TW495835B - Peripheral exposure device - Google Patents

Abstract

The subject of the present invention is to improve the efficiency of a peripheral exposure device. Light source units 14A and 14B are movable in ±X direction in the diagram along a support member 12. While a beam is emitted from the light source units 14A and 14B, the support member 12 is traveled in ±Y direction in the diagram, so that a photoresist in the periphery of a glass board G is exposed. A distance between the light source units 14A and 14B is controlled to be a specified value or more. Masks 16A and 16B are driven in the ±X direction in the diagram, and when there is a part in an area subject to the peripheral exposure that requires no irradiation, the masks 16A and 16B cover the glass board G partly to shield the light.

Description

495835 V. Description of the invention (1) " " --- The present invention relates to a peripheral exposure device, especially a suitable peripheral exposure device, which can be applied to the production of LCD (liquid crystal display device), pDp (plasma display panel) ） In the process of special glass breaking plate, the photoresist ^ coated on the periphery of the substrate outside the circuit pattern area to be exposed is exposed to light. 上 ～ Known technology: Projection in the lithograph system The exposure is projected to the area set in the process of the substrate, that is, the non-pattern area is irradiated with the remaining agent. It also remains thick on the substrate when the photoresist is applied. Generally, the remaining photoresist is easy to peel off. The guide of the positive film (grain) is exposed to the outside. Even if it is not processed, if it is in the order of the plate, the part of the coated surface formed by the mask will be seen in the lithographic action. On the tincture, the film thickness of the spin-coated # & This kind of production effect occurs at # & residual light crystal display surface, and in this process the light device. Photoresist on top Exposure pattern Non-pattern area Light. This is 5 positives. In particular, the "peripheral" substrate agent has a piece of anti-scattering agent in the form of an image. The substrate is peeled off. The periphery of the substrate is a program of lithography. The pattern of projection optics is thoughtfully contained by the projection optics. On this substrate, with the pattern area above and in the unexposed brushing procedure, the positive-type anti-exposure portion that must be coated on the above-mentioned plate will be more than the degree of spin coating on the substrate. The central part of the substrate also has a pattern area. That is, the thicker the film thickness, the more it peels off during the production process, and the main reason for the liquid crystal display surface to fall due to the broken particle system. This ^ substrate is implemented with a post-resistor such as cvc, which is formed in the pattern area. 5. The thickness of the film of the invention description (2) will also be non-uniform due to the jh 6η. Λα line to make it feel; Photoresist irradiates the photoresist. There are already various kinds of anti- # traces like-= 2 needed to illuminate the light on the substrate: the light is collected to sweep. In this description, the light is irradiated on the plate 2 = 2 1 is proposed. The following is the side exposure device. " h The device of the game pattern area on the soil plate is called "Zhou began to use a short reading pattern to refine the formation on the substrate. 5 The photosensitive wavelength band of the projection exposure device is also: i Ur coated on the substrate The photoresist device π is used for peripheral exposure to provide Shengyan; the corresponding peripheral exposure of the agent is to attack the light source, for the reason, when giving a mild lamp, ultra-high dust mercury lamp, etc. The light source requires only a short exposure Day ;; :: Agent: 0 Temple 'If you use a large amount of concentrated light to scan the speed of sound' :. That is, 'can improve the light source emission-shot in the non-pattern area, the wrong, in a short time Inside the light shines A = 5 :: 2 ί: It is well-known that in order to illuminate the spotlight on the substrate, the right side is exposed to the front, you must use an optical fiber to light out. Look at the flower-shaped bureau buckle on the periphery of the optical fiber ^ 致 先 You first source radiation is fixed in advance, so the light source; extension = ^ fiber; = mercury lamp and other light source substrates are exposed first, and then you can

495835 I V. Description of the invention (3) I want to solve the invention However, at that time, there was a need for I on the substrate because of the use of the fiber \ because it is the main consumption | short, on the fiber, is South efficiency, will be g * | into the fiber. In this case, it is possible to increase the quality of the optical fiber. In addition, it is possible (solarizatio) In addition, the shape of the rectangular "field" around the board is complicated. The irradiation position is temporarily interrupted and operated. In the light problem: the problems described below are required to improve the production efficiency of the peripheral exposure device described above. In other words, in order to improve the effect seat, as much light as possible is introduced on the photosensitive surface, and it cannot be ignored. Consumption caused. If it is due to the relationship between the filling rate of the optical fiber, then the attenuation phenomenon of light traveling in the optical domain k is the main reason. In particular, as the absorption of the wavelength of the light used increases, the consumption also increases. Therefore In order to increase the amount of light from the light source, the high-priced quartz glass will be used to repeatedly move the tip of the optical fiber, which will also cause the transmission of the amount of light. In terms of optical fiber degradation, the optical fiber is damaged or reversed. Η )and many more. The peripheral exposure patterns formed on the substrate are not only around the base pattern, but also patterns such as "r", "mesh," in Chinese characters, or patterns formed by combining the above shapes. The necessity for such a complicated pattern is also the cause of the inefficiency of the optical device. Some parts of the area where the peripheral exposure is performed will be left with alignment; another number bucket. The data about this part at the time of the final exposure. Therefore, in the process of peripheral exposure, in order to align the marks and identification numbers that will be exposed, etc., it is necessary to control the stop and start of the light emitting part in the scanning process.邛 彳 T stop motion, because acceleration and deceleration require I 4 495835 V. Description of the invention (4) It takes some time, so the peripheral exposure device may be inefficient. An object of the present invention is to improve the efficiency of a peripheral exposure device. Means for solving the problem: The present invention is a single illumination area of a peripheral light-collecting optical system and a non-exposure pattern of a non-exposed illumination unit, which supports a plurality of illumination substrates and a support unit to move along a first movement; a second drive The driving unit drives the lighting unit (the direction along the X axis in FIG. 1), and drives a plurality of lighting units for the above purpose. Drive control Guo will be more than a predetermined distance range. The drive control unit can make the remaining lighting units (such as 14A in FIG. 1) when making part of the lighting unit sample area. The present invention is also an illumination pattern area and non-exposure pattern of the surrounding and collecting optical system. The exposure and light device has a plurality of pattern areas containing light sources and elements, and a photosensitive substrate has an exposure pattern area on the photosensitive substrate. The non-pattern area of the photosensitive substrate is exposed by light, and includes: a support unit, which can illuminate the unit; a first drive A driving unit, which can drive a sense direction (direction along the Y axis in FIG. 1) relative to each of the lighting units that can be positioned at a substantially central element in a second direction different from the first direction; and a drive control unit, which controls the second The units do not interfere with each other. In this way, the distance between adjacent lighting units is controlled. Non-photographed units (such as 14B in FIG. 1) that expose light from a plurality of lighting units (such as 1 4 A in FIG. 1) on a photosensitive substrate are not used. Will interfere with the above elements.

