JP4342663B2 - Peripheral exposure equipment - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a peripheral exposure apparatus, and in particular, in the process of manufacturing a glass plate or the like used for an LCD (Liquid Crystal Display) or PDP (Plasma Display Panel), a circuit pattern is exposed on a substrate coated with a photoresist. The present invention relates to a peripheral exposure apparatus suitable for use in irradiating light to a photoresist applied to a portion other than a region to be applied.
[0002]
[Prior art]
In a lithography process, which is a process for manufacturing a liquid crystal display panel or the like, a projection exposure apparatus in which a projection optical system is incorporated is used. The image of the pattern formed on the mask is projected onto the photoresist coating surface on the substrate by this projection optical system. On this substrate, a portion where a pattern is exposed by the above-described process, that is, a pattern region, and a region where the pattern is not exposed, that is, a non-pattern region are set. In the lithography process, it is necessary to irradiate the non-pattern area with light. This is because a positive resist is applied to the substrate. That is, the unexposed portion of the positive resist remains on the substrate after development. In particular, when a photoresist is applied on the substrate by spin coating, the film thickness is thicker at the peripheral portion than at the central portion of the substrate. In general, the peripheral portion of the substrate is a non-pattern region, and the photoresist remaining without being removed has a property that it is more easily peeled off as the film thickness increases. This positive resist may be peeled off during a subsequent processing step and scattered as fine particles (particles). This particle is a factor that reduces the yield of a substrate to be exposed, such as a liquid crystal display panel. Even if no peeling occurs, when a post-process such as CVD is applied to the substrate, if the photoresist remains on the periphery of the substrate, etc., the film thickness of the thin film formed in the pattern region will be non-uniform. There is also.
[0003]
Therefore, it is generally performed to irradiate the photoresist in the non-pattern region with light and to remove unnecessary resist in the subsequent development process. As described above, various apparatuses for irradiating the non-pattern area on the substrate by irradiating the non-pattern area on the substrate by scanning the spot light emitted from the light source have been proposed. Hereinafter, in this specification, an apparatus that irradiates light to a non-pattern area on a substrate is referred to as a “peripheral exposure apparatus”.
[0004]
As the pattern formed on the substrate becomes finer, projection exposure apparatuses having a shorter wavelength have been used. Accordingly, the photosensitive wavelength band of the photoresist applied to the substrate is also shifted to the single wavelength side. Therefore, the light source used in the peripheral exposure apparatus is a light source that emits single-wavelength light such as g-line or i-line.
[0005]
As a light source used in the peripheral exposure apparatus capable of handling the above-described photoresist, a high-luminance light source such as an ultra-high pressure mercury lamp is used for the purpose of improving production efficiency. The reason is that if a large amount of light source is used to give the same dose to the photoresist, the exposure time can be shortened. That is, it is possible to increase the speed at which the spot light emitted from the light source is scanned, so that the light irradiation to the non-pattern region can be completed within a short time.
[0006]
As described above, in order to irradiate a portion of the substrate to be exposed with the spot light, there is known one that guides the light emitted from the light source to the light emitting portion by the optical fiber. In a peripheral exposure apparatus using an optical fiber, a light source such as an ultra-high pressure mercury lamp is fixed, and the tip of the optical fiber extending from the light source, that is, the light emitting part is moved relative to the photosensitive surface of the substrate to be exposed. Thus, the substrate can be exposed with a desired exposure pattern.
[0007]
[Problems to be solved by the invention]
However, as the peripheral exposure apparatus is required to further improve production efficiency, the problems described below are becoming a problem. That is, in order to improve the throughput, it is necessary to guide as much light as possible to the photosensitive surface of the substrate, and the loss of light amount due to the use of the optical fiber cannot be ignored. This loss is caused by a loss that occurs due to the filling rate of the optical fiber, an attenuation that occurs when light travels through the optical fiber, and the like. In particular, as the light used becomes shorter, the absorption in the optical fiber increases and the loss also increases. For this reason, in order to improve the throughput, it is necessary to increase the light amount of the light source or to make the optical fiber made of expensive quartz glass. Further, there are cases where the optical fiber deteriorates and the light transmission loss increases as the tip of the optical fiber repeats moving. Examples of the deterioration of the optical fiber include a case where the optical fiber is broken or undergoes solarization.
[0008]
Also, the peripheral exposure pattern formed on the substrate is not only a rectangular pattern surrounding the periphery of the substrate, but also a so-called “day”, “eye”, “field” pattern, or these It tends to be complicated, such as a pattern of a shape combining the above. The necessity of forming such a complicated pattern also contributes to a decrease in the throughput of the peripheral exposure apparatus.
[0009]
Further, an alignment mark, a substrate identification number, or the like may be formed in a part of the region where the peripheral exposure is to be performed. If this part is exposed, important information is lost. For this reason, during the peripheral exposure operation, it is necessary to stop and start the operation of the light emitting unit during the scanning operation in order to temporarily interrupt the light irradiation in the exposed region portion such as the alignment mark and the identification number. There is. When the light emitting unit is stopped in this way, it takes time to accelerate and decelerate, so the throughput of the peripheral exposure apparatus may decrease.
[0010]
An object of the present invention is to improve the throughput of a peripheral exposure apparatus.
[0011]
[Means for Solving the Problems]
(1) Claim 1A peripheral exposure apparatus, in a peripheral exposure apparatus that forms an exposure pattern on a photosensitive substrate with light emitted from at least the first and second illumination units, a holding unit that movably holds the first and second illumination units. A first driving unit that relatively moves the photosensitive substrate and the holding unit in a first direction, and a second driving unit that is different from the first direction with respect to the holding unit. And a drive control unit that controls the drive of the first drive unit and the second drive unit, and the drive control unit includes at least four extending in the first direction. The interval between the two exposure patterns at the center of the four exposure patterns is determined to be narrower than the narrowest interval between the first illumination unit and the second illumination unit. To form four exposure patterns In addition, the positions of the first and second illumination units are the positions of the exposure pattern located at one end of the four exposure patterns and the position of one of the two exposure patterns in the central portion. The second drive unit is controlled so as to correspond to each other, and in the corresponding state, the first drive unit is controlled so as to relatively move the photosensitive substrate and the holding unit in the first direction. The position of the second illumination unit is made to correspond to the position of the other exposure pattern of the two exposure patterns in the center and the position of the exposure pattern positioned at the other end of the four exposure patterns, respectively. The second drive unit is controlled as described above, and the first drive unit is controlled so as to relatively move the photosensitive substrate and the holding unit in the first direction in this corresponding state.
