黏性化合物。 1 8 ·如申請專利範圍第2項之裝置,其中該線網路更以電連 接至適於外界電接觸之選取段。 } 9 ·如申請專利範圍第2項之裝置,其中該線網路,連同該 金屬填補通孔在該主動電路元件間提供配電功能。 20· —種製造半導體裝置之方法,該半導體裝置包括具有第 一及弟一表面之半導體晶片,該方法包括以下步驟: 在該第一晶片表上形成一積體電路,該電路包括主動 元件,至少一金屬層及一機械性堅固,與電絕緣之保護 外衣; & 經該外衣形成複數個通孔以進出該至少一金屬層; 藉由該外衣上沈積一堆疊金屬層而填補該通孔,該疊 -21 - 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 531867 A8 B8 C8 D8 、申請專利範圍 具有至少一吸壓膜及一非腐蝕性並可與金屬接合之外膜; .在該膜印製線網路圖案,俾使該線路實質上垂直位於 該主動元件上並適合配電流; 在該外衣上形成複數個窗口以暴露電路接觸墊; 提供一預製導線框,包括晶片安裝墊,第一複數個段 用於電信號,及第二複數個段適於電力及接地; 接合該晶片至該晶片安裝墊; 接合電導體至該電路接觸墊及該第一複數個段;及 接合電導體至及該第二複數個段。 2 1 .如申請專利範圍第2 0項之方法,其中接合該電導體至該 電路接觸墊及該線網路之步驟,包括以接合線或接合帶 接合至該電路接觸墊及該線網路,或以回流焊接球接合 至該電路接觸墊及該線網路之步驟。 2 2.如申請專利範圍第20項之方法,更包括將該晶片,晶片 安裝墊,電導體及該導線框段之至少一部分封裝至容器 中之步驟。 2 3 .如申請專利範圍第2 0項之方法,更包括藉由焊接球貼合 該電路接觸墊及該線網路至外部零件之步驟。 -22- 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐)
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DE202018004354U1 (de) * | 2018-09-19 | 2018-10-15 | Heraeus Sensor Technology Gmbh | Widerstandsbauelement zur Oberflächenmontage auf einer Leiterplatte und Leiterplatte mit zumindest einem darauf angeordneten Widerstandsbauelement |
US10867991B2 (en) * | 2018-12-27 | 2020-12-15 | Micron Technology, Inc. | Semiconductor devices with package-level configurability |
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JPH05226564A (ja) * | 1992-02-14 | 1993-09-03 | Rohm Co Ltd | 半導体装置 |
EP0637840A1 (en) * | 1993-08-05 | 1995-02-08 | AT&T Corp. | Integrated circuit with active devices under bond pads |
KR950010762B1 (ko) * | 1993-10-14 | 1995-09-22 | 엘지전자주식회사 | 아날로그 디지탈 변환 데이타의 안정화 방법 |
JP2536436B2 (ja) * | 1993-11-19 | 1996-09-18 | 日本電気株式会社 | モ―ルド型半導体装置 |
KR0145394B1 (ko) * | 1995-06-29 | 1998-07-01 | 김광호 | 전원 공급용 리드가 분리된 리드 온 칩용 리드프레임 및 그를 이용한 리드 온 칩 패키지와 버스바를 갖지 않으며 전원 공급용 리드가 분리된 리드 온 칩용 리드프레임 및 그를 이용한 리드 온 칩 패키지 |
JP3387282B2 (ja) * | 1995-08-03 | 2003-03-17 | 日産自動車株式会社 | 半導体装置の構造及びその製造方法 |
US5965903A (en) * | 1995-10-30 | 1999-10-12 | Lucent Technologies Inc. | Device and method of manufacture for an integrated circuit having a BIST circuit and bond pads incorporated therein |
JPH09321214A (ja) * | 1996-05-30 | 1997-12-12 | Mitsubishi Electric Corp | 半導体装置 |
US6033937A (en) * | 1997-12-23 | 2000-03-07 | Vlsi Technology, Inc. | Si O2 wire bond insulation in semiconductor assemblies |
US5986343A (en) * | 1998-05-04 | 1999-11-16 | Lucent Technologies Inc. | Bond pad design for integrated circuits |
TW445616B (en) * | 1998-12-04 | 2001-07-11 | Koninkl Philips Electronics Nv | An integrated circuit device |
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2001
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- 2001-10-12 US US09/975,630 patent/US6972484B2/en not_active Expired - Lifetime
- 2001-10-12 EP EP01000533A patent/EP1198004A3/en not_active Ceased
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2005
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EP1198004A3 (en) | 2003-10-01 |
CN1355567A (zh) | 2002-06-26 |
CN1269212C (zh) | 2006-08-09 |
KR100801360B1 (ko) | 2008-02-05 |
US7060607B2 (en) | 2006-06-13 |
JP2002164383A (ja) | 2002-06-07 |
US20020043712A1 (en) | 2002-04-18 |
EP1198004A2 (en) | 2002-04-17 |
US6972484B2 (en) | 2005-12-06 |
US20050248027A1 (en) | 2005-11-10 |
KR20020029644A (ko) | 2002-04-19 |
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