TWI407265B - Exposure machine - Google Patents

Abstract

The present invention provides an exposure machine, including a exposure platform for bearing a workpiece and an original copy, at least one light source set provided above the exposure platform for producing exposure light source irradiating toward the exposure platform, the exposure light source being made to reach a predetermined area on the exposure platform in accordance with a predetermined displacement path of the light source set in order to develop and expose a workpiece on the exposure platform, thereby greatly reducing the number of light bulbs, and relatively lessening the overall volume of the exposure machine, equipment cost, and the heating phenomenon in the exposure machine; especially, the light source set only passes through the area requiring the exposure light source to irradiate on the exposure platform. Accordingly, the unnecessary processing cost can be eliminated.

Description

Exposure machine

The invention relates to an exposure and development technology of an exposure machine, which aims to provide an exposure machine which can perform exposure work on a specific area of an exposure platform, relatively no heat collecting phenomenon, and an exposure machine which can reduce the volume and cost of the device, and related thereto. Exposure method.

According to the general printed circuit board or the semiconductor wafer, when performing the exposure and development process, a photoresist is applied on the surface of the workpiece, and the circuit wiring pattern on the original is mapped to the surface of the workpiece by the illumination of the light source. On the resist layer, so that the chemical properties of the photoresist layer are changed by the illumination of the light source, and then the photoresist or the unexposed photoresist which is irradiated by the light source is removed from the surface of the workpiece by using a photoresist. A line layout corresponding to the original is formed.

The basic structure of the exposure machine for performing the exposure and development processing process is as shown in the first figure, and has an exposure chamber 12 composed of a casing 11 and an exposure platform 13 which can be relatively moved into and out of the exposure chamber 12, and at least A light source group 14 is disposed inside the exposure chamber 12 corresponding to the upper or lower position of the exposure platform 13; please refer to the second figure at the same time, the exposure platform 13 is used for placing the workpiece 20 and the original (Fig. The transparent platform, the overall exposure platform 13 and in and out of the exposure chamber 12 by a set of linear slides 15.

After the exposure platform 13 and the workpiece and the original enter the exposure chamber 12 to be positioned, it is generally necessary to stay inside the exposure chamber 12 for a period of time (about 3 to 5 seconds), so that the workpiece receives the exposure light source of the light source group 14. After the exposure is completed, the workpiece is sent out by the exposure stage 13.

Since the conventional exposure machine performs exposure operation in such a manner that the exposure platform 13 is stagnated inside the exposure chamber 12, a plurality of bulbs 141 in an array configuration are disposed in the light source group 14 to form an entire exposure platform 13 . Parallel light source; when a large number of bulbs 141 are operated at the same time, a serious heat collecting phenomenon will be generated inside the casing 11, and an additional water cooling system is required to dissipate heat, resulting in high equipment cost.

Another conventional exposure machine corrects the light of the bulb through the compound eye device to the required parallel light and area. The action mode is to let the light source bulb pass through the elliptical mirror to direct the light to the compound eye device through a set of first mirrors. The light is homogenized, and then a set of second mirrors is used to change the direction of the light. Finally, a set of convex lenses is used to correct the light to the required parallel light and area, thereby projecting the required exposure light source, thereby reducing the number of light bulbs. .

Such a design not only makes the structure of the overall exposure machine more complicated, but also the body of the overall exposure machine is relatively larger; in addition, it also exposes the workpiece by using an exposure light source covering the entire exposure platform; In the actual exposure development process, not all of the processed areas have the same exposure area as the exposure stage, that is, some areas of the entire exposure stage do not need to be illuminated by the exposure light source, thus excessively wasting a lot of unnecessary processing costs.

In view of the above, the main object of the present invention is to provide an exposure machine capable of performing exposure work on a specific area of an exposure platform, relatively less heat-collecting phenomenon, and capable of reducing equipment volume and cost, and an exposure method therefor. .

In order to achieve the above, the exposure machine of the present invention has an exposure platform for carrying the workpiece and the original, and at least one light source group is disposed above the exposure platform for generating an exposure light source toward the exposure platform, and the light source group is It can be displaced according to the preset path.

In implementation, the two corresponding side systems of the exposure platform are respectively provided with a first linear slide rail, and at least one second linear slide rail is spanned between the two first linear slide rails, and the light source group is Arranging on the at least one second linear slide rail; and providing a first driving component for driving the second linear slide rail along the first linear slide rail, and providing a second driving component for driving the light source group Displacement along the associated second linear slide. The exposure light source reaches a predetermined area of the exposure platform by the displacement of the light source group along the associated second slide rail and the displacement of the second linear slide along the first linear slide rail, and the workpiece on the exposure platform is performed. Exposure development.

In particular, the present invention has the following effects:

1. The light source used to generate the exposure effect can be a single-point light source instead of a large-area light source covering the entire exposure platform, thereby greatly reducing the number of light bulbs in the light source group, relatively reducing the volume of the overall exposure machine, and relatively reducing the equipment cost. .

2. The control circuit used can increase the power of the light source group when the exposure light source reaches a predetermined stroke, so that the heat collecting phenomenon of the overall exposure machine can be relatively reduced.

