CN201438259U

CN201438259U - Exposure machine

Info

Publication number: CN201438259U
Application number: CN200920164339XU
Authority: CN
Inventors: 徐福润
Original assignee: KINTEC PRECISION MACHINERY CO Ltd
Current assignee: KINTEC PRECISION MACHINERY CO Ltd
Priority date: 2009-06-30
Filing date: 2009-06-30
Publication date: 2010-04-14
Anticipated expiration: 2019-06-30

Abstract

The utility model provides an exposure machine, which mainly comprises an exposure platform, two first linear slide rails, at least one second linear slide rail, at least one light source group, at least one first driving component and at least one second driving component, wherein the two first linear slide rails are respectively arranged on the two corresponding sides of an exposure platform; the second linear slide rail spans the space between the two first linear slide rails; the light source group used for producing an exposure light source irradiating towards the exposure platform is arranged on the second linear slide rail; and the first driving component is used for driving the second linear slide rail to displace along the first linear slide rails, and the second driving component is used for driving the light source group to displace along the second linear slide rail, so that the exposure light source reaches the presumptive area of the exposure platform to expose and develop a processed object on the exposure platform.

Description

Exposure machine

Technical field

The relevant a kind of exposure machine of the utility model refers to a kind ofly can carry out exposure operation to the specific region of exposure stage especially, more can not produce the heat build-up phenomenon relatively, and the exposure machine structure that can reduce equipment volume and cost.

Background technology

Press, general printed circuit board (PCB) or semiconductor wafer are when carrying out the exposure imaging processing procedure, on the machined object surface, be coated with earlier the last layer photoresistance, by the irradiation of light source the wiring pattern on the original copy is videoed to the photoresist layer on machined object surface again, so that the chemical property of photoresist layer changes because of the irradiation of light source, and then utilize photoresistance that the removing photoresistance agent will be crossed by light source irradiation or without the photoresistance of exposure from the machined object surface removal, to form configuration corresponding to original copy.

Wherein, in order to the exposure machine basic structure of carrying out the exposure imaging procedure for processing as shown in Figure 1, mainly has an exposure room 12 that constitutes by casing 11, and be provided with an exposure stage 13 that can pass in and out exposure room 12 relatively, and at least these exposure room 12 inside correspond to exposure stage 13 above or below the position, be provided with a light sources 14; Please be simultaneously with reference to shown in Figure 2, this exposure stage 13 is one for placing the transparent platform of machined object 20 with original copy (figure is slightly), overall exposing platform 13 and by one group of linear slide rail, 15 turnover exposure rooms 12.

This exposure stage 13 enters exposure room 12 to the location together with machined object and original copy, generally must make machined object accept the exposure light source irradiation of light sources 14, wait to finish after the exposure again by exposure stage 13 machined object is sent 12 internal stops a period of times of exposure room (not waiting in about 3～5 seconds).

Because, generally commonly use the mode that exposure machine adopts exposure stage 13 to be stuck in exposure room 12 inside more and carry out exposure operation, therefore be provided with the bulb 141 of a large amount of employing array configuration mode more than in its light sources 14, use forming the source of parallel light that contains whole exposure stage 13; Under a large amount of bulbs 141 operate simultaneously, will make the serious heat build-up phenomenon of casing 11 inner generations, need cause equipment cost higher in addition with the heat radiation of water-cooled system.

Other has a kind of exposure machine of commonly using to see through the compound eye device light of bulb is modified to required directional light and area size, its manner of execution is to allow light source bulb see through oval shape mirror utilize one group of first catoptron trend of purchasing compound eye device to make its equalizing light rays light, utilize one group of second catoptron that light is changed working direction again, utilize one group of convex lens that light is modified to required directional light and area size at last, and then project must exposure light source, and use the quantity that reduces bulb.

So design not only makes the structure of integral exposing machine be tending towards complicated, and the body machine of integral exposing machine also relatively more becomes huge; Moreover its same exposure light source of containing whole exposure stage that adopts carries out exposure imaging to machined object; Yet in the exposure imaging processing procedure of reality, the exposure area that is not all machined objects is all suitable with exposure stage, that is some zone of whole exposure stage do not need to be exposed light source irradiation, so the many unnecessary processing costs of excess waste.