(2) ClaimThe exposure method according to 11, wherein the first and second illumination units, the holding unit that holds the first and second illumination units movably, and the photosensitive substrate and the holding unit are relatively in the first direction. Peripheral exposure comprising: a first drive unit that moves to the holding unit; and a second drive unit that moves each of the first and second illumination units with respect to the holding unit along a second direction different from the first direction. In the exposure method of the apparatus, at least four exposure patterns extending in the first direction, and the interval between the two exposure patterns in the central portion of the four exposure patterns is the first illumination unit and the second exposure pattern. In order to form on the photosensitive substrate four exposure patterns that are defined to be narrower than the narrowest distance between the first illumination unit and the second illumination unit, the positions of the first illumination unit and the second illumination unit are four exposure patterns. Exposure located at one end of The second driving unit moves the first and second illumination units in the second direction so as to correspond to the position of the turn and the position of one of the two exposure patterns at the center. In the first step, and thereafter, the photosensitive substrate and the holding unit are relatively moved in the first direction by the first driving unit, and are positioned at one end by the emitted light from the first and second illumination units. The exposure pattern to be formed and the second step of forming one of the exposure patterns, and the position of the other of the two exposure patterns in the center of the first illumination unit and the second illumination unit. And a third driving unit that moves the first and second illumination units in the second direction by the second driving unit so as to correspond to the position of the exposure pattern located at the other end of the four exposure patterns. And, after that, the photosensitive substrate and the holding unit are relatively moved in the first direction by the first driving unit, and the other exposure pattern and the other are emitted by the light emitted from the first and second illumination units. And a fourth step of forming an exposure pattern positioned at the end, respectively.
(3) ClaimThe exposure method according to 13, wherein four exposure patterns extending in a first direction and spaced apart from each other in a second direction different from the first direction are emitted from the first and second illumination units. In the exposure method for forming on the photosensitive substrate by the light to be emitted, the interval between two of the four exposure patterns is the maximum in the second direction between the first illumination unit and the second illumination unit. In order to form the four exposure patterns defined to be narrower than the narrow interval, the first and second illumination units and the photosensitive substrate are relatively moved in the first direction, and the four exposure patterns are selected. And forming a third exposure pattern from one end of the four exposure patterns by the light emitted from the second illumination unit. Formation A relative movement of the photosensitive substrate on which the exposure pattern at one end and the third exposure pattern from the one end are formed, and the first and second illumination units; The second illumination unit and the photosensitive substrate are moved relative to each other in the first direction to form an exposure pattern at the other end of the four exposure patterns by light emitted from the second illumination unit. Forming a third exposure pattern from the other end of the book exposure patterns with light emitted from the first illumination unit.
[0012]
In the section of the means for solving the above-described problems for explaining the configuration of the present invention, the drawings of the embodiments of the invention are used for easy understanding of the present invention. It is not limited.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 is a plan view illustrating a schematic configuration of a peripheral exposure apparatus according to an embodiment of the present invention. FIG. 2 is a diagram showing a state viewed from the direction II shown in FIG. In FIG. 1, the X-axis is taken in the left-right direction on the paper surface, the Y-axis is taken in the up-down direction, and the Z-axis is taken in the direction perpendicular to the paper surface. Called. Further, the direction in which the coordinate value increases is referred to as a plus X direction, a plus Y direction, a plus Z direction, or the like as necessary. In other figures, the coordinate axes are shown so as to coincide with the coordinate axes shown in FIG.
[0014]
− Main scanning direction drive mechanism −
Four struts 6A, 6B, 6C and 6D are fixed to the four corners of the upper surface of the surface plate 2. A guide rail 8A is fixed to the upper ends of the columns 6A and 6C, and a guide rail 8B is fixed to the upper ends of the columns 6B and 6D, respectively, extending along the Y direction.
[0015]
A support member 12 is stretched along the X direction between the guide rails 8A and 8B. Inside the guide rails 8A and 8B, feed screw mechanisms (not shown) that are rotationally driven by main scanning motors 30A and 30B (not shown in FIG. 1, see FIG. 7) are built in the Y direction. . By rotating the main scanning motors 30A and 30B forward and backward, it is possible to move the support member 12 in the ± Y direction (hereinafter, the ± Y direction in FIG. 1 is referred to as “main scanning direction”). It has become.
[0016]
− Sub-scanning direction drive mechanism −
The two light source units 14A and 14B are supported by the support member 12 so as to be movable in the ± X directions. In addition, two feed screw mechanisms (not shown) that are rotationally driven by sub-scanning motors 32A and 32B (not shown in FIG. 1, refer to FIG. 7) are incorporated in the support member 12 along the X direction. Yes. By independently rotating the sub-scan motors 32A and 32B in the forward and reverse directions, the light source units 14A and 14B can be independently operated in the ± X direction (hereinafter, the ± X direction in FIG. ”).
[0017]
− Shading unit −
A beam 9A is stretched over the side surfaces of the columns 6A and 6C, and a beam 9B is stretched over the side surfaces of the columns 6B and 6D along the Y direction. A light shielding unit 11A is fixed to the beam 9A, and a light shielding unit 11B is fixed to the beam 9B.
[0018]
The configuration of the light shielding unit 11A will be described. The light shielding unit 11A includes a base 10A, a moving member 13A, and a mask 16A. The moving member 13A can be moved relative to the base 10A in the ± X direction by a pneumatic actuator (not shown). With the configuration described above, the mask 16A is driven in the sub-scanning direction by the pneumatic actuator, so that the light beam emitted from the light source units 14A and 14B can be switched between the state of guiding to the exposure object and the state of blocking. The light shielding unit 11B also has the same configuration as that of the light shielding unit 11A, and drives the mask 16B in the sub-scanning direction by a pneumatic actuator so that the light beams emitted from the light source units 14A and 14B can be used as necessary. Thus, it is possible to switch between the state of guiding to the exposure object and the state of blocking.
[0019]
Although the above-described light shielding unit is described as being fixed to each of the beams 9A and 9B, the position and number of the light shielding units are not limited to those shown in the present embodiment. Can be determined arbitrarily. The plurality of light shielding units 11A and 11B may be provided not only to be fixed to the beams 9A and 9B but also to be movable along the beams 9A and 9B. By thus providing the light shielding units 11A and 11B so as to be movable, it is possible to mask any position in the peripheral exposure region of the substrate G corresponding to the recipe.
