TW494568B - Semiconductor integrated circuit device - Google Patents

Semiconductor integrated circuit device Download PDF

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Publication number
TW494568B
TW494568B TW089106998A TW89106998A TW494568B TW 494568 B TW494568 B TW 494568B TW 089106998 A TW089106998 A TW 089106998A TW 89106998 A TW89106998 A TW 89106998A TW 494568 B TW494568 B TW 494568B
Authority
TW
Taiwan
Prior art keywords
transistor
gate
input
node
source
Prior art date
Application number
TW089106998A
Other languages
English (en)
Chinese (zh)
Inventor
Kunihito Rikino
Yasuhiko Sasaki
Kazuo Yano
Naoki Kato
Original Assignee
Hitachi Ltd
Hitach Device Engineering Co L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitach Device Engineering Co L filed Critical Hitachi Ltd
Application granted granted Critical
Publication of TW494568B publication Critical patent/TW494568B/zh

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K19/00Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • H03K19/02Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
    • H03K19/173Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using elementary logic circuits as components
    • H03K19/1733Controllable logic circuits
    • H03K19/1737Controllable logic circuits using multiplexers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Computing Systems (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Logic Circuits (AREA)
TW089106998A 1999-04-16 2000-04-14 Semiconductor integrated circuit device TW494568B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10891599A JP3986036B2 (ja) 1999-04-16 1999-04-16 半導体集積回路装置

Publications (1)

Publication Number Publication Date
TW494568B true TW494568B (en) 2002-07-11

Family

ID=14496881

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089106998A TW494568B (en) 1999-04-16 2000-04-14 Semiconductor integrated circuit device

Country Status (4)