The utility model content

In view of this, the technical matters that the utility model solved promptly can be carried out exposure operation to the specific region of exposure stage providing a kind of, more can not produce the heat build-up phenomenon relatively, and the exposure machine structure that can reduce equipment volume and cost.

Take off purpose on reaching, the technical solution of the utility model is: a kind of exposure machine includes: an exposure stage for carrying machined object and original copy; Two first linear slide rails are two corresponding sides that parastate is provided in this exposure stage respectively; At least one second linear slide rail is across between these two first linear slide rails; At least one in order to produce light sources towards the exposure light source of this exposure stage irradiation, be located on this at least one second linear slide rail; At least one in order to drive first driven unit of this second linear slide rail along this first linear slide rail displacement; At least one in order to drive second driven unit of each light sources along the affiliated second linear slide rail displacement; And, set the control circuit of this at least one second linear slide rail and this at least one light sources shift motion and translational speed.

Wherein, between these two first linear slide rails, be provided with plural groups second linear slide rail and light sources, and be provided with plural groups first, second driven unit in order to each second linear slide rail of indivedual drives and each light sources displacement.

At least therein one first linear slide rail two ends, and be provided with cut-off switch at each second linear slide rail two ends.

This exposure machine is provided with plural light sources.

Be equiped with a trilinear slide rail on this second linear slide rail, this at least one light sources then is arranged on this trilinear slide rail.

This at least one light sources is carried out the action of directions X by this first linear slide rail, carries out the action of Y direction by second linear slide rail, and is carried out the action of Z direction by the trilinear slide rail.

This exposure stage is provided with plural support portion and hollow part, and close first linear slide rail is located in order to machined object to be set in this support portion, and this transmittance section then is located between 2 first linear slide rails, and each support portion and hollow part are arranged above and below.

This at least one light sources has at least one in order to produce the light source towards the exposure light source of this exposure stage irradiation.

This light source is bulb or light emitting diode.

Exposure machine mainly is respectively equipped with one first linear slide rail in two corresponding sides of an exposure stage, other has at least one second linear slide rail to stride to be located between two first linear slide rails, and this at least one second linear slide rail is provided with a light sources and produces exposure light source towards the exposure stage irradiation in order to light sources.

And, be provided with one first driven unit in order to drive second linear slide rail along the first linear slide rail displacement, be provided with second driven unit in order to drive light sources along the affiliated second linear slide rail displacement.See through light sources along the affiliated second slide rail displacement, and second linear slide rail allows exposure light source arrive the presumptive area of exposure stage, and the machined object on the exposure stage is carried out exposure imaging along the mode of the first linear slide rail displacement.

Particularly, exposure machine of the present utility model has following effect:

1. can be the single-point light source in order to the light source that produces exposure effect, but not contain the large tracts of land light source of whole exposure stage, so can significantly reduce the bulb quantity of light sources, reduce the volume of integral exposing machine relatively, and reduce equipment cost relatively.

2. employed control circuit can be when exposure light source arrives predetermined stroke, and row increases the power of light sources again, so can reduce the heat build-up phenomenon of integral exposing machine relatively.

3. integral exposing machine can cooperate the specification change of machined object, and adjusts the travel settings of light sources in good time, can significantly promote the applicability and the practicality of exposure machine.

4. light sources only need be exposed the zone of light source irradiation by exposure stage, therefore can not waste unnecessary processing cost.

Description of drawings

Fig. 1 is a structure cut-open view of commonly using exposure machine;

Fig. 2 is the exposure stage stereoscopic figure that commonly uses exposure machine;

Fig. 3 is the exposure machine stereoscopic figure of the utility model first embodiment;

Fig. 4 is the exposure machine construction profile of the utility model first embodiment;

Fig. 5 is the exposure machine action synoptic diagram of the utility model first embodiment;

Fig. 6 is the exposure machine action synoptic diagram of the utility model second embodiment;

Fig. 7 is the exposure machine structural representation of the utility model second embodiment;

Fig. 8 is the structural representation of the utility model light sources;

Fig. 9 is the exposure machine stereoscopic figure of the utility model the 3rd embodiment;

Figure 10 is the exposure machine stereoscopic figure of the utility model the 4th embodiment;

Figure 11 is the exposure machine action synoptic diagram of the utility model the 4th embodiment.