[0020]
Further, by making the moving speed of the plurality of light shielding units 11A and 11B higher than the moving speed of the light source units 14A and 14B, it is possible to mask a plurality of locations per light source unit. This will be described. First, the light shielding units 11A and 11B are put on standby at the first positions where masking is desired, and the peripheral exposure is started. After the light source units 14A and 14B pass over the light shielding units 11A and 11B, the masks 16A and 16B. Is retracted, the light shielding units 11A and 11B are moved again, and pass the light source units 14A and 14B. Then, it is stopped at the position to be masked next, and the next area to be masked on the exposure area PA is covered with the masks 16A and 16B, and when waiting, a plurality of portions can be masked per light source unit as described above. It becomes possible. Further, when the light source units 14A and 14B come over the light shielding units 11A and 11B, the light shielding units 11A and 11B are started to move at the same speed as the light source units 14A and 14B, and the light shielding units 11A and 11B are moved at predetermined positions. By stopping, masking of a region wider than the light shielding width of the masks 16A and 16B can be performed. Although the example in which the masks 16A and 16B are driven by the pneumatic actuator has been described, a motor capable of position control may be used.
[0021]
− Light sensor −
The light quantity sensor 48 is a sensor for measuring the quantity of light emitted from the light source units 14A and 14B. The light quantity sensor 48 sequentially measures the quantity of light beams emitted from the light source units 14A and 14B prior to the peripheral exposure operation. Note that a half mirror or the like may be disposed in the light path of the light source units 14A and 14B to monitor the light reflected by the half mirror. The reason why the light amount sensor 48 measures the light amount of the light beam emitted from the light source units 14A and 14B will be described later.
[0022]
− Plate holder −
Referring to FIG. 2, the plate holder 4 on which the glass substrate G as an exposure object is placed is supported by a plate holder support portion 5 fixed to the surface plate 2 so as to be rotatable around the Z axis. ing. A plurality of protrusions 4 a are provided on the upper surface of the plate holder 4. The plurality of protrusions 4a have the same height. Moreover, a hole connected to a negative pressure source through a pipe line (not shown) is formed on the upper surface of the plurality of protrusions 4a, and a glass substrate G as an exposure object is placed on the plate holder 4. After that, it is adsorbed and fixed. FIG. 4 shows an example in which eight protrusions 4a are provided. However, depending on the Young's modulus, size, thickness, and the like of the substrate G, the number of protrusions 4a is such that the deflection of the substrate G does not have an adverse effect. Provided in position.
[0023]
− Light source unit −
FIG. 3 is a diagram schematically illustrating the internal configuration of the light source units 14A and 14B, and shows a cross section of the light source unit 14A (14B) extending in a direction parallel to the Z axis on a plane including the optical axis. Since the light source units 14A and 14B have the same configuration, the components of the light source unit 14B are denoted by parenthesized symbols in FIG. 3, and only the configuration of the light source unit 14A will be described.
[0024]
An ultrahigh pressure mercury lamp 40A is fixed inside the reflecting mirror 62A inside the light source unit 14A. A relay lens 66A and a projection lens 65A are fixed below the reflecting mirror 62A. A light beam emitted from the ultra-high pressure mercury lamp 40A is collected by the reflecting mirror 62A, and then the glass is passed through the relay lens 66A and the projection lens 65A. It is guided to the photosensitive surface of the substrate G, that is, the surface coated with the photoresist.
[0025]
The shutter 63A, which is driven in the direction along the XY plane by the shutter actuator 34A, is for switching between the state in which the light emitted from the ultrahigh pressure mercury lamp 40A is guided to the incident surface of the relay lens 66A and the state in which it is blocked. In general, several tens of minutes of warm-up time is required from the start of lamp lighting until the light emitted from the ultra-high pressure mercury lamp is stabilized. For this reason, when it is necessary to temporarily stop the irradiation of light emitted from the ultra-high pressure mercury lamp 40A after the peripheral exposure apparatus starts operation, the ultra-high pressure mercury lamp 40A is not turned off. The light is shielded by the shutter 63A.
[0026]
The blind 64 </ b> A driven by the blind actuator 36 </ b> A has a function of shaping the light beam applied to the glass substrate G into a rectangle and adjusting the width (size) of the light beam in the sub-scanning direction. The blind 64A is disposed between the exit surface of the projection lens 65A and the photoresist coating surface of the glass substrate G so as to be as close as possible to the photoresist coating surface. The blind 64A may be disposed at a position conjugate with the photoresist coating surface (position indicated by symbol C in FIG. 3) with respect to the projection lens 65A.
[0027]
− Loader −
The loader 70 described below with reference to FIGS. 4 and 5 may or may not be built in the peripheral exposure apparatus, but is installed outside (near) the peripheral exposure apparatus here. It will be described as being done. 4 and 5, only the surface plate 20, the plate holder 4, and the plate holder support 5 are shown in the peripheral exposure apparatus, and other components are not shown.
[0028]
The loader 70 is used to transport the glass substrate G as an exposure object between the peripheral exposure apparatus and another apparatus such as a coater / developer or a liquid crystal exposure apparatus. A SCARA robot arm 72 is installed on a base 75 installed on the floor or the like. The arm 72 has a degree of freedom of movement around the plane direction parallel to the XY plane, the ± Z direction, and the Z axis. A U-shaped conveyance frame 73 is fixed to the tip of the arm 72. The glass substrate G is transported while being supported by the arm portions 73 a of the transport frame 73.
[0029]
The operation of the loader 70 when the glass substrate G is placed on the plate holder 4 will be described with reference to FIGS. 4 and 5. As described above, the plate holder 4 is provided with the plurality of protrusions 4a, and the loader 70 has an arm in a space slightly above the protrusion 4a so that the arm 72 and the substrate G do not collide with the protrusion 4a. The glass substrate G supported by the part 73a is conveyed. When the glass substrate G reaches a predetermined position on the plate holder 4, the loader 70 moves the arm 72 in the minus Z direction to lower the glass substrate G. In this process, the glass substrate G comes into contact with the plurality of protrusions 4a, and then the glass substrate G is vacuum-sucked on the upper surface of the protrusions 4a. Thereafter, the loader 70 moves the arm 72 in the minus Y direction and retracts it from the peripheral exposure apparatus. Then, as will be described later, the peripheral exposure apparatus starts operating.
