JP2001305747A - Exposure device and exposure method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To expose only the desired regions of a photosensitive substrate without increasing the width of light shielding zones disposed at a mask. SOLUTION: This exposure device has blinds 4a and 4b movable in a direction approximately along the moving direction of the mask so as to shield the optical path of illumination light EL emitted from an illumination optical system between the mask (55) and a projection optical system 5. The blinds 41a and 41b are so moved as to cover the segments (light shielding zones) exclusive of the pattern regions 55 of the mask during the synchronous movement of the mask and the photosensitive substrate (56).

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus and an exposure method, and more particularly, to a scanning type which sequentially projects and transfers an image of a pattern formed on a mask onto a substrate while moving the mask and the substrate synchronously. The present invention relates to an exposure apparatus and an exposure method.

[0002]

2. Description of the Related Art In recent years, liquid crystal display panels have been frequently used as display elements for word processors, personal computers, televisions and the like. In particular, a liquid crystal display panel is indispensable as a display element in a notebook type word processor or a notebook type personal computer where portability is important. In recent years, liquid crystal display panels exceeding 20 inches have been put to practical use. However, since the liquid crystal display panels do not require much installation space, they are often used as televisions for general home use.

A liquid crystal display panel is manufactured by patterning a transparent thin-film electrode on a glass substrate into a desired shape by photolithography. As an apparatus for this lithography, a scan type (scanning type) exposure apparatus for transferring an original pattern formed on a mask to a photoresist layer on a glass substrate via a projection optical system has been conventionally used. This scanning type exposure apparatus illuminates a mask using slit-like illumination light emitted from an illumination optical system, and projects an image of an original image pattern formed on the mask onto a plate such as a glass substrate. Then, the entire original pattern formed on the mask is transferred onto the plate by scanning exposure, that is, exposure is performed while moving the mask and the plate synchronously.

In recent years, the size of the liquid crystal display panel has been increasing, and the area of the plate has been increasing year by year.
At present, the enlargement of the plate does not accompany the enlargement of the mask. For this reason, a step-scan type exposure apparatus has been developed in which scan exposure is performed on a portion of a plate, and scan exposure is repeatedly performed at different positions on the plate while sequentially moving the plate in steps.

[0005]

In the above-described scanning type exposure apparatus, since exposure is performed while the mask and the plate are moved synchronously, slit-like illumination light from an illumination light source is applied to the mask. Before reaching the pattern area (the area where the pattern to be transferred is formed) and after passing through the pattern area, it is necessary to shield the plate so as not to expose the plate with the illumination light.
Usually, a light-shielding band (light-shielding region) formed by depositing and forming chromium or the like is provided outside the pattern region of the mask.

Unless such a light-shielding zone is provided, portions other than the portion where the image of the mask pattern is to be transferred are exposed on the plate, and the patterning efficiency is reduced. In addition, it is conceivable to use this part as a scribe line, that is, a part for cutting each circuit after forming a circuit or the like, but with an increase in scanning speed, the width of the scribe line also increases, The patterning efficiency also decreases accordingly.

The light-shielding band has at least a width in the scanning direction of the illumination light (for scanning by a plurality of partial illumination lights separated in the scanning direction, the leading edge of the preceding partial illumination light and the subsequent partial illumination light). It is necessary to make the width sufficiently larger than the width of the illumination light because the acceleration and deceleration sections are generally considered in relation to the maximum speed during scanning. Need to secure.

However, a mask is generally formed by evaporating chromium on a transparent glass substrate. However, if the evaporation area is increased, point defects such as pinholes often occur. A portion which should not be exposed originally is exposed in a dot shape. As described above, when the light-shielding band of the mask is widened, the probability of occurrence of a point defect increases, which is not preferable in performing plate exposure. Further, if the width of the light shielding band is increased,
There is also a problem that the cost of the mask increases.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, and is directed to an exposure apparatus and an exposure method for exposing while synchronously moving a mask on which a pattern is formed and a photosensitive substrate to be exposed. It is another object of the present invention to provide an exposure apparatus and an exposure method capable of exposing only a desired region of a photosensitive substrate without increasing the width of a light-shielding band formed on a mask.

[0010]

In order to solve the above problems, an exposure apparatus according to the present invention synchronously moves a mask (2) on which a pattern (PA) is formed and a photosensitive substrate (6) as an exposure target. A stage device (3, 8), an illumination optical system (1) for illuminating the mask, and a projection optical system (5) for projecting an image of a pattern from the mask onto the photosensitive substrate; While moving the mask and the photosensitive substrate, in an exposure apparatus configured to sequentially project and expose the image of the pattern on the photosensitive substrate, so as to block the optical path of the illumination light emitted from the illumination optical system A direction substantially along the moving direction of the mask (X-axis direction,
SD), wherein the blind is moved so as to cover a part of the mask during the movement of the mask.

In this case, the illumination optical system (1)
A plurality of light emitting portions (2a to 2g) for partially illuminating the mask (2), and an image of a pattern from the mask on the photosensitive substrate as the projection optical system (5). (6) A system having a plurality of partial optical systems (5a to 5g) that partially project onto it can be employed.

According to the present invention, during the movement of the mask (ie,
Since the blind is moved so as to cover a part of the mask (during scanning exposure), for example, a portion outside the pattern region of the mask (a portion corresponding to a portion where a light-shielding band is formed in the past) is blindly moved. If covered, ideally, there is no need to provide a light-shielding band in the mask. However, it is desirable to provide a light-shielding band in the mask in relation to the performance of the blind following the movement of the mask.
In this case, the width (size) of the light-shielding band can be determined by the relationship with the blind following performance regardless of the width of the illumination light and the like, so that the light-shielding band can be made smaller than before. .

In the case where the light-shielding band of the mask is provided in the same manner as in the prior art, even if there is a point defect (pinhole) in the light-shielding band, since the light is shielded by the blind, the point defect is eliminated. Is not transferred to the substrate.

In order to solve the above-mentioned problems, an exposure apparatus according to the present invention moves a mask (2) and a photosensitive substrate (6) relative to illumination light from a light source, and moves the illumination light through the mask. In an exposure apparatus that scans and exposes the photosensitive substrate,
The photosensitive substrates are separated from each other in a first direction (X) in which the photosensitive substrate moves during the scanning exposure, and are arranged so that at least one end partially overlaps in a second direction (Y) orthogonal to the first direction. A projection optical system (5) having a plurality of projection areas to be formed and forming images of the pattern of the mask on the plurality of projection areas; and a plurality of field areas conjugated to the plurality of projection areas with respect to the projection optical system. An illumination optical system (1) for irradiating the illumination light on an illumination area on the mask, the mask moving relative to the illumination area during the scanning exposure, and A stage device (3, 8) for relatively moving the photosensitive substrate, wherein at least a portion of the mask is covered at the time of the scanning exposure, and Characterized in that a light shielding member is moved to the mask in the same direction so as to stop (4).

In this case, although not particularly limited,
The projection optical system (5) includes a plurality of optical units each of which defines the plurality of projection regions in a rectangular shape having the second direction (Y) as a longitudinal direction, and the plurality of optical units each include the pattern. Is re-imaged on the photosensitive substrate (6), and a field stop defining the projection area is arranged on or near the surface on which the primary image is formed. Further, the illumination area is divided into a plurality of areas corresponding to the plurality of viewing areas, and the illumination optical system (1) selectively irradiates the plurality of illumination areas with the illumination light according to movement of the mask. Is done. Further, the light shielding member (4)
Are provided corresponding to the plurality of projection regions, respectively.

In order to solve the above-mentioned problems, a method of manufacturing a display device according to the present invention is directed to a method of manufacturing a display device, comprising the steps of: It is characterized by including a step of transferring onto the top.

In order to solve the above problems, the exposure method of the present invention moves the mask (2) and the photosensitive substrate (6) relative to the illumination light from the light source, and moves the illumination light through the mask. An exposure method for scanning and exposing the photosensitive substrate,
Forming the pattern image of the mask in a plurality of projection areas separated from each other within the field of view of the projection optical system (5), and forming a plurality of field areas conjugate with the plurality of projection areas with respect to the projection optical system during the relative movement. A light shielding member (4) that selectively irradiates with the illumination light and partially blocks the illumination light incident on the photosensitive substrate is moved in the same direction as the mask. In this case, although not particularly limited, the plurality of projection regions are arranged separately from each other with respect to a first direction (X) in which the photosensitive substrate (6) moves during the scanning exposure, and the plurality of projection regions are separated from the first direction. It is arrange | positioned so that at least one end may partially overlap with respect to the orthogonal 2nd direction (Y).