The side exposure device has a plurality of non-pattern areas containing a light source unit, and a photosensitive substrate has a non-pattern area of an exposure pattern. The non-pattern area of the photosensitive substrate 2177-3574-P.ptd page 7 495835 V. Description of the invention (5)- The exposure by the light emitted by the lighting unit includes: a light amount detecting device that can detect the intensity of light emitted from each of the lighting units; and a movement speed measuring device that relatively moves the lighting unit and the photosensitive substrate to expose the light. When the non-pattern area on the substrate 5 is set, the relative movement speed of each light-sensitive substrate is set according to the lowest light intensity among the lighting units detected by the light quantity detecting device described above. The invention is also a peripheral exposure device, which has a plurality of illumination units containing a light source and a light collecting optical system. The photosensitive substrate has an exposure pattern / pattern area and a non-exposure pattern non-pattern area.

Exposure to the light emitted by the above-mentioned lighting unit includes: a beam size ς: device, which can independently change the beam size emitted by the plurality of lighting devices ^ = beam size. On the other hand, it is almost clear that the change of the unit can be perpendicular to the above. The above-mentioned plural rotation driving unit has a light source and a pattern. The pattern area has a distance between the rotation and straight intersects and a rotation lighting device with the rotations. Rotary drive, the light collection optical sample area of the present invention and the above-mentioned illumination rotation drive unit, the rotation axis rotates: As the photosensitive base rotation drive unit rotates the drive unit, the photosensitive substrate emitted by the axis rotation photosensitive unit is also a kind of peripheral system illumination. The light of the unit that exposes the pattern can be rotated around the photosensitive substrate, and the non-pattern rotation drive on the board can be photosensitive and it can be rotated around the photosensitive substrate, and the beam size is performed. In the side exposure device unit, the sense of the photosensitive substrate emitted from the non-patterned area '3 is sensed by the photosensitive substrate. Moreover, the arrangement of a plurality of use areas is performed simultaneously on the substrate. Photosensitive substrate of the feeling # ’each independently change] The action can be the same as the above: ¾’ has a plurality of ^ First, the substrate is exposed to light with and exposed to 5 sides of the photosensitive substrate, ^

2177-3574-P.ptd page 495835

V. Description of the invention Including: a light-shielding device is provided near a path of relative movement between a plurality of lighting units and a photosensitive substrate, and is used to prevent the light emitted by the light emitting portion from irradiating a portion of the photosensitive substrate that is not to be irradiated. | In this case, the above-mentioned light shielding device is arranged to be compatible with the photosensitive substrate

! For movement, the relative position between the lighting unit and the photosensitive substrate can be set as needed. 1 Detailed description of the best implementation mode: Fig. 1 is a plan view illustrating a schematic configuration of a peripheral exposure apparatus according to an embodiment of the present invention. FIG. 2 is a cross-sectional view showing what is seen from the direction π shown in FIG. 1. In Figure 1, the left-right direction on the paper surface is the X axis, the up and down 0 direction is the Υ axis, and the direction orthogonal to the paper surface is the Z axis. In the following description, the coordinate axes along these directions are referred to as the X direction, Z direction. In addition, the directions of increasing coordinate values are called positive X direction, positive γ direction j, and positive Z direction. In other figures, it is the same as that in Figure 1, and it is the same way.

Represents the coordinate axis. I-Main scanning direction driving mechanism-i

Four pillars 6A, I 6C and 6D are fixed to the four corners above the chassis 2. The guide 8A is fixed to the upper ends of the pillars 6A and 6C along the Y direction. The guide rail 8B is fixed to the upper ends of the pillars 6B and 61) along the Y direction. The support element 12 is fixed between the guides 8A and 8B along the Y direction. Inside the guide rails 8A and 8B, along the γ direction, there are built-in main scanning motors 30A, 30B (not shown in the figure), please refer to FIG. 7. ). By forward and reverse the main scanning motor 丨 ·

2177-3574-P.ptd Page 9

495835 V. Description of the invention (7) 30A and 30B can move the supporting element 12 in the ± γ direction (in the following misunderstanding, the ± Y direction in Fig. 1 is called the "main scanning direction"). -Second scanning direction driving mechanism- The two light source units 14A and 14B are supported by the support element 12 and are movable in the X direction. In addition, inside the support element 12, two screw conveying mechanisms (not shown) that are each driven by the secondary scanning motors 32A and 32B (not shown in Fig. I, see ~ Fig. 7) are rotationally built in the χ direction. ). By independently reversing these secondary scanning motors 32A & 32b independently, the source units 14A and 14B can be made independent in the ± χ direction (in the following. In the description, ± X in FIG. 1 The direction is called the "secondary scanning direction"). -Light-shielding unit- There are beams 9 ^ on the sides of the pillars 6A and 6C and the sides of the pillars 6B and 6D, respectively: 9B is fixed to it along the Y direction. A light shielding unit 11A 'is fixed to the beam 9A, and a light shielding unit is fixed to the beam 9B. The structure of the light shielding unit 1 1 A will be described below. The light shielding unit 11a includes a base 10A / moving element 13A and a cover 16A. The moving element UA can be moved by a pneumatic actuator (not shown) in the ± X direction relative to the base 10 A. With the above-mentioned structure, the pneumatic actuator drives the mask 16A in the secondary scanning direction, and the state where the light beams emitted from the light source units 14a and i4g are guided to the exposure target can be switched to the mask state. The light shielding unit UB has the same structure as the light shielding unit 7G11 A. The pneumatic actuator drives the mask 16B in the secondary scanning direction, and can switch the state where the light beams emitted from the light source units 14A and 14B to the exposed object are switched to the mask state. The case where the above-mentioned light shielding units are respectively fixed to the beams 9 A and 9 b will be described below.