[0030]
− Control circuit −
FIG. 6 is a block diagram illustrating a schematic configuration of a control circuit that performs operation control of the peripheral exposure apparatus described above. The control unit 100 that performs overall control of the operation of the peripheral exposure apparatus includes main scanning motors 30A and 30B, sub-scanning motors 32A and 32B, shutter actuators 34A and 34B, blind actuators 36A and 36B, and ultrahigh pressure mercury lamps 40A and 40B. It is connected. Further, electromagnetic direction switching valves 46A, 46B and 50, a light amount sensor 48 and a stage actuator 52 are connected to the control unit 100. A host computer 200 is connected to the control unit 100. The host computer 200 communicates with a control circuit incorporated in each of a plurality of apparatuses including a peripheral exposure apparatus to control the manufacturing process in an integrated manner, and is installed outside the peripheral exposure apparatus. is there. The control unit 100 controls the control parameters such as the process sequence when the glass substrate G to be exposed is placed on the plate holder 4 and the glass substrate G is exposed from the host computer 200 and the dose amount given to the exposure surface of the glass substrate G. The control of the exposure operation described below is started in response to the input of information such as (recipe).
[0031]
− Operation of peripheral exposure device −
The operation of the peripheral exposure apparatus configured as described above will be described with reference to FIGS. In the following description of the operation, it is assumed that the ultra-high pressure mercury lamps 40A and 40B have been in a stable state, that is, a state where peripheral exposure can be performed after a considerable time has elapsed since the start of lighting. In accordance with the recipe input from the host computer 200, the control unit 100 starts peripheral exposure operation control.
[0032]
First, the case where the periphery and the four sides of the glass substrate G having a rectangular outer shape are exposed in a “B” shape will be described. After the glass substrate G is placed on the plate holder 4, the control unit 100 controls the electromagnetic direction switching valve 50 so that the holes formed in the plurality of protrusions 4 a communicate with a negative pressure source (not shown). Thereby, the glass substrate G is adsorbed and fixed to the plate holder 4.
[0033]
The control unit 100 controls and rotates the main scanning motors 30A and 30B and the sub-scanning motors 32A and 32B, sequentially positions the light emitting units of the light source units 14A and 14B above the light quantity sensor 48, and emits light from each light source unit. Measure the amount of luminous flux. The control unit 100 moves the light source units 14A and 14B relative to the glass substrate G from the value of the smaller light amount and the dose amount (exposure amount) included in the recipe information input from the host computer 200. The movement speed at the time is calculated.
[0034]
When the peripheral exposure is performed at the moving speed thus obtained, the photoresist exposed with the light beam emitted from the light source unit with the larger amount of light becomes overexposed. However, since the peripheral exposure is intended to remove unnecessary resist, there is no problem even if the exposure amount is slightly over. Rather, the problem is that unnecessary resist cannot be completely removed due to insufficient dose. Therefore, the amount of exposure of the photoresist is insufficient by obtaining the moving speed of these light source units based on the light flux emitted from the plurality of light source units 14 and 14B with the least amount of light as in the present embodiment. Can be suppressed. Therefore, the photoresist that remains without being removed can be prevented from being peeled off.
[0035]
The control unit 100 controls the shutter actuators 34A and 34B to close the shutters 63A and 63B so that no light beam is emitted from the light source units 14A and 14B. Subsequently, the control unit 100 controls the main scanning motors 30A and 30B and the sub scanning motors 32A and 32B, and drives the light source units 14A and 14B in the main scanning direction and the sub scanning direction for positioning. That is, the light beam emission positions of the light source units 14A and 14B are made to coincide with the peripheral exposure start position. Subsequently, the control unit 100 controls the blind actuators 36A and 36B based on the recipe input from the host computer 200, and adjusts the beam width of the light beam emitted from the light source units 14A and 14B according to the width of the non-pattern area. .
[0036]
By the way, when there is a portion in which an alignment mark or an identification number is burned in the peripheral portion of the glass substrate G, it is necessary to prevent this portion from being exposed. In such a case, information indicating that there is a portion in which the peripheral exposure is not performed in the recipe input from the host computer 200 is included. Based on this information, the control unit 100 controls the electromagnetic direction switching valves 46A and 46B to drive the mask 16A in the plus X direction and the mask 16B in the minus X direction. Thereby, the light shielding units 11A and 11B are switched to the state illustrated in FIG. 1, and the masks 16A and 16B cover a part of the exposure area PA on the glass substrate G. As a result, the light beam emitted from the light source units 14A and 14B and incident on the photoresist applied to the glass substrate G is partially shielded, and the portion of the substrate G that is not desired to be exposed is masked.
[0037]
The control unit 100 controls the shutter actuators 34A and 34B to open the shutters 63A and 63B so that light beams are emitted from the light source units 14A and 14B, and then controls the main scanning motors 30A and 30B to control the light source units 14A and 14B. 14B is scanned in the main scanning direction. The light source units 14A and 14B integrally scan the upper side of the glass substrate G at a substantially constant speed while being held by the support member 12, and have two sides (two sides along the Y direction in FIG. 1) of the glass substrate G. Complete peripheral exposure. At this time, the portions shielded by the light shielding units 11A and 11B are not exposed. As described above, in the peripheral exposure apparatus according to the present invention, even when there is a portion that is not desired to be exposed in the middle, the light source units 14A and 14B are substantially constant from the start of scanning to the stop thereof. Scan at a speed. In this regard, the scanning of the light source unit is temporarily stopped at the head of the portion that is not desired to be exposed, the shutters 63A and 63B are closed, the scanning is resumed, the scanning is paused again at the end of the portion that is not desired to be exposed, and the shutter again. The peripheral exposure can be completed in a short time compared to the conventional method in which the scanning is resumed after opening, and the throughput of the peripheral exposure apparatus can be improved.
[0038]
As described above, as the peripheral exposure of the two opposing sides of the glass substrate G is completed, the control unit 100 controls the shutter actuators 34A and 34B to close the shutters 63A and 63B, and from the light source units 14A and 14B. The emission of the luminous flux is stopped.