[0018]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an exposure apparatus according to an embodiment of the present invention will be described in detail with reference to the drawings. FIG.
1 is a perspective view of an exposure apparatus according to an embodiment of the present invention. In the following description, X shown in FIG.
An YZ orthogonal coordinate system is set, and the positional relationship of each member will be described with reference to the XYZ orthogonal coordinate system. In the XYZ orthogonal coordinate system shown in FIG. 1, the direction (scanning direction) in which the mask 2 on which a predetermined original pattern PA is formed and the plate 6 on which a resist is applied on a glass substrate is defined as an X-axis direction. The direction orthogonal to the X axis in the plane of the mask 2 is set to the Y axis direction, and the normal direction of the mask 2 is set to the Z axis method. In the XYZ coordinate system in FIG. 1, the XY plane is actually set to a plane parallel to the horizontal plane, and the Z axis is set vertically upward.

In FIG. 1, an illumination optical system 1 emits illumination light having substantially uniform illuminance to uniformly illuminate a mask 2 in an XY plane in the figure. The illumination optical system 1 preferably has, for example, the configuration shown in FIG. FIG. 2 is a diagram showing an example of a specific configuration of the illumination optical system 1 shown in FIG.

In FIG. 2, a light source such as a mercury lamp for supplying g-line (436 nm) or i-line (365 nm) illumination light is provided inside the elliptical mirror 20, and the illumination light from this light source is provided. Are collected by the elliptical mirror 20.
The illumination light condensed by the elliptical mirror 20 forms a light source image at the incident end of the light guide 21 via the shutter 20a.
Here, the shutter 20a transmits the illumination light when in the open state, but shuts off the illumination light and stops the illumination of the mask 2 when in the closed state. Light guide 21
Are uniform light intensity distributions at the emission ends 21a and 21b.
The next light source surface is formed. Note that the light guide 21 is desirably composed of randomly bundled optical fibers.

The light beam emitted from the light guide 21 reaches the fly-eye lenses 23a and 23b via the relay lenses 22a and 22b, respectively. A plurality of secondary light sources are formed on the exit surface side of these fly-eye lenses 23a and 23b. Light from the plurality of secondary light sources is passed through condenser lenses 24a and 24b provided such that the front focal point is located at the secondary light source forming position, and the opening 25 has a rectangular shape.
The field stop 25 having a and 25b is uniformly illuminated.

Illumination light passing through the field stop 25 passes through lenses 26a and 26b and mirrors 27a and 27b, respectively.
The optical path is deflected by 90 °, and the lenses 28a and 28b
Reach Here, the lens 26a and the lens 28a and the lens 26b and the lens 28b are
Is a relay optical system that conjugates
8b passes through the apertures 25a, 25a of the field stop 25.
Illumination areas 29a and 29b, which are images of 25b, are formed.

The apertures 25a, 25 of the field stop 25
The shape of b is not limited to a rectangular shape. It is desirable that the shape of the illumination area be as similar as possible to the shape of the field of view of the projection optical system. Also, in FIG. 2, for simplicity of description, only the optical axis of the illumination optical system forming the illumination regions 29c to 29g is shown. Although not shown in FIG. 2, the light emitting ends of the light guide 21 are provided corresponding to the number of the illumination regions, and the illumination regions 29 c to 29 g are provided with the light guides 21 of the light guide 21 not shown. Illumination light from the exit end is supplied.

In the present embodiment, the field stop 25 is arranged on a surface conjugate to the pattern forming surface of the mask 2 or in the vicinity thereof in the illumination optical system, but the field stop 25 is arranged close to the pattern forming surface. The field stop 25 may be arranged on the surface conjugate to the pattern forming surface of the mask or in the vicinity thereof in the projection optical system 5 described later.

The shutter 20a described above is omitted,
In the middle of the optical path of each of the illumination optical systems forming the illumination areas 29a to 29g (for example, the field stop 25 and the lenses 26a, 26
b) between the illumination areas 29a to 29
The illumination light illuminated on g may be selectively stopped.

Further, as shown in FIG. 2, when one light source is insufficient in light quantity, a configuration as shown in FIG. 3 may be applied. FIG. 3 is a diagram schematically illustrating a main part of a modified example of the illumination optical system. In FIG. 3, the light guide 32 has five emission ends 32a to 32e. However, as is clear from FIGS.
Has seven emission ends, and FIG. 3 shows five emission ends for convenience. In FIG. 3, illumination light from light sources 30 a to 30 c such as a mercury lamp is
The light is condensed by a to 31c to form a light source image. The light guide 32 is provided so that the incident end is located at the light source image forming position. Illumination light passing through the light guide 32 is applied to the plurality of exit ends 32a to 32e with a uniform secondary light intensity distribution. Form a light source surface. This light guide 3
It is desirable that the optical fiber 2 is also configured by randomly bundling optical fibers similarly to the light guide 21 of FIG. Injection end 32
The optical path from a to 32e to the mask 2 is the same as the illumination optical system shown in FIG.

The above-mentioned plurality of illumination areas 29a to 29a-2
Instead of a plurality of illumination optical systems forming 9g, an illumination optical system that illuminates the mask 2 with one rectangular area extending in a direction (Y-axis direction) orthogonal to the scanning direction (X-axis direction) is applied. May be. As such an optical system, a system using a rod-shaped light source extending in the Y-axis direction can be considered. In the present example (FIGS. 1 and 2), seven illumination areas 29a to 29g are formed, but the number may be arbitrary, and similarly, the illumination optical system and the projection optical system may be formed according to the number of illumination areas. And set it. At this time, one illumination optical system or projection optical system may be provided corresponding to at least two illumination regions. Further, in FIG. 3, the light guide 32 has three input ends, but the number may be arbitrary, for example, the number of branches (the number of light guides emitted), the illuminance required on the plate 6, and What is necessary is just to determine according to the power of a light source, etc. Of course, the exit end of the light guide may be determined according to the number of illumination optical systems (illumination areas), and the combination of the number of the entrance end and the exit end of the light guide is arbitrary.

Returning to FIG. 1, the mask 2 is placed on a mask stage 3 which can move in parallel in the X-axis direction in the figure. An illumination optical system 1 is provided below the mask 2 and the mask stage 3.
A blind 4 is provided to block illumination light emitted from the mask 2 and transmitted through the mask 2.

The blind 4 is configured to be movable in a space, and its moving operation is set variously. For example, it is configured to be able to translate in the XY plane, or to be rotatable about a point outside the blind 4 in the ZX plane.

The blind 4 may be made of the plate-like member shown in FIG. 1. For example, a flexible sheet having a light shielding portion formed at a predetermined position by a transparent material having flexibility is not shown. It may be configured to be movable by winding it up with a pair of rollers. Although only one blind 4 is shown in FIG.
May consist of a plurality of blinds.

Further, FIG. 1 shows a case where the illumination light passing through the mask 2 is blocked by only one blind 4, but the visual field regions 2a to 2g of the illumination optical system 1 shown in FIG.
A blind may be provided for each of the visual field regions 2a to 2g so as to individually shield each light. Also in this case, a plurality of blinds may be provided for each of the visual field regions 2a to 2g. Further, different blinds are provided for the visual field regions 2a to 2d and the visual field regions 2e to 2g, that is, the visual field regions having the same position in the scanning direction (X-axis direction) of the mask 2 are defined as one group, and the blinds are provided for each group. It may be provided. Further, the position of the blind 4 is not limited to between the mask 2 and the projection optical system 5, but may be between the projection optical system 5 and the plate 6, or a plane conjugate with the mask pattern formation surface in the projection optical system 5 or You may make it arrange | position in the vicinity.

Hereinafter, the projection optical system 5 will be described with reference to FIG. The projection optical system 5 includes a partial projection optical system 5.
Since each of the partial projection optical systems 5a to 5g has the same configuration, only the partial projection optical system 5a will be described to simplify the description.

FIG. 4 is a lens configuration diagram of the partial projection optical system 5a. The partial projection optical system 5a has a configuration in which two sets of Dyson optical systems are combined. 4, the partial projection optical system 5a includes a first optical system 40 and a field stop 41.
And a second optical system 42. The first optical system 40 and the second optical system 42 are each obtained by modifying the Dyson-type optical system.

