TW466255B - Photoactivatable nitrogen-contained bases on Α-amino alkenes - Google Patents

Photoactivatable nitrogen-contained bases on Α-amino alkenes Download PDF

Info

Publication number
TW466255B
TW466255B TW087105322A TW87105322A TW466255B TW 466255 B TW466255 B TW 466255B TW 087105322 A TW087105322 A TW 087105322A TW 87105322 A TW87105322 A TW 87105322A TW 466255 B TW466255 B TW 466255B
Authority
TW
Taiwan
Prior art keywords
group
alkyl
patent application
page
cns
Prior art date
Application number
TW087105322A
Other languages
English (en)
Chinese (zh)
Inventor
Sean Colm Turner
Gisele Baudin
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of TW466255B publication Critical patent/TW466255B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D487/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0046Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paper (AREA)
  • Polyamides (AREA)
  • Plural Heterocyclic Compounds (AREA)
TW087105322A 1997-03-18 1998-04-07 Photoactivatable nitrogen-contained bases on Α-amino alkenes TW466255B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH65297 1997-03-18

Publications (1)

Publication Number Publication Date
TW466255B true TW466255B (en) 2001-12-01

Family

ID=4192009

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087105322A TW466255B (en) 1997-03-18 1998-04-07 Photoactivatable nitrogen-contained bases on Α-amino alkenes

Country Status (12)

Country Link
US (1) US6087070A (enExample)
EP (1) EP0970085B1 (enExample)
JP (1) JP4308326B2 (enExample)
KR (1) KR100527614B1 (enExample)
CN (1) CN1128799C (enExample)
AU (1) AU720834B2 (enExample)
BR (1) BR9808899B1 (enExample)
CA (1) CA2283446C (enExample)
DE (1) DE69806739T2 (enExample)
TW (1) TW466255B (enExample)
WO (1) WO1998041524A1 (enExample)
ZA (1) ZA982233B (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59903270D1 (de) * 1998-08-21 2002-12-05 Ciba Sc Holding Ag Photoaktivierbare stickstoffhaltige basen
RU2002128750A (ru) * 2000-03-28 2004-02-27 Акцо Нобель Н.В. (NL) Фотоактивируемая композиция для покрытия и ее применение для получения покрытий с быстро обрабатываемой при температуре окружающей среды поверхностью
RU2332419C2 (ru) * 2001-10-17 2008-08-27 Циба Спешиалти Кемикэлз Холдинг Инк. Фотоактивируемые азотистые основания, фотополимеризующиеся композиции и применение
CN100482694C (zh) * 2002-04-19 2009-04-29 西巴特殊化学品控股有限公司 等离子体诱发的涂层固化
EP1593728B1 (en) * 2004-05-03 2012-05-09 Rohm And Haas Company Michael addition compositions
EP1640388B1 (en) * 2004-09-24 2015-02-25 Rohm and Haas Company Biomass based Michael addition composition
CN101522745B (zh) * 2006-09-29 2013-06-19 西巴控股有限公司 以封闭异氰酸酯为基础的体系的光潜碱
ATE524765T1 (de) * 2007-04-03 2011-09-15 Basf Se Fotoaktivierbare stickstoffbasen
DE102008049848A1 (de) 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
EP3023462A4 (en) 2013-07-18 2017-04-12 Cemedine Co., Ltd. Photocurable composition
KR102330121B1 (ko) 2013-12-13 2021-11-23 세메다인 가부시키 가이샤 접착성을 갖는 광경화성 조성물
KR101994466B1 (ko) 2014-10-29 2019-06-28 테사 소시에타스 유로파에아 활성화될 수 있는 게터 물질을 함유하는 접착제 화합물
US20180127538A1 (en) 2015-04-29 2018-05-10 3M Innovative Properties Company Composition including a polythiol and a polyepoxide and methods relating to the composition
MX375374B (es) 2015-04-29 2025-03-06 Bsn Medical Gmbh Dispositivo de baño médico.
CA2984044A1 (en) 2015-04-29 2016-11-03 Bsn Medical Gmbh Steady-state no production via ph control
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
EP3535333A1 (en) 2016-11-03 2019-09-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
EP3535621A1 (en) 2016-11-03 2019-09-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
JP7109438B2 (ja) 2016-12-05 2022-07-29 アーケマ・インコーポレイテッド 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む3dプリンティングに有用な光硬化性組成物
EP3395800B1 (en) 2017-04-26 2021-11-03 Henkel AG & Co. KGaA Heterocyclic quaternary nitrogen compounds comprising a polymeric substituent and their use as a photolatent catalyst in curable compositions
JP2021529840A (ja) 2018-04-26 2021-11-04 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェンHenkel AG & Co. KGaA 硬化性組成物における潜在性触媒として使用するための第四級窒素化合物。
US20210371667A1 (en) 2018-09-27 2021-12-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
ATE89262T1 (de) * 1987-03-26 1993-05-15 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
DE3825586A1 (de) * 1988-07-28 1990-02-01 Basf Ag Substituierte imidazolylmethyloxirane und substituierte imidazolylpropene, ihre herstellung und sie enthaltende fungizide
JP2583364B2 (ja) * 1990-06-19 1997-02-19 三菱電機株式会社 感光性樹脂組成物
JP2654339B2 (ja) * 1992-11-24 1997-09-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性レジスト組成物及び基板上にレジスト像を形成する方法