Country Link
US (2) US6356118B1 (enExample)
JP (1) JP3986036B2 (enExample)
KR (1) KR100713765B1 (enExample)
TW (1) TW494568B (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3555080B2 (ja) * 2000-10-19 2004-08-18 Necエレクトロニクス株式会社 汎用ロジックモジュール及びこれを用いたセル
US6779158B2 (en) * 2001-06-15 2004-08-17 Science & Technology Corporation @ Unm Digital logic optimization using selection operators
JP4156864B2 (ja) * 2002-05-17 2008-09-24 Necエレクトロニクス株式会社 半導体装置及びその製造方法
JP2003338750A (ja) * 2002-05-20 2003-11-28 Nec Electronics Corp 汎用ロジックセル、これを用いた汎用ロジックセルアレイ、及びこの汎用ロジックセルアレイを用いたasic
DE102004007398B4 (de) * 2004-02-16 2007-10-18 Infineon Technologies Ag Konfigurierbare Gate-Array-Zelle mit erweiterter Gate-Elektrode
US9230910B2 (en) 2006-03-09 2016-01-05 Tela Innovations, Inc. Oversized contacts and vias in layout defined by linearly constrained topology
US8653857B2 (en) 2006-03-09 2014-02-18 Tela Innovations, Inc. Circuitry and layouts for XOR and XNOR logic
US7763534B2 (en) 2007-10-26 2010-07-27 Tela Innovations, Inc. Methods, structures and designs for self-aligning local interconnects used in integrated circuits
US8541879B2 (en) 2007-12-13 2013-09-24 Tela Innovations, Inc. Super-self-aligned contacts and method for making the same
US8658542B2 (en) 2006-03-09 2014-02-25 Tela Innovations, Inc. Coarse grid design methods and structures
US8448102B2 (en) 2006-03-09 2013-05-21 Tela Innovations, Inc. Optimizing layout of irregular structures in regular layout context
US9035359B2 (en) 2006-03-09 2015-05-19 Tela Innovations, Inc. Semiconductor chip including region including linear-shaped conductive structures forming gate electrodes and having electrical connection areas arranged relative to inner region between transistors of different types and associated methods
US7446352B2 (en) 2006-03-09 2008-11-04 Tela Innovations, Inc. Dynamic array architecture
US9009641B2 (en) 2006-03-09 2015-04-14 Tela Innovations, Inc. Circuits with linear finfet structures
US9563733B2 (en) 2009-05-06 2017-02-07 Tela Innovations, Inc. Cell circuit and layout with linear finfet structures
US7956421B2 (en) 2008-03-13 2011-06-07 Tela Innovations, Inc. Cross-coupled transistor layouts in restricted gate level layout architecture
US8839175B2 (en) 2006-03-09 2014-09-16 Tela Innovations, Inc. Scalable meta-data objects
US8667443B2 (en) 2007-03-05 2014-03-04 Tela Innovations, Inc. Integrated circuit cell library for multiple patterning
US7888705B2 (en) 2007-08-02 2011-02-15 Tela Innovations, Inc. Methods for defining dynamic array section with manufacturing assurance halo and apparatus implementing the same
US8453094B2 (en) 2008-01-31 2013-05-28 Tela Innovations, Inc. Enforcement of semiconductor structure regularity for localized transistors and interconnect
US7939443B2 (en) 2008-03-27 2011-05-10 Tela Innovations, Inc. Methods for multi-wire routing and apparatus implementing same
MY152456A (en) 2008-07-16 2014-09-30 Tela Innovations Inc Methods for cell phasing and placement in dynamic array architecture and implementation of the same
US9122832B2 (en) 2008-08-01 2015-09-01 Tela Innovations, Inc. Methods for controlling microloading variation in semiconductor wafer layout and fabrication
WO2010122754A1 (ja) * 2009-04-22 2010-10-28 パナソニック株式会社 半導体集積回路
US8661392B2 (en) 2009-10-13 2014-02-25 Tela Innovations, Inc. Methods for cell boundary encroachment and layouts implementing the Same
US9159627B2 (en) 2010-11-12 2015-10-13 Tela Innovations, Inc. Methods for linewidth modification and apparatus implementing the same
US11062739B2 (en) * 2019-06-27 2021-07-13 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor chip having memory and logic cells
CN112908987B (zh) * 2021-03-22 2025-06-27 西安紫光国芯半导体股份有限公司 三维集成电路及其制造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5200907A (en) * 1990-04-16 1993-04-06 Tran Dzung J Transmission gate logic design method
US5079614A (en) * 1990-09-26 1992-01-07 S-Mos Systems, Inc. Gate array architecture with basic cell interleaved gate electrodes
US5162666A (en) 1991-03-15 1992-11-10 Tran Dzung J Transmission gate series multiplexer
JP3144967B2 (ja) 1993-11-08 2001-03-12 株式会社日立製作所 半導体集積回路およびその製造方法
JP3072887B2 (ja) * 1995-12-11 2000-08-07 川崎製鉄株式会社 フィールドプログラマブルゲートアレイ
US6097221A (en) * 1995-12-11 2000-08-01 Kawasaki Steel Corporation Semiconductor integrated circuit capable of realizing logic functions
JP3072888B2 (ja) * 1995-12-14 2000-08-07 川崎製鉄株式会社 フィールドプログラマブルゲートアレイ
US5955912A (en) * 1995-10-25 1999-09-21 Texas Instruments Incorporated Multiplexer circuits
KR100439527B1 (ko) * 1997-04-11 2004-07-12 가부시키가이샤 히타치세이사쿠쇼 반도체집적회로
KR100278275B1 (ko) * 1997-06-30 2001-01-15 김영환 저전력-고속스택틱캐스코드회로

Also Published As

Publication number Publication date
KR100713765B1 (ko) 2007-05-07
US20020063582A1 (en) 2002-05-30
JP2000299385A (ja) 2000-10-24
JP3986036B2 (ja) 2007-10-03
US6356118B1 (en) 2002-03-12
KR20010006984A (ko) 2001-01-26
US6690206B2 (en) 2004-02-10

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MM4A Annulment or lapse of patent due to non-payment of fees