The first optical system 40 includes a right-angle prism 4 having a reflection surface disposed at an angle of 45 ° with respect to the surface of the mask 2.
And a plano-convex lens component 44 having an optical axis along the in-plane direction of the mask 2 and having a convex surface facing the opposite side of the right-angle prism 43.
A lens component 45 having a reflective surface with a meniscus shape as a whole and a concave surface facing the plano-convex lens component 44 side.
And a right-angle prism 46 having a reflection surface orthogonal to the reflection surface of the right-angle prism 43 and arranged at an inclination of 45 ° with respect to the mask 2 surface.

The light from the illumination optical system 1 through the mask 2 has its optical path deflected by 90 ° by the right-angle prism 43, and the plano-convex lens component 4 joined to the right-angle prism 43.
4 is incident. The plano-convex lens component 44 includes a lens component 4 made of a glass material different from the plano-convex lens component 44.
5, the light from the right-angle prism 43 is refracted at the joint surface 44a between the plano-convex lens component 44 and the lens component 45, and reaches the reflective surface 45a on which the reflective film is deposited.

The light reflected by the reflecting surface 45a is
The light is refracted at 4 a and reaches a right-angle prism 46 joined to the plano-convex lens component 44. The light from the plano-convex lens component 44 has its optical path deflected by 90 ° by the right-angle prism 46,
A primary image of the mask 2 is formed on the exit surface side of the right-angle prism 46. Here, the primary image of the mask 2 formed by the first optical system 40 is an equal-magnification image in which the lateral magnification in the X-axis direction (optical axis direction) is positive and the lateral magnification in the Y-axis direction is negative. is there.

The light from the primary image forms a secondary image of the mask 2 on the plate 6 via the second optical system 42. Second
Like the first optical system 40, the configuration of the optical system 42 includes a right-angle prism 47 having a reflection surface disposed at an angle of 45 ° with respect to the surface of the mask 2, and a light along the in-plane direction of the mask 2. A plano-convex lens component 48 having an axis and a convex surface facing the opposite side of the right-angle prism 47; a lens component 49 having a meniscus shape as a whole and having a concave surface facing the plano-convex lens component 48 side; And a right-angle prism 50 having a reflecting surface orthogonal to the 47 reflecting surfaces and arranged at an angle of 45 ° with respect to the mask 2 surface.

The light emitted from the exit surface side of the right-angle prism 46 has an optical path of 90 degrees by the right-angle prism 47.
And is incident on the plano-convex lens component 48 joined to the right-angle prism 47. A lens component 49 made of a glass material different from the plano-convex lens component 48 is joined to the plano-convex lens component 48, and light from the right-angle prism 47 is applied to a joint surface between the plano-convex lens component 48 and the lens component 49. 4
The light is refracted at 8a and reaches the reflection surface 49a on which the reflection film is deposited.

The light reflected by the reflecting surface 49a is
The light is refracted at 8 a and reaches a right-angle prism 50 joined to the plano-convex lens component 48. The light from the plano-convex lens component 50 has its optical path deflected by 90 ° by the right-angle prism 46,
A secondary image of the mask 2 is formed on the plate 6. This second
Like the first optical system 40, the optical system 42 forms an equal-magnification image with a lateral magnification of positive in the X-axis direction and negative in the Y-axis direction. Therefore, the secondary image formed on the plate 6 is an erect image of the same magnification of the mask 2 (an image having a positive horizontal magnification in the vertical and horizontal directions). Here, the partial projection optical system 5a (the first optical system 40 and the second optical system 42) is a double-sided telecentric optical system.

The first optical system 40 and the second optical system 42 are configured so that the reflection surfaces 45a and 49a are oriented in the same direction. This makes it possible to reduce the size of the entire projection optical system. The first optical system 40 and the second optical system 42 according to the present embodiment include plano-convex lens components 44 and 4.
8 and the reflecting surfaces 45a and 49a are filled with a glass material in the optical path. Thereby, the plano-convex lens component 4
There is an advantage that no eccentricity occurs between the reflection surfaces 45a and 49a.

As shown in FIG. 5, the first optical system 40 and the second optical system 42 include a plano-convex lens component 44,
A configuration of a so-called Dyson-type optical system itself, in which air is provided between 48 and the reflecting surfaces 45a and 49a, may be used.

In this embodiment, the field stop 41 is disposed at the position of the primary image formed by the first optical system 40. FIG. 6 is a diagram illustrating an example of the field stop 41. The field stop 41 has, for example, a trapezoidal opening 41a as shown in FIG. With this field stop 41,
The exposure area on the plate 6 is defined in a trapezoidal shape.

Here, as shown by a broken line in FIG.
In the Dyson optical system according to the present embodiment, the plano-convex lens component 44, the lens component 45, the plano-convex lens component 48,
Since the cross section (YZ plane) of the lens component 49 is circular, the maximum field of view that can be taken is substantially semicircular.
At this time, the trapezoidal viewing region 2a defined by the field stop 41 preferably has a short side of the pair of parallel sides facing the arc side of a semicircular region (region of the largest field of view).
Thereby, the width of the visual field region in the scanning direction (X-axis direction) can be maximized with respect to the maximum visual field region that the Dyson optical system can take, and the scanning speed can be improved.

As the field stop 41, FIG.
As shown in (1), a configuration having a hexagonal opening 41b may be employed. At this time, as shown in FIG.
The size of the hexagonal opening is within the range of the maximum viewing area indicated by the broken line in the figure. 6B and FIG.
The maximum viewing area indicated by the broken line in FIG.
Of the off-axis light beams that pass through the second optical system 42 without vignetting, it is a region surrounding the point where the light beam passing the outermost passes on the mask 2.

Returning to FIG. 1, the arrangement of the partial projection optical systems 5a to 5g will be described. In FIG. 1, the partial projection optical systems 5a to 5g are composed of field regions 2a to 2g defined by a field stop 41 provided in the partial projection optical systems 5a to 5g.
2 g. The images of these visual field regions 2a to 2g are formed as the same-size erect images on the exposure regions 6a to 6g on the plate 6. Here, the partial projection optical systems 5a-5
d is provided so that the viewing areas 2a to 2d are arranged along the Y-axis direction in the drawing.

The partial projection optical systems 5e to 5g are provided at positions different from the visual field regions 2a to 2d in the X-axis direction in the figure so that the visual field regions 2e to 2g are arranged along the Y-axis direction. ing. At this time, the partial projection optical systems 5a to 5d
And the partial projection optical systems 5e to 5g are provided such that their right-angle prisms are located very close to each other. In the X-axis direction, the partial projection optical systems 5a to 5g may be arranged so as to widen the interval between the visual field regions 2a to 2d and the visual field regions 2e to 2g.
Scanning amount for performing scanning exposure (mask 2 and plate 6
Undesirably increases the amount of movement) and decreases the throughput.

On the plate 6, the partial projection optical systems 5a to 5a
Exposure regions 6a to 6d arranged along the Y-axis direction in the figure are formed by 5d, and are arranged along the Y-axis direction at positions different from the exposure regions 6a to 6d by the partial projection optical systems 5e to 5g. Exposure areas 6e to 6g are formed.
These exposure areas 6a to 6g are erect images at the same magnification as the visual field areas 2a to 2g.

Here, as described above, the mask 2 is mounted on the mask stage 3 which can move in parallel in the X-axis direction in the figure, and the plate 6 is mounted on the plate stage 7. Further, the plate stage 7 is mounted on an XY stage 8 which can be translated in the XY plane. Further, the mask stage 3 and the plate stage 7 move synchronously in the X-axis direction in the figure. Thus, the image of the mask 2 illuminated by the illumination optical system 1 is sequentially transferred onto the plate 6, and so-called scanning exposure is performed. When the scanning of the entire surface of the mask 2 by the viewing areas 2a to 2g is completed by the movement of the mask 2, an image of the mask 2 is formed over the entire surface of the plate 6 (partly in the case of the step scan method). Transcribed.

On the plate stage 7, a reflecting member 9 having a reflecting surface along the Y-axis and a reflecting member 10 having a reflecting surface along the X-axis are provided. Further, on the exposure apparatus main body side, for example, He-Ne (wavelength
33 nm), a beam splitter 12 that splits the laser light from the laser light source 11 into a laser beam for measuring in the X-axis direction and a laser beam for measuring in the Y-axis direction, and from the beam splitter 12. And a prism 13 for projecting the laser beam from the beam splitter 12 to two points on the reflecting member 10. Thereby, the position of the plate stage 7 in the X-axis direction, the position in the Y-axis direction, and the rotation in the XY plane can be detected. In FIG. 1, a detection system for detecting the laser light reflected by the reflection members 9 and 10 and the reference laser light after making them interfere with each other is not shown.