[0039]
Subsequently, the control unit 100 controls the stage actuator 52 to rotate the plate holder 4 by 90 degrees around a rotation axis parallel to the Z axis. At the same time, according to the recipe input from the host computer 200, the control unit 100 controls the sub-scan motors 32A and 32B and the blind actuators 36A and 36B to change the distance between the optical axes of the light source units 14A and 14B and change the beam size. Do. Thus, by rotating the plate holder 4 and changing the distance between the optical axes of the plurality of light source units 14A and 14B and changing the beam size at the same time, the throughput of the peripheral exposure apparatus can be improved. Note that only the change in the distance between the optical axes between the plurality of light source units 14A and 14B may be performed simultaneously with the rotation of the plate holder 4, or only the change in the beam size may be performed.
[0040]
Following the rotation of the plate holder 4, the change of the distance between the optical axes of the light source units 14A and 14B, and the change of the beam size, the control unit 100 controls the main scanning motors 30A and 30B to control the light flux of the light source units 14A and 14B. Is moved to the start position of the next peripheral exposure. If the controller 100 determines that there is an area that needs to be shielded in the area where the next peripheral exposure is performed based on the recipe input from the host computer 200, the control unit 100 exposes the masks 16A and 16B on the glass substrate G. A state of covering a part of the area PA is maintained. On the other hand, if it is determined that there is no area requiring light shielding, the control unit 100 controls the electromagnetic direction switching valves 46A and 46B to retract the masks 16A and 16B from the peripheral exposure range of the glass substrate G. Subsequently, the control unit 100 controls the shutter actuators 34A and 34B to open the shutters 63A and 63B so that the light beams are emitted from the light source units 14A and 14B, and then controls the main scanning motors 30A and 30B. 14A and 14B are scanned in the main scanning direction.
[0041]
With the above control operation by the control unit 100, the peripheral exposure of the four sides ("B" shape) of the glass substrate G is completed. When the peripheral exposure pattern is a so-called “eye” character, “day” character, “field” character, or a pattern that is a combination of these, the control unit 100 continues. The same peripheral exposure operation as that described above is repeated. At this time, when there are an even number of peripheral exposure patterns, the control unit 100 performs exposure by scanning both the light source units 14A and 14B. On the other hand, when the peripheral exposure pattern is an odd number such as a “day” character pattern, the last remaining pattern is performed using one of the plurality of light source units 14A and 14B. As described above, the control unit 100 controls the sub-scanning motors 32A and 32B. At this time, the remaining light source units, that is, the light source units that are not involved in the peripheral exposure operation, are controlled by the control unit 100 so as to move so as not to interfere with the light source units that participate in the peripheral exposure operation. In the description of the above embodiment, an example in which two light source units are provided has been described, but the number of light source units may be three or more. In this case, the remaining number of patterns obtained by dividing the number of peripheral exposure patterns by the number of light source units may be exposed by some of the light source units. Then, the light source unit that is not involved in the peripheral exposure operation is controlled by the control unit 100 so as to move so as not to interfere with the light source unit that participates in the peripheral exposure operation.
[0042]
Here, referring to FIG. 7, two examples of the peripheral exposure of the “eye” -shaped pattern in the peripheral exposure apparatus according to the embodiment of the present invention, and the “day” -shaped pattern An example in which the peripheral exposure is performed will be described.
[0043]
FIG. 7A shows an example in which two of the “eye” -shaped patterns have a relatively wide interval, and FIG. 7B shows an example of FIG. An example of an exposure control procedure by the control unit 100 when performing peripheral exposure of the shape pattern shown is shown. As shown in step A of FIG. 7B, two patterns along the long side of the substrate G are exposed by the light source units 14A and 14B, and then the plate holder 4 (FIG. 2) is rotated by 90 degrees. . While the plate holder 4 is rotating, the light source units 14A and 14B are driven in the sub-scanning direction to adjust the interval. Subsequently, as shown in the procedure B, two patterns along the short side of the substrate G are exposed. At this time, the relative movement direction between the light source units 14A and 14B and the glass substrate G is opposite to the relative movement direction in the procedure A. After the exposure operation in the procedure B is completed, the light source units 14A and 14B are driven in the sub-scanning direction to narrow the interval between the two light source units. Then, as shown in Procedure C, the light source units 14A and 14B and the substrate G are relatively driven in the direction opposite to the relative movement direction in Procedure B, and the remaining two patterns are exposed.
[0044]
FIG. 7C shows an example in which two of the “eye” -shaped patterns have a relatively narrow interval, and FIG. 7D shows the example shown in FIG. An example of an exposure control procedure by the control unit 100 when performing peripheral exposure of the shape pattern shown is shown. Here, “relatively narrow” means that the light source units 14A and 14B emit light from the light emitting units of the light source units 14A and 14B even when the light source units 14A and 14B are brought closest to each other due to restrictions such as the size of the light source units 14A and 14B. This means that the pattern interval is narrower than the light flux pitch.
[0045]
As shown in the procedure P of FIG. 7D, two patterns along the long side of the substrate G are exposed by the light source units 14A and 14B, and then the plate holder 4 is rotated by 90 degrees. While the plate holder 4 is rotating, the light source units 14A and 14B are driven in the sub-scanning direction to adjust the interval. Subsequently, as shown in Procedure Q, the leftmost pattern of the four patterns along the direction parallel to the extending direction of the short side of the substrate G and the third pattern from the left are exposed. The At this time, the relative movement direction between the light source units 14A and 14B and the glass substrate G is opposite to the relative movement direction in the procedure P. After the exposure operation in the procedure Q is completed, the light source units 14A and 14B are driven in the sub scanning direction. Then, as shown in the procedure R, the light source units 14A and 14B and the substrate G are relatively driven in the direction opposite to the relative movement direction in the procedure Q, and the remaining two patterns are exposed.
[0046]
In the example shown in FIG. 7B, when four patterns along the direction parallel to the extending direction of the short side of the glass substrate G are exposed, the outside / outside, inside / inside are exposed, In the example shown in FIG. 7D, the exposure is performed on the outside / inside and inside / outside. That is, when a certain light source unit moves in the sub-scanning direction, the control unit 100 keeps the distance between the light source unit and the light source unit adjacent to the light source unit at a predetermined distance or more. The units 14A and 14B are controlled. And the control part 100 moves another light source unit so that the movement of one light source unit may not be disturbed (it does not interfere). By moving a plurality of light source units as described above, adjacent light source units do not interfere with each other. Further, exposure can be performed even if there is a portion having a relatively narrow interval in the pattern forming the exposure pattern. In particular, in the case where a light source unit in which a light source and a condensing optical system are integrally formed is used as in the peripheral exposure apparatus according to the present embodiment, the size of the light source and the condensing optical system becomes a bottleneck. It is easy to produce restrictions on the pitch of light beams emitted from adjacent light source units. However, by performing the exposure as described above, it is possible to perform the exposure without reducing the throughput even at a narrow pattern interval.
[0047]
FIG. 7E shows an example in which the exposure pattern has a “Sun” character shape pattern, and FIG. 7F shows the control unit 100 when performing peripheral exposure of the shape pattern shown in FIG. 2 shows an example of an exposure control procedure by. As shown in the procedure X of FIG. 7F, two patterns along the long side of the substrate G are exposed by the light source units 14A and 14B, and then the plate holder 4 is rotated by 90 degrees. While the plate holder 4 is rotating, the light source units 14A and 14B are driven in the sub-scanning direction to adjust the interval. Subsequently, as shown in the procedure Y, two patterns along the short side of the substrate G are exposed. At this time, the relative movement direction between the light source units 14A and 14B and the glass substrate G is opposite to the relative movement direction in the procedure X. After the exposure operation in the procedure Y is completed, only the light source unit 14B is driven in the sub scanning direction. Then, as shown in the procedure Z, the light source units 14A and 14B and the substrate G are exposed in the remaining pattern in the direction opposite to the relative movement direction in the procedure Y. In step Z, the shutter 63A of the light source 14A is closed. Although the example in which the light source unit 14B is used for the exposure of the remaining pattern has been described above, the light source unit 14A may be used as a matter of course. In addition, when the above-described “day” shape or similar pattern exposure is repeatedly performed, the light source units 14A and 14B may be used alternately or alternately after a predetermined number of times.
[0048]
As described above, the peripheral exposure apparatus according to the embodiment of the present invention can perform high-throughput exposure regardless of the exposure pattern shape. In particular, since the light from the ultrahigh pressure mercury lamps 40A and 40B is guided to the substrate G without using an optical fiber, a decrease in the amount of light due to the filling rate of the optical fiber is suppressed, and the throughput of the peripheral exposure apparatus is increased. Can be improved. Further, since there is no problem due to degradation of the optical fiber, the reliability of the peripheral exposure apparatus can be improved, and the peripheral exposure that can be formed on the substrate by driving a plurality of light source units as described above. It becomes possible to raise the freedom degree of a pattern.
[0049]
In the above description, the example in which the light amount sensor 48 is provided on the surface plate 2 in order to detect the light amount of the light beams emitted from the light source units 14A and 14B has been described. However, the light amount units 14A and 14B each have a light amount. A sensor may be incorporated. The number of light source units included in the peripheral exposure apparatus is not limited to two, and may be three or more.
[0050]
In order to drive a plurality of light source units in the main scanning direction and the sub-scanning direction, not only the feed screw mechanism described above but also other actuators and mechanisms such as a linear motor and a belt driving mechanism are used. May be. Further, as will be described below with reference to FIG. 8, a rotation mechanism may be used as a mechanism for driving the light source unit in the sub-scanning direction.
[0051]
FIG. 8 is a diagram showing another example of the sub-scanning direction driving mechanism of the light source unit in the peripheral exposure apparatus according to the embodiment of the present invention. Although only a part of the peripheral exposure apparatus is shown in FIG. 8, the other parts are the same as those shown in FIG. In FIG. 8, the same components as those of the peripheral exposure apparatus shown in FIG. The drive member 12 supports light source units 14A and 14B via rotating arms 134A and 134B. A sub-scanning motor 132A and an encoder 133A are attached to the rotation center axis of the rotation arm 134A. Similarly, a sub-scanning motor 132B and an encoder 133B are attached to the rotation center axis of the rotation arm 134B. These sub-scanning motors 132A and 132B and encoders 133A and 133B are all connected to the control unit 100.
[0052]
The sub scanning motors 132A and 132B controlled by the control unit 100 are driven to swing the rotation arms 134A and 134B, respectively. The light source units 14A and 14B are fixed to the tips of the rotating arms 134A and 134B, and the positions of the light source units 14A and 14B in the sub-scanning direction are determined according to the angular positions of the rotating arms 134A and 134B. The angular positions of the rotating arms 134A and 134B are detected by the encoders 133A and 133B, respectively. The control unit 100 controls the sub scanning motors 132A and 132B based on the angular position information input from the encoders 133A and 133B, and positions the light source units 14A and 14B in the sub scanning direction. In the example described here, the opening shape (beam cross-sectional shape) formed by the blinds 64A and 64B has an inclination with respect to the main scanning direction in accordance with the angular positions of the rotating arms 134A and 134B. . In order to correct this inclination, the light source units 14A and 14B may be rotatable relative to the rotating arms 134A and 134B. Alternatively, only the portions of the blind 64A (64B) and the blind actuator 36A (36B) may be rotatable relative to the rotating arm 134A (134B). Further, instead of using such a rotating mechanism, each of the rotating arms 134A and 134B is replaced with a parallel link using two arms, and the light source units 14A and 14B are respectively supported by the distal ends of the parallel links. Also good. In this case, the angular position of the opening formed by the blinds 64A and 64B is kept constant with respect to the main scanning direction regardless of the angular position of the parallel link, that is, the position of the light source units 14A and 14B in the sub-scanning direction.
[0053]
Furthermore, although the example in which a plurality of light source units are driven in the main scanning direction has been described above, the substrate G may be driven in the main scanning direction instead. Further, both the plurality of light source units and the substrate G may be driven to relatively move the plurality of light source units and the substrate G. In this case, the light shielding units 11 </ b> A and 11 </ b> B shown in FIG. 1 may be configured to move integrally with the plate holder 4.
[0054]
In the correspondence between the embodiments of the present invention and the claims, the ultrahigh pressure mercury lamps 40A and 40B are the light sources, the relay lenses 66A and 66B and the projection lenses 65A and 65B are the condensing optical system, and the light source units 14A and 14B are the light sources units 14A and 14B. The illumination unit, the glass substrate G is the photosensitive substrate, the holding member 12 is the holding unit, the main scanning motors 30A and 30B are the first driving unit, the sub-scanning motors 32A, 32B, 132A and 132B are the second driving unit, The light quantity sensor 48 is the light quantity detection means, the control section 100 is the drive control section, the illumination unit movement control means and the movement speed setting means, the blinds 64A and 64B and the blind actuators 36A and 36B are the beam size changing means, and the stage actuator 52 is the stage actuator 52. The rotation drive unit, and the light shielding units 11A and 11B constitute the light shielding means. That.
[0055]
【The invention's effect】
As described above, the present invention has the following effects.
(1) According to the first to third aspects of the invention, when each of the plurality of illumination units that can be positioned at the substantially central portion of the photosensitive substrate is driven in the second direction, the plurality of illumination units are mutually connected. By driving so as not to interfere, it is possible to operate the peripheral exposure apparatus smoothly without causing problems such as collision of the plurality of illumination units, and to improve the throughput of the peripheral exposure apparatus. Become.
(2) According to the invention described in claim 4, the intensity of light emitted from each of the plurality of illumination units is detected, and each of the plurality of illumination units and the photosensitive substrate are moved relative to each other on the photosensitive substrate. When exposing a non-pattern area, the speed of relative movement between each of the plurality of illumination units and the photosensitive substrate is set based on the lower intensity of the light intensities of the plurality of illumination units detected by the light amount detection means. As a result, even if there is a variation in the amount of light beams emitted from the plurality of illumination units, exposure can be performed with a sufficient amount of light to remove the photoresist. Also, it is not necessary to repeat the peripheral exposure operation many times according to the light quantity for each illumination unit, and the exposure can be performed collectively, so even if the light quantity for each illumination unit varies, the peripheral exposure apparatus It is possible to suppress a decrease in throughput.
(3) According to the invention described in claim 5, by simultaneously changing the size of the beam emitted from each of the plurality of illumination units, a plurality of patterns having different widths are exposed simultaneously. Thus, the throughput of the peripheral exposure apparatus can be improved.
(4) According to the invention described in claim 6, the distance changing operation between the plurality of illumination units is performed in parallel with the rotation of the photosensitive substrate being rotated by the rotation driving unit. The interval between a plurality of exposure operations is shortened. Therefore, the throughput of the peripheral exposure apparatus can be improved.
(5) According to the invention described in claim 7, the size changing operation of the beam emitted from each of the plurality of illumination units is performed in parallel with the photosensitive substrate being rotationally driven by the rotational driving unit. This shortens the interval between a plurality of subsequent exposure operations. Therefore, the throughput of the peripheral exposure apparatus can be improved.
(6) According to the invention described in claim 8, the light emitted from the light emitting portion is not desired to be irradiated on the photosensitive substrate, provided in the vicinity of the movement path for relatively moving the plurality of illumination units and the photosensitive substrate. By providing the light shielding means for preventing the portion from being irradiated, even if there is a portion where exposure is not desired in the non-pattern region to be exposed, the illumination unit can be scanned without being temporarily stopped. That is, it is not necessary to temporarily stop the illumination unit being scanned for the peripheral exposure operation and operate the shutter in the illumination unit to prevent exposure to an undesired portion. In this way, it is not necessary to stop the illumination unit (acceleration / deceleration operation) during the peripheral exposure operation, so that the throughput of the peripheral exposure apparatus can be increased.
(7) According to the invention described in claim 9, by setting the light shielding means at a position between the illumination unit and the substrate as necessary, the periphery of different types of substrates in one peripheral exposure apparatus It becomes possible to perform exposure.
[Brief description of the drawings]
FIG. 1 is a plan view illustrating a schematic configuration of a peripheral exposure apparatus according to an embodiment of the present invention.
FIG. 2 is a partial cross-sectional view illustrating a schematic configuration of a peripheral exposure apparatus according to an embodiment of the present invention.
FIG. 3 is a longitudinal sectional view schematically showing a configuration example of a light source unit.
FIG. 4 is a diagram for explaining a loader that delivers an exposure object between the peripheral exposure apparatus according to the present embodiment and another apparatus.
FIG. 5 is a diagram for explaining how an exposure object is set in a peripheral exposure apparatus by a loader.
FIG. 6 is a block diagram schematically showing a control circuit of the peripheral exposure apparatus according to the embodiment of the present invention.
FIG. 7 is a diagram for explaining a procedure of a peripheral exposure operation performed corresponding to various exposure pattern shapes.
FIG. 8 is a diagram illustrating another example of the sub-scanning mechanism of the light source unit.
[Explanation of symbols]
2 ... Surface plate 4 ... Plate holder 5 ... Plate holder support
8A, 8B ... Guide rails 9A, 9B ... Beam
11A, 11B ... Light-shielding unit 12 ... Support member
14A, 14B ... Light source unit
16A, 16B ... Mask 30A, 30B ... Main scanning motor
32A, 32B ... Sub-scanning motor
34A, 34B ... Shutter actuator
36A, 36B ... Blind actuator
40A, 40B ... Super high pressure mercury lamp
46A, 46B ... Electromagnetic direction switching valve 48 ... Light quantity sensor
52 ... Stage actuator 70 ... Loader
DESCRIPTION OF SYMBOLS 100 ... Control part 200 ... Host computer

Claims (13)

In a peripheral exposure apparatus that forms an exposure pattern on a photosensitive substrate with light emitted from at least the first and second illumination units ,
A holding unit that movably holds the first and second lighting units;
A first driving unit that relatively moves the photosensitive substrate and the holding unit in a first direction;
A second drive unit that moves each of the first and second lighting units with respect to the holding unit along a second direction different from the first direction ;
A drive control unit for controlling driving of the first drive unit and the second drive unit ;
With
The drive control unit includes at least four exposure patterns extending in the first direction, and an interval between two exposure patterns in a central portion of the four exposure patterns is the first illumination unit. In order to form four exposure patterns that are defined narrower than the narrowest distance between the second illumination unit and the second illumination unit,
The positions of the first and second illumination units are set such that the position of the exposure pattern located at one end of the four exposure patterns and the position of one of the two exposure patterns in the central portion. In addition, the second driving unit is controlled so as to correspond to each other, and in the corresponding state, the first driving unit is configured to relatively move the photosensitive substrate and the holding unit in the first direction. Control
The positions of the first and second illumination units are determined based on the position of the other exposure pattern of the two exposure patterns in the central portion and the position of the exposure pattern positioned at the other end of the four exposure patterns. In addition, the second driving unit is controlled so as to correspond to each other, and in the corresponding state, the first driving unit is configured to relatively move the photosensitive substrate and the holding unit in the first direction. A peripheral exposure apparatus characterized by controlling . The peripheral exposure apparatus according to claim 1,
The drive control unit causes the position of the first illumination unit to correspond to the position of the exposure pattern located at the one end, and sets the position of the second illumination unit to the position of the two exposure patterns in the central portion. Among these, the second drive unit is controlled so as to correspond to the position of the exposure pattern farther from the one end, and further the position of the second illumination unit is made to correspond to the position of the exposure pattern located at the other end. And controlling the second driving unit so that the position of the first illumination unit corresponds to the position of the exposure pattern farther from the other end of the two exposure patterns in the central portion. A featured peripheral exposure apparatus. The peripheral exposure apparatus according to claim 1 or 2,