3. The overall exposure machine can be adjusted according to the specifications of the workpiece, and the stroke setting of the light source group can be adjusted in time to greatly improve the applicability and practicability of the exposure machine.

4. The light source group only passes through the area where the exposure platform needs to be illuminated by the exposure light source, so that unnecessary processing costs are not wasted.

The features of the present invention can be clearly understood by referring to the drawings and the detailed description of the embodiments.

The invention aims to provide an exposure machine which can perform exposure work on a specific area of an exposure platform, relatively less heat accumulation phenomenon, and can reduce the volume and cost of the device, and an exposure method related thereto; the exposure method is firstly An upper portion of the exposure platform for carrying the workpiece and the original is provided with at least one light source group for generating an exposure light source toward the exposure platform, and then the exposure light source reaches the exposure manner according to the displacement of the light source group according to a preset path. The predetermined area of the platform is exposed and developed on the exposed substrate.

As shown in the third and fourth figures, the exposure machine of the present invention comprises: an exposure platform 30, two first linear slides 41, at least one second linear slide 42, at least one light source group 50, At least one first driving component 61, at least one second driving component 62, and a control circuit (not shown); wherein: the exposure platform 30 is for carrying the workpiece and the original; the two first linear sliding rails The 41 series are respectively disposed on two opposite sides of the exposure platform 30 in parallel; the at least one second linear slide 42 is spanned between the two first linear slides 41; the at least one light source The group 50 is disposed on the at least one second linear slide 42. Each of the light source groups 50 has a single light source 51 (which may be a bulb or a light emitting diode) for generating an exposure light source that is irradiated toward the exposure platform 30. The group 50 can also have at least one light source 51, as shown in the eighth figure, which is formed by a plurality of light sources 51.

The at least one first driving component 61 is configured to drive the second linear sliding rail 42 to be displaced along the first linear sliding rail 41; the at least one second driving component 62 is configured to drive each of the light source groups 50 along The second linear slide 42 is displaced, as shown in the fifth figure, the overall exposure machine can set the movement and movement of the at least one second linear slide 42 and the at least one light source group 50 through the control circuit used. speed.

The control circuit is configured to set a movement stroke and a moving speed of the at least one second linear slide 42 and the at least one light source group 50 through the control circuit used, and to set the power of the light source group 50, so that When the exposure light source reaches the predetermined stroke, the power of the light source group is further increased; if the overall exposure machine is provided with the plurality of light source groups 50, as shown in the seventh figure, the control circuit can also control the second linear slides 42. The distance between each of the light source groups 50 is a, and the angle of the light source 51 on each of the light source groups 50, so that the overall exposure machine is not limited to a working platform of a specific size.

When the exposure machine of the present invention is used, the workpiece 20 and the original are fixed on the exposure platform 30 (or the workpiece and the original are transported to the fixed point of the exposure platform by other conveying means), and then through The light source group 50 is displaced along the associated second slide rail 42 and the second linear slide rail 42 is displaced along the first linear slide rail 41 so that the exposure light source generated by the light source group 50 reaches the exposure platform 30 in a timely manner. The area is further exposed and developed on the workpiece 20 on the exposure stage 30.

As shown in the sixth embodiment, in the specific implementation, a plurality of second linear slides 42 and a light source group 50 are disposed between the two first linear slides 41, and a complex array is provided. The first and second driving components 61 and 62 respectively driving the second linear sliding rails 42 and the respective light source groups 50 can shorten the workpieces in the sub-working of the second linear sliding rails 42 and the light source groups 50. 20 The exposure and development time is performed, or a plurality of workpieces are exposed and developed at the same time.

Furthermore, the overall exposure system is provided at least at one of the first linear slide rails 41, and at each end of each of the second linear slide rails 42 is provided with a power-off switch 70 for limiting each of the second linear slide rails 42 and Each of the light source groups 50 is out of the safe range to prevent the associated components from being damaged by the impact of the second linear slide 42 or the light source set 50.

Another embodiment of the present invention is shown in FIG. 9 , which is also provided with an exposure platform 30 , two first linear slides 41 , at least one second linear slide 42 , at least one light source set 50 , at least one a first driving component 61 and at least one second driving component 62, wherein the second linear sliding rail 42 is provided with a third linear sliding rail 43, and the at least one light source group 50 is disposed on the third linear sliding rail 43, the at least one light source group 50 can be operated by the first linear slide rail 41 in the first direction (X direction), and the second linear slide rail 42 can be operated in the second direction (Y direction). The third linear slide 43 is operated in the third direction (Z direction), and wherein the exposure platform 30 can be in the form of a single plane as shown in the figure, or as shown in the tenth figure, the exposure platform 30 is provided with a plurality of The support portion 31 and the transparent portion 32 are disposed adjacent to the first linear slide rail 41 for setting the workpiece 20, and the light transmission portion 32 is disposed between the two first linear slide rails 41. Each of the support portions 31 and the transparent portions 32 are vertically arranged, and a plurality of workpieces 20 are respectively provided in each of the upper and lower support portions 31, and When one of the workpieces 20 completes the processing output, in the embodiment shown in FIG. 11 , after the upper workpiece 20 is output, the light source group 50 is moved downward by the third linear slide 43 to The lower layer is processed at the workpiece 20 to greatly increase work efficiency.