Next, the arrangement of the viewing area according to the present embodiment will be described with reference to FIG. FIG. 7 is a diagram showing a planar positional relationship between the field of view regions 2a to 2g by the partial projection optical systems 5a to 5g and the mask 2. In FIG. 7, an original pattern PA is formed on a mask 2, and a light-shielding portion LSA is provided so as to surround a region of the original pattern PA. The width of the light-shielding portion LSA is approximately the same as the width generally formed conventionally, for example, 2 mm.

The illumination optical system 1 shown in FIG. 2 uniformly illuminates the illumination areas 29a to 29g surrounded by broken lines in the figure. The visual field regions 2a to 2g described above are arranged in the illumination regions 29a to 29g. These viewing areas 2a
.About.2 g is a field stop 41 in the partial projection optical systems 5a.about.5g.
Thereby, the shape becomes substantially trapezoidal. Here, the upper side (short side of a pair of parallel sides) of the visual field regions 2a to 2d
And the upper sides (short sides of a pair of parallel sides) of the viewing areas 2e to 2g are arranged to face each other. here,
The shapes of the viewing areas 2a and 2d along the light-shielding portion LSA are as follows:
The oblique side (the side other than the pair of parallel sides) on the light shielding portion LSA side is defined so as to coincide with the edge of the area of the original pattern PA. Note that the viewing areas 2a and 2d are
The shape may overlap with SA.

In the present embodiment, the partial projection optical system 5
Since a to 5g are bilateral telecentric optical systems, X
In the Y plane, the areas occupied by the partial projection optical systems 5a to 5g are larger than the areas occupied by the visual field areas 2a to 2g, respectively. Therefore, the arrangement of the viewing areas 2a to 2d is
It is inevitable to have a space between the respective regions 2a to 2d. In this case, if scanning exposure is performed using only the visual field areas 2a to 2d, the area on the mask 2 between the visual field areas 2a to 2d cannot be projected and transferred onto the plate 6. Therefore, in the present embodiment, in order to perform scanning exposure on the area between the visual field areas 2a to 2d, the partial projection optical systems 5e to 5g use the visual field areas 2e to 5g.
It is configured to provide 2 g.

At this time, it is desirable that the sum of the widths of the visual field regions 2a to 2g (or the exposure regions 6a to 6g) along the scanning direction (X-axis direction) is always constant at any position in the Y-axis direction. . Hereinafter, the exposure amount will be described with reference to FIG. FIG. 8 is a diagram for explaining an exposure amount in each of the visual field regions 2a to 2g. 8, the horizontal axis indicates the position on the plate 6 in the Y-axis direction, and the vertical axis indicates the exposure amount. FIG. 8A is a diagram showing the exposure amount of each of the exposure regions 6a to 6g, and FIG.
It is a figure which shows the sum of the exposure amount of a-6g.

In FIG. 8A, on the plate 6,
Exposure amount distributions Ea to Eg corresponding to the trapezoidal exposure regions 6a to 6g are obtained. Here, since the sum of the widths of the exposure regions 6a to 6g in the X-axis direction is defined to be constant when performing the scanning exposure, the exposure regions 6a to 6g are defined.
The same exposure amount is always obtained for the region where g overlaps. For example, regarding the area where the exposure distribution Ea corresponding to the exposure area 6a and the exposure distribution Ee corresponding to the exposure area 6e overlap, the width of the exposure area 6a in the X-axis direction and the X
Since the sum with the width in the axial direction is constant, the sum of the exposure amounts in the overlapping region is the same as the exposure amount in the non-overlapping region. Therefore, as shown in FIG. 8B, a uniform exposure amount distribution E is obtained on the plate 6 over the entire surface.

In the above description, the exposure regions 6a to 6a
The case where g is trapezoidal is described, but the combination of exposure regions for obtaining a uniform exposure distribution is not limited to trapezoidal. For example, the opening 4 having the shape shown in FIG.
When a plurality of hexagonal exposure regions are formed by the field stop 41 having 1b, each exposure region is defined so that the width of each exposure region in the scanning direction is always constant. Thereby, a uniform exposure amount distribution can be obtained over the entire surface of the plate 6.

Next, the operation of the exposure apparatus of this embodiment will be described. In the exposure apparatus of the present embodiment, as described above, the blind 4 can have various configurations. Therefore, in the following description, the operation of the exposure apparatus will be described for each configuration of the blind 4.

[First Operation Example] FIGS. 9 and 10 are diagrams for explaining a first operation example of the exposure apparatus according to the present embodiment. In FIGS. 9 and 10, for ease of understanding, of the members shown in FIG. 1, the area of the mask 2 where the original pattern PA is formed, the blind 4, the projection optical system 5, and the like.
And only the area of the plate 6 to be exposed is schematically shown.

9 and 10, the area of the mask 2 where the original pattern PA is formed is denoted by reference numeral 55 and is referred to as a pattern area, and the area of the plate 6 to be exposed is denoted by reference numeral 56. Is referred to as a region to be exposed. 9 and 10 show only the pattern region 55 of the mask, the scanning direction S of the pattern region 55 is not shown.
A light-shielding portion LSA is formed at a peripheral portion including the D side and the side opposite to the scanning direction SD.

FIGS. 9 and 10 illustrate the operation of the exposure apparatus when the blind 4 shown in FIG. 1 is composed of two blinds 4a and 4b. The blinds 4a and 4b have a substantially rectangular shape, and are arranged between the mask 2 and the projection optical system 5 so as to be parallel to the XY plane (mask 2) by shifting the position in the Z direction in FIG. ing. Furthermore,
9 and 10, the projection optical system 5 in FIG. 1 is schematically shown, and a partial projection optical system 5a of the projection optical system 5 is shown.
Reference numerals 60, 61, and 62 are respectively assigned to the first optical system 40, the field stop 41, and the second optical system 42 (see FIG. 4) included in the optical system 40 to 5g.
And is simplified for simplicity. When the illumination light EL emitted from the illumination optical system 1 in FIG. 1 enters the first optical system 60, the exposure area 56 is exposed through the field stop 61 and the second optical system 62.

In FIGS. 9 and 10, the first optical system 60, the field stop 61, and the second optical system 62 are spatially stationary, and the pattern area 55, the blind 4a,
4b and the exposure region 56 move in the scanning direction indicated by SD in the drawing (X-axis direction in FIG. 1). Blind 4a,
The width 4b in the scanning direction SD is set to a width sufficient to cover the upper part of the first optical system 60.

Before the start of the exposure operation, the illumination light EL emitted from the illumination optical system 1 as shown in FIG.
The blind 4 a is disposed above the first optical system 60 so that the light does not enter the first optical system 60. In the present embodiment, the illumination light EL is also emitted before the exposure operation is started, that is, before the pattern area 55 of the mask 2 and the exposed area 56 of the plate 6 move in the scanning direction SD in synchronization. Irradiated. When the exposure operation is started, the pattern area 55 of the mask 2 and the exposed area 56 of the plate 6 start moving in the scanning direction SD in synchronization.

The blind 4a also starts operating in the scanning direction SD, but as shown in FIG. 9B, the end 55a of the pattern area 55 and the end 56 of the area 56 to be exposed.
Until a is located at the position ES, the blind 4a moves so that the end 63 does not advance toward the scanning direction SD with respect to the position ES. That is, the end 55 of the pattern area 55
a, the end 63 of the blind 4a and the end 56a of the exposed area 56 are arranged on the same plane perpendicular to the scanning direction SD, and the original pattern formed in the pattern area 55 from the time when it is located at the position ES. Exposure to the exposed region 56 is started.

When the exposure is started, as shown in FIG. 9C, the pattern area 55, the blind 4a, and the exposed area 56 move synchronously at the same speed in the scanning direction SD. Advance. As the exposure proceeds, as shown in FIG. 9D, when the end 63 of the blind 4a passes the position indicated by the symbol E1, the blind 4a stops moving. On the other hand, even if the blind 4a stops moving, the pattern area 55 and the exposure area 56 continue to move in the scanning direction SD in synchronization at the same speed to perform exposure.