A light-shielding unit disposed between at least one of the first and second illumination units and the photosensitive substrate, and shielding light emitted from the one illumination unit;
The light blocking means is movable between a light blocking position that blocks light emitted from the one lighting unit and a non-light blocking position that does not block light emitted from the one lighting unit. A peripheral exposure apparatus that is also movable in the direction of 4. The peripheral exposure apparatus according to claim 3 , wherein the light shielding unit blocks the light emitted from the one illumination unit at the light shielding position, moves to the non-light shielding position, and then performs the first drive. Moving in the first direction at the non-light-shielding position at a higher speed than the relative movement speed of the one illumination unit accompanying the relative movement of the photosensitive substrate and the holding unit by the unit, and then again shielding the light A peripheral exposure apparatus that moves to a position and blocks light emitted from the one illumination unit . 4. The peripheral exposure apparatus according to claim 3, wherein the light shielding unit has the same speed as a relative movement speed of the one illumination unit according to a relative movement of the photosensitive substrate and the holding unit by the first driving unit. A peripheral exposure apparatus that moves in the first direction at the light shielding position . In the peripheral exposure apparatus according to any one of claims 1 to 5,
The second exposure unit is capable of positioning at least one of the first and second illumination units at a position where a substantially central portion of the photosensitive substrate can be exposed in the second direction. apparatus. In the peripheral exposure apparatus according to any one of claims 1 to 6,
A light amount detecting means for detecting the intensity of light emitted from each of the first and second illumination units;
A moving speed setting for setting a speed of relative movement between the photosensitive substrate and the holding unit based on the lower one of the light intensities of the first and second illumination units detected by the light amount detecting means. peripheral exposure apparatus further comprising a means. In the peripheral exposure apparatus according to any one of claims 1 to 7,
The peripheral exposure apparatus further comprising beam size changing means for changing the sizes of the beams emitted from the first and second illumination units independently of each other . In the peripheral exposure apparatus according to any one of claims 1 to 8,
A rotation drive unit that rotates the photosensitive substrate about a rotation axis that is substantially orthogonal to the photosensitive surface of the photosensitive substrate;
The peripheral exposure apparatus , wherein the distance changing operation between the first and second illumination units by the second driving unit is performed in parallel with the rotation driving of the photosensitive substrate by the rotation driving unit. The peripheral exposure apparatus according to claim 8, wherein
  A rotation drive unit for rotating the photosensitive substrate around a rotation axis substantially orthogonal to the photosensitive surface of the photosensitive substrate;
  The peripheral exposure apparatus, wherein the beam size changing operation by the beam size changing means is performed in parallel with the rotation driving of the photosensitive substrate by the rotation driving unit. First and second illumination units, a holding unit that movably holds the first and second lighting units, and a first drive that relatively moves the photosensitive substrate and the holding unit in a first direction. And a second driving unit that moves each of the first and second illumination units along a second direction different from the first direction with respect to the holding unit. In the method
  At least four exposure patterns extending in the first direction, and an interval between two exposure patterns in a central portion of the four exposure patterns is the first illumination unit and the second illumination unit. In order to form four exposure patterns on the photosensitive substrate that are narrower than the narrowest interval between the first and second illumination units, the positions of the first and second illumination units are the four exposure patterns. Of the first and second exposure patterns so as to correspond respectively to the position of the exposure pattern located at one end of the exposure pattern and the position of one of the two exposure patterns in the central portion. A first step of moving two lighting units in the second direction;
  Thereafter, the photosensitive substrate and the holding unit are relatively moved in the first direction by the first driving unit, and are positioned at the one end by light emitted from the first and second illumination units. A second step of respectively forming an exposure pattern to be performed and the one exposure pattern;
  Exposure in which the position of the first illumination unit and the second illumination unit is located at the other end of the four exposure patterns and the position of the other exposure pattern of the two exposure patterns in the central portion A third step of moving the first and second illumination units in the second direction by the second drive unit so as to correspond to the positions of the patterns, respectively;
  Thereafter, the first driving unit relatively moves the photosensitive substrate and the holding unit in the first direction, and the other exposure is performed by light emitted from the first and second illumination units. A fourth step of forming a pattern and an exposure pattern located at the other end,
An exposure method comprising: The exposure method according to claim 11.
  In the first step, the position of the first illumination unit is made to correspond to the position of the exposure pattern located at the one end, and the position of the second illumination unit is set to the two exposure patterns in the central portion. The first driving unit is moved in the second direction by the second driving unit so as to correspond to the position of the exposure pattern far from the one end,
  In the third step, the position of the second illumination unit is made to correspond to the position of the exposure pattern located at the other end, and the position of the first illumination unit is changed to the two exposure patterns in the central portion. The first and second illumination units are moved in the second direction by the second driving unit so as to correspond to the position of the exposure pattern farther from the other end. Method. Four exposure patterns extending in the first direction and spaced apart from each other in a second direction different from the first direction are formed on the photosensitive substrate by the light emitted from the first and second illumination units. In the exposure method to
  The interval between two of the four exposure patterns is determined to be narrower than the narrowest interval in the second direction between the first illumination unit and the second illumination unit. In order to form four exposure patterns,
  The first and second illumination units and the photosensitive substrate are relatively moved in the first direction, and an exposure pattern at one end of the four exposure patterns is emitted from the first illumination unit. Forming the third exposure pattern from the one end of the four exposure patterns with the light emitted from the second illumination unit;
  Relatively moving the exposure pattern on the one end and the photosensitive substrate on which the third exposure pattern from the one end is formed, and the first and second illumination units in the second direction;
  The first and second illumination units and the photosensitive substrate are relatively moved in the first direction, and an exposure pattern at the other end of the four exposure patterns is emitted from the second illumination unit. Forming a third exposure pattern from the other end of the four exposure patterns with light emitted from the first illumination unit;
An exposure method comprising:

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