TW490604B - Method of determining set temperature trajectory for heat treatment system - Google Patents

Method of determining set temperature trajectory for heat treatment system Download PDF

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Publication number
TW490604B
TW490604B TW090120656A TW90120656A TW490604B TW 490604 B TW490604 B TW 490604B TW 090120656 A TW090120656 A TW 090120656A TW 90120656 A TW90120656 A TW 90120656A TW 490604 B TW490604 B TW 490604B
Authority
TW
Taiwan
Prior art keywords
temperature
trajectories
treatment process
processed
film
Prior art date
Application number
TW090120656A
Other languages
English (en)
Chinese (zh)
Inventor
Koichi Sakamoto
Wen-Ling Wang
Fujio Suzuki
Moyuru Yasuhara
Keisuke Suzuki
Original Assignee
Tokyo Electron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Co Ltd filed Critical Tokyo Electron Co Ltd
Application granted granted Critical
Publication of TW490604B publication Critical patent/TW490604B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
TW090120656A 2000-08-24 2001-08-22 Method of determining set temperature trajectory for heat treatment system TW490604B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000254479 2000-08-24
JP2001176216A JP3901958B2 (ja) 2000-08-24 2001-06-11 熱処理装置設定温度の作成方法、および熱処理方法

Publications (1)

Publication Number Publication Date
TW490604B true TW490604B (en) 2002-06-11

Family

ID=26598410

Family Applications (1)

Application Number Title Priority Date Filing Date
TW090120656A TW490604B (en) 2000-08-24 2001-08-22 Method of determining set temperature trajectory for heat treatment system

Country Status (3)

Country Link
JP (1) JP3901958B2 (ko)
KR (1) KR100713288B1 (ko)
TW (1) TW490604B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5774532B2 (ja) * 2012-03-28 2015-09-09 東京エレクトロン株式会社 連続処理システム、連続処理方法、及び、プログラム
KR101801452B1 (ko) * 2012-07-09 2017-11-24 쌩-고벵 글래스 프랑스 코팅된 기판을 가공하기 위한 가공 상자, 조립체 및 방법
JP6541599B2 (ja) * 2016-03-28 2019-07-10 東京エレクトロン株式会社 制御装置、基板処理システム、基板処理方法及びプログラム
FR3091618B1 (fr) * 2019-01-09 2021-09-24 Soitec Silicon On Insulator Procédé de fabrication d’un substrat receveur pour une structure de type semi-conducteur sur isolant pour applications radiofrequences et procédé de fabrication d’une telle structure

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW266230B (ko) * 1993-09-09 1995-12-21 Tokyo Electron Co Ltd
TW429497B (en) * 1999-03-02 2001-04-11 United Microelectronics Corp Method of monitoring in-line temperature

Also Published As

Publication number Publication date
JP2002141343A (ja) 2002-05-17
JP3901958B2 (ja) 2007-04-04
KR20020016589A (ko) 2002-03-04
KR100713288B1 (ko) 2007-05-04

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