The pattern area 55 and the exposure area 56 continue to move in synchronization with each other in the scanning direction SD, and as shown in FIG. 10A, the end 55b of the pattern area 55 and the end of the exposure area 56. When 56b reaches the position ES, the blind 4b moves so that the end 64 of the blind 4b is located at the position ES. That is, when the end 55b of the pattern region 55 reaches the position ES, the illumination light EL
As a result, the light-shielding portion LSA formed on the mask 2 is illuminated. If the light-shielding portion LSA has a point defect such as a pinhole, a portion to be exposed other than a portion to be exposed occurs, which is prevented. Therefore, light passing through areas other than the pattern area 55 is blocked by the blind 4b.

Thereafter, the pattern area 55 and the exposed area 56 move in the scanning direction SD at a constant speed while being synchronized with each other, but as shown in FIG.
Of the blind 4b, the end 64b of the blind 4b, and the end 56b of the exposed area 56 are kept in the same plane perpendicular to the scanning direction SD. It moves in synchronization with the area 56.

When the pattern area 55, the blind 4b, and the exposed area 56 advance synchronously in the scanning direction SD, and the end 64 of the blind 4b is located at the position EE in FIG. Since the illumination light EL covers the upper part of the first optical system 60 and does not enter the first optical system 60, the exposure ends in this state. Then, FIG.
As shown in (d), in a state where the end portion 64 of the blind 4b advances beyond the position EE in the scanning direction SD, and the end portion 65 of the blind 4b is positioned forward of the position ES in the scanning direction SD. , The operation of the pattern area 55, the blind 4b, and the area to be exposed 56 are stopped, and the series of exposure operations ends.

[Second Operation Example] FIGS. 11 and 12 are views for explaining a second operation example of the exposure apparatus according to the present embodiment.
In FIGS. 11 and 12, similarly to FIGS. 9 and 10, for ease of understanding, of the members shown in FIG. , The projection optical system 5 and the area of the plate 6 to be exposed are schematically shown. The area of the mask 2 where the original pattern PA is formed is denoted by reference numeral 55 and is referred to as a pattern area. Code 56
And is referred to as a region to be exposed.

In the exposure apparatus shown in FIGS. 11 and 12,
Similar to the exposure apparatus shown in FIGS.
As two blinds 4c and 4d as blinds 4a and
4b, but with blinds 4c,
The width 4d in the scanning direction SD is set to be smaller than the width of the blinds 4a and 4b. The widths of the blinds 4c and 4d should be at least enough to cover the upper part of the first optical system 60.

In this operation example, the illumination optical system 1 in FIG. 1 controls, for example, the shutter 20a shown in FIG. 2 to control whether or not to emit the illumination light EL. Others
The arrangement of each member shown in FIG. 11 and FIG.
The arrangement is similar to that shown in FIG.

Before the start of the exposure operation, FIG.
As shown in (2), for example, the shutter 20a (see FIG. 2) is closed, and the illumination light EL is not emitted. Therefore, the blinds 4c and 4d need not be disposed above the first optical system 60 as in the first operation example. FIG. 11 (a)
In the example shown in FIG. 5, the blinds 4c and 4d are located below the pattern area 55. When the exposure operation is started, the pattern area 55 of the mask 2, the blind 4c, and the exposed area 56 of the plate 6 are synchronized with each other in the scanning direction S.
Start moving to D.

In this case, as shown in FIG. 11B, before reaching the position ES, the pattern area 55, the blind 4c, and the exposed area 56 have their ends 55a, 66, and 66. The portion 56a is placed in the same plane perpendicular to the scanning direction SD. Also, the pattern area 55
Before the exposure region 56 reaches the position ES, the shutter 20a is opened after the blind 4c covers the upper part of the first optical system 60, and the illumination light E
L is emitted.

With the end 55a of the pattern area 55, the end 66 of the blind 4c, and the end 56a of the exposed area 56 arranged on the same plane perpendicular to the scanning direction SD,
It moves in the scanning direction SD while maintaining synchronization, and from the time when it reaches the position ES, exposure of the exposed area 56 of the original pattern formed in the pattern area 55 is started (FIG. 11).
(C)). When the exposure is started, the pattern area 55, the blind 4c, and the exposed area 56 are synchronously moved at the same speed in the scanning direction SD to advance the exposure.

When the exposure advances and the end 66 of the blind 4c passes through the position EE, as shown in FIG. 11D, the blind 4c stops moving. Meanwhile, blind 4
Even if c stops moving, the pattern area 55 and the exposure area 56 continue to move in the scanning direction SD in synchronization at the same speed. The pattern area 55 and the exposure area 56 continue to move in synchronization with each other in the scanning direction SD, and as shown in FIG. 12A, the end 55b of the pattern area 55 and the exposure area 5
At the time when the end 56b of the blind 6 reaches the position ES, the end 67 of the blind 4d is located at the position ES.
The blind 4d moves.

Thereafter, the pattern area 55 and the exposed area 56 move in the scanning direction SD at a constant speed while being synchronized with each other.
The blind 4d moves in synchronization with the pattern area 55 and the exposed area 56 so that the end 67 of the exposed area 56 and the end 56b of the exposed area 56 are maintained in the same plane perpendicular to the scanning direction SD. Then, as shown in FIG.
The exposure ends when the position EE is reached. FIG. 12 (c)
When the end 67 of the blind 4d passes through the position EE, the blind 4d covers the upper part of the first optical system 60 as shown in FIG.

In this state, for example, the shutter 20a
Is closed to stop the irradiation of the illumination light EL. And
Pattern area 55, blind 4d, and exposed area 5
6 is a predetermined distance, for example, blind 4c and blind 4d
Are moved by such a distance that they overlap in the direction perpendicular to the scanning direction (see FIG. 12D), a series of exposure operations ends.

In the above-described first operation example, the size of the blind 4a is inevitably increased because the illumination light EL is emitted while the blind 4a starts moving and is performing an acceleration operation. Although it was necessary, in the second operation example, the illumination light EL was not emitted using the shutter 20a while the blind 4c started moving and was performing the acceleration operation, and even after the exposure, Since the illumination light EL is not illuminated, the size of the blind can be reduced.

In the first and second operation examples described above, the case where the blinds 4a to 4d are arranged between the mask 2 and the projection optical system 5 has been described as an example. The same effect can be obtained by disposing .about.4d between the projection optical system 5 and the plate 6 in which the exposure region 56 is set. Further, the blinds 4a to 4d may be arranged between the first optical system 60 and the second optical system 62,
When it is arranged at this position, the moving direction of the blinds 4a to 4d is opposite to the scanning direction SD.

Of the three positions between the mask 2 and the projection optical system 5, between the projection optical system 5 and the plate 6, or between the first optical system 60 and the second optical system 62, the blind 4a And the blind 4b may be arranged at different locations. This is the same when the blind 4c and the blind 4d are arranged.

[Third Operation Example] Next, a third operation example will be described. FIG. 13 shows a third example of the exposure apparatus according to the present embodiment.
FIG. 13 is a diagram illustrating an operation example, and the same members as those illustrated in FIGS. 9 to 12 are denoted by the same reference numerals. In the first operation example and the second operation example described above, the mask 2
Although the operation in the case where the blinds 4a to 4d that move in a plane parallel to the rotation axis c are described, in this operation example, the blinds 4a to 4d are arranged in parallel with the rotation axis c, and are arranged on a circumference around the rotation axis c. Are provided with flat plate-shaped blinds 4e and 4f, respectively, arranged perpendicularly to each other, and by rotating the blinds 4e and 4f about the rotation axis c, the same effects as in the first operation example and the second operation example will be obtained. It is assumed that.

The operation of the blinds 4e and 4f is as follows. When the exposure operation is started, the pattern area 55 and the exposed area 56 move in the direction indicated by the symbol SD in synchronization with each other, but in synchronization with this moving speed, the blinds 4e and 4f move the rotation axis c. Rotate on the circumference as the center.

When the end 55a of the pattern area 55 and the end 56a of the exposed area 56 reach the position ES, the blind 4e rotates so as to gradually open the upper part of the first optical system 60. During the exposure, the blind 4e and the blind 4f completely open the upper part of the first optical system 60, and the end 55b of the pattern area 55 and the end 56b of the exposed area 56 are located at the position ES. At this point, the blind 4f gradually rotates to close the upper part of the first optical system 60.

