TW529102B - Liquid processing apparatus - Google Patents

Abstract

Cleaning processing unit (SCR) 21a according to one embodiment of liquid processing apparatus of the present invention, comprises a spin plate 41 for holding a substrate G supported on supporting pins 42 by means of holding pins 43, a motor 47 for rotating a spin plate 41 in a manner to permit the substrate G to make a planar rotation, a process cup 60 consists of an upper cup 61 capable of moving in the vertical direction which is arranged to surround the edge of the substrate G and a fixed under cup 62, and a buffer room 63 formed with the process cup 60. An air stream and/or a mist produced by the rotation of the substrate G are stayed within the buffer room 63, with the result that it is possible to prevent the air stream and/or the mist from hoisting and diffusing toward the substrate G.

Description

529102 A7 V. Description of the invention (1) [Purpose of the invention] [Technical field to which the invention belongs and its conventional technology] (Please read the precautions on the back before filling this page) The present invention relates to, for example, liquid crystal display Device (LCD) A rotary liquid processing device that performs a predetermined liquid processing on a substrate such as a glass substrate or a semiconductor wafer. For example, in the photo-etching step of a liquid crystal display or a semiconductor device, a liquid processing device generally called a spin type is used to spin the liquid crystal display substrate or semiconductor wafer in-plane to perform cleaning and resist coating. , Development, etc. In a rotary liquid processing apparatus, the substrate is held substantially horizontally, and while the substrate is rotated in-plane, various processing liquids such as a cleaning liquid, a resist liquid, a developing liquid, and a washing liquid are supplied to the substrate. At this time, the processing liquid is inevitably scattered from the substrate toward the four sides. Such scattering of the processing liquid also occurs when the substrate is dried and the substrate is rotated after the supply of the processing liquid is stopped.

Li I Therefore, in the past, if a cup-shaped processing container (processing cup) is arranged around the substrate, a drain is provided on the bottom surface of the processing cup, and the processing liquid scattered from the substrate hits the inner wall of the processing cup and is guided downward. The treatment liquid is discharged from the drain. Furthermore, the bottom surface of the processing cup is provided with another exhaust port 'for the above-mentioned drain port, so that the ambient gas in the processing cup can be discharged. However, in the above-mentioned rotary liquid processing device, not all of the air flow containing particles and other foreign matter generated by the rotation of the substrate or the mist of the processing liquid scattered from the substrate during the liquid processing are not all immediately provided from the steam outlet or exhaust provided on the bottom surface of the container. , The mouth drains the matter. Therefore, there is a problem that particles or mist float in the vicinity of the substrate and adhere to the substrate, and attach to the inner wall of the processing cup to handle the processing cup. This paper size applies to China National Standard (CNS) A4 specifications (21 × 297 mm) 4

529102 V. Description of the invention (2) Furthermore, after the predetermined processing liquid is supplied and the liquid processing is performed, since the processing liquid attached to the substrate is used to rotate the substrate to break away from the spin-drying substrate, the rotation number becomes higher, not only the substrate, Even the treatment liquid coming out of the inner wall of the collision processing cup has become a small amount of fine mist that is prone to occur. The adhesion of the mist and the like that occurred along the inner wall of the processing cup soared above the substrate 'again caused the problem of so-called adhesion to the substrate. In addition, there is a problem that such mist and the like become particles or cause of pollution. [Technical problems that must be achieved by the invention] The present invention has been achieved in view of such a situation, and an object thereof is to provide a mist or the like that can be prevented from being caused to fly above the substrate during liquid processing of the substrate or spin drying after the liquid processing. Liquid handling device for substrate contamination. Furthermore, the present invention aims to provide a liquid processing apparatus for improving the efficiency of discharging a processing apparatus such as a mist outward. That is, according to the first aspect of the present invention, there is provided a liquid processing apparatus that performs predetermined liquid processing on a substrate, including: a holding mechanism for holding the substrate; and a processing liquid supply mechanism for supplying a predetermined processing liquid to the substrate. A rotation mechanism that rotates the substrate in-plane together with the holding mechanism; and a buffer chamber to prevent the airflow and / or mist from being hoisted and diffused toward the substrate. Furthermore, according to the second aspect of the present invention, a liquid processing device for performing predetermined liquid processing on a substrate is provided, including: This paper size is applicable to China National Standard (CNS) A4 specifications (210X297 mm> # (Please read first (Notes on the back then fill out this page)

可 I: 嬅 5 529102 A7 B7 V. Description of the invention (3) A holding mechanism for holding a substrate, and a processing liquid supply mechanism for supplying a predetermined processing liquid to the aforementioned substrate; a rotating mechanism, together with the aforementioned holding mechanism, transfers the aforementioned The substrate is rotated in-plane; the processing cup is composed of a freely adjustable upper cup and a fixed lower cup arranged around the periphery of the substrate; and a buffer chamber is formed in the processing cup, which is held by the rotation of the substrate. The airflow and / or mist prevent the hoisting and diffusion of the airflow and / or mist toward the substrate. In such a liquid processing device, part of the airflow and / or mist generated due to the rotation of the processed substrate is introduced into the buffer chamber, and the momentum of the airflow is weakened in the buffer chamber, and because the mist or the collision or collision with the wall surface Growth and falling down, fog, etc. will not fly over the substrate and pollute the substrate again, which can maintain the high quality of the product. According to a third aspect of the present invention, there is provided a liquid processing apparatus that performs predetermined liquid processing on a substrate, including: a holding mechanism for holding the substrate; a processing liquid supply mechanism for supplying a predetermined processing liquid to the substrate; and rotating The mechanism rotates the substrate in-plane together with the holding mechanism, and the partition wall plate is arranged under the holding mechanism in an umbrella shape to form a plurality of window portions; and the wing plate is disposed on the partition wall plate. The airflow and / or mist generated by the driving of the rotating mechanism is introduced into the window portion. 6 (Please read the precautions on the back before filling this page) This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 529102 5. Description of the invention (4 A7 B7 According to the fourth aspect of the present invention, provide a A liquid processing device that performs a predetermined liquid processing on a substrate includes a holding mechanism for holding the substrate; a processing liquid supply mechanism for supplying a predetermined processing liquid to the substrate; a square-turn mechanism and the holding mechanism Rotate the above-mentioned substrate together in-plane; the next-door plate, which is umbrella-shaped, is placed below the holding mechanism to form a plurality of windows; the first wing is the airflow generated by the driving of the rotation mechanism and / or The mist is introduced into the window portion and installed on the partition wall; the processing cup is composed of an upper cup and a fixed lower cup arranged around the periphery of the substrate; and the second wing is formed by the rotation mechanism. The airflow and / or mist generated by the driving is introduced below the processing cup and is disposed on the inner peripheral wall of the upper cup. In such a liquid processing device, since the The partition plate is provided with a window portion, and a wing (i-th fin) is provided on the window portion. The airflow and / or mist generated by the rotation of the substrate can be easily introduced from the window portion to improve the discharge efficiency. This can suppress the processing cup. The occurrence of internal updrafts can suppress the adhesion of mist and the like to the substrate. Moreover, the airflow or mist is introduced into the fins (second fins) below the inner peripheral wall of the upper cup due to the installation and rectification, which makes it possible to introduce airflow to the window more effectively. It becomes possible to reduce the mist trapped in the processing cup. In this case, it is also possible to prevent the substrate from being contaminated by setting up the aforementioned buffer chamber in combination. [The composition and function of the invention] This paper standard is applicable to the Chinese national standard (CNS ) A4 size (210X297 mm) 529102 A7

5. Description of the invention (5) The following is a detailed description of the embodiment of the present invention with reference to the attached drawings. (Please read the precautions on the back before filling this page.) Figure 1 shows one embodiment of the liquid processing device of the present invention. The liquid crystal display substrate G (substrate G) is provided with a cleaning treatment device 2la, 21b. 100 plan view of development processing system. The anti-money agent coating and development processing system 100 includes: a card® station (1) for loading a cassette C that houses a plurality of substrates G; a processing unit (2) that is used to perform a substrate g containing a resist A plurality of processing devices for a series of processing of coating and development of an agent; the interface section (3) is used to carry the substrate G between the exposure device (not shown in the figure), and is ordered at both ends of the processing section 2 The cassette station 1 and the interface section 3 are respectively configured. -# The carding station 1 includes a transfer mechanism 10 for transferring the substrate G between the cassette C and the processing unit 2. Furthermore, the card is carried in and out at the cassette station 1. The transport mechanism 10 includes a transport arm 11 that is movable along a transport path 10a arranged in the cassette arrangement direction. The transport arm u transfers the substrate 0 between the cassette c and the processing unit 2. The processing section 2 is divided into a front section 2a, a middle section 2b, and a rear section 2c. Each of the processing sections 2 has transport paths 12, 13, and 14 in the center, and processing devices are arranged on both sides of the transport paths. Further, the relay sections 15 and 16 are provided between these sections. The front section 2a includes a main conveying device 17 that can be moved along the conveying path. Two washing treatment devices 2ia and 21b are arranged on one side of the conveying path 12, and an ultraviolet irradiation device and a cooling device are arranged on the other side of the conveying path to overlap. The processing structure 25, the heating processing device overlapping the processing structure 26 in two sections, and the cold paper size apply the Chinese National Standard (CNS) A4 specification (210X297 mm) 529102 A7 ----- 87 ___ V. Description of the invention (6) A processing structure 27 overlapping two sections is installed. The middle section 2b includes a main transfer device 18 that is movable along the transfer path 13. A resist coating processing device 22 and a peripheral resist for removing the resist on the peripheral portion of the substrate G are provided on one side of the transfer path 13. The agent removing device 23 is arranged on the other side of the conveying path 13 with a processing structure 28 in which the heating processing device is overlapped in two stages, a processing structure 29 in which the heating processing device and the cooling device are stacked up and down, and an adhesive processing device and the cooling device are arranged up and down. The superposed processing structure 30. Furthermore, the rear part # 2 includes a main conveying device 19 that is movable along the conveying path 14, and three development processing devices 24a, 24b, and 24c are arranged on one side of the conveying path 14, and the other side of the conveying path 14 is provided. The heat treatment device 31 has a treatment structure 31 formed by overlapping two sections, and the heat treatment device and the cooling device 32, 33 are formed by overlapping with each other. In addition, the processing unit 2 is provided with only a rotary system such as 21a, an anti-corrosion coating processing device 22, and a development processing device 24a on one side sandwiched in the conveying path, and only a thermal system such as a heating processing device or a cooling device is disposed on the other side. Structure of the device. In addition, the relay unit 15, 16 is provided with a medicinal liquid supply device 34 on the rotation device arrangement side, and a space 35 is provided for performing maintenance on the main transfer devices 17, 18, and 19. The main conveying devices 17, 18, and 19 each include an X-axis drive mechanism, a Y-axis drive mechanism, and a vertical z-axis drive mechanism in two directions in a horizontal plane, and include a Z-axis rotation drive mechanism for centering rotation, each of which has a support Arm of substrate G. This paper size applies to China National Standard (WS) A4 specifications (21〇 \ 297 公 #)

(Please read the precautions on the back before filling in this page). Order 丨. See _529102 A7 ____B7 V. Description of the invention (7) The main conveying device 17 has a conveying arm 17a. When the conveying mechanism 10 is between the conveying arms 11 The substrate G is conveyed, and at the same time, the substrate G of each processing device of the front section 2a is carried in and out, and the substrate G is conveyed between the relay sections 5 and 5. Furthermore, the 'main conveying device 18 has a conveying arm 18 a which conveys the substrate G between the relay section 15 and the substrate G of each processing device in the middle section 2 b, and also conveys the substrate G between the relay section 16. Carry out the function of substrate G transportation. Furthermore, the main transfer device 19 has a transfer arm 9a, which carries the substrate G between the relay sections 16 and simultaneously carries in and out the substrate G of each processing device of the rear section 2C, and further includes the interface section 3 The substrate G is conveyed. In addition, the relay sections 15 and 16 can also function as cooling plates. The interface section 3 includes: the extension section 3 6 ′ is used to temporarily hold the substrate G between the processing sections 2; the buffer table 37 is provided on both sides of the extension section 36 to configure the buffer card The cassette; and the conveying mechanism 38 are for carrying in and out of the substrate G between these and an exposure device (not shown). The conveying mechanism 38 includes a conveying arm 39 that is movable along a conveying path 38a arranged in the alignment direction of the elongated portion 36 and the buffer table 37, and conveys the substrate 0 between the processing unit 2 and the exposure device by the conveying arm 39. In this way, by integrating and integrating each processing device, space saving and efficiency of processing can be achieved.