Page 10 495835

condition. The number of bits set by the cover early is to pray about this choice, the number of brothers 7 and the number of members, and the number is not limited to the situation of the present embodiment, and can be arbitrarily determined. Bu 11 A. 1 1 R X ^ ^ m ^ Xi 1, the plurality of shading units 11A, 11B are not only fixed to the beam 971 '9β ^. The light-shielding units m and 11B can be moved, and the moss :::: is moved along the beam 9-4 to 9 in a wide setting in the peripheral exposure area on the formula mask substrate G '~ according to any part of X Jia. In addition, the movement speeds of the shading units m and UB 14A and i4B should be faster than that of 5; 5 sources: masking at several locations. In the following, the source of this early morning is also exposed to the surrounding area, so that the shading unit U4,] Tian, and ^ ^ t "β stands by at the place where the mask is to be initially masked. Retrospective-He also, after Yu Yuanzao 14A, 14B, make the cover, 1-6 :, 16B back, and then move the shading unit ⑴, 11β, exceeding the light source early element A, 14B. Then, stop it For the part to be masked, use mask 1 + 6A ″ 6B to cover the next part to be masked in the exposure area PA. On the standby day ^ ', one light source can be used for masking at multiple locations. In addition, when the light source early elements 1 4A, 1 4B reach the light shielding units 11 a, 11 B, the light shielding units 1 1 A, 11 B start to move the light source units 1 4 A, 1 4 B at a constant speed, and then the light shielding units 11A, 11 1ΐβ stops the operation at a predetermined position, thereby making it possible to perform a wider mask than the masking width regions of the masks 16A and 16β. In addition, an example in which the masks 16 A and 16 B are driven by a pneumatic actuator will be described below, and a motor with a controllable position may be thrown. -Light amount sensor-The light amount sensor 48 is a sensor for measuring the light amount of the light beams emitted from the light source units 14A, 14B. With such a light amount sensor 48, before the peripheral exposure process is performed, the emission surfaces of the light source units 4A and 1 4B can be sequentially measured.

Page 11 2177-3574-P.ptd V. Description of the invention (9) Two beams of light. In addition, in the light source units 1 4 A, 1 4 B, 弁 蠄 and 隹 are irradiated: a device such as a lenticular lens can be installed to monitor the half lens: Α 14Α, ίΒ ί 说明 Describes the amount of light sensor The reason for measuring the amount of light emitted by the chirped light beam i4B from the light source unit i4B. ; ^ A flat support-support _ t 2 flats on which the glass substrate e, which is the object of exposure, is placed ▽ ▽ is supported by a flat support holding part 5 fixed to the chassis 2 and surrounded by a The Z axis rotates. A plurality of this is provided on the plate holder 4 = (4a ° The height of the plurality of protrusions 4a is almost the same. In addition, 5 is on the ^ protrusion 4a, opened through a pipe not shown in the figure and a negative pressure source = The glass substrate G, which is the object of exposure, is placed on the plate holder 4 and then adsorbed and fixed. The example shown in Fig. 4 is set = 8 "protrusions 4a. The number and position of the substrate G will be determined based on the new and old degree, size, and extent of the substrate g. The number and position of the substrate G will not be adversely affected. -Light source unit «Fig. 3 schematically illustrates the interior of the light source unit 1 4A '1 4B Structure, the section shown includes the optical axis of the light source units 14A, 14B extending along the parallel Z-axis direction. In addition, the light source units 14A, 14B have the same structure, so in FIG. 3, the light source units 14B The constituent elements are enclosed with brackets, and only the structure of the light source unit 1 4 A is explained. Inside the light source unit 1 4 A, the ultra-high pressure water lamp 40 A is fixed inside the reflector 62A. It is fixed below the reflector 62A There is an intermediate lens 66A and a projection lens 6 5 A. 4 Ο A pressure mercury lamp emitted light beam reflected by the mirror

2177-3574-P.ptd Page 12 495835 V. Description of the invention (62) After collecting 62A, it is introduced into the photosensitive surface of the glass substrate G through the intermediate lens 66A 'projection lens 65A, that is, the side where the photoresist is applied: by the shutter The shutter 63A, which is driven along the XY plane, can switch the state where the light emitted from the ultra-high pressure mercury lamp 40A is guided to the incident surface of the intermediate lens 66A to the mask state. Generally, it takes tens of minutes to prepare for the light from the start of the lamp to stabilize the light emitted by the ultra-high pressure mercury lamp. Therefore, after the peripheral exposure device starts to work, if it is necessary to temporarily stop the light from the super-south pressure mercury lamp 40A, when the ultra-high pressure mercury lamp 40a is turned off, it is necessary to use a shutter 6 3A to block light. The shutter 64A driven by the shutter actuator 36A not only adjusts the light beam irradiated on the glass substrate G to a rectangular shape 3, but also has a function of adjusting the amplitude (size) of the light beam in the secondary scanning direction. The shutter 64A is disposed between the exit surface of the projection lens 65A and the photoresist coating surface on the glass substrate G, and is as close as possible to the photoresist coating surface. Regarding the projection lens 65A, the shielding window 64A may also be disposed at a position that interacts with the photoresist coating surface (position indicated by the symbol c in FIG. 3 \-loader-the loader will be described below with reference to FIGS. 4 and 5). 70. It can be built in the peripheral exposure device or not in the peripheral exposure device. It is assumed here that it is set outside (near) the peripheral exposure device. In addition, 'In Figure 4 and Figure In the figure 5, only the chassis 2 of the peripheral exposure device and the tablet support 4 and the tablet support 5 are shown. The other components are omitted in the illustration. „„ Loading 70 is used for peripheral exposure devices and • Other equipment such as paint: glass: V exposure / equipment, etc. • • Soil plate G, which is the object of exposure, is provided with a calibration on the base 75 provided on the floor, etc.