[figure number explanation]

11 casings, 12 exposure rooms

13 exposure stage, 14 light sources

141 bulbs, 15 linear slide rails

20 machined objects, 30 exposure stage

31 support portions, 32 hollow parts

41 first linear slide rails, 42 second linear slide rails

43 trilinear slide rails, 50 light sources

51 bulbs, 61 first driven units

62 second driven units, 70 cut-off switch

Embodiment

As shown in Figures 3 and 4, exposure machine of the present utility model includes: an exposure stage 30, two first linear slide rails 41, at least one second linear slide rail 42, at least one light sources 50, at least one first driven unit 61, and at least one second driven unit 62; Wherein:

This exposure stage 30 is for carrying machined object and original copy; These two first linear slide rails 41 are two corresponding sides that parastate is provided in this exposure stage 30 respectively; This at least one second linear slide rail 42 is across between these two first linear slide rails 41; This at least one light sources 50 is located on this at least one second linear slide rail 42, each light sources 50 has single light source 51 (can be bulb or light emitting diode) in order to produce the exposure light source towards these exposure stage 30 irradiations, this light sources 50 can also have at least one light source 51, as shown in Figure 8, form radiation response by plural light source 51.

As for, this at least one first driven unit 61 is in order to drive this second linear slide rail 42 along these first linear slide rail, 41 displacements; 62 of this at least one second driven units are in order to drive each light sources 50 along affiliated second linear slide rail, 42 displacements, as shown in Figure 5, integral exposing machine can see through shift motion and the translational speed that employed control circuit is set this at least one second linear slide rail 42 and this at least one light sources 50; When if integral exposing machine is provided with plural light sources 50, as shown in Figure 7, this control circuit is the spacing a of 50 of each light sources on each second linear slide rail 42 of may command also, and the angle of light source 51 on each light sources 50, so that integral exposing machine is not limited to the workbench of specific dimensions.

Exposure machine of the present utility model is when using, machined object 20 and original copy are fixed on (or machined object and original copy being transported the fixed point place of this exposure stage of arrival by other conveying device) on this exposure stage 30, see through light sources 50 again along 42 displacements of affiliated second slide rail, and second linear slide rail 42 along the mode of the first linear slide rail displacement 41, arrive the presumptive area of exposure stage 30 when the exposure light source that allows light sources 50 be produced is true, and then the machined object on this exposure stage 30 20 is carried out exposure imaging.

The utility model in the specific implementation as shown in Figure 6, can between these two first linear slide rails 41, be provided with plural groups second linear slide rail 42 and light sources 50, and be provided with plural groups first, second driven

unit

61,62 in order to each second linear slide rail 42 of indivedual drives and 50 displacements of each light sources, under the division of labor operation of plural groups second linear slide rail 42 and light sources 50, can shorten the time that machined object 20 carries out exposure imaging, or simultaneously a plurality of machined objects be carried out exposure imaging.

Moreover, integral exposing machine is one first linear slide rail 41 two ends at least therein, and be provided with cut-off switch 70 at each second linear slide rail, 42 two ends, exceed safe range in order to each second linear slide rail 42 of restriction and each light sources 50, avoid associated components because of suffering second linear slide rail 42 or light sources 50 bumps and damaging.

Be illustrated in figure 9 as another embodiment of the present utility model, it is provided with an exposure stage 30 equally, two first linear slide rails 41, at least one second linear slide rail 42, at least one light sources 50, at least one first driven unit 61, and at least one second driven unit 62, and be equiped with a trilinear slide rail 43 on this second linear slide rail 42, this at least one light sources 50 then is arranged on this trilinear slide rail 43, make this at least one light sources 50 carry out the action of first direction (directions X) by this first linear slide rail 41, carry out the action of second direction (Y direction) by second linear slide rail 42, and carry out the action of third direction (Z direction) by trilinear slide rail 43, and wherein this exposure stage 30 can as shown be the form of single plane, can also be as shown in figure 10, this exposure stage 30 is provided with plural support portion 31 and hollow part 32, this support portion 31 is located near first linear slide rail 41 in order to machined object 20 to be set, 41 of 2 first linear slide rails then are located in this transmittance section 32, each support portion 31 and hollow part 32 are arranged above and below, make each support portion 31 up and down that a plurality of machined objects 20 are set respectively, and when wherein a machined object 20 is finished processing output, among the embodiment as shown in figure 11, after machined object 20 outputs of this top, 50 of this light sources move down by trilinear slide rail 43 and process to lower floor's machined object 20 places, significantly to increase work efficiency.

Particularly, the utility model can be the single-point light source in order to the light source that produces exposure effect, but not contains the large tracts of land light source of whole exposure stage, so can significantly reduce the bulb quantity of light sources, reduce the volume of integral exposing machine relatively, and reduce equipment cost relatively; And employed control circuit can be when exposure light source arrives predetermined stroke, and row increases the power of light sources again, so can reduce the heat build-up phenomenon of integral exposing machine relatively.

Especially, integral exposing machine can cooperate the specification change of machined object, and adjusts the travel settings of light sources in good time, can significantly promote the applicability and the practicality of exposure machine; Add that light sources only need be exposed the zone of light source irradiation by exposure stage, therefore can not waste unnecessary processing cost.

In sum, the utility model provides a preferable feasible exposure machine, and the application of novel patent is offered in the whence in accordance with the law; Technology contents of the present utility model and technical characterstic the sixth of the twelve Earthly Branches disclose as above, yet the personage who is familiar with this technology still may do various replacement and the modifications that do not deviate from this case utility model spirit based on announcement of the present utility model.Therefore, protection domain of the present utility model should be not limited to those disclosed embodiments, and should comprise various do not deviate from replacement of the present utility model and modifications, and is contained by following claim.

Claims

1. an exposure machine is characterized in that, includes:

One exposure stage for carrying machined object and original copy;

Two first linear slide rails are two corresponding sides that parastate is provided in this exposure stage respectively;

At least one second linear slide rail is across between these two first linear slide rails;

At least one in order to produce light sources towards the exposure light source of this exposure stage irradiation, be located on this at least one second linear slide rail;

At least one in order to drive first driven unit of this second linear slide rail along this first linear slide rail displacement;

At least one in order to drive second driven unit of each light sources along the affiliated second linear slide rail displacement; And,

Set the control circuit of this at least one second linear slide rail and this at least one light sources shift motion and translational speed.

2. exposure machine as claimed in claim 1, it is characterized in that, between these two first linear slide rails, be provided with plural groups second linear slide rail and light sources, and be provided with plural groups first, second driven unit in order to each second linear slide rail of indivedual drives and each light sources displacement.

3. exposure machine as claimed in claim 1 or 2 is characterized in that, one first linear slide rail two ends at least therein, and be provided with cut-off switch at each second linear slide rail two ends.

4. exposure machine as claimed in claim 1 or 2 is characterized in that this exposure machine is provided with plural light sources.

5. exposure machine as claimed in claim 1 or 2 is characterized in that, is equiped with a trilinear slide rail on this second linear slide rail, and this at least one light sources then is arranged on this trilinear slide rail.

6. exposure machine as claimed in claim 5 is characterized in that, this at least one light sources is carried out the action of directions X by this first linear slide rail, carries out the action of Y direction by second linear slide rail, and is carried out the action of Z direction by the trilinear slide rail.

7. exposure machine as claimed in claim 5, it is characterized in that this exposure stage is provided with plural support portion and hollow part, this support portion is located near first linear slide rail in order to machined object to be set, this transmittance section then is located between 2 first linear slide rails, and each support portion and hollow part are arranged above and below.

8. exposure machine as claimed in claim 1 is characterized in that, this at least one light sources has at least one in order to produce the light source towards the exposure light source of this exposure stage irradiation.

9. exposure machine as claimed in claim 8 is characterized in that, this light source is bulb or light emitting diode.