In this structure of the resist coating and development processing system 100, cassette C, the paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 10 (Please read the precautions on the back before filling this page )

529102 A7

V. Description of the invention The substrate G in (8) is transported to the processing section 2. In the processing section 2, first, the ultraviolet irradiation device UV of the processing structure 25 of the previous section 2a is subjected to surface modification, cleaning treatment, and cooled by a cooling device. After that, scrubbing and washing are performed with the washing treatment apparatuses 2U and 21b, and one of the heat treatment apparatuses in the treatment structure 26 is heated and dried, and then cooled by one of the cooling means in the treatment structure 27. Next, 'transfer the substrate G to the middle section 2b. In order to improve the fixation of the resist, the adhesive processing device at the upper section of the processing structure 30 is subjected to drainage treatment. After cooling by the cooling device COL at the lower section, the processing device is coated with an anti-name agent. 22 Apply the resist, and use the peripheral resist removing device ER 23 to remove excess resist on the peripheral edge of the substrate G. Next, the substrate G is pre-baked with one of the heating processing devices in the middle section 2b, and is cooled by the cooling device in the lower section of the processing structure 29 or 30. Thereafter, the substrate G is transferred from the relay section to the exposure device through the interface section 3 in the main transfer device 9, so that a predetermined pattern is exposed. Furthermore, the substrate G is carried in again through the interface portion 3, and one of the processing structures 31, 32, and 33 in the second portion 2C is processed as necessary, and one of the structures is subjected to a post-photosensitive drying treatment by the heating processing device to develop the processing devices 24a and 24b. One of the 24c is developed to form a predetermined circuit pattern. The image-processed substrate G is subjected to post-baking processing by one of the heating processing devices in the rear section 2c, and then cooled in one of the cooling devices, and is accommodated in the cassette station 1 by the main transfer device 19, 18, 17 and the transfer mechanism 10. On the predetermined cassette. Next, the cleaning treatment apparatus 21a of the present invention will be described in detail. Fig. 2 is a plan view and a cross-sectional view showing a schematic structure of the cleaning treatment device 21a. The cross-sectional view is a cross-sectional view taken along line AA in the plan view. Figures 3 and 4 are also 11 (please read the precautions on the back before filling out this page), a t — This paper size applies to China National Standard (CNS) A4 specifications (210X297 mm) 529102 A7 ----- ---- B7 ____ V. Description of the invention (9) The plan view and cross-sectional view of the structure of the cleaning treatment device 21a are shown again. The cross-sectional view of FIG. 3 is a cross-sectional view taken along line BB in the plan view, and a cross-sectional view of FIG. 4 The figure is a sectional view taken along the line PQRS in a plan view. Here, each of the plan views of FIGS. 2 to 4 shows the same, and in each cross-section view, it is easy to understand the structure of the cleaning treatment device 21, and components not shown on the line AA, the line BB, and the line PQRS are also shown. On the other hand, there are members that are shown in a sectional view but not shown in a plan view. The cleaning processing device 21a is installed in a drain basin or a box (not shown), and has a rotating plate 41 of a holding mechanism on which the substrate G is placed and held. On the rotating plate 41, only a plurality of support pins are discretely fixed in an appropriate arrangement pattern. When the substrate G is placed on the rotating plate, the substrate 0 is supported on the supporting pin ", which makes it difficult for the substrate G to bend. Etc. Alternatively, a holding pin 43 is fixedly provided on the "rotary plate" as a means for holding the substrate G. The raising and lowering of the substrate G is performed by the top member pins 44. For example, four top member pins 44 are provided. A through hole 牦 is formed in the rotating plate 41 so as to pass through the top pin 44. It is preferable that at least the contact portion of the support pin 42, the stopper pin 43, and the top pin 44 with the substrate G be made of a resin or rubber member that does not damage the substrate G. The condensing plate 41 may be made of stainless steel, for example. A pivot shaft 46 is attached to the center portion of the inner surface of the rotating plate 41, and the shaft rotating mechanism is, for example, mounted on a motor 0 fixed to a supporting member (not shown). By operating the motor 47 to rotate the pivot 46 at a predetermined speed, the rotating plate "can rotate in the same plane as the substrate G. In addition, a part of the storage pivot 46 and the motor's driving device storage container 48 are also provided for lifting Mechanisms for top material locking, such as the cylinders not shown in the figure. The paper size is Gu Jiaguan (CNS) A4 specification (210X297 Gong Chu 1 1 ---- -12-

、! · C Please read the precautions on the back before filling in this page} 529102 A7 V. Description of the invention (1〇) In the rotating plate 41, a slightly rectangular plate-shaped air-supply fin extending radially from its center to the outer edge is formed. 49. The air-supply fin 49 generates an air flow that can be smoothly entered when the rotating plate 41 rotates. The installation number of the air supply fins 49 can be arbitrarily selected. Below the rotating plate 41, an upper wall of the drive device accommodating container 48 also serves as an umbrella-shaped partition wall plate 51 that surrounds the pivot 46. On the inclined surface of the partition plate 51, window portions 52 along the periphery are formed, for example, in eight places. For each window portion 52, the wings 53 that complete the task of introducing airflow and / or mist into the window portion generated by the rotation of the rotating plate 41 are provided to project On the partition wall 51. Further, a second row & port 54 formed on the bottom surface below the window 52 forms an exhaust path having a short diameter from the air flow and / or mist entering from the window part 52 and is discharged from the second discharge port 54. Fig. 5 is a diagram showing the exhaust path of the airflow and / or mist from the window 52. When the substrate G is rotated toward the arrow 8, the milk flow direction (arrow S1) accompanying the rotation becomes the same rotation direction as the arrow 8, and the direction becomes # 气 β The sheet 53 is fixed on the side wall 51 to the side wall under the airflow, and because the slope is installed when the side is installed, the upper side of the L money flow becomes a higher position, and it becomes a little vertical due to the wing 53 The opening portion 53a easily introduces airflow toward the exhaust chamber 55, and also becomes easy to enter the airflow from the window and toward the exhaust chamber 55. The wall portion 53b provided on the side of the fin 53 is dry, and it becomes possible to more effectively introduce airflow and / or mist from the opening portion 53a and the window portion 52. The second discharge port 54 is a path for shortening the flow of the airflow and / or mist flowing from the window portion 52 and the opening portion 53a. The second discharge port 54 is provided at a position on the downstream side of the airflow for the cymbal portion 52 in consideration of the flow of the airflow. In doing so, since the paper size of the self-windows is suitable for the family and family standards (⑽A4 regulation; 7 ^ 297 mm

1.Y (please read the precautions on the back before filling this page) 13 529102 A7 ------- B7_ 5. Description of the invention (U) '' ^ The airflow and / or mist leading to the second outlet 54 The exhaust path becomes the shortest path indicated by arrow S2, which can improve exhaust efficiency. In this case, since the amount of gas μ or service gas remaining in the exhaust chamber 55 formed below the window portion 52 is reduced, the occurrence of countercurrent mist from the window portion 52 can be suppressed, and furthermore, it can be perpendicular to the outer edge of the partition plate 51 The hole portion 56 of the ground-mounted wall portion 51a slips out to the outside and the amount of mist flying on the substrate G again can be reduced. Such an effect can be obtained even when the buffer chamber 63 is not provided later. In addition, the airflow and / or mist that slip out from the exhaust chamber 55 to the outside through the hole 56 are mostly discharged from the first discharge port 58 after flowing into the buffer chamber 63. A sensor 57 is mounted on the partition plate 51 to check and confirm the holding state of the substrate G on the rotating plate 41. As the sensor 57, for example, an optical sensor can be used. For example, as shown in FIG. 5, a window portion 57 a made of a transparent member such as glass is formed on the partition plate 51, and a sensor can be provided below the window portion 57 a. The sensor 57 ° uses the sensor 57 to check whether the stopper pin 43 is disposed away from the substrate G. When the sensor 57 detects an abnormal state, it can be constructed as an interlocking mechanism so that the device will not operate. The cleaning processing apparatus 21a includes a processing cup 60 composed of an upper cup 61 and a fixed lower cup 62 which are arranged to be raised and lowered around the periphery of the substrate G, for example. The cross-sectional views shown in Figs. 2 to 4 show a state in which the upper cup 6 is raised to the ascent limit position. A buffer chamber 63 is formed in the processing cup 60 to retain the airflow and / or mist generated by the rotation of the substrate G, and to prevent the dust from spreading toward the substrate G due to the mist or the like. The upper cup 61 has an inner peripheral wall 61a and an outer peripheral wall 61f, and a top plate 61e of a horizontal inner frame 61a and an outer peripheral wall 61f is provided. On the other hand, the lower cup 62 has an outer peripheral wall 62a and a bottom plate 62b, and the buffer chamber 63 is composed of the inner peripheral wall 61a and the outer peripheral wall. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 14 ... ..............-- Preparation ------------------ Ceremony. (Please read the notes on the back before filling this page) 529102 A7 B7___ 5. Description of the invention (12) 61f, top plate 61e, outer peripheral wall 62a, bottom plate 62b. A first protruding wall portion 62c 'is formed outwardly from the upper portion of the outer peripheral wall 62a of the lower cup 62, and a second protruding wall portion 61g is formed inward from the lower portion of the outer peripheral wall 61f of the upper cup 61. As shown in Figs. 2 to 4, when the upper cup 61 is stationary at the rising limit position, it is assumed that a structure is sealed between the first projection wall portion 62c and the second projection wall portion 61g by the sealing member 66. Although the cross-sectional view in FIG. 6 (a) shows the lowered state of the upper cup 61, the structure around the sealing member 66 is shown in the cross-sectional view in FIG. A structure in which a gap is formed between the second protruding wall portions 61 g. . The visibility of the Hai gap can be positively set to be wide, and vice versa. The upper cup 61 can be lowered, for example, during the transportation of the substrate g. A buffer chamber guide wall 61 b is formed on the inner side of the inner peripheral wall 61 a of the upper cup 61 to introduce the airflow and / or mist rising along the inner peripheral wall 61 a into the buffer chamber. Furthermore, the airflow and / or mist introduced by the buffer chamber guide wall 61b will not fly toward the substrate G again, and the protective wall 61c is formed on the inner peripheral wall 61a so as to cover the buffer chamber guide wall 6 more than the upper part. The airflow and / or mist introduced into the guide wall 61a of the buffer chamber is changed into direction by the protective wall 61o in addition to the mist or the like adhering to the protective wall 61c, and is introduced into the buffer chamber 63 through a ventilation hole 68 formed in the inner peripheral wall 61a. In addition, in order to prevent mist or the like from the treatment cup 60 from diffusing into the entire washing treatment clothes 21a, an upper portion of the inner peripheral wall 61a of the upper cup 61 is formed with a tapered portion 61d inclined on the inside. The first outlets 58 are formed around the bottom surface of the buffer chamber 63. The weakened airflow or the mist growing from the collision or the adhesion in the buffer chamber 63 adheres to the Chinese paper standard (CNS) A4 (210X297). ) ------------------------___ (Please read the notes on the back before filling out this page), one-T— 15 529102 A7 _ — B7________ 5. Description of Invention (13) The mist and the like of the invention (13) can be discharged from the first discharge port 58. Furthermore, the airflow and / or mist descending along the partition plate 51 or from the window portion 52 and the opening portion 53a provided in the partition plate 51-once enter the exhaust chamber 55 and enter the airflow and / or mist discharged from the hole portion% again. It flows into the buffer chamber 63 from the lower part of the inner peripheral wall 61a, and the airflow and / or mist are also discharged from the first discharge port 58. As can be seen by comparing Figs. 2 to 4, the buffer chamber 63 has a structure that effectively utilizes the space of the cleaning treatment device 21a. The line AA has a wider width, and the line BB has a narrower width. By using the space of the cleaning processing device 21a in this way, the volume of the buffer chamber 63 is greatly ensured to increase the amount of airflow and / or mist that can be retained in the buffer chamber 63. Controlling the airflow in the processing cup 60 can prevent the substrate from reaching the substrate. The occurrence of flying air and / or mist on G. Fig. 7 is an explanatory diagram showing an example of a defogger mounting configuration using the first discharge port 58 as an example. A mist eliminator 67 is provided at each of the i-th discharge port 58, and the main liquid components separated from the mist eliminator 67 are discharged from the discharge port 60. On the other hand, gas components are discharged from the exhaust pipe 67b. The installation of the demister even with the second discharge port 54 is also applicable. In addition, the shape of the mist eliminator or the method of capturing mist components is not limited to the form shown in FIG. FIG. 8 is a cross-sectional view showing one embodiment of the scrubbing and washing mechanism 设置 provided in the washing processing apparatus 21a. The scrubbing and cleaning mechanism 80 includes, for example, a bristle brush scrubbing mechanism 71 and a blower cleaning mechanism 72. Although FIG. 8 shows the bristle brush scrubbing mechanism 71 and the blast cleaning mechanism 72 at the same time, it usually uses the bristle brush scrubbing mechanism 71 and the blast cleaning mechanism 72, but usually uses the bristle brush scrubbing mechanism 71. The brushing and washing (brushing and washing) is performed first, and then the brushing and washing by the blast cleaning mechanism 72 is performed. When one of the institutions operates, the paper size of the other institution applies the Chinese National Standard (CNS) A4 Specifications (210X297mm) 16 # (Please read the precautions on the back before filling this page)

_, \ Swallow I V. Description of the invention (14) Stand by at a predetermined standby position such as the top of a box that is not shown in the upper cup 61. The structure of the bristle brush scrubbing mechanism 71 is not limited. For example, a brush rotation driving unit 74 that rotates and drives a plurality of disc brushes 73 while contacting the substrate surface with a certain pressure, and a rotary drive 4 74 is sent along the guide plate 91 to the brush feeding mechanism of the substrate ⑽ long side pattern not shown. In addition, a roller brush having a length substantially the same in the short side direction of the substrate G may also be used. A hard-bristle brush scrub that sweeps in the long direction of the plate G and rotates while rotating the roller brush The air cleaning mechanism 5 of the machine 7 2 includes, for example: a series of 75 blasts, which discharges the cleaning liquid from directly above the surface of the substrate G; the cleaning liquid supply unit (not shown) supplies the cleaning liquid to These nozzles 75; and the 'nozzle feed mechanism' (not shown) send the nozzles 75 along the guide plate 90 to the long side of the substrate G. In addition, when the blast cleaning mechanism 72 is used for blast cleaning, the timing circuit of the rotatable substrate G can usually be composed. Next, the cleaning processing steps of the cleaning processing device 21a will be described. The transfer time of the substrate G held by the transfer arm 17a of the main transfer device 17 is combined, and the upper cup 6 is lowered as shown in FIG. 6 (a), and the ejector pin bucket 4 is raised to a predetermined position. 'From the transfer arm 17a toward the ejector pin 44 feeding the substrate G. Next, as shown in FIG. 2 to FIG. 4, the top pin 44 is lowered to a predetermined position, and 529102 A7 V. Description of the Invention (15) The plate G is placed on the support pin 42 formed on the rotating plate 41. The stopper pin 43 positions the substrate G while raising the upper cup to a predetermined position. After the substrate G is moved into the cleaning processing device 21a, as shown in FIG. 8, the brush G is cleaned by the brush cleaning mechanism 71. This brush-cleaning disk brush 73 rotates while contacting the surface of the substrate G with a certain pressure, and moves the substrate G from one end to the other end, thereby removing particles or resin components throughout the entire substrate surface. Wait for dirt. When the brush is cleaned, the cleaning liquid is supplied to the disc brush 73. Therefore, the cleaning liquid is scattered from the disk brush 73 or the substrate G in all directions. As shown in FIG. 4, the scattered cleaning liquid is dropped from the window portion 52 formed in the partition plate 51 toward the exhaust chamber, and is discharged through the second discharge port 54, and is then transmitted to the partition plate 51 and dropped. It falls to the bottom of the washing treatment device 21a, that is, the bottom plate 62b of the lower cup 62, is discharged through the second discharge port 54 or the first discharge port 58, and the inner peripheral wall 6U or the buffer chamber guide wall 61b in the collision upper cup 61 After that, the wall surface is conveyed to fall downward and discharged from the second discharge port 54 or the first discharge port 58. After the brushing and washing is completed, the blower washing mechanism 72 is blown and washed. The cleaning nozzle 75 sprays the ultrasonic vibration high-pressure cleaning liquid toward the substrate G while reciprocating the substrate G horizontally. At this time, the motor 47 is operated to rotate the substrate G together with the rotating plate 41 at a predetermined speed. As a result, the entire surface of the substrate G was cleaned by air, and the dirt and the like that could not be removed by brushing was previously washed away. 豉 After the wind cleaning is completed, it is not necessary to supply a treatment liquid, and the scrub cleaning mechanism 80 faces the upper cup 61. Rotary drying is performed in the state of evacuation outside. G When rotating at a rotation speed greater than that during blast cleaning This paper size is in accordance with China National Standard (CNS) A4 (210X297 mm)

#… (Please read the notes on the back before filling out this page) Order | 18 529102 A7 B7 V. Description of Invention (16). The cleaning liquid adhered to the surface or inside of the substrate G by the high-speed rotation is released from the surroundings by centrifugal force, and the substrate G becomes dry in a short time. By the blast cleaning by the above-mentioned blast cleaning mechanism 72, in order to spin dry the substrate G while supplying a large amount of high-pressure cleaning liquid to the substrate 0, a large amount of powerful cleaning liquid from the substrate G is scattered toward the four sides. Further, when the substrate G or the left rotating plate 41 is rotated during the blast cleaning, an air flow and / or a mist are generated as shown by the arrow si in FIG. 5 earlier. Furthermore, the spin-drying is to increase the rotation speed of the substrate G or the rotary plate 14, and generate a stronger airflow than cleaning. Fog also occurs at this time, and the generated mist becomes easier to produce than the mist generated during air washing. Furthermore, the generated mist once collided with the inner peripheral arm 61a of the cup 61 once by the strong airflow 'again became a small mist-adhered airflow, and it is also considered that a state of scattering toward the outside of the processing cup 60 occurred. However, the cleaning treatment device 21 a is a part of the cleaning liquid scattered from the substrate 0 or the like during the blast cleaning or a part of the airflow and / or mist generated by the rotation of the substrate G and the rotating plate 14 is attached to This air flow is subjected to the action of the fins 53 provided in the partition plate 5 i, is introduced into the exhaust chamber 55 from the window portion 52 and the opening portion 53 a, and is configured to be discharged from the second discharge port 54. This exhaust path is shown as shown by arrow S2 in Fig. 5. By performing such an effective exhaust, it is possible to suppress part of the scattered cleaning liquid or generated mist from flying toward the substrate G. In addition, another part of the cleaning liquid scattered from the substrate G or the like during the blast cleaning or another part of the airflow and / or mist generated when the substrate G or the rotating plate 41 rotates collides with the inner peripheral wall 61a. After the buffer chamber guide wall 61b flows downward, it is discharged from the second discharge port 54 or the first discharge port 58. This paper size applies to China National Standard (CNS) A4 specification (210X297 mm) 19 ------------------------___ (Please read the note on the back first Please fill in this page again.) Order ancestor 529102 A7 r—— --————-__ ^ 2._ ____ V. Description of the invention (17) " — '~ By inner air wall 61a or buffer room where air conflict occurs The guide wall 61b, that is, an upward air flow along the guide wall 61b of the buffer chamber occurs. The upward flow is attached and the "washing liquid-part or mist-part rises, but because the upper wall ^ is equipped with a protective wall 6U ', such as an updraft or a rising air along the updraft, it will not The flying substrate G is introduced into the buffer chamber 63 through the vent 68. In addition, the mist or the like adhered to the protective wall 61c is condensed and transmitted to the wall surface, and naturally falls, and is discharged from the second discharge port 54 or the first discharge port 58. The air introduced into the buffer chamber 63 becomes turbulent and weakens inside, and the mist or mist collides with each other, which is equivalent to colliding with the wall surface and increasing the quality and falling to the bottom, and is discharged from the first discharge port 58. This can prevent the cleaning liquid introduced into the buffer chamber 63 or the airflow and / or airflow generated by the rotation of the substrate G from flying toward the substrate G. Since the buffer chamber 63 is formed by increasing the volume of the cleaning treatment device 21 & the size of the buffer chamber 63 is not to increase the coverage area of the cleaning treatment device 21 & Moreover, since the buffer chamber 63 can receive a large amount of scattered cleaning liquid or airflow and / or mist generated by rotation of the substrate (), for example, the airflow and / or mist flow around the substrate G becomes smooth, which can prevent rising The occurrence of airflow and the like can prevent mist I from flying on the substrate G. In addition, even if the buffer chamber 63 has a large volume, such a large effect can be obtained. However, the large volume of the buffer chamber 63 also causes a large 2U cleaning treatment device. Therefore, the size of the buffer chamber 63 is appropriately set in a range in which the scattered cleaning liquid or the airflow and / or mist generated by the rotation of the substrate G can be appropriately controlled. As a result, the% air cleaning system spit out and wash Cleansing ^ while proceeding, even when ................. ___ This paper size Applicable to China National Standard (CNS) A4 specification (210X297 mm)