2 ^ 7-3574.p.ptd 苐 page 13 495835 V. Description of the invention (11) Robot arm 72. The robot arm 72 has the degrees of freedom of being movable in the direction of the XY plane, moving in the ± redundant direction, and being rotatable about the z-axis. A door self-propelled carrier 73 is fixed to the tip of the robot arm 72. The glass substrate G is transported while being supported by the wrist portion 7 3 a of the transport frame 3. Next, referring to Figs. 4 and 5, the operation of the loader 70 when the glass substrate g is placed on the plate holder 4 will be described below. As described above, the flat plate holder 4 is provided with a plurality of protrusions 4a. When the robot arm 72 and the base plate G of the loader 70 do not collide with the protrusions 4a, they are transported by supporting the glass substrate g with the wrist portion 73a only in the space above the protrusions 4a. Furthermore, as soon as the glass substrate G reaches a predetermined position on the flat plate holder 4, the loader 70 is moved 2 in the direction of the injury z, and the glass substrate G is lowered. In this process, the glass substrate 6 is in contact with the plurality of dogs 4a, and then the glass substrate G is moved in the negative ¥ direction by the vacuum arm W arm 72; = side action. The control circuit that starts the peripheral exposure device-Figure 6 is a block diagram illustrating the rough structure of the lightning suppression circuit, which is used to make the upper, f, and Jiaji two electric circuits. This control circuit is Responsible for controlling the above-mentioned peripheral exposure device is responsible for the integrated control of the operation of the peripheral exposure device = in control.戸 100 has main scanning mana and 30B, = J control unit ⑽ connected to actuators 34A and 34B, window actuators _ and ^ operation and chat, shutters 40A and 40B. On the control unit 100, a stack of ultra-high pressure mercury lamp valves 46A, 46B, and 50, a light sensor, and a magnetic sensor are used to switch the magnetic direction. A computer host is connected to the control unit 100. 52. In addition, the 0 ° control circuit of the machine contains peripheral exposures 495835. V. Description of the invention (12) Optical devices are each assembled on a plurality of devices. The host computer 2000 is used to communicate with the control circuit to integrate and control the entire manufacturing. program. The control unit 100 places the glass substrate G as the object of exposure on a flat plate holder, and then exposes the manufacturing process of the above-mentioned glass substrate G. The control parameters (formulations) are given to the agent on the surface of the glass substrate G from the host computer. Input 2 0 0, and then start controlling the exposure operation as described later. —The operation of the peripheral exposure device— ^ The operation of the peripheral exposure device with the above structure will be shown in FIGS. I to 6 " Er. Ming. In addition, in the following operation description, it will take some time for the ultra-high-pressure mercury lamps 40A and jOB to turn into a stable state after being turned on, and the peripheral exposure operation can be performed only in a sad state. When the recipe is taken from the host computer, the control unit 100 starts to control the action of peripheral exposure. "First, 谠 谠 is exposed around the glass substrate with a rectangular shape. The glass substrate G is placed on the plate holder 4 after 5 control σ 卩 〇 00 controls the magnetic field 4, h Μ π β i Υ. The magnetic direction τ knife change valve 50, so that the holes opened in the plurality of protrusions 4a and the fishnet, not shown, negative, negative / original k pass of w, N rx, ^ τ. Hunting Therefore, the glass substrate G is adsorbed and fixed on the plate holder 4 to 32f, and the main control motors 30A, 30β, and the first scanning number of the secondary scanning light number are controlled by the two-degree rotation. The input from each light source unit is matched with a small amount of light and from the host computer 2000 ^ ^ ^ ^ 14A " 14B ^-When performing peripheral exposure at the requested moving speed, the maximum light is 495835

The control unit 100 controls the shutter actuators 3 and 34B to close the shutter 63A and make the light beams from the light source units i4A and i4B appear incapable of being emitted. Control by the controller 邰 1 0 〇 control the main scanning motors 3 0 A, 3 0 B and secondary-lag "motors 32A, 32B 'drive the light source units 14A, i4B along the main scanning direction j to f the secondary scanning direction and position. That is, the i-beam emission position of the light source units ΐ4A and i4B and peripheral exposure start The positions are the same. Next, the control unit 100 controls the shutter actuators 36A and 36B according to the recipe input by the host computer 2000, and adjusts the light beam emitted by the light source unit, 1 4 B according to the width of the non-pattern area. Width. Of course, the right side burns in the alignment mark or identification number on the glass substrate G. You must avoid it and pay a strict umbrella 丄 + | to give priority to this position. In this case , The formula input from the host computer t〇o contains lean material showing the parts that do not need peripheral exposure. Based on this information, the control unit 100 controls the electromagnetic directional switching valves _ 46A and 46B to drive the mask 16A along the negative side. χ direction, covering i6B along the positive χ square P shifting movement. Accordingly, the light shielding unit 11A, 11B is switched to the state shown in FIG} [_ mask 16A, 16B cover the upper part of the glass substrate G to the exposed areas. By

495835 V. Description of the invention (14) Therefore, the slave light source unit 14A,! The light beam emitted from 4B and set into the photoresist applied on the glass substrate G is partially shielded from light, and the portion of the substrate g that does not want to be exposed is shielded. A control unit 100 controls the shutter actuators 34A and 34β to activate the shutter 63A, and presents a state in which the light beam is emitted from the light source units 14A and 14B. The motors 30A and 3 () δ are mainly described so that The light source units 14A, 14B scan along the main Z = line. The light source units 14A and 148 scan the glass substrate C at a nearly constant speed in a large state under the support element, and the upper and lower sides of the light source unit = the periphery of the glass substrate G (two sides along the Y direction in FIG. 1). At 2:00, due to the use of the light-shielding units 11A and UB, the light-shielding part is made of 士 and i. In this way, the peripheral exposure device of the present invention can scan at a nearly constant speed during the scanning stop period in the light source unit 14A and the conventional camera even if there is a portion that is not intended to be exposed. The single γ ί is to temporarily stop the light source at the apex of the part that you do not want to expose, and temporarily close the shutter 63Α, 63Β, then restart the scan, and temporarily stop scanning again at the end, # 着 再 ί and then ~ scanning. Compared with the conventional method, the efficiency of the optical device described above. The inside of the door-into the surrounding exposure, Asia's "peripheral exposure." ^ ^ As described, as the two opposite sides of the glass substrate G explode around the $ 丄 λ department actuators 34A, 3 Qing Zhizhi first beam from the light source units 14A, 14B Shooting. Rounding section :: Controls the stroke actuator 52 to rotate the flat support 4 '" 疋 rotation axis 90 degrees. At the same time, according to the slave computer host

495835 V. Description of the invention (15) 200 input recipes, the control part 100 controls the secondary scanning motor, 3? Window shutter actuators 36A, 36B to change the light source distance of the light source Qin Yuan i4A, UB and change the size of the beam at the same time . In this way, # by rotating sheep cedar "Main two 4, change the distance between the optical axes of the light source units 14A, 14B and change the size of the light" beam y at the same time, can improve the efficiency of the peripheral exposure device. In addition, support in the rotating sub-i At the same time, you can only change the distance between the light source units, ια, or only the beam size u — 'As described above, the tablet holder 4 is continuously rotated, and the light sources 14A and 14B are changed. The distance between the axes and the beam size are changed. The control unit ^ can control the main scanning motors 30A and 30B to move the beam emitting portions of the light source units 14A and 14β to the starting position of the next peripheral exposure. Then, the input from the host computer 200 is The formula is based on that if it is judged that the next peripheral exposure range contains the area that needs to be shielded, the control 刼 〇〇〇 will maintain the coverage of 16 A, 16B covering the exposed area PA on the glass substrate G-part of the state 'conversely, If it is determined that there is no area that needs to be shielded, the control unit 〇〇 controls the electromagnetic directional switching valves 46A and 46B to withdraw the masks 16A and 16B from the peripheral exposure range on the glass substrate G. Then, the 'control unit 1 〇 The shutter actuators 3 4 a and 34B are controlled to activate the shutters 63A and 63B. After the light beams are emitted from the light source unit HA ′ 14B, the main scanning motors 3〇A and 30β are controlled so that the light source is early 4 A , 1 4 B scans along the main scanning direction. By the control action performed by the control unit 100, the "peripheral" -shaped peripheral exposure around the glass substrate G is completed. If the pattern of peripheral exposure is "mesh", "Japanese" or "field", or a shape formed by compound or more, the control unit 100 repeatedly performs the above-mentioned peripheral exposure operation.

2177-3574-P.ptd Page 18 495835 V. Description of the invention (16) The pattern of the peripheral exposure at 2:22 f is an even number, and the control department will send the images broadcasted by both the 14A and i4B at the same time. For an odd number, for example, "day", $ = exposed = patterns will use any of the light source units 14A, "B", and the control section 100 controls the secondary scanning motors 32α, 32β. This At that time,-that is, not yet: the control of the ΐ 100 部 100 'the remaining one light source unit, that is, 2: 2: the light source of Zhou Xun's exposure action Qin Yuan will not work with the light source units when moving. In the above The number of implementation examples is two examples, where two light source units are set. In fact, the number of light source units is like: 3 or more. In this case, the light of the pattern of 5 peripheral exposures: ": the number of yuan allocated After 'remaining pattern can be used-part = early original exposure. Then, the light source unit that is operated by the π light does not interfere with the light source unit that is operating when being moved by the control unit 100. Nine & Here, two examples of performing "" mesh "-shaped exposures and one example of" daily-one-shaped exposures "in the embodiment of the peripheral exposure device of the present invention will be described with reference to FIG. 7 (a). ) In the example shown, the two patterns in the "mesh" glyph pattern have a wide gap. The example shown in Fig. 7 (b) is the control section when performing peripheral exposure of the pattern shown in Fig. 7 (Technology) 丨〇〇 progress. As shown in step _ in Fig. 7, the two feeds are drawn along the basis of the long and first two drawing ㈣, the unit 14 is exposed, and then the plate is supported; 4 turns ° 鰊:, degrees. During the rotation of the plate holder 4, the light source units 14A, 14B are moved in the secondary scanning direction to adjust the interval. Then, as shown in step B, two

I made 0 > the scan of the light source diagram because of the number of light exposures, and the number of light lines in the motion state of the central exposure sample tool shown in the steps. Received light i degree ° Scanning This 8 ^ > 'right peripheral warming unit m, UB is square, and the control unit 100 will make both Λ Μ β perform at the same time as an odd number, such as Γ ρ ^ right peripheral exposure

I used a pattern / pre-shaped pattern, and I left the last one to ensure I will use the first source of early yuan 1 4A, 1 4B, and the tower-I = 'control section 1 00 to control the secondary scanning motor 32A , 3'2b. This ^ temple wood, enter = the control of the house control unit 100, the remaining light = the light source for the side exposure action, Qin Yuan will not move when he moves. · ^ According to # ,, take and leave-After allocating the number of patterns exposed to the surroundings of 〇U 况 广 ', the number of ^ source early exposures is allocated, and the remaining patterns can be exposed using one source sheet. Then, under the control of the control unit 100, the light source unit that operates in three lights does not interfere with the light source unit that performs peripheral chirp when moving. ° An embodiment of the peripheral exposure device of the present invention will be described with reference to FIG. 7. Two examples of performing “mesh” -shaped exposure and one example of light entering. In the example shown in Figure 7 (a), the two figures in the "mesh" glyph pattern have a wide interval. The example shown in Figure 7 (b) is when the peripheral exposure of the figure in Figure 7 (a) is performed. Step of exposure control performed by the time control unit 100) As shown in step A of FIG. 7 (b), the two patterns along the long side of the substrate G are exposed by the source units 14A and 14B, and then the tablet holder 4 is rotated 9 〇 " During the rotation of the plate holder 4, the light source units 1 4A, 4B are moved in the secondary direction to adjust the interval. Then, as shown in step B, the two along 495835 V. Description of the invention (17) ----

The pattern on the short side of the substrate G is exposed. At this time, the relative movement directions between the light source units ΐ4A, ΐ4β and the glass substrate G are opposite to the direction of the relative movement in the step. After the exposure action in step B is completed, the light source units 1 4A, 4B are driven to move in the secondary scanning direction at reduced intervals. Then, as shown in step C, the direction of the relative movement in the opposite direction of the line N and the second line β and the relative movement of the substrate G and the relative movement of the substrate G are performed to expose the remaining two patterns. In the example shown in Fig. 7 (c), the two patterns in the "mesh" glyph pattern have a narrower interval. The example shown in Fig. 7 (d) is that when the pattern shown in Fig. 7 (c) is performed Exposure control steps performed by the control unit 100 during peripheral exposure. The "narrower" here means that even when the light source units UA, 14β are closest to each other due to the size limitation of the light source unit, yA, 14B, etc., the interval between the patterns is longer than each light emitted from each light source unit. Be narrow in height.

I ◊ As shown in step p of = 7 (d), the two patterns along the long side of the substrate are exposed to the light source units UA, ι4B, and then the plate holder 4 is rotated by 90 degrees. During the rotation of the plate holder 4, the light source units 14A, 14β are moved in the secondary scanning direction to adjust the interval. Then, as shown in step 0, among the four patterns parallel to the extension direction of the short side of the substrate G, the leftmost pattern and the number of left edges are exposed to the third pattern. At this time, the relative movement direction between the light source units 14A, 14B. And the glass substrates G is a direction opposite to the relative movement direction in step ρ. After the exposure operation in step Q is completed, the light source unit A ^ 4B is driven to move in the secondary scanning direction. Then, as shown in step r, the light source units 1 4 A, 1 4 B are driven along the direction of relative movement in step q

2177-3574-P.ptd Page 20 Nine, Description of the invention (⑻ Opposite direction is known 纟 r ★ light. • One pair of soil plates is moved to expose the remaining two patterns. In the pattern shown, the exposure mode is humiliating & the inside and the inside are opposite. In the example shown in Figure 7 (b), when moving in the direction of 2 and the outside, the control unit i00 / stays a light source along the source unit of the two inflammation units. Centering distance :: In the case of a built-in light source unit of 1U, = a fixed distance of 2 is used in this case, when a light source unit is operated, another ~ 彳 (2 ...... Ί "comes within, within ..." When a certain light source unit goes forward π πη 合 你 ”丄 _ ^ ^ ^ a,% two owed ^ *" ~ 丨 month child Γ 1 especially knife 7 Γ — is prepared. The above-mentioned way to move the light source unit Neighbors, and neighbors interfere with each other. In addition, even if there is Capricorn on the exposed pattern, it can be exposed%. Especially in this embodiment of the week ^ Nushou: using light sources and light collection optics System integrated light source list: 成型 exposure first: ΛΛ, and the size of the light collection optical system, so it is more convenient, the exposure under the circumstances of the order In the example shown in Fig. 7 (e), the exposure pattern has: the height limit of the beam emitted by the element. However, due to the above owing: two, even if there is a narrow interval in the 隹 pattern, it is:% of 愔, ΠΓ 治 t ^ 丄 * 只, A 2 _ during the rotation of the holder 4, the light source units 14A, 1 4B along the secondary rotation. Food pattern, the example shown in Figure 7 (f) is shown in Figure 7 ( e) Exposure control steps performed by the controller 100 during the wide-side exposure. As shown in ^ _post = stain step X, two patterns along the long side of the substrate G receive light, ^ 7 (f), month Exposure of 1 4A, 1 4B, then make the plate holder 4 90 °, 、% 495835, 5. Description of the invention (19) ^ "-fight to adjust the interval. Then, as shown in step γ , Two patterns along the short side of the substrate G are exposed successively. At this time, the relative movement direction between the light source units 14A, 14B and the glass substrate G is the opposite direction to the relative movement direction in step χ. Complete step Υ After the exposure operation in the middle, only the light source unit ΐ4β is driven to move in the secondary scanning direction. Then, as shown in step Z, the light source unit 14A 14B is driven to move relative to the substrate G in a direction opposite to the direction of the relative movement in step γ to expose the remaining pattern. In addition, in step Z, the shutter 63A of the light source UA is closed. An example of using the light source unit 1 4B for the remaining pattern exposure. Of course, the light source unit 1 4A can also be used here. In addition, when repeatedly exposing the "Japanese" pattern or the pattern based on this, the interactive unit HA can be used. , 14B or alternately using two light sources at a fixed number of times, ', 14B. As explained above, the peripheral exposure device of the embodiment of the present invention can perform high-efficiency exposure on any exposure pattern. In particular, the light emitted by the ultra-high voltage lamps 40A and 40B can be used on the non-use light J substrate G, so it can prevent the optical fiber from filling the special low-light two sides: the first efficiency is 3. And 1, because there is no degradation of the optical fiber, etc., the reliability of the peripheral exposure device can be improved. In addition, by driving a plurality of light source units in the above manner, the degree of freedom of the peripheral exposure pattern can be increased. An example that was explained earlier is that in order to detect the light amount of the light source unit :: A ,, = the light amount of the emitted earth beam, a light amount sensor is installed on the chassis 2, and the light source unit is separated from the light source unit HA. , 14B built-in stripping

2177-3574-P.ptd Page 22 495835 V. Description of the invention (20). The number of light source units in the peripheral exposure device is not limited to two, but may be three or more. Not only the transmission screw mechanism described above, but also other actuators or mechanisms such as linear motors and belt transmission mechanisms can be used to drive the plurality of light source units to move in the main scanning direction and the secondary scanning direction. In addition, as explained below with reference to FIG. 8, the mechanism for driving the light source unit to move in the secondary scanning direction can also be used as a rotation mechanism to make two.

