JP4308326B2 - α−アミノアルケン類に基づく光励起性の窒素含有塩基類 - Google Patents

α−アミノアルケン類に基づく光励起性の窒素含有塩基類 Download PDF

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Publication number
JP4308326B2
JP4308326B2 JP54008698A JP54008698A JP4308326B2 JP 4308326 B2 JP4308326 B2 JP 4308326B2 JP 54008698 A JP54008698 A JP 54008698A JP 54008698 A JP54008698 A JP 54008698A JP 4308326 B2 JP4308326 B2 JP 4308326B2
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Japan
Prior art keywords
alkyl
formula
phenyl
diastereomer
compound
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Expired - Fee Related
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JP54008698A
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English (en)
Japanese (ja)
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JP2001515500A5 (enExample
JP2001515500A (ja
Inventor
コールム ターナー，ショーン
ボーダン，ジゼル
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BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
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Publication date
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paper (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Polyamides (AREA)
JP54008698A 1997-03-18 1998-03-07 α−アミノアルケン類に基づく光励起性の窒素含有塩基類 Expired - Fee Related JP4308326B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH65297 1997-03-18
CH652/97 1997-03-18
PCT/EP1998/001346 WO1998041524A1 (en) 1997-03-18 1998-03-07 PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMINO ALKENES

Publications (3)

Publication Number Publication Date
JP2001515500A JP2001515500A (ja) 2001-09-18
JP2001515500A5 JP2001515500A5 (enExample) 2005-11-10
JP4308326B2 true JP4308326B2 (ja) 2009-08-05

Family

ID=4192009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54008698A Expired - Fee Related JP4308326B2 (ja) 1997-03-18 1998-03-07 α−アミノアルケン類に基づく光励起性の窒素含有塩基類

Country Status (12)

Country Link
US (1) US6087070A (enExample)
EP (1) EP0970085B1 (enExample)
JP (1) JP4308326B2 (enExample)
KR (1) KR100527614B1 (enExample)
CN (1) CN1128799C (enExample)
AU (1) AU720834B2 (enExample)
BR (1) BR9808899B1 (enExample)
CA (1) CA2283446C (enExample)
DE (1) DE69806739T2 (enExample)
TW (1) TW466255B (enExample)
WO (1) WO1998041524A1 (enExample)
ZA (1) ZA982233B (enExample)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59903270D1 (de) * 1998-08-21 2002-12-05 Ciba Sc Holding Ag Photoaktivierbare stickstoffhaltige basen
AU2001258304A1 (en) * 2000-03-28 2001-10-08 Akzo Nobel N.V. Photoactivatable coating composition and its use for the preparation of coatings with a rapidly processable surface at ambient temperature
RU2332419C2 (ru) 2001-10-17 2008-08-27 Циба Спешиалти Кемикэлз Холдинг Инк. Фотоактивируемые азотистые основания, фотополимеризующиеся композиции и применение
ATE479713T1 (de) * 2002-04-19 2010-09-15 Basf Se Plasmainduzierte härtung von beschichtungen
EP1593728B1 (en) * 2004-05-03 2012-05-09 Rohm And Haas Company Michael addition compositions
EP1640388B1 (en) * 2004-09-24 2015-02-25 Rohm and Haas Company Biomass based Michael addition composition
US20090298962A1 (en) * 2006-09-29 2009-12-03 Katia Studer Photolatent bases for systems based on blocked isocyanates
JP5606308B2 (ja) * 2007-04-03 2014-10-15 ビーエーエスエフ ソシエタス・ヨーロピア 光活性窒素塩基
DE102008049848A1 (de) 2008-10-01 2010-04-08 Tesa Se Mehrbereichsindikator
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
JP5927750B2 (ja) 2013-07-18 2016-06-01 セメダイン株式会社 光硬化性組成物
KR102330121B1 (ko) 2013-12-13 2021-11-23 세메다인 가부시키 가이샤 접착성을 갖는 광경화성 조성물
WO2016066435A1 (de) 2014-10-29 2016-05-06 Tesa Se Klebemassen mit aktivierbaren gettermaterialien
BR112017023170B1 (pt) 2015-04-29 2022-08-16 Bsn Medical Gmbh Dispositivo de banho medicinal e seu uso
WO2016176548A1 (en) 2015-04-29 2016-11-03 3M Innovative Properties Company Composition including a polythiol and a polyepoxide and methods relating to the composition
CN107809996A (zh) 2015-04-29 2018-03-16 Bsn医疗有限公司 一氧化氮产生的多步骤方法
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
CA3042861A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
CA3042864A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
CN110036342A (zh) 2016-12-05 2019-07-19 阿科玛股份有限公司 引发剂共混物和可用于3d打印的含有此类引发剂共混物的可光固化组合物
EP3395800B1 (en) 2017-04-26 2021-11-03 Henkel AG & Co. KGaA Heterocyclic quaternary nitrogen compounds comprising a polymeric substituent and their use as a photolatent catalyst in curable compositions
CN112004851A (zh) 2018-04-26 2020-11-27 汉高股份有限及两合公司 用作可固化组合物中的潜在催化剂的季氮化合物
WO2020065588A1 (en) 2018-09-27 2020-04-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
ES2054861T3 (es) * 1987-03-26 1994-08-16 Ciba Geigy Ag Nuevas alfa-aminoacetofenonas como fotoiniciadores.
DE3825586A1 (de) * 1988-07-28 1990-02-01 Basf Ag Substituierte imidazolylmethyloxirane und substituierte imidazolylpropene, ihre herstellung und sie enthaltende fungizide
JP2583364B2 (ja) * 1990-06-19 1997-02-19 三菱電機株式会社 感光性樹脂組成物
JP2654339B2 (ja) * 1992-11-24 1997-09-17 インターナショナル・ビジネス・マシーンズ・コーポレイション 感光性レジスト組成物及び基板上にレジスト像を形成する方法

Also Published As

Publication number Publication date
AU720834B2 (en) 2000-06-15
TW466255B (en) 2001-12-01
WO1998041524A1 (en) 1998-09-24
US6087070A (en) 2000-07-11
ZA982233B (en) 1998-09-18
EP0970085A1 (en) 2000-01-12
DE69806739T2 (de) 2003-03-13
DE69806739D1 (de) 2002-08-29
KR20000076332A (ko) 2000-12-26
KR100527614B1 (ko) 2005-11-15
CN1251103A (zh) 2000-04-19
AU7032798A (en) 1998-10-12
CN1128799C (zh) 2003-11-26
EP0970085B1 (en) 2002-07-24
CA2283446A1 (en) 1998-09-24
JP2001515500A (ja) 2001-09-18
BR9808899B1 (pt) 2009-12-01
BR9808899A (pt) 2000-08-01
CA2283446C (en) 2008-05-06

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