TW466255B - Photoactivatable nitrogen-contained bases on Α-amino alkenes - Google Patents

Photoactivatable nitrogen-contained bases on Α-amino alkenes Download PDF

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Publication number
TW466255B
TW466255B TW087105322A TW87105322A TW466255B TW 466255 B TW466255 B TW 466255B TW 087105322 A TW087105322 A TW 087105322A TW 87105322 A TW87105322 A TW 87105322A TW 466255 B TW466255 B TW 466255B
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TW
Taiwan
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group
alkyl
patent application
page
cns
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Application number
TW087105322A
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English (en)
Chinese (zh)
Inventor
Sean Colm Turner
Gisele Baudin
Original Assignee
Ciba Sc Holding Ag
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Publication of TW466255B publication Critical patent/TW466255B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Paper (AREA)
  • Polyamides (AREA)
TW087105322A 1997-03-18 1998-04-07 Photoactivatable nitrogen-contained bases on Α-amino alkenes TW466255B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH65297 1997-03-18

Publications (1)

Publication Number Publication Date
TW466255B true TW466255B (en) 2001-12-01

Family

ID=4192009

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087105322A TW466255B (en) 1997-03-18 1998-04-07 Photoactivatable nitrogen-contained bases on Α-amino alkenes

Country Status (12)

Country Link
US (1) US6087070A (enExample)
EP (1) EP0970085B1 (enExample)
JP (1) JP4308326B2 (enExample)
KR (1) KR100527614B1 (enExample)
CN (1) CN1128799C (enExample)
AU (1) AU720834B2 (enExample)
BR (1) BR9808899B1 (enExample)
CA (1) CA2283446C (enExample)
DE (1) DE69806739T2 (enExample)
TW (1) TW466255B (enExample)
WO (1) WO1998041524A1 (enExample)
ZA (1) ZA982233B (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6489374B1 (en) * 1998-08-21 2002-12-03 Ciba Specialty Chemicals Corporation Photoactivatable bases containing nitrogen
AU2001258304A1 (en) * 2000-03-28 2001-10-08 Akzo Nobel N.V. Photoactivatable coating composition and its use for the preparation of coatings with a rapidly processable surface at ambient temperature
US7538104B2 (en) * 2001-10-17 2009-05-26 Ciba Specialty Chemicals Corporation Photoactivable nitrogen bases
PL207529B1 (pl) * 2002-04-19 2010-12-31 Ciba Sc Holding Ag Sposób wytwarzania powlekanego podłoża
EP1593728B1 (en) * 2004-05-03 2012-05-09 Rohm And Haas Company Michael addition compositions
EP1640388B1 (en) * 2004-09-24 2015-02-25 Rohm and Haas Company Biomass based Michael addition composition
US20090298962A1 (en) * 2006-09-29 2009-12-03 Katia Studer Photolatent bases for systems based on blocked isocyanates
JP5606308B2 (ja) * 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
DE102008049848A1 (de) 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
US20160152783A1 (en) 2013-07-18 2016-06-02 Cemedine Co., Ltd. Photocurable composition
WO2015088021A1 (ja) 2013-12-13 2015-06-18 セメダイン株式会社 接着性を有する光硬化性組成物
US20170327717A1 (en) 2014-10-29 2017-11-16 Tesa Se Adhesive compounds containing getter materials that can be activated
BR112017023170B1 (pt) 2015-04-29 2022-08-16 Bsn Medical Gmbh Dispositivo de banho medicinal e seu uso
JP6942058B2 (ja) 2015-04-29 2021-09-29 ビーエスエヌ メディカル ゲーエムベーハー No生成のための多段階プロセス
BR112017023446A2 (pt) 2015-04-29 2018-07-31 3M Innovative Properties Co método para a fabricação de uma rede polimérica a partir de um politiol e um poliepóxido
WO2018085534A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
EP3535332A1 (en) 2016-11-03 2019-09-11 3M Innovative Properties Company Method of applying a sealant to an aircraft component
WO2018085190A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
US20190369494A1 (en) 2016-12-05 2019-12-05 Arkemea Inc. Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing
EP3395800B1 (en) 2017-04-26 2021-11-03 Henkel AG & Co. KGaA Heterocyclic quaternary nitrogen compounds comprising a polymeric substituent and their use as a photolatent catalyst in curable compositions
KR20210003869A (ko) 2018-04-26 2021-01-12 헨켈 아게 운트 코. 카게아아 경화성 조성물에서 잠재성 촉매로서 사용하기 위한 4급 질소 화합물
EP3856849A1 (en) 2018-09-27 2021-08-04 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
DE3880868D1 (en) * 1987-03-26 1993-06-17 Ciba Geigy Ag Neue alpha-aminoacetophenone als photoinitiatoren.
DE3825586A1 (de) * 1988-07-28 1990-02-01 Basf Ag Substituierte imidazolylmethyloxirane und substituierte imidazolylpropene, ihre herstellung und sie enthaltende fungizide
JP2583364B2 (ja) * 1990-06-19 1997-02-19 三菱電機株式会社 感光性樹脂組成物
JP2654339B2 (ja) * 1992-11-24 1997-09-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性レジスト組成物及び基板上にレジスト像を形成する方法

Also Published As

Publication number Publication date
EP0970085B1 (en) 2002-07-24
JP2001515500A (ja) 2001-09-18
JP4308326B2 (ja) 2009-08-05
AU720834B2 (en) 2000-06-15
BR9808899B1 (pt) 2009-12-01
US6087070A (en) 2000-07-11
BR9808899A (pt) 2000-08-01
CN1128799C (zh) 2003-11-26
AU7032798A (en) 1998-10-12
CA2283446C (en) 2008-05-06
CA2283446A1 (en) 1998-09-24
CN1251103A (zh) 2000-04-19
EP0970085A1 (en) 2000-01-12
WO1998041524A1 (en) 1998-09-24
KR20000076332A (ko) 2000-12-26
KR100527614B1 (ko) 2005-11-15
DE69806739D1 (de) 2002-08-29
DE69806739T2 (de) 2003-03-13
ZA982233B (en) 1998-09-18

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