In the first and second operation examples, since the blinds 4a to 4d are moved in the scanning direction SD, it is necessary to arrange a mechanism for moving the blinds 4a to 4d in the scanning direction SD. It was necessary to secure a space for device configuration in the direction SD. In contrast,
Blinds 4e, 4d performing the operation described in the third operation example
Is used, the same effect as in the first operation example and the second operation example can be obtained by securing a space for the device configuration in a direction perpendicular to the scanning direction SD. Therefore, when space in the scanning direction SD cannot be secured due to the configuration of the apparatus, it is preferable to use the blinds 4e and 4f.

When the blinds 4a to 4d described in the first operation example and the second operation example are used, the blind 4a
a and the blind 4b, or the blind 4c and the blind 4d, need to be individually driven. Therefore, there is a possibility that the driving mechanism may be enlarged. However, if the blinds 4e and 4f rotating on the circumference are used, the Only one drive mechanism is required, and the device configuration can be simplified.

In the example shown in FIG. 13, the case where two blinds 4e and 4f are arranged on the circumference has been described as an example, but the number is not limited to two and may be arbitrary. . Further, the arrangement of the blinds 4e and 4f is not limited between the mask 2 in which the pattern area 55 is formed and the projection optical system 5, but between the first optical system 60 and the second optical system 62 or the projection optical system. The position between the system 5 and the plate 6 in which the exposure region 56 is set may be the same as in the first operation example and the second operation example. However, when the blinds 4e and 4f are arranged between the first optical system 60 and the second optical system 62,
The rotation direction is opposite to the case where the rotation direction is set at another position.

[Fourth Operation Example] FIGS. 14 and 15 are views for explaining a fourth operation example of the exposure apparatus according to the present embodiment. The same members as those shown in FIGS. , Are denoted by the same reference numerals. In the above-described third operation example, the blinds 4e and 4f rotate around the rotation axis c set between the mask 2 and the projection optical system 5, but in this operation example, the first blind 4e and 4f rotate in the first operation example. The difference is that a blind 4g that rotates on the circumference c1 around the optical system 60 is used. As the blind 4g rotates along the circumference c1, the upper part of the first optical system 60, or the upper parts of the field stop 61 and the second optical system 62 are covered. The center of rotation of the blind 4g is set in the first optical system 60 only by one blind 4g, and the first operation example described above is used.
This is to obtain the same effect as the second operation example and the third operation example.

When the exposure operation is started, as shown in FIG. 14A, the pattern area 55 and the exposed area 56 start to move in the scanning direction marked SD in synchronization with each other.
In addition, the blind 4g starts rotating along the circumference c1. As shown in FIG. 14B, the pattern area 55
The movement of the exposed area 56 causes the end 55a of the pattern area 55 and the end 56a of the exposed area 56 to move to the position ES.
Is reached, the blind 4g is arranged at the illustrated position on the circumference c1, and controls the rotation of the blind 4g so as to completely cover the field stop 61 and the upper part of the second optical system 62.

In the state shown in FIG. 14B, the illumination light is emitted, and the exposure of the original pattern formed in the pattern area 55 onto the exposed area 56 is started. That is,
When the blind 4g rotates while the pattern area 55 and the exposure area 56 move in the scanning direction SD while synchronizing with each other, the upper portions of the second optical system 62 and the field stop 61 gradually open, so that illumination is performed. Light EL to pattern area 5
An image of the original image pattern obtained by irradiating the target area 5 is exposed on the exposed area 56.

When the movement of the pattern area 55 and the exposed area 56 in the scanning direction SD and the rotation of the blind 4g are further performed, as shown in FIG.
2 and the upper part of the field stop 61 are completely released, and in this state, the blind 4g is stopped. When the movement of the pattern area 55 and the exposure area 56 in the scanning direction SD progresses and the end 55b of the pattern area 55 reaches the position ES, the blind 4g moves to the position shown in FIG. The illumination light EL other than the illumination light EL that has passed through the pattern area 55 is blocked.

In portions other than the pattern region 55,
Since the light-shielding portion LSA shown in FIG. 7 is formed, the illumination light EL should not be transmitted. However, when a pinhole is formed in the light-shielding portion LSA, the illumination light E
Since L is transmitted, this is blocked by a blind 4g.

The pattern area 55 and the area to be exposed 56 further move in the scanning direction SD and move to the end 55 of the pattern area 55.
When b and the end 56b of the exposed area 56 reach the position EE shown in FIG.
Rotate to the position shown in. In this state, the exposure ends. When exposure is completed, blind 4g
Completely covers the upper part of the first optical system 60, and the illumination light E
In this state, L does not enter the first optical system 60.

Accordingly, when this state is reached, the shutter 20a shown in FIG.
The irradiation of is stopped. When the exposure is completed, the pattern area 5
5 and the exposure region 56 stop their operation by reducing the moving speed. Further, the blind 4g rotates to the position shown in FIG. 15C and returns to the initial state, thereby completing a series of exposure operations. In the operation examples described with reference to FIGS. 14 and 15, the exposure operation in the case where the blind 4 g is rotated about the first optical system 60 has been described.
By performing the same operation when the second optical system 62 is the center, the same effects as those of the first to third operation examples can be obtained.

[Fifth Operation Example] FIGS. 16 and 17 are views for explaining a fifth operation example of the exposure apparatus according to the present embodiment.
The same members as those shown in FIGS. 9 to 15 are denoted by the same reference numerals. In this operation example, as shown in FIGS. 16 and 17, a transparent flexible sheet 70 is arranged in parallel with the mask 2 between the mask 2 in which the pattern region 55 is formed and the projection optical system 5, This flexible sheet 70 has light shielding portions 71a, 71b, 71c, 71
By forming d, the openings 70a, 70b, 70
c is provided. Scanning direction SD of the light shielding portions 71a to 71d
Is set to a width that only covers at least the upper part of the first optical system 60.

The openings 70a to 70c are set to have widths that open at least the entire upper part of the first optical system 60. Further, the flexible sheet 70 is wound around rollers 72 and 73 each arranged in the scanning direction SD such that the projection optical system 5 is located therebetween. The rollers 72 and 73 are configured to be rotatable. When the roller 72 and the roller 73 rotate in the same direction, the light shielding portions 71a to 71d and the openings 70a to 70c formed on the flexible sheet 70 are formed.
Moves in the scanning direction SD or the reverse direction. In this operation example having such a configuration, effects similar to those of the first to fourth operation examples are obtained.

When the exposure operation starts, as shown in FIG. 16A, the illumination light EL from the illumination optical system 1 in FIG.
Is not emitted, and the opening 70c is disposed above the first optical system 60, and the pattern region 5 formed in the mask 2
The exposure region 56 formed on the plate 5 and the plate 6 starts operating in the scanning direction SD in synchronization. Also, the rollers 72, 7
3 is rotated, and the light-shielding portions 71a to 71d and the openings 70a to
The flexible sheet 70 is wound up so that 70c moves in the scanning direction SD. The movement of the pattern area 55 and the exposure area 56 proceeds, and as shown in FIG. 16B, the end 55a of the pattern area 55 and the end 56 of the exposure area 56.
When a reaches the position ES, the opening 70b and the light shielding portion 71
The roller 73 winds up the flexible sheet 70 so that the boundary with c is located at the position ES.

In the state shown in FIG. 16B, the illumination light is emitted, and the exposure of the original pattern formed in the pattern area 55 onto the exposed area 56 is started. That is,
The roller 73 is moved by the flexible sheet 70 so that the pattern area 55 and the exposure area 56 move in the scanning direction SD while synchronizing with each other, and the light shielding section 71c also synchronizes with them.
Is wound up, the upper portion of the first optical system 60 is gradually opened, and the illumination light EL is applied to the pattern area 55, so that the image of the original pattern obtained is transferred to the exposed area 56.

When the exposure is started, the pattern area 55,
The light-shielding portions 71a to 71d, the openings 70a to 70c, and the exposed area 56 are synchronized at the same speed in the scanning direction SD.
And proceed to exposure. When the exposure proceeds and the opening 70b is located above the first optical system 60 and the upper portion of the first optical system 60 is completely released, as shown in FIG.
The roller 73 temporarily stops the winding of the flexible sheet 70. Even in this state, the pattern area 55 and the exposure area 56 move in the scanning direction SD while maintaining synchronization,
Advance the exposure.

The pattern area 55 and the exposure area 56 continue to move in synchronization with each other in the scanning direction SD, and as shown in FIG. 16C, the end 55b of the pattern area 55 and the end 56b of the exposure area 56. , And the light-shielding portion 71b and the opening 70b
Is included in the same plane perpendicular to the scanning direction SD, the pattern region 55, the exposed region 56, and the light shielding portions 71a to 71d and the openings 70a to 70c are synchronized with each other in the scanning direction SD. Moving.

Thereafter, the pattern region 55 and the exposed region 56, the light shielding portions 71a to 71d, and the openings 70a to
0c moves in the scanning direction SD at a constant speed while being synchronized, and as shown in FIG. 17A, the end 55b of the pattern area 55, the end 56b of the exposed area 56, and the light-shielding section 71b. The exposure ends when the boundary between the opening and the opening 70a reaches the position EE. Thereafter, as shown in FIG. 17B, the pattern area 55 and the exposure area 56 stop at a reduced speed. Further, the roller 73 moves the flexible sheet 70 until the opening 70 a is positioned above the first optical system 60.
, And a series of exposure operations ends.

Although the fifth operation example has been described above, the same effects as those of the first to fourth operation examples described above can be obtained, and the flexible sheet 7 as the blind 4 in FIG.
0 and the light-shielding portions 71a to 71d and the opening 70a
Using the flexible sheet 70 with the roller 7
Because it is wound up and moved at 2,73,
As in the first operation example and the second operation example, the blind 4a and the blind 4b or the blind 4c and the blind 4
Since it is not necessary to individually control d, the device configuration in the scanning direction SD can be simplified, and the configuration in the direction perpendicular to the scanning direction SD as shown in the third operation example and the fourth operation example. Can be simplified.

In the above-described fifth operation example, the case where the flexible sheet 70 is disposed between the mask 2 and the projection optical system 5 has been described as an example. The same effect can be obtained even if it is arranged between the plate 6 where the exposure region 56 is set. Further, the flexible sheet 70 may be disposed between the first optical system 60 and the second optical system 62. However, when the flexible sheet 70 is disposed at this position, the moving direction of the flexible sheet 70 is opposite to the scanning direction SD. Becomes

In the above-described fifth operation example, when the exposure operation is repeatedly performed, the positions of the light-shielding portions 71a to 71d and the openings 70a to 70c formed on the flexible sheet 70 as the blind 4 may be caused by mechanical errors or electric noise. It may change under the influence of, for example, and the change may be accumulated to increase the error. In particular, when one lot of the plate 6 is processed for a long time, the possibility becomes large. Hereinafter, a method of correcting errors in the positions of the light shielding portions 71a to 71d and the openings 70a to 70c formed on the flexible sheet 70 will be described.

This method does not affect the exposure,
The sensor is disposed at any one of the boundaries of the light shielding portions 71a to 71d and the openings 70a to 70c, for example, at a position where the boundary position between the light shielding portion 71a and the opening 70a can be measured. The sensor used here is optimally a SPD (silicon photodiode) from the condition of measuring the amount of light, but a line sensor or a CCD (Charge Coupled Device)
If a sensor that can measure not only the uniform light amount but also its distribution can be used, the boundary position can be detected with higher accuracy. Then, the position of the boundary and the light amount information of the installed sensor are measured in advance, and stored in a storage device such as a memory or a hard disk. Also, each time the exposure is performed, the value of the sensor output is stored together with the position of the boundary.

When performing the correction, during the repeated exposure processing, the position information and the light amount information of the boundary obtained in the previous exposure processing and the position information and the light amount stored in the storage device in advance. An error in the current position of the boundary is calculated from the information and the correction is performed by winding up the flexible sheet 70 with the rollers 72 and 73. With the above operation, it is possible to eliminate errors accumulated each time the exposure processing is performed.

According to the present embodiment, of the illuminating light EL applied to the mask 2, light that passes through the area other than the pattern area 55 formed on the mask 2 is blocked by blinds. As shown in FIG.
Even if the width of 2 g is widened in the scanning direction SD (X-axis direction), the light shielding portion LSA formed around the mask 2
It is not necessary to increase the width of the mask 2, and it is possible to suppress an increase in the manufacturing cost of the mask 2. Further, even when a point defect such as a pinhole is formed in the light-shielding portion LSA, the illumination light passing through the point defect is shielded by the blinds 4. Since the portion is not exposed, exposure failure can be reduced.

In the first to fifth operation examples of the present embodiment, the end of the blind is set to the pattern area 5 at the start of the exposure.
The movement of the blind is controlled so as to substantially coincide with the end 55a of No. 5 and the end 56a of the exposed area 56. However, when the width of the light-shielding band LSA on the mask 2 is not wide, for example, when the width is about the same as the conventional mask (about 2 mm), it is considered that a defect such as a pinhole does not occur in the light-shielding band LSA. . Therefore, when using a mask on which a light-shielding band LSA in which defects such as pinholes are negligible is used, at the start of exposure, the end of the blind is exactly the end 55a of the pattern area 55 and the end 56a of the exposed area 56. It is not necessary to control the movement of the blind so that the end of the blind does not come out of the light-shielding band LSA. In this case, the movement accuracy of the blind can be made relatively slow, and the drive mechanism of the blind can be reduced in size and simplified.

The embodiments described above are described for facilitating the understanding of the present invention, but not for limiting the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention.

For example, not only an exposure apparatus used for manufacturing a liquid crystal display element, but also an exposure apparatus, a reticle and a mask used for manufacturing a plasma display, a semiconductor element, a thin film magnetic head, and an image pickup element (CCD or the like) are manufactured. For this purpose, the present invention can be applied to an exposure apparatus that transfers and forms a circuit pattern on a glass substrate, a silicon wafer, or the like.
That is, the present invention is applicable regardless of the use of the exposure apparatus.

As the light source of the exposure apparatus, g-line (436n
m) and i-line (365nm), KrF excimer laser
(248 nm), ArF excimer laser (193n)
m), F ₂Laser (157nm), Kr₂laser
(Wavelength 146 nm), KrAr laser (wavelength 134 n
m) or Ar₂Laser (wavelength 126nm) etc.
In addition, charged particle beams such as X-rays and electron beams should be used.
Can also be.

Instead of using an F ₂ laser or an ArF excimer laser, a single-wavelength laser in the infrared or visible range oscillated from, for example, a DFB semiconductor laser or a fiber laser is used as erbium (or both erbium and yttrium). ) May be amplified by a doped fiber amplifier, and a harmonic converted into a UV light using a non-linear optical crystal may be used.

For example, the oscillation wavelength of a single-wavelength laser is set to 1.
When the wavelength is in the range of 51 to 1.59 μm, the generated wavelength is 18
An eighth harmonic having a wavelength in the range of 9 to 199 nm or a tenth harmonic having a generation wavelength in the range of 151 to 159 nm is output. Especially the oscillation wavelength is 1.544 to 1.553 μm
m, 8 in the range of 193 to 194 nm.
A harmonic wave, that is, ultraviolet light having substantially the same wavelength as the ArF excimer laser is obtained, and the oscillation wavelength is set to 1.57 to 1.58 μm.
m, 1 in the range of 157 to 158 nm.
0 harmonic, i.e., ultraviolet light having almost the same wavelength as the F ₂ laser is obtained.

The oscillation wavelength is set to 1.03 to 1.12 μm
, A 7th harmonic whose output wavelength is in the range of 147 to 160 nm is output.
Assuming that the wavelength is in the range of 099 to 1.106 μm, the generated harmonic is the seventh harmonic in the range of 157 to 158 μm, that is, F _2.
Ultraviolet light having substantially the same wavelength as the laser is obtained. In addition,
As a single-wavelength oscillation laser, ytterbium-doped
A fiber laser is used.

The projection optical system may be not only the same magnification system but also a reduction system or an enlargement system. The projection optical system, when using a far ultraviolet rays such as an excimer laser using a material which transmits far ultraviolet rays such as quartz and fluorite as glass material, a catadioptric or refractive system when using a F ₂ laser or X-ray An optical system (a reflection type mask is used for the mask). When an electron beam is used, an electron optical system including an electron lens and a deflector may be used as the optical system. It goes without saying that the optical path through which the electron beam passes is in a vacuum state.

The illumination optical system 1 composed of a plurality of optical elements such as lenses and the projection optical system 5 are incorporated in the main body of the exposure apparatus for optical adjustment, and a reticle stage or a wafer stage composed of many mechanical parts. Is attached to the main body of the exposure equipment to connect the wiring and piping.
By installing the blind 4 and its driving device according to the present invention,
Further, the exposure apparatus of the above embodiment can be manufactured by performing overall adjustment (electrical adjustment, operation confirmation, and the like).
It is desirable that the manufacture of the exposure apparatus be performed in a clean room in which the temperature, cleanliness, and the like are controlled.

Further, the micro device performs the function / performance design of the circuit.
Manufacturing a reticle, manufacturing a silicon wafer, transferring a reticle pattern onto the wafer using the exposure apparatus described in the above embodiment,
It is manufactured through an assembling step (including a dicing step, a package step, and the like), an inspection step, and the like.

[0115]

As described above, according to the present invention,
Since the outer portion of the pattern area of the mask can be covered by the blind, there is an effect that only a desired area of the photosensitive substrate can be exposed without increasing the width of the light shielding band provided in the mask.

Further, even in the case where a point defect (pinhole) is present in the light shielding zone of the mask, there is an effect that the image of the point defect can be prevented from being transferred to the substrate.

[Brief description of the drawings]

FIG. 1 is a perspective view of an exposure apparatus according to an embodiment of the present invention.

FIG. 2 is a diagram showing an example of a specific configuration of the illumination optical system shown in FIG.

FIG. 3 is a diagram schematically illustrating a main part of a modification of the illumination optical system.

FIG. 4 is a lens configuration diagram of a partial projection optical system.

FIG. 5 is a diagram showing a modification of the first optical system and the second optical system shown in FIG.

FIG. 6 is a diagram illustrating an example of a field stop.

FIG. 7 is a diagram showing a planar positional relationship between a field of view by a partial projection optical system and a mask.

FIG. 8 is a diagram for explaining an exposure amount in each visual field region.

FIG. 9 is a diagram illustrating a first operation example of the exposure apparatus according to the embodiment of the present invention.

FIG. 10 is a diagram illustrating a first operation example of the exposure apparatus according to the embodiment of the present invention.

FIG. 11 is a diagram illustrating a second operation example of the exposure apparatus according to the embodiment of the present invention.

FIG. 12 is a diagram illustrating a second operation example of the exposure apparatus according to the embodiment of the present invention.

FIG. 13 is a diagram illustrating a third operation example of the exposure apparatus according to the embodiment of the present invention.

FIG. 14 is a diagram illustrating a fourth operation example of the exposure apparatus according to the embodiment of the present invention.

FIG. 15 is a diagram illustrating a fourth operation example of the exposure apparatus according to the embodiment of the present invention.

FIG. 16 is a diagram illustrating a fifth operation example of the exposure apparatus according to the embodiment of the present invention.

FIG. 17 is a diagram illustrating a fifth operation example of the exposure apparatus according to the embodiment of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Illumination optical system 2 ... Mask 2a-2g ... Field-of-view area (light emission part) 3 ... Mask stage (stage device) 4, 4a-4g ... Blind 5 ... Projection optical system 5a-5g ... Partial projection optical system (partial optical system) 6) Plate (photosensitive substrate) 8 ... XY stage (stage device) 20a ... Shutter (shutter device) 21, 32 ... Light guide 70 ... Flexible sheet 71a-71d ... Light shielding portion 72, 73 ... Roller PA ... Original pattern (pattern) ) SD: scanning direction

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) H01L 21/30 518

Claims (16)

[Claims] 1. A stage device for synchronously moving a mask on which a pattern is formed and a photosensitive substrate to be exposed, an illumination optical system for illuminating the mask, and projecting an image of a pattern from the mask onto the photosensitive substrate. And a projection optical system
An exposure apparatus configured to sequentially project and expose the image of the pattern onto the photosensitive substrate while moving the mask and the photosensitive substrate by the stage device, wherein an optical path of illumination light emitted from the illumination optical system is blocked. An exposure apparatus, comprising: a blind movable in a direction substantially along a moving direction of the mask, wherein the blind is moved to cover a part of the mask while the mask is moving. 2. A stage device for synchronously moving a mask on which a pattern is formed and a photosensitive substrate as an exposure target, an illumination optical system having a plurality of light emitting portions for partially illuminating the mask, A projection optical system having a plurality of partial optical systems for partially projecting an image of the pattern onto the photosensitive substrate, wherein the stage device moves the mask and the photosensitive substrate while exposing the image of the pattern to the photosensitive substrate. An exposure apparatus configured to sequentially project and expose a substrate, comprising: a blind movable in a direction substantially along a moving direction of the mask so as to block an optical path of illumination light emitted from the illumination optical system; An exposure apparatus, wherein a blind is moved so as to cover a part of the mask while the mask is moving. 3. The exposure apparatus according to claim 2, wherein the illumination optical system has a light guide for distributing light from a light source to the plurality of light emitting units. 4. The exposure apparatus according to claim 2, wherein at least one blind is provided corresponding to each of the partial optical systems. 5. The exposure apparatus according to claim 1, wherein the illumination optical system has a shutter device for selectively stopping illumination of the mask. 6. The blind is provided between the projection optical system and the mask, between the projection optical system and the photosensitive substrate, and a plane conjugate with a pattern forming surface of the mask in the projection optical system or in the vicinity thereof. The exposure apparatus according to claim 1, wherein the exposure apparatus is provided in at least one of the following. 7. The exposure apparatus according to claim 1, wherein the blind is moved on a circular orbit between the projection optical system and the mask or the photosensitive substrate. . 8. The blind so that it can pass between the projection optical system and the mask or the photosensitive substrate and a plane conjugate with a pattern forming surface of the mask in the projection optical system or in the vicinity thereof. The exposure apparatus according to any one of claims 1 to 5, wherein the exposure apparatus is moved on an orbit. 9. The blind according to claim 1, wherein the blind comprises a light-shielding portion formed on a part of a transparent flexible sheet, and has a pair of rollers for winding the flexible sheet according to the movement of the mask. 1
The exposure apparatus according to any one of claims 1 to 6. 10. An exposure apparatus that moves a mask and a photosensitive substrate relative to illumination light from a light source and scans and exposes the photosensitive substrate with the illumination light via the mask. Has a plurality of projection regions which are arranged separately from each other with respect to a first direction in which they move, and which are arranged so that at least one end partially overlaps with respect to a second direction orthogonal to the first direction; A projection optical system for forming an image of a pattern in the plurality of projection regions; and irradiating the illumination light to an illumination region on the mask including a plurality of viewing regions conjugate to the plurality of projection regions with respect to the projection optical system. An illumination optical system, a stage for moving the mask relative to the illumination area during the scanning exposure, and for moving the photosensitive substrate relative to the plurality of projection areas. A light shielding member that is moved in the same direction as the mask so as to cover at least a part of the mask during the scanning exposure and to prevent the illumination light from entering the scanning substrate other than the scanning exposure area. An exposure apparatus, comprising: 11. The projection optical system includes a plurality of optical units each defining the plurality of projection regions in a rectangular shape having the second direction as a longitudinal direction, and the plurality of optical units are each configured to correspond to the pattern. The exposure apparatus according to claim 10, wherein a primary image is re-imaged on the photosensitive substrate, and a field stop defining the projection area is disposed on or near a surface on which the primary image is formed. 12. The illumination area is divided into a plurality of areas corresponding to the plurality of viewing areas, and the illumination optical system selectively illuminates the plurality of illumination areas with the illumination light in accordance with movement of the mask. The exposure apparatus according to claim 10, wherein the exposure is performed. 13. The exposure apparatus according to claim 10, wherein the light shielding member is provided corresponding to each of the plurality of projection areas. 14. A method for transferring an image of a pattern constituting a display element formed on a mask onto a photosensitive plate using the exposure apparatus according to claim 10. Description: A method for manufacturing a display device characterized by the following. 15. An exposure method for relatively moving a mask and a photosensitive substrate with respect to illumination light from a light source, and scanning and exposing the photosensitive substrate with the illumination light via the mask, wherein the pattern image of the mask is provided. Are formed in a plurality of projection areas separated from each other in the field of view of the projection optical system, and the plurality of field areas conjugate to the plurality of projection areas with respect to the projection optical system are selectively irradiated with the illumination light during the relative movement. Along with
An exposure method, wherein a light-shielding member that partially blocks illumination light incident on the photosensitive substrate is moved in the same direction as the mask. 16. The plurality of projection areas are arranged separately from each other in a first direction in which the photosensitive substrate moves during the scanning exposure, and have at least one end in a second direction orthogonal to the first direction. The exposure method according to claim 15, wherein the exposure methods are arranged so as to overlap each other.