FIG. 8 shows another example of the driving mechanism of the secondary scanning direction of the light source unit in the peripheral exposure apparatus according to the embodiment of the present invention. FIG. 8 shows only a part of the peripheral exposure device, and other parts are the same as those of FIG. 1. In FIG. 8, the same constituent elements as those of the peripheral exposure device shown in FIG. I | are assigned the same symbols and their explanations are omitted. The light source unit 1 4A '1 4B is supported on the driving element 12 through a rotary arm 134B. On the axis of rotation of the rotating arm] · 34Α, Amp has a secondary scanning motor 1 3 2 A and an encoder 1 3 3 A. Similarly, a secondary scanning motor 132B and an encoder 133B are mounted on the rotation central axis of the rotary arm! 34β. These secondary scanning motors 132A and 1328 and the encoders 3A and 13 are connected to the control unit 100. In the case of 3 A error, the control section 100 controls the secondary scanning motors 132A and 132B to drive the arms 134A and 134B to swing. Light source unit 14A, 14β @ 定 于 旋

At the leading end of 4A and 134B, the light source units UA and Ηβ determine the position of the secondary scanning direction according to the angular position of the rotating arm # 1 q / l Λ MU. Rotation measurement. The angular positions of the two 134B are encoders 133A and 133B, respectively. The inspection unit 100 controls the secondary scanning motors U2A and 13 according to the angular position M input by the encoders 133A and ΐ33β to determine the light source setting unit.

外 5835 5. Description of the invention (21) " ^^ '" ------- 14A, the position of the secondary scanning direction. In addition, in the rest of the examples mentioned here, from 64A, 64B with the rotating arms ι34A, ΐ34β; the opening: the shape (the shape of the section of Guangdong) is relative to the main scan ί ': =. It Γ adjusts this inclination, so that the light source units 1 4 A, 1 _ rotator arms 1 3 4 A, 1 3 4 B can communicate with each other μ. Mountain ^ ^ One of the actuator 36A (36B); ^, the window 64A (64B) and the window can be made as an alternative, and the arms can also be turned on the two arms =: 13 ... each time the light source unit 14A replaces the above Rotating mechanism, in the case, will not be supported by parallel to: row, ministry. Here, the angular position of H ☆ in the secondary scanning direction of 14B, that is, the position of the light source units 14A, .pa ^ ^. ^ Y, is formed by the openings 64A, 64B: the angular position can be maintained for the primary scanning direction fixed. An example of moving in the drawing direction is to know J: the light source unit is driven along the main scan ^ {a) In addition, the substrate G can be driven to move in the main second direction: In addition, 'the light source and the substrate G can be driven by both sides = private The movement causes the plurality of light source units and the substrate G to move relatively. In this month's state, the shading units ΗA and 11 β shown in FIG. 1 may also have a structure that can be moved integrally with the flat support 4. Efficacy of the invention: As explained above, the present invention can realize the following effects. U) According to the inventions in claims 1 to 3 of the scope of application for patents, it can locate the position where the $ and Ming yuan are located at approximately the center of the photosensitive substrate. When driving each photo and early yuan to move in the second direction, these lighting units Does not interfere with each other / so / so these lighting units will not cause adverse situations such as conflict, but

Page 24 V. Description of the invention (22)-Rate: The side-exposure dress works smoothly and improves the effectiveness of the peripheral exposure device. The invention claimed in item 4 of the scope of patent application can detect the light intensity of the emission unit i ^ disk # t Γ unit, and when each lighting unit and the light are exposed to the non-pattern area on the non-sensing substrate according to the light 222 , The lowest light intensity in the lighting unit will be used to set the complex bill. Brother ^ Except for light 1, there is no clue that there is clutter, and there is still a sufficient amount of light for exposure at the handle. In addition, X and X are based on the amount of light of each lighting unit; 'Side to be < 碓 荇 碓 荇 virtual & 3) Broadcasting: Prevents inefficiency of peripheral exposure devices. (3) According to the change in item 5 of the scope of the patent application, the light beams emitted by a plurality of lighting devices χ ': each can independently expose a plurality of samples with different widths', two fine, two can simultaneously simultaneously . ‘’. I can mention the peripheral exposure (4) according to the scope of the patent application, the distance between the lighting units can be adjusted to 4 # 丝 扪 a 明, which changes a plurality of P] B 士, # ^ ', and Fang Zhuan drive unit rotation 7 7 = ¾ 氺 I it; if you enter it wrong, you can shorten the number of continuous ^ dynamic first substrate space: to improve the effect of peripheral exposure settings ^ time of light action) according to the 7th patent application The action of the size of the light beam emitted by the light emitting unit can be changed '' the plurality of moving photosensitive substrates are performed at the same time, and the time interval between the rotation driving operation of the rotation driving unit: heart = what is the number of exposures; I can expose the provocative Fangzhuo around the south edge.

2177-3574-P.ptd Page 25 丨 Fifth, the description of the invention (23) (6 \ According to the scope of the patent application ^ The invention between the solid light unit and the photosensitive substrate is opposite, and it is set in the multiple light-shielding emitting section and emitted Near the path where the light is irradiated, it is used to prevent the part. Therefore, if the part that is not intended to be irradiated on the warm and light substrate is exposed, the non-patterned area of the illuminated image may not be included. That is, in the peripheral exposure action, do not ㉟ = temporarily stop and scan. Also = to the exposure and make scanning in the second sentence, to avoid the shutter in some units that do not want to be exposed. In this way, since the ^ Ming unit is temporarily stopped and The act of starting the lighting unit (acceleration or reduction) It is not necessary to stop the rate during peripheral exposure. ^ The invention that can increase the peripheral exposure device (7) is installed in the lighting unit and according to the scope of the patent application. Perform the type and position of a peripheral exposure device, so that the peripheral exposure of the substrate can be thought of unexpectedly. The drawings briefly explain: the outline of the structure. The plan view 'explains the type of implementation of the present invention. Outline 5 of the peripheral exposure device is a plan view of the peripheral exposure device according to the embodiment of the present invention, and schematically shows an example of the structure of the light-emitting unit. In the 4VV implementation mode, the peripheral exposure device and other devices are referred to as "1 garment carrier ~ connected." The condition of the exposure object. Set the name of the child. The exposure object is placed on the peripheral exposure device via the loader.

2177-3574-P.ptd Modified Japanese double positive f 丄 月 said M # 89] Zhanka V. Description of the invention (24) Figure 6 is a block diagram, outline # L-the control circuit of the device. Peripheral exposure of the implementation type not shown in Fig. 7 (a) is the exposure pattern of the "mesh" shape. ° The two patterns in the sample have a wide interval

Fig. 7 (b) is the exposure control steps performed in Fig. Γ (V. The exposure mode of the control part when the peripheral exposure of the pattern not shown in a is: "The two patterns in the sub-pattern pattern have a narrow interval. Figure 7 (d) is the exposure control step performed in FIG. 7 (c). The exposure pattern of the “glyph pattern” of the control section at the time of peripheral exposure of y, 67 π. The exposure control step performed. At the time of peripheral exposure of the pattern The control unit in Figure 8 demonstrates the lighting unit as a symbol description: Other examples of the T-drawing mechanism. 2 Chassis 5 Flat plate support 9A, 9B Beam 1 2 Support elements 1 6A, 16B Mask 32A, 32B Secondary scanning motors 40A, 40B Ultra-high pressure mercury lamp 48 light quantity sensor 7 0 loader 2 0 0 computer host 2177-3574-pfl.ptc 4 tablet support 8A, 8B guide 1 1 A, 11B shading unit 14A, 14B light unit 30A, 30B main scanning Motors 36A, 36B actuate the shutter 46A, 46B electromagnetic directional switching valve 5 2 stroke actuator 1 0 0 control page 27

Claims (1)

Sixth, the scope of patent application " a ^ ------------- Department of the first system: = light; has a plurality of non-L pattern areas containing light sources and tender non-exposure patterns light pattern area and Β --^ b 7 The non-patterned area of the far-sensitive substrate is exposed with the light emitted by the above-mentioned illumination 70, and its features include the following: · = f ^… 'It can be moved * Supports multiple Illumination unit; the second movement is that it can drive the photosensitive substrate to move relative to each other. °°°° The first drive unit can position each illumination position and drive each Zhaoming 箪 亓, er μ ^ Ύ heart U ... , Yuezaowu moves in a second direction different from the first direction, and the drive control section controls the second drive section to cause the plurality of lighting units to interfere with each other. 2. For the peripheral exposure device according to item 1 of the scope of patent application, wherein the drive control unit controls the separation between the plurality of talents_Xiao Ming units above a predetermined distance range. 3. For example, the peripheral exposure device of the scope of application for a patent, wherein the drive control section can expose the non-patterned area of the photosensitive substrate to the light emitted by a part of the plurality of illumination units to expose the non-pattern area of the photosensitive substrate. The unit does not interfere with the lighting unit described above. More than eight ... 4. A peripheral exposure device with a plurality of illumination sheets containing a light source and a concentrator system = the photosensitive substrate has a pattern area with an exposure pattern and a non-pattern of the photosensitive substrate with a too-exposed pattern- Ming Qin Yuan's historical light exposure, _ 2177-3574-P.ptd page 28 495835 6. The scope of the patent application is characterized by including: a light amount detection device that can detect the light intensity emitted from each of the above lighting generations And a moving speed measuring device, which sets each of the lighting units and the photosensitive base f relative to expose a non-patterned area on the photosensitive substrate according to the lowest light intensity among the lighting units detected by the light detection device ... The relative moving speed of the moon unit and the photosensitive substrate ° and / 5 · A peripheral exposure device having a plurality of lighting units containing a light source and a light collecting optical system, the photosensitive substrate has a pattern area of an exposure pattern and a non-exposed pattern Pattern area 'The non-pattern area of the photosensitive substrate is exposed with the light emitted by the above-mentioned Zhaoming unit, ..., and is characterized by including: Ming F ί 5 Γ Xiao Chugeng', each of which independently changes the aforementioned plurality of illumination units The size of the emitted beam. Set, V; 曱 5 seek: Fan f item 1: The rotation of the photosensitive surface of the peripheral exposure device of item 2, 2, 3, 4 or 5 approximately perpendicularly intersects, and the distance between the light unit and the several lighting units of the sensor substrate varies with Touching = photosensitive substrate, and repeated changes can be made with the arrangement of non-patterned areas on the spinner spinner plate. '° • Know the rotation of the photosensitive substrate at the same time as half of the week of the scope of the patent application, # Η a f has a rotation drive section, which can be equipped with an exposure device, where the rotation axis of the father is rotated, where σ is sensitive The light beams emitted by the light-sensitive surface of the substrate are perpendicular to each other. The above-mentioned complex < Ma Zuoke and the above-mentioned rotation drive 2177-3574-P.ptd 29th member; 495835 6. Scope of application for patents The rotation of the photosensitive substrate is performed simultaneously. 8. A peripheral exposure device having a plurality of illumination generations including a light source and a light collecting optical system, and a photosensitive substrate has a pattern area of an exposure pattern and I. A non-pattern area of an unexposed pattern, a non-pattern of the photosensitive substrate The area is exposed by the light emitted by the light emitting part of the above-mentioned light source. I. It is characterized by comprising: a light-shielding device, which is arranged near a relatively 'moving path' between a plurality of lighting units and a photosensitive substrate, and is used for Prevent the light emitted from the light emitting part from irradiating the part on the I photosensitive substrate that is not intended to be irradiated. I 9. If the peripheral exposure device according to item 8 of the scope of patent application, wherein the above-mentioned light shielding device is set to be relatively movable with the photosensitive substrate, and the relative position between the lighting unit and the photosensitive substrate can be set according to needs . 2177-3574-P.ptd Page 30