In particular, the light source used to generate the exposure effect of the present invention can be a single-point light source instead of a large-area light source covering the entire exposure platform, so that the number of light bulbs of the light source group can be greatly reduced, and the volume of the overall exposure machine can be relatively reduced, and The device cost is relatively reduced; and the control circuit used can adjust the power of the light source group when the exposure light source reaches a predetermined stroke, so that the heat collecting phenomenon of the overall exposure machine can be relatively reduced.

In particular, the overall exposure machine can be adapted to the specifications of the workpiece, and the stroke setting of the light source group can be adjusted in time to greatly improve the applicability and practicability of the exposure machine; and the light source group only needs to be illuminated by the exposure light source through the exposure platform. The area, so no unnecessary processing costs are wasted.

In summary, the present invention provides a preferably viable exposure machine and an exposure method therefor, and an application for an invention patent according to the law; the technical content and technical features of the present invention are disclosed above, but those skilled in the art It is still possible to make various substitutions and modifications without departing from the spirit of the invention. Therefore, the scope of the present invention should be construed as being limited by the scope of the appended claims

11. . . cabinet

12. . . Exposure room

13. . . Exposure platform

14. . . Light source group

141. . . light bulb

15. . . Linear slide

20. . . Processed object

30. . . Exposure platform

31. . . Support

32. . . Ventilation

41. . . First linear slide

42. . . Second linear slide

43. . . Third linear slide

50. . . Light source group

51. . . light bulb

61. . . First drive component

62. . . Second drive component

70. . . Power off switch

The first figure is a cross-sectional view of a conventional exposure machine.

The second figure is a perspective view of the appearance of an exposure platform of a conventional exposure machine.

The third drawing is a perspective view showing the appearance of the exposure machine of the first embodiment of the present invention.

The fourth drawing is a side structural view of the exposure machine of the first embodiment of the present invention.

The fifth figure is a schematic view of the operation of the exposure machine according to the first embodiment of the present invention.

Figure 6 is a schematic view showing the operation of the exposure machine of the second embodiment of the present invention.

Figure 7 is a schematic view showing the structure of an exposure machine according to a second embodiment of the present invention.

The eighth figure is a schematic structural view of the light source group of the present invention.

The ninth drawing is a perspective view showing the appearance of the exposure machine of the third embodiment of the present invention.

The tenth drawing is an external perspective view of the exposure machine of the fourth embodiment of the present invention.

Figure 11 is a schematic view showing the operation of the exposure machine of the fourth embodiment of the present invention.

20. . . Processed object

30. . . Exposure platform

41. . . First linear slide

42. . . Second linear slide

50. . . Light source group

61. . . First drive component

62. . . Second drive component

70. . . Power off switch

Claims (9)

An exposure machine includes: an exposure platform for carrying a workpiece and an original; two first linear slides are respectively disposed in parallel with two corresponding sides of the exposure platform; at least a second a linear slide rail spanning between the two first linear slide rails; at least one light source group disposed on the at least one second linear slide rail for generating an exposure light source for illuminating the exposure platform; at least one The first driving component is configured to drive the second linear sliding rail to be displaced along the first linear sliding rail; and the at least one second driving component is configured to drive the respective light source groups to be displaced along the associated second linear sliding rail; And a control circuit configured to set a movement stroke and a movement speed of the at least one second linear slide and the at least one light source group, and the control circuit is configured to set the power of the light source group. The exposure machine of claim 1, wherein a plurality of second linear slides and a light source group are disposed between the two first linear slide rails, and a complex array is provided for individually driving each of the second linear slides. The first and second driving components of the rail and the displacement of each light source group. The exposure machine of claim 1, wherein the at least one light source group has at least one light source for generating an exposure light source that is illuminated toward the exposure platform. The exposure machine of claim 3, wherein the light source is a light bulb or a light emitting diode. The exposure machine of claim 1 or 2 is provided with a power-off switch at least at one of the first linear slide rails and at both ends of each of the second linear slide rails. The exposure machine of claim 1 or 2, wherein the exposure machine is provided with a plurality of light source groups, and the control circuit controls the distance between the light source groups on each of the second linear slides. The exposure machine of claim 1 or 2, wherein the second linear slide rail is provided with a third linear slide rail, and the at least one light source set is disposed on the third linear slide rail. The exposure machine of claim 7, wherein the at least one light source group is operated by the first linear slide rail in the X direction, the second linear slide rail is operated in the Y direction, and the third linear slide rail is operated by the third linear slide rail. Perform the Z direction action. The exposure machine of claim 7, wherein the exposure platform is provided with a plurality of support portions and a transparent portion, the support portion is disposed adjacent to the first linear slide rail for setting a workpiece, and the light transmission portion The first support portion and the air-permeable portion are arranged vertically between the two first linear slide rails, so that a plurality of workpieces are respectively disposed on the upper and lower support portions.