# (Please read the precautions on the back before filling this page) Order 丨 529102 A7 __B7_ V. Description of the invention (18) The mist generated during the blast cleaning will fly on the substrate G and fall on the substrate Q, and it will become re-washed The neat liquid flows out together. On the other hand, when the spin-dry flying mist or the like adheres to the substrate G, the mist becomes a cause of dirt such as particles. Therefore, the airflow and / or mist generated by the rotation of the substrate G and the like prevents the airflow and / or mist from being introduced into the buffer chamber 63 by providing the buffer chamber 63, and the partition wall 51 is provided with a window portion 52 and a fin 53. The effect of preventing mist from flying by introducing airflow and / or mist into the exhaust chamber 55 can be particularly significantly obtained in the step of spin drying. In addition, in the above-mentioned blast cleaning or spin drying, the rectifying effect of the air supply wing 49 provided in the rotating plate 41 is used to strengthen the air flow from the rotating plate 41 side to the inner peripheral wall 61 a of the upper cup 61. Wind pressure, especially in the direction of radiation or its normal. Due to this rectifying effect, the airflow and / or mist generated by the rotation of the rotating plate 41 and the base plate G are easily introduced into the exhaust chamber 55 or the buffer chamber 63. However, the air supply fin 49 is not necessarily required, and even if the air supply fin 49 is not provided, the airflow and / or mist generated by the rotation of the substrate 0 or the like can be controlled. When the blast cleaning and connection are completed, the top pin 44 is raised to lift the substrate G from the rotating plate 41 to a predetermined height, and the upper cup 61 is lowered to a predetermined position. At this time, the transfer arm na of the main transfer device 17 enters, receives the substrate G from the ejector pin 44, and the substrate G is transferred to the processing device of the next step. The surface of the substrate G, which has been cleaned through such a series of steps, is scrubbed and cleaned, and because the fog or the like is hardly attached, it has a very clean surface. Therefore, even in the next step of the resist coating process or The paper size of the development area is in accordance with Chinese national standard (q ^ S) A4 specification (210X297 mm) # (Please read the precautions on the back before filling in this page) Order 丨 •• Li, 21 529102 A7 ~ ---- — B7 V. Description of the invention (19) " ~ '~ Management' can also obtain the treatment results with little pollution or fine particles. This can further improve the manufacturing yield of liquid crystal displays. Next, another embodiment of the cleaning processing apparatus will be described. The ninth diagram is a plan view and a cross-sectional view of a schematic structure of the non-washing treatment device 21c. The washing treatment clothes set 21 can replace the washing treatment devices 2u and 21b and can be mounted on an anti-name agent coating and development treatment system 100. Below the buffer chamber wall 61b inside the inner peripheral wall 61a of the cleaning treatment device 21, a fin 69 for introducing the gas μ generated by the rotation of the substrate G to the lower portion is provided. At this point, it has a structure different from that of the aforementioned cleaning treatment device 21a. . In the cleaning processing device 21a, although the rotating plate 41 is made to be able to place the entire substrate g on it, the cleaning processing device 21c reduces the outer diameter of the rotating plate 41, and the edge portion of the substrate G is rotated from the rotating plate 41. Exposed. In this way, the size of the rotating plate 41 can be kept within the limit of the substrate 0 and is not limited. Fig. 10 is an explanatory diagram showing the mounting form of the fin 69 in more detail. The fins 69 are placed lower than the substrate held slightly horizontally, and 32 pieces (for example, 16 pieces are arranged at regular intervals along the inner circumference of the inner peripheral wall 61a (16 pieces are shown in the plan view of FIG. 9)), facing the vertical direction. The predetermined angle 0 is, for example, about 30 degrees to 60 degrees, and is preferably inclined at about 45 degrees. The air flow generated when the substrate g is rotated in the direction of the arrow S3 in FIG. 10 is as shown by an arrow S4. The air flow inflows toward the opening 53a and the window 52 due to the fins 69 being rectified below the processing cup 60. In order to facilitate the inflow of the airflow toward the opening portion 53a and the window portion 52 by the fins 69, it is desirable to arrange the fins 69 at positions where the fins 53 or the window portions 52 are provided. Furthermore, 'the fins 69 are also provided on the inner peripheral wall of the outer side of the portion where the fins 53 are not provided, so that the airflow generated by the rotation of the substrate G can be more effectively introduced into the processing cup. The paper size applies the Chinese National Standard (CNS) A4 (210X297 public director) 22 (Please read the notes on the back before filling in this page)

May I 529102

Fifth, the description of the invention (20) below 60, thereby improving the exhaust efficiency. In this way, the fins 69 are provided on the inner peripheral wall 61a, and the airflow from the vicinity of the inner peripheral wall 61a to the lower side of the processing cup 60 increases and is discharged from the exhaust port 58 or the second exhaust port 54. The airflow flowing into the window portion ^ is increased and discharged from the second exhaust port 54 to improve exhaust efficiency. By doing so, it is possible to prevent the retention of 4 gases in the processing cup 6G and prevent the mist from adhering to the substrate g. In addition, the fin 69 is made of, for example, stainless steel, and its surface is preferably coated with a fluorinated resin or the like to suppress the adhesion of mist. Although the embodiment of the present invention has been described above, it goes without saying that the present invention is not limited to the above embodiment. For example, by rotating the rotating plate 41, the rectifying effect of the air flow and / or mist generated by the air blowing fins 49 provided inside the rotating plate 41 is enhanced by the buffer chamber guide wall 61b provided in the upper cup 61. However, even if the structure is not provided with the buffer chamber guide wall 61b, it is possible to obtain the effect of preventing the flying of the service air toward the substrate G. Furthermore, in the above-mentioned embodiment, although the processing cup 60 is composed of an upper cup 61 that can be raised and lowered and a fixed lower cup 62, one processing cup may be arranged within the range formed by the buffer chamber 0. In order to discharge the air flow and / or mist to the outside, the two means are not placed in the washing treatment device 2ia, 21b, that is, it is generally considered that one of the means of providing the window portion 52 or the wing 53 in the partition wall 51

The cup 60 is provided with one of the buffer chambers 63. Although it is not necessary to provide both of them, a permanent buffer chamber 63 is preferable. It is also desirable that X is configured to change the inclination of the fins 53. In this case, when the cleaning liquid such as brushing and washing is discharged on the substrate G, and the substrate g is subjected to a predetermined treatment, since the flap 53 is made not to protrude from the partition plate 51, the paper standard can be suppressed from applying Chinese national standards. (CNS) A4 size (210X297 mm)

#… (Please read the precautions on the back before filling in this page), OK |: Li-23 529102 A7 B7 21 V. Description of the invention The cleaning solution springs back from the wing 53 to stop the spin drying process and other cleaning solutions. When the processing is performed under the condition of the supply, as described above, the fins $ 3 are tilted to a predetermined angle, and the introduction of airflow and / or mist is performed. At this time, the tilt of the fin 53 is increased when the number of rotations of the rotary plate 41 is oriented, and the tilt of the fins 53 is reduced equally when the number of rotations of the rotary plate 41 is low and small, in cooperation with the rotation of the rotary plate 41 The intensity of the generated airflow can also control the volume of airflow towards the exhaust chamber. The means for holding the substrate G on the square turn plate 41 is not limited to the mechanical means using the stopper pin 43 as in the above embodiment. For example, a vacuum suction type holding mechanism may be used. The shape of the rotary plate 41 when the air-sending fins 49 are provided is preferably a circular shape in order to improve the effect, but other shapes such as a rectangular shape may be used. In this case, since the air flow may occur from the side of the rectangular rotating plate, it is desirable to take measures such as designing the shape of the inner wall of the processing cup as appropriate if the control is performed. It is also desirable that the inclination angle of the buffer chamber guide wall 61b formed in the upper cup 61 can be changed. When the substrate G is rotated, the inclination angle of the buffer chamber guide wall 61 b can be changed due to the amount of the cleaning solution released from the substrate g or the number of rotations of the substrate G, and the cleaning solution that hits the buffer chamber guide wall 61 can be changed on the one side. While being surely dropped downward, airflow and / or mist can be introduced into the buffer chamber 63. Although the above embodiment has exemplified the case where the liquid processing apparatus of the present invention is applied to a resist coating and development processing system, the present invention is not limited to this, and other liquid processing apparatuses may be applied. For example, when the liquid processing device of the present invention is suitable for resist coating, and the resist processing device 22 or the developing processing devices 24a to 24c of the developing processing system, basically only the paper size of the processing solution is applicable to the Chinese national standard ( CNS) A4 specification (210X297mm) ------------------------___ (Please read the notes on the back before filling this page)-、 —: Li-24 529102 A7 B7 V. Description of the invention (22 The supply mechanism or cleaning mechanism replaces the predetermined mechanism, the other parts are common with the cleaning processing device 21a, and the same effect as above can be obtained ^ = Although the liquid crystal display used as the substrate is described, other substrates such as semiconductor wafers and optical disk substrates can also be used.% Stomach '[Effects of the Invention] As described above, according to the present invention, the partition wall provided below the rotating plate is used. The plate is provided with a window or a flap, and a processing chamber is provided with a buffer chamber, and the airflow and / or mist generated when the rotary substrate performs a predetermined liquid treatment can be smoothly discharged to the outside of the liquid treatment device. Furthermore, the surrounding The inner wall of the cup is set like a base plate. When the substrate is installed, the exhaust airflow can be improved by introducing the generated airflow into the lower wing. This can prevent the updraft from occurring in the liquid processing device. 'Because it can prevent the mist from flying on the substrate and its mist from adhering to the substrate, it becomes The high-quality substrate can be maintained, and the so-called significant effect of improving the manufacturing yield rate can be obtained. In addition, as long as the buffer space is formed by using the spare space of the liquid processing device, the coverage area of the liquid processing device does not become larger. The buffer chamber can be easily installed or modified as part of the existing liquid processing device. Simple illustration of the drawing Figure 1 shows that the liquid processing device of the present invention has the anti-resistance coating and development of the cleaning processing device. A plan view of an embodiment of a processing system. Fig. 2 shows a plan view and a sectional view of an embodiment of a cleaning treatment apparatus for a liquid processing apparatus of the present invention. Fig. 3 shows a cleaning process for a liquid processing apparatus of the present invention. One embodiment of the device, another plan view and cross-sectional view. This paper size applies to Chinese national standards (CNS) A4 size (210X297 mm) 25 (Please read the notes on the back of this page and then fill in) - Order # --529102

V. Description of the Invention (23) FIG. 4 shows another embodiment of the cleaning treatment device of the liquid treatment device of the present invention, and another plan view and sectional view. Fig. 5 is an explanatory diagram schematically showing a flow path of airflow and / or mist generated by rotation of the substrate. Fig. 6 is a cross-sectional view shown in Fig. 2 showing a state in which the upper cup is lowered, and a cross-sectional view showing a structure around the sealing member of the upper and lower cups. Fig. 7 is an explanatory diagram showing an example of a defogger mounting form toward the first discharge port. Fig. 8 is a cross-sectional view showing a state where the cleaning mechanism is arranged on the substrate in the cross-sectional view shown in Fig. 2. Fig. 9 shows a plan view and a wearing view of another embodiment of the cleaning processing apparatus of the liquid processing apparatus of the present invention. Fig. 10 is a diagram for explaining the structure of a fin installed in the cleaning treatment device shown in Fig. 9; This paper size applies to Chinese National Standard (CNS) A4 specification U10X297 mm) 26 # (Please read the precautions on the back before filling out this page), OK — 529102 A7 B7 V. Description of the invention (24) Component label comparison 1— ^ Box station 39 ... Transporting arm 2 ... Processing section 41 ... Rotating plate 2a ... Front section 42 ... Abutment pins 2b, 2c ... Rear section 43 ... Stop pin 3 ... Interface section 44 ... Top piece pin 10 ... Transport mechanism 46 ... Polar axis 11 ... Transport arm 47 ... Motor 12,13,14 ... Transport path 48 ... Receiving container 15,16 ... Relay section 49 ... Air supply flaps 17,18,19 ... Main transfer device 51 ... Partition plate 21 core 211), 21 ^ cleaning processing device 51a ... wall portion 22 ... resist coating processing device 52 ... window portion 23 ... resist removing device 53 ... fins 24a, 24b, 24c ... development processing device 53a ... Openings 25, 26, 27, 28, 29, 30 " processing structure 54b ... wall portion 32, 33 ... processing structure 54 ... second discharge port 34 ... medicinal liquid supply device 55 ... exhaust chamber 35 ... maintenance space 56 ... hole portion 36 ... extension portion 57 ... sensor 37 ... buffer table 57a ... window portion 38 ... carrying mechanism 58 ... first discharge port 38a ... Sending path 60 ... Processing cup (please read the precautions on the back before filling this page) This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) 27 529102 A7 B7 V. Description of the invention (25) 61a ·· · Inner peripheral wall 62c ... First protruding wall portion 61b ... Inner wall 63 ... Buffer chamber 61c ... · Protective wall 66 ... Sealing member 61d ... Tapered portion 67 ... Mist eliminator 61e ... Top plate 68 ... Vent 61f ... Outer peripheral wall 69 ... 61g of wings ... 2nd protruding wall portion 80 ... Scrubbing and washing mechanism 62 ... Lower cup 100 ... Anti-insecticide coating and development processing system 62a ... Peripheral wall G ... Substrate (LCD) (liquid crystal display) 62b ... Base plate (please (Please read the notes on the back before filling this page) This paper size applies to China National Standard (CNS) A4 (210X297 mm) 28

Claims (1)

6. Patent application scope h A liquid processing device, which performs a predetermined liquid processing on a substrate, includes: a holding mechanism for holding a substrate; a processing liquid supply mechanism for supplying a predetermined processing liquid to the aforementioned substrate; The rotating mechanism rotates the holding mechanism and the substrate in-plane together; and the buffer chamber retains airflow and / or radon generated by the rotation of the substrate, and prevents the airflow and / or mist from being hoisted and Diffusion toward the aforementioned substrate. 2. A liquid processing device for performing a predetermined liquid processing on a substrate, including: a holding mechanism for holding the substrate; a processing liquid supply mechanism for supplying a predetermined processing liquid to the substrate; a rotation mechanism, the system The holding mechanism is rotated in-plane with the substrate; the processing cup is composed of an upper cup that can be raised and lowered and a fixed lower cup that is arranged around the periphery of the substrate; and the buffer is formed in the processing cup just described so that The airflow and / or mist generated due to the rotation of the substrate is retained, and the hoisting and diffusion of the airflow and / or service air to the substrate is prevented. 3β The liquid processing device according to item 2 of the scope of patent application, wherein: the buffer chamber is horizontally arranged on the inner peripheral wall and the outer periphery of the upper cup 529102 The scope of patent application is printed by the wall of the Intellectual Property Bureau of the Ministry of Economic Affairs, the consumer cooperative, and the top plate of the inner and outer peripheral walls, and the outer and bottom walls of the lower cup. The liquid treatment device of the second patent claim declares that, when the upper cup is stationary at the rising limit position, the outer peripheral wall of the upper cup and the outer peripheral wall of the lower cup are sealed, and the upper cup is in When it is lower than the rising limit position, a gap is generated between the outer peripheral wall of the cup and the outer peripheral wall of the lower cup. The liquid treatment device claiming the scope of the patent No. 2, 3 or 4, wherein:-a buffer chamber guide member is provided on the inner peripheral wall of the upper cup, and C is used to control the air flow rising from the inner peripheral wall of the upper cup and / or The mist is introduced into the buffer chamber. 6. The liquid processing device according to item 5 of the scope of patent application, wherein: a protective wall is provided on the upper part of the buffer member to the guide member to prevent the airflow and / or mist rising along the guide member of the buffer chamber from scattering. 7. The liquid processing device according to item 5 of the scope of the patent application, wherein: a vent is formed on the inner peripheral wall of the upper cup, which is used to direct the airflow and / domain air conduction of ± liters along the guide member of the buffer chamber. The aforementioned buffer room. 8. If the scope of patent application is the first! Or the liquid processing device according to item 2, wherein: a drain port is formed on the buffer to the bottom surface to discharge the airflow and / or mist introduced into the buffer chamber to the outside. 9‘If the liquid treatment device of the second item of the scope of patent application, wherein: a plurality of fins are provided on the inner peripheral wall of the upper cup, which is used for borrowing (please read the precautions on the back before filling this page) 30 529102 The airflow and / or mist generated by the driving of the rotating mechanism is introduced below the processing cup. 10 * If the liquid processing device in the scope of application for item i or 2 includes an umbrella-shaped partition wall, it is arranged below the holding mechanism, and a plurality of window portions are formed on the partition wall. A wing is provided on the board, so that the airflow and / or mist generated by the driving of the rotating mechanism is introduced into the window portion. 1. A liquid processing apparatus for performing a predetermined liquid processing on a substrate, comprising: a holding mechanism for holding the substrate; a processing liquid supply mechanism for supplying a predetermined processing liquid to the substrate; a rotation mechanism for The retaining mechanism and the substrate rotate the umbrella-shaped partition wall together in the plane, which is arranged below the holding mechanism and forms a plurality of window portions; and the fins are arranged on the partition wall plate, and are used for rotating the The airflow and / or mist generated by the driving of the mechanism is introduced into the aforementioned window portion. 1) A liquid processing device for performing a predetermined liquid processing on a substrate, comprising: a holding mechanism for holding the substrate; a processing liquid supply mechanism for supplying a predetermined processing liquid to the substrate; a rotation mechanism for The aforesaid holding mechanism rotates in-plane with the aforesaid substrate; this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling this page) • 0 Order! Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 31 529102 6. Scope of patent application Umbrella-shaped partition wall printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is arranged below the aforementioned holding mechanism and forms a plurality of window portions; the first wing piece is not placed on the aforementioned partition wall The upper part causes the airflow and / or mist generated by the driving of the rotating mechanism to be introduced into the window portion; the processing cup is composed of a movable upper cup and a fixed lower cup arranged around the periphery of the substrate; The 2 wings are arranged on the inner peripheral wall of the upper cup, so that the airflow and / or mist generated by the driving of the rotating mechanism is introduced below the processing cup. 13. The liquid processing device according to item 12 of the scope of patent application, wherein the second fin is provided at a position corresponding to a position where the window is formed. 14. The liquid processing device according to item 12 of the patent application scope, wherein: the second wing is provided at a certain interval with a number greater than the number of formations of the window portion. 15. The liquid processing device according to claim 12, 13, or 14, wherein: a discharge port is formed on the bottom surface below the aforementioned window portion for discharging the airflow and / or mist passing through the aforementioned window portion. For example, the liquid handling device of claim 12, 13, or 14, in which: Λ is provided with a sensor on the aforementioned partition wall to check the holding state of the aforementioned substrate in the aforementioned holding mechanism. (Please read the notes on the back before filling this page) I I