Also Published As

Publication number Publication date
AU720834B2 (en) 2000-06-15
US6087070A (en) 2000-07-11
KR100527614B1 (ko) 2005-11-15
BR9808899A (pt) 2000-08-01
DE69806739D1 (de) 2002-08-29
AU7032798A (en) 1998-10-12
CN1251103A (zh) 2000-04-19
JP2001515500A (ja) 2001-09-18
DE69806739T2 (de) 2003-03-13
WO1998041524A1 (en) 1998-09-24
ZA982233B (en) 1998-09-18
EP0970085A1 (en) 2000-01-12
CA2283446A1 (en) 1998-09-24
BR9808899B1 (pt) 2009-12-01
CN1128799C (zh) 2003-11-26
EP0970085B1 (en) 2002-07-24
KR20000076332A (ko) 2000-12-26
JP4308326B2 (ja) 2009-08-05
CA2283446C (en) 2008-05-06

Similar Documents

Publication Publication Date Title
TW466255B (en) Photoactivatable nitrogen-contained bases on Α-amino alkenes
TW381106B (en) Alkoxyphenyl-substituted bisacylphosphine oxides
JP4246268B2 (ja) α−アミノケトンに基づく光活性化可能な窒素含有塩基
AU720186B2 (en) Molecular complex compounds as photoinitiators
TW452575B (en) New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators
AU750819B2 (en) Photogeneration of amines from alpha-aminoacetophenones
DK176096B1 (da) Alkylphenylbisacylphosphinoxider, fotoinitiatorblanding indeholdende disse forbindelser, fotopolymeriserbare sammensætninger med indhold af forbindelserne, samt anvendelse af forbindelserne eller fotoinitiatorblandingerne til fotopolymerisation........
TW494123B (en) A borate compound and a composition containing the same
KR100979660B1 (ko) 혼입 가능한 광개시제
KR101944734B1 (ko) 광활성화가능한 질소 염기
KR100548976B1 (ko) 비휘발성 페닐글리옥살산 에스테르
AU726375B2 (en) Photoactivatable nitrogen-containing bases based on alpha-ammonium ketones, iminium ketones or amidinium ketones and aryl borates
US5723512A (en) Dimeric bisacylphosphines, oxides and sulfides
JP2002544205A (ja) 新規な光開始剤及びその応用
JP2002523393A (ja) 光活性化が可能な窒素含有塩基
TWI701255B (zh) 具有耐酸性之鹼或/及自由基產生劑,以及含有該鹼或/及自由基產生劑之硬化性樹脂組成物
JP2000510884A (ja) 重合性組成物
US6551761B1 (en) Photoactivatable nitrogen-containing bases based on α-ammonium ketones, iminium ketones or amidinium ketones and aryl borates
JP2005225793A (ja) ホスフィンオキシド化合物
MXPA99007895A (en) PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON&agr;-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES
MXPA99008508A (en) PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON&agr;-AMINO ALKENES

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees