TW446575B - Device for treating substrates in a fluid container - Google Patents

Device for treating substrates in a fluid container Download PDF

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Publication number
TW446575B
TW446575B TW086104566A TW86104566A TW446575B TW 446575 B TW446575 B TW 446575B TW 086104566 A TW086104566 A TW 086104566A TW 86104566 A TW86104566 A TW 86104566A TW 446575 B TW446575 B TW 446575B
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TW
Taiwan
Prior art keywords
item
liquid
patent application
scope
substrate
Prior art date
Application number
TW086104566A
Other languages
Chinese (zh)
Inventor
Martin Weber
John Oshinowo
Original Assignee
Steag Micro Tech Gmbh
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Priority claimed from DE1996116402 external-priority patent/DE19616402C2/en
Application filed by Steag Micro Tech Gmbh filed Critical Steag Micro Tech Gmbh
Application granted granted Critical
Publication of TW446575B publication Critical patent/TW446575B/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Weting (AREA)
  • Chemically Coating (AREA)
  • Nozzles (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)

Abstract

Disclosed is a device for treating substrates (5) in a fluid container (1) via a nozzle system with a number of nozzles (7) for introducing a fluid. Even when the fluid with high inflow velocity is fast injected in, an excellent uniform laminar flow can be generated over the entire fluid container profile.

Description

經濟部中央橾準局負工消費合作社印装 4465?g A7 B7 五、發明説明（1 ) 本發明係關於一種在液體容器内處理基質之裝置。 此型裝置習知例如US-PS 5 275 184或本案申請人提出 之DE-A-44 13 077，在這些裝置内，液體經由一個注入開 口或一個擴散器被導入液體槽内’並且自槽的上端溢流 出。當在液體容器的底部設一個單獨入流口，則單位時 間的流入量及注入液體的速度受到限制。更甚者，不能 在容器内達到均勻的流動關係，使液體槽内欲處理的基 質或晶圓片能均勻地以液體噴射及沖洗整片基質寬度或 表面範圍。當運用一個擴散器，雖然能在液體容器内把 注入的液體較佳地分佈於整個液體表面，但單位時間的 流入量及特別是液體流入速度受到擴散器的運用而大幅 被限制住。 本發明之課題即，製造一種在液體容器内處理基質之 裝置’其能在液體容器内有最佳的流動關係，並且實現 .最大的滾動及流動速度。 此既定課題，如本發明所述，係經由一個噴嘴系統解 決，其含有多個導入液體的喷嘴。基於多個噴嘴的構造 ，被導入的液體在液體容器内具有所欲的流動關係或欲 達到的所需流動關係，而能把整片欲處理的基質以液體 均勻地沖洗及喷射。經由運用噴嘴導引液體，能以單位 時間高流入速度及高流量把液體注入到液體容器内而 達到極高流速卻維持一個層狀流動。藉此不僅改善基質 的處理，同時也縮短處理程序而提升裝置的工作效率。 依據本發明特別合宜的構造，至少有幾個噴嘴具備不 本紙張ΛΛΛΛΙ +¾时縣（CNS)从狀（4465? G A7 B7 Printed by the Central Labor Bureau of the Ministry of Economic Affairs, Consumer Cooperatives V. Description of the Invention (1) The present invention relates to a device for processing a substrate in a liquid container. This type of device is known, for example, US-PS 5 275 184 or DE-A-44 13 077 proposed by the applicant of this case. In these devices, liquid is introduced into the liquid tank through an injection opening or a diffuser 'and the The upper end overflows. When a separate inlet is provided at the bottom of the liquid container, the inflow per unit time and the speed of liquid injection are limited. What's more, it is impossible to achieve a uniform flow relationship in the container, so that the substrate or wafer to be processed in the liquid tank can uniformly spray and rinse the entire substrate width or surface range with the liquid. When a diffuser is used, although the injected liquid can be distributed over the entire liquid surface in the liquid container, the inflow per unit time and especially the liquid inflow rate are greatly restricted by the use of the diffuser. The object of the present invention is to manufacture a device for processing a substrate in a liquid container ', which can have an optimal flow relationship in the liquid container and achieve the maximum rolling and flow speed. This established problem, as described in the present invention, is solved by a single nozzle system, which includes a plurality of nozzles into which a liquid is introduced. Based on the structure of multiple nozzles, the liquid to be introduced has the desired flow relationship or the desired flow relationship in the liquid container, and the entire substrate to be treated can be evenly flushed and sprayed with the liquid. Through the use of nozzles to guide the liquid, the liquid can be injected into the liquid container at a high inflow speed and high flow rate per unit time to achieve a very high flow rate while maintaining a laminar flow. This not only improves the handling of the substrate, but also shortens the processing procedure and improves the working efficiency of the device. According to a particularly suitable construction of the present invention, at least several nozzles are provided with a paper sheet ΛΛΛΛΙ + ¾ (CNS)

(請先Μ讀背面之注$項再填寫本頁) 訂 — 446575 A7 B7 五、發明说明（2 ) 同的喷出角度。噴嘴的喷出形狀以圓錐形為佳，但亦可 以是扇葉形’而使得液體的引入端視各情形的性質和嘴 嘴的位置，且基於在液體容器内達到一個均勻的、層狀 的液流，而使液體均句沖洗基質的考慮能被最佳化。 噴嘴主要被排列在容器的底部，並且根據一個特別合 適的實施例，是以矩陣形式分佈在容器的底部。依此方 式，液體被引入且均勻地分佈在整個液體容器的表面， 並且尤其也能夠在邊緣部位實現最佳的流動關係。 噴嘴宜被組成喷嘴群，其最好設置在不同的容器底部 區域。合適的方式是，安排一组噴嘴在中央區域及在兩 個外圍區域各設置一組喷嘴，而在個別區域的喷嘴密度 和數目可以不同。同樣也適合在各個喷嘴及/或喷嘴群 設置分離的液體供給裝置，而使得噴嘴能以不同的液壓 喷射。 依據本發明一優異的實施例，在液體容器的底部預設 一個液體注入腔與喷嘴銜接。依據本發明另一實施例， 液體注入腔針對各個喷嘴及/或喷嘴群被分割成部份空 腔。 經濟部中央標準局負工消費合作社印製 位於液體容器底部的液體注入腔主要被構造成為介於 一個雙底部之間的一個夾層空間形式。 依據本發明一個特別合宜的實施例，除了喷嘴之外， 預設有任意清洗噴嘴的任意清洗開口，其亦宜以矩陣形 式設於噴嘴之間。依此方式，亦可能任意清洗介於噴嘴 和死角之間的中間區域。任意清洗開口最好亦如同喷嘴 本紙張尺度適用t國國家揉準（CNS > Α4规格（210Χ2!»7公釐） -5 - ^ 446 571 A7 B7 五 經濟部中央標孳局負工消費合作杜印褽 發明説明（3 ) 與位於下面的液體注入腔銜接。 依據本發明另一優異的實施例，液體容器的底部成斜 面，底部宜朝向中央傾斜，大致朝向液體容器的中心線 或中央點下降。依此方式，則液體容器朝下排放液體時 能快速且完全漏完。 為了快速排放液體，而在液體容器内，且特別在該容 器内的中央或中心線’預設一個具有大直徑可緊閉的開 口。在停電或其他偶發事件時，但亦與常見的製程步驟 相關’依此方式’能把在液體容器内的基質快速從處理 液’例如酸蝕劑’移開。一般在液體槽下面預設一個承 接容器’以承接快速排放出的液體。 本發明另一實施例為，除了或替代在容器底部的喷嘴 之外’在液體容器的邊壁上預設喷嘴，以此方式，方便 在侧邊或在液體底部和邊壁之間的過渡區域内導引液體 而在液體容器内流動，因此進一步地改善流動關係或 提昇液體滾動體積。 依據本發明另一優異的實施例，噴嘴及/或喷嘴群配 屬於不同的液體。屬於不同組群的各別噴嘴及/或噴嘴 群也因此基於導管和幫浦而彼此分開，則不同的液體， 如不同的化學劑，經由配屬化學劑的噴嘴及/或噴嘴群 被導引《如此，能夠快速更換液體且不會有混雜的顧慮 ’此係只有配置到這個嘴嘴的液體流到這個別的噴嘴。 依據本發明另一優異的實施例，除了經由噴嘴導引的 液體之外’導引其他的液體，如附加的化學劑、氣體、 本紙張又度速用中國國家橾率（CNS ) A4規格（210>：23_7公釐） 經濟部中央樣準局負工消費合作社印聚 ^ 446β?Β Α7 ______Β7 _ 五、發明説明（4 ) 臭氧、水等到液體容器内。特別是為了附加引入化學劑 、氣體、臭氧或水，而在液體容器肉至少預設一個擴散 器。 本發明之一個也很合宜的實施例為，在液體容器的上 面區域’大約靠在邊壁上安排噴灑噴嘴，以清潔液體容 器及/或在同一液體容器内進行不同程序的中間，大致 是介於酸蝕、清洗及乾燥過程之間，作為基質濕潤及維 持潮濕之用。此處主要是把氣溶膠、水份、其他的化學 劑蒸氣噴灑出去，或者也喷灑從下面被導引入液體容器 的液體。 上述課題的解決方式是，在液體容器設置一個基質承 載裝置’其含有三個撐托基質的撐托部位，此可以與上 述特徵結合，但也可以與之無關。在三個位置撐托基質 則保持基質的一個確定位置，而不需在液體槽内導引。 .基質承載裝置主要能夠抬昇及降下。此處適宜的作法是 ，至少有一個撐托部位是一個刀形架，其在橫著架梁走 向具有狹縫以承載基質的邊緣部位。主要至少有一個撐 托部位，相對於至少其他的一個撐托部位，沿著垂直方 向能夠移動。為了不重複敘述，關於這個特徵此參閱本 案申請人未預先公開的文件DE-A-196 15 108和DE-A_195 46 990，以避免一再敘述，此特徵係被作為目前本發明的 物件。 依據本發明另一優異的實施例，基質承載裝置僅具有 —個約成為刀形架的撐托部位，而在液體容器至少一個 用中目«家標率（) A4祕（210XM7公釐)~~~ : ---(Please read the note on the back before filling in this page) Order — 446575 A7 B7 V. Description of the invention (2) Same spraying angle. The shape of the nozzle is preferably conical, but it can also be fan-shaped, so that the introduction end of the liquid depends on the nature of the situation and the position of the mouth, and is based on achieving a uniform, layered shape in the liquid container. The flow can be optimized so that liquid homogeneous flushing of the substrate is considered. The nozzles are mainly arranged at the bottom of the container and are distributed in a matrix form at the bottom of the container according to a particularly suitable embodiment. In this way, the liquid is introduced and uniformly distributed over the entire surface of the liquid container, and in particular, an optimal flow relationship can also be achieved at the edges. Nozzles should be grouped into nozzle groups, which are preferably located in different container bottom areas. A suitable method is to arrange a group of nozzles in the central region and a group of nozzles in the two peripheral regions, and the density and number of nozzles in individual regions may be different. It is also suitable to provide separate liquid supply devices for each nozzle and / or nozzle group, so that the nozzles can spray with different hydraulic pressure. According to an excellent embodiment of the present invention, a liquid injection cavity is preset on the bottom of the liquid container to be connected with the nozzle. According to another embodiment of the present invention, the liquid injection cavity is divided into partial cavities for each nozzle and / or nozzle group. Printed by the Office of the Central Standards Bureau, Ministry of Economic Affairs, Consumer Cooperatives The liquid injection cavity at the bottom of the liquid container is mainly constructed as a sandwich space between a double bottom. According to a particularly suitable embodiment of the present invention, in addition to the nozzles, any cleaning openings of any cleaning nozzles are preset, which are also preferably arranged between the nozzles in a matrix form. In this way, it is also possible to arbitrarily clean the intermediate area between the nozzle and the dead space. Arbitrary cleaning of openings is also best as nozzles. The paper size is suitable for countries and countries (CNS > Α4 size (210 × 2! »7mm) -5-^ 446 571 A7 B7. Five Central Ministry of Economic Affairs, Ministry of Economic Affairs, Central Bureau of Standards, Off-line Consumer Cooperation Du Yinyu's invention description (3) is connected with the liquid injection cavity located below. According to another excellent embodiment of the present invention, the bottom of the liquid container is beveled, and the bottom should be inclined toward the center and approximately toward the centerline or center point of the liquid container. Down. In this way, the liquid container can drain quickly and completely when the liquid is discharged downward. In order to quickly discharge the liquid, in the liquid container, and especially in the center or centerline of the container, a large diameter is preset. Closeable opening. In the event of a power outage or other occasional event, but also related to common process steps, 'in this way', the substrate in the liquid container can be quickly removed from the processing solution, such as an acid etchant. Generally in A receiving container is preset under the liquid tank to receive the rapidly discharged liquid. In another embodiment of the present invention, in addition to or replacing the nozzle at the bottom of the container, the receiving container is The nozzle is preset on the side wall of the body container. In this way, it is convenient to guide the liquid to flow in the liquid container at the side or in the transition area between the bottom of the liquid and the side wall, thereby further improving the flow relationship or enhancing the liquid. Rolling volume. According to another excellent embodiment of the present invention, the nozzles and / or nozzle groups are assigned to different liquids. The respective nozzles and / or nozzle groups belonging to different groups are therefore separated from each other based on the duct and the pump. Different liquids, such as different chemicals, are guided through the nozzle and / or nozzle group of the chemical agent. “In this way, the liquid can be changed quickly without confusion. 'This is the only liquid that is allocated to this mouth. Flow to this other nozzle. According to another excellent embodiment of the present invention, in addition to the liquid guided through the nozzle, 'lead other liquids, such as additional chemicals, gases, and paper. Rate (CNS) A4 specification (210 >: 23_7 mm) Printed by the Consumers' Cooperatives of the Central Procurement Bureau of the Ministry of Economy ^ 446β? Β Α7 ______ Β7 _ V. Description of the invention (4) Ozone, water Wait until the liquid container. Especially for the additional introduction of chemicals, gases, ozone or water, at least one diffuser is preset in the liquid container meat. A also very suitable embodiment of the invention is in the upper area of the liquid container ' Spray nozzles are arranged around the side wall to clean the liquid container and / or perform different procedures in the same liquid container, which is roughly between the acid etching, cleaning and drying processes, and is used as a substrate to moisten and maintain humidity. The main purpose here is to spray out aerosol, water, and other chemical agent vapors, or spray liquid introduced into the liquid container from below. The solution to the above problem is to set a substrate carrying device in the liquid container. 'It contains three support parts of the support matrix, which can be combined with the above features, but it can also be irrelevant. Supporting the matrix in three positions maintains a defined position of the matrix without the need to guide in the liquid tank. The substrate-bearing device can mainly be raised and lowered. A suitable method here is that at least one supporting portion is a knife-shaped frame which runs across the frame beam and has a slit to support the edge portion of the substrate. There is at least one supporting part, which can move in a vertical direction relative to at least one other supporting part. In order not to repeat the description, please refer to DE-A-196 15 108 and DE-A_195 46 990, which are not disclosed in advance, by the applicant of the present application, to avoid repeated description. This feature is used as the object of the present invention. According to another excellent embodiment of the present invention, the substrate carrying device only has a supporting portion that becomes a knife-shaped frame, and at least one of the liquid containers uses a middle mesh «house standard rate () A4 secret (210XM7 mm) ~ ~~: ---

(請先閲讀背面之注意事項再填寫本頁)(Please read the notes on the back before filling this page)

446575 A7 ___________ B7 五、發明説明（5 ) 邊壁的内側表面的裡面或上面預設基質的導引件。此實 施例的優點是，基質承載裝置在液體槽内沒有或僅有微 小的空間需求’因而維持小的容器體積和化學劑體積， 並且處理程序的成本，大致依照化學劑的損耗量而定， 就能夠被降低《導引件由狹缝，然而主要是架子、梢柱 及/或粒結所構成，與狹縫的結構比較，其優點為較容 易且快速被清潔，並且必要時被乾燥。當先後浸入一種 液體或注滿液體容器’則在狹缝内停留相對多的液體， 並且污染後續注入的液體。 依據本發明另一優異的實施例，在液體容器邊壁的内 侧表面具有不含導引件的區域。為了不妨礙在液體容器 内確實的導引和基質的撐托，把内侧表面沒有導引件的 區域相對於内侧表面含有導引件的區域偏移安置。例如 若在一個内侧表面區域已預設導引件，則在對面的内侧 .表面區域不必設置導引件，因為導引件在一個侧邊已足 夠了。在内側表面無導引件的區域主要預設注入開口、 噴灑噴嘴、擴散器、紫外線光源及/或超音波發射裝置 0 經濟部中央橾準局貝工消费合作社印製 本發明另一合適的實施例為，運用一個從液體槽上面 可以放置的罩蓋，其主要至少具備一個液體注入開口， 特別作為按照MARANGONI原理的乾燥處理時注入一種 液體之用。為了避免重覆敘述此實施例，特別參閱DE_A-44 13 077及未預先公開之由本案申請人提出的專利案DE_ A-195 00 239、DE-A-196 15 108及在 1996年4月 22 日申請 本紙張尺度適用中βΗ家樣丰{ CNS ) A4規格（210X297公釐） 446575 Α7 Β7 經濟部中央樣準局貝工消费合作社印1i 五、發明説明（6) 的專利案DE-A-196 15 970.9，其被作為目前本發明的物件 〇 另外合宜的是運用一個加溫及/或冷卻裝置，以加溫 及/或冷卻在液體容器内的液體，藉此能把液溫調整在 一個可選擇的最佳值。同樣使用一個紫外線光源也是合 宜，其被安置在液體容器的底部及/或邊壁上面。 本發明另一合適的實施例為，預設一個基質下止動架 ’其形式大約為一個停住框架，可以置放在基質的上邊 緣區域。為了避免在此重覆敘述，可參閱由本案申請人 在1996年4月22日申請的DE-A-196 159 70.9，其被作為目 前本發明的内容。 另外較佳的方式是一個超音波發射裝置，其主要是以 一個超音波轉換器的形式一個或多個組合到液體容器内 。就此適宜的放置位置是在由液體容器的底部和邊壁構 .成的角落，而發射方向和水平主要成45度。 因為使用本發明的裝置能夠很快速裝填容器，並且在 引入液體到容器内產生一個強勁的噴嘴效應，則最好有 一個覆住液體容器的裝置，其防止液體噴射到一個既有 之主要為乾燥處理程序設置的罩蓋。 本發明裝置主要和一個液體淨化再生設備連接，在此 設備内液體或混和液被收取並被淨化再生，因此能夠被 重複使用並且主要被送回到液體容器内。 另外宜有一個隔離設備，以區隔開在排放氣内含有鹼 性和酸性的蒸氣。 -請 先 Μ 面 之 注 3 訂 冬紙》尺度適用中8躪家梯芈（CNS > Α4規格（2丨0Χ297公釐) -9 - 446575 經濟部中央標隼局月工消費合作社印裝 A7 B7 五、發明説明（7 ) 特別合宜的作法是，在處理和沖洗過程能夠在液體容 器内轉動基質。為此主要預設一個在液體容器内轉動基 質的裝置》 當使用混合液時’液體宜在放入液體容器前先行混合 0 . 本發明將在下文藉由較佳的實施例，並參閱圖式加以 說明。圖中： 圖一本發明裝置之一實施例的橫切面， 圖二圖一所示裝置之俯視圖，或從上面看入液體容器的 方向，及 圖三沿著一個相對於圖一所示圖形之橫切面旋轉90度的 切平面的一個橫切面β 從囷式可以看到，本發明裝置之液體容器丨具有一個 底部2和邊壁3。在圖一内相向對立的邊壁3上面預設狹縫 4，在狹缝内，基質片5豎立在一個基質承載裝置6上面被 導引，而基質承載裝置藉一個未圖示之驅動裝置在垂直 方向移動，並且把晶圓片5降入液體容器i内及從其内移 出。在此實施例，基質承載裝置6是由一個刀形架組成， 内有狹縫或凹痕，其在相向對立的邊壁3内以對應於導引 狹縫4之間的間距隔開排列。 如最好從圖一可以看出，在一條中心線的兩側的展部 2朝内傾斜，使得當排洩容器〗時液體在中央向流出。 底部2設置多個噴嘴7以矩陣形式排列，此可以從圖三 清楚看到。噴嘴有不同的噴嘴出口或射出角度8, 9，如圖 冬紙張尺度通用宁K国家梯準（CNS > A4規格 210X297 公漦） •10·446575 A7 ___________ B7 V. Description of the invention (5) The guide of the substrate is preset inside or on the inside surface of the side wall. The advantage of this embodiment is that the substrate-bearing device has no or only minimal space requirements in the liquid tank, and thus maintains a small container volume and chemical agent volume, and the cost of the processing procedure is roughly determined by the amount of chemical agent consumption. It can be lowered. The guide is composed of slits, but is mainly composed of shelves, stalks, and / or granules. Compared with the structure of the slits, its advantages are that it is easier and faster to clean, and it is dried if necessary. When successively immersed in a liquid or filled with a liquid container ', a relatively large amount of liquid stays in the slit, and contaminates the subsequent injected liquid. According to another excellent embodiment of the present invention, the inner surface of the side wall of the liquid container has a region without a guide. In order not to hinder the accurate guidance and support of the substrate in the liquid container, the area without the guide on the inner surface is offset from the area with the guide on the inner surface. For example, if a guide is preset in an inner surface area, it is not necessary to provide a guide in the opposite inner surface area, because the guide is sufficient on one side. In the area without guides on the inner surface, mainly injection openings, spray nozzles, diffusers, ultraviolet light sources and / or ultrasonic emission devices are pre-set. For example, a cover that can be placed from above the liquid tank is mainly provided with at least one liquid injection opening, especially for injecting a liquid during a drying process according to the MARANGONI principle. In order to avoid repeating the description of this embodiment, please refer to DE_A-44 13 077 and the patent cases DE_A-195 00 239, DE-A-196 15 108 and April 22, 1996 which were not previously published and filed by the applicant of this case. Japanese paper application for βΗ 家 样 丰 {CNS) A4 size (210X297 mm) 446575 Α7 Β7 Printed by the Central Bureau of Standards, Ministry of Economic Affairs, Shellfish Consumer Cooperatives, printed 1i 5. Patent Description DE-A- 196 15 970.9, which is regarded as the object of the present invention. It is also suitable to use a heating and / or cooling device to warm and / or cool the liquid in the liquid container, thereby adjusting the liquid temperature to a Selectable best value. It is also expedient to use an ultraviolet light source, which is placed on the bottom and / or on the side walls of the liquid container. Another suitable embodiment of the present invention is that a pre-substrate stopper frame is preset in the form of a stop frame and can be placed in the upper edge region of the substrate. In order to avoid repeated description here, reference can be made to DE-A-196 159 70.9, filed by the applicant of the present application on April 22, 1996, which is taken as the content of the present invention. Another preferred method is an ultrasonic transmitting device, which is mainly combined in the form of an ultrasonic converter into one or more liquid containers. A suitable place for this is at the corner formed by the bottom and side walls of the liquid container, and the emission direction and level are mainly at 45 degrees. Because the device of the present invention can be used to fill containers very quickly and produce a strong nozzle effect when introducing liquid into the container, it is best to have a device that covers the liquid container, which prevents the liquid from being sprayed onto an existing, mainly dry Cover set by the handler. The device of the present invention is mainly connected to a liquid purification and regeneration equipment, in which the liquid or mixed liquid is collected and purified and regenerated, so it can be reused and returned mainly to the liquid container. In addition, an isolation device should be provided to distinguish the alkaline and acidic vapors contained in the exhaust gas. -Please note on the first side of the page. 3 Winter Paper Orders. Applicable to 8 standard home elevators (CNS > A4 size (2 丨 0 × 297 mm) -9-446575 Printed by A7 of the Central Industry Bureau of the Ministry of Economic Affairs B7 V. Description of the invention (7) A particularly suitable method is to be able to rotate the substrate in the liquid container during the processing and rinsing process. For this purpose, a device for rotating the substrate in the liquid container is pre-set. "When using mixed liquids, 'liquid should Mix into the liquid container before putting it in. The present invention will be explained below with reference to the preferred embodiments and the drawings. Figure: Figure 1 is a cross section of an embodiment of the device of the present invention, Figure 2 Figure 1 The top view of the device shown, or the direction of looking into the liquid container from above, and a cross section β along a tangent plane that is rotated 90 degrees relative to the cross section of the figure shown in FIG. The liquid container of the device of the present invention has a bottom 2 and a side wall 3. A slit 4 is preset on the side wall 3 opposite to each other in Fig. 1. In the slit, the substrate sheet 5 stands on a substrate carrying device 6 and is Guide while the matrix The carrier device is moved in a vertical direction by a driving device (not shown), and the wafer 5 is lowered into and removed from the liquid container i. In this embodiment, the substrate carrier device 6 is composed of a knife-shaped frame, There are slits or dents in them, which are arranged in the opposite side wall 3 at a distance corresponding to the guide slits 4. As can be seen from Figure 1, it is best seen on both sides of a center line The exhibition section 2 is inclined inward, so that the liquid flows out in the center when the container is discharged. The bottom 2 is provided with a plurality of nozzles 7 arranged in a matrix form, which can be clearly seen from Figure 3. The nozzles have different nozzle outlets or shooting angles 8, 9, as shown in the winter paper standard General Ning K national ladder standard (CNS > A4 size 210X297 cm) • 10 ·

^' 44657^ A7 B7 五、發明説明（8〉 所不。基於不同的射出角度或由於不同的射出型，則 在整個液體容器輪廓範圍產生一個良好的均句層流，並 且基質5的整片範園均句地被從噴嘴7射出的液體喷射。 從圖一可以看出，底部2的下面構造出空腔12, 13, 14, 15，其下面被一片密閉平板16封閉住。液體經由空腔^ 至15被導引到各個和空腔銜接的嘴嘴7。 介於噴嘴7之間，在底部2内預設任意清洗開口 18，此 對應圖二在液體容器1的底部2同樣以矩陣形式分佈設置 。任意清洗開口 18自由清洗底部2介於喷嘴7之間的區域 ’並且同樣連接到在底部2下面的液體輸送空腔12至15， 以供給液體。 如圖一所示’在底部2的中央預設一個開口 19，以快 速排放液體容器1内的液體，此係在發生停電時及/或在 液體容器1内的基質5必須從液體環境，如一個酸蝕劑， ，快速脫離時的措施。當打開一個封蓋2〇時，液體即在短 時間内排放進入一個未圖示之安置在液體容器1下面的一 個承接容器。 基質承載裝置6的位置是在封蓋20的上面區域内，部 份在底部2内，並且只有一個微小部位向上突出到噴嘴開 口的上面》因此，基質承載裝置只在液體容器1内佔有一 小部份額外的空間，而使得在液體容器1内可以維持小量 的液體體積。 在邊壁3的上邊是溢流開口21，從下面注入的液體可 從此溢流開口流掉。 本紙張尺度適用中國«家揉準（CNS ) A4現格（210XW7公* ) -11 - 先 閲 .讀 背 *面 之 注 3 訂 經濟部中央標準局負工消費合作社印製 446575 A7 B7 五、發明説明（9 ) 請 閲 讀 $ 以上藉由較佳實施例說明本發明的内容。然而專業人 士可在不偏離本發明的構想下，做出許多變化和設計。 例如在液體容器1上面可以放置一個罩蓋，或者在液體容 器1的邊壁3上，例如在上邊部位，設置噴灑喷嘴，以做 作為清潔容器或在各個程序和處理步驟之間噴灑基質5之 用。如上所述，也可以在液體容器1内安置超音波轉換器 、紫外線光源或轉動晶圓片5的裝置。 填 寫 訂 經濟部中央標準局貝工消費合作社印製 本紙張尺度逋用中國國家揉率（CNS > A4規格< 210x_2|^jfc )^ '44657 ^ A7 B7 V. Description of the invention (8> No. Based on different injection angles or due to different injection types, a good uniform sentence laminar flow is generated throughout the outline of the liquid container, and the entire piece of matrix 5 Fan Yuan was uniformly sprayed by the liquid ejected from the nozzle 7. As can be seen from Fig. 1, a cavity 12, 13, 14, 15 is formed under the bottom 2, and the bottom is closed by a closed flat plate 16. The liquid passes through the air The cavities ^ to 15 are guided to the mouths 7 that are connected to the cavity. Between the nozzles 7, any cleaning opening 18 is preset in the bottom 2. This corresponds to Figure 2. The bottom 2 of the liquid container 1 is also matrixed. Form distribution setting. Any cleaning opening 18 freely cleans the area of the bottom 2 between the nozzles 7 'and is also connected to the liquid delivery cavities 12 to 15 below the bottom 2 to supply liquid. As shown in Fig. 1' at the bottom An opening 19 is preset in the center of 2 to quickly discharge the liquid in the liquid container 1. This is to be quickly separated from the liquid environment, such as an acid etchant, during a power outage and / or the substrate 5 in the liquid container 1 Measures when opening. When opening At a time of a cover 20, the liquid is discharged into a receiving container (not shown) placed below the liquid container 1 in a short time. The position of the substrate carrying device 6 is in the upper area of the cover 20, partly in Inside the bottom 2 and only a small part protrudes upwards above the nozzle opening. Therefore, the substrate carrying device only occupies a small part of the extra space in the liquid container 1, so that a small amount of liquid can be maintained in the liquid container 1. Volume. On the side of the side wall 3 is an overflow opening 21, and the liquid injected from below can flow out of this overflow opening. This paper size is applicable to China «Home Kneading Standard (CNS) A4 now (210XW7 male *) -11- Read first. Read the back note 3 above. Printed by the Central Standards Bureau of the Ministry of Economic Affairs and printed by the Consumer Cooperatives 446575 A7 B7. 5. Description of the invention (9) Please read above to illustrate the content of the present invention with a preferred embodiment. However, professional A person can make many changes and designs without departing from the concept of the present invention. For example, a cover can be placed on the liquid container 1, or on the side wall 3 of the liquid container 1, such as above At the side, spray nozzles are provided for cleaning the container or spraying the substrate 5 between the various procedures and processing steps. As described above, an ultrasonic transducer, an ultraviolet light source, or a rotating wafer can also be placed in the liquid container 1 Device for sheet 5. Fill in the paper size printed by the Central Standards Bureau of the Ministry of Economic Affairs, Shellfish Consumer Cooperative, and use the Chinese national kneading rate (CNS > A4 specifications < 210x_2 | ^ jfc)

Claims (1)

446575 Α8 Β8 C8 D8 經濟部智慧財產局員工消費合作社印製 六、申讀利範圍JL86104566號卷利案申諸卷利篏面瘀芷t 1. 一種在液體容器(1)内處理基質(5)之裝置，具有一喷嘴 系統含有多個噴嘴(7)以導入液體’其噴嘴(7)被安置分 佈在一容器的底部(2)上面，其特徵為，液體容器(!）的 底部(2)被作成斜面並且因而朝向液體容器(1)的中央部 位下斜，至少幾個喷嘴(7)具有不同的噴射角度(8, 9), 至少有一噴嘴(7)具有一扇葉形的喷射形狀，至少有一 噴嘴(7)具有一圓錐形的噴射形狀，且喷嘴(7)被組合成 為噴嘴群。 2. 根據申請專利範圍第〖項所述之裝置，其特徵為，喷嘴 群設置在液體容器(1)的不同底部區域》 3. 根據申請專利範固第1項所述之裝置，其特徵為，設置 一組噴嘴群在中央區域，及分別各一組喷嘴群在底部(2) 的兩個外圍區域。 4. 根據申請專利範圍第1項所述之裝置，其特徵為，個別 的喷嘴(7)及/或個別的噴嘴群具有彼此分開的液體供 給裝置。 5_根據申請專利範圍第1項所述之裝置，其特徵為，在液 體容器⑴的底部(2)下面設置一液體輸送空腔(12, 13, 14, 15)，和喷嘴⑺銜接。 6.根據申請專利範圍第5項所述之裝置，其特徵為，液體 輸送空腔依個別的喷嘴Ρ)及/或個別的喷嘴群，而被 區分成液體區隔空腔(12, 13, 14,15)。 ij!il -裝 i — * . <請先閲讀背面之注意事項再填寫本頁) 訂· --線' 本紙張尺度適用中國國家標準（CNS)A4規格（21〇 X 297公爱） -13- U6575 Mi 經濟部智慧財產局員工消費合作社印製 六、申請專利範圍 7. 根據申請專利範圍第5項所述之裝置，其特徵為，液體 輸送空腔(12, 13, 14, 15)由一介於一雙底部(2, 16)的夾層 空間所構成。 8. —種在液體容器(1)内處理基質(5)之裝置，具有一喷嘴 系統含有多個噴嘴(7)以導入液體，其噴嘴(7)被安置分 佈在一容器的底部(2)上面，其特徵為，預設任意清洗 開口（18)以自由沖洗噴嘴(7)，其任意清洗開口（18)以矩 陣形式排列，設置在液體容器(1)的底部(2)，任意清洗 開口（18)設置於噴嘴⑺之間，且任意清洗開口（18)和位 於下面的液體輸送空腔(12,13,14, 15)銜接。 9_ 一種在液體容器⑴内處理基質(5)之裝置，具有—喷嘴 系統含有多個噴嘴(7)以導入液體，其噴嘴(7)被安置分 佈在一容器的底部(2)上面，其特徵為，在液體容器(1) 的邊壁(3)旁邊設置噴嘴(7)，喷嘴(7)及/或噴嘴群係為 不同的液體而設置，且設置彼此分離的導管連接到為不 同的液體而設置的噴嘴(7)及/或喷嘴群，將附加的液 體導入液體容器(1)内，附加的液體是化學劑、氣體、 臭氧及/或水，且附加的液體係經由至少一擴散器導 入。 10· —種在液體容器(1)内處理基質(5)之裝置，具有一噴嘴 系統含有多個噴嘴(7)以導入液體，其噴嘴(7)被安置分 佈在一容器的底部(2)上面’其特徵為，喷濃喷嘴被安 置在邊壁上’並且主要位於液體容器(丨）的上面部位， 且預設喷ί麗嘴嘴，以在個別的處理步驟間喷麗出化學446575 Α8 Β8 C8 D8 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs VI. The application scope of the application is JL86104566. The profit case is applied to the volume and the surface stasis. 1. A substrate (5) is processed in a liquid container (1) The device has a nozzle system containing a plurality of nozzles (7) to introduce liquid. Its nozzles (7) are arranged and distributed on the bottom (2) of a container, and are characterized in that the bottom (2) of the liquid container (!) Beveled and thus inclined downward toward the center of the liquid container (1), at least several nozzles (7) have different spray angles (8, 9), at least one nozzle (7) has a leaf-shaped spray shape, At least one nozzle (7) has a conical spray shape, and the nozzles (7) are combined into a nozzle group. 2. According to the device described in the scope of the patent application [item, characterized in that the nozzle groups are arranged in different bottom areas of the liquid container (1) "3. According to the device described in the patent application, the solid device is characterized in that: , A group of nozzle groups is set in the central area, and two groups of nozzle groups are respectively located in the two peripheral areas at the bottom (2). 4. The device according to item 1 of the scope of patent application, characterized in that the individual nozzles (7) and / or individual nozzle groups have separate liquid supply devices. 5_ The device according to item 1 of the scope of the patent application, characterized in that a liquid conveying cavity (12, 13, 14, 15) is arranged below the bottom (2) of the liquid container ⑴ and is connected with the nozzle ⑺. 6. The device according to item 5 of the scope of the patent application, characterized in that the liquid delivery cavity is divided into liquid compartments (12, 13, according to individual nozzles P) and / or individual nozzle groups. 14,15). ij! il -install i — *. < Please read the notes on the back before filling in this page) Order · --line 'This paper size applies Chinese National Standard (CNS) A4 (21〇X 297 public love)- 13- U6575 Mi Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 6. Scope of patent application 7. The device described in item 5 of the scope of patent application is characterized by a liquid delivery cavity (12, 13, 14, 15) It consists of a sandwich space between a pair of bottoms (2, 16). 8. A device for processing a substrate (5) in a liquid container (1), which has a nozzle system containing a plurality of nozzles (7) for introducing liquid, and the nozzles (7) are arranged and distributed on the bottom of the container (2) Above, it is characterized in that the arbitrary cleaning openings (18) are preset with free washing nozzles (7), the arbitrary cleaning openings (18) are arranged in a matrix form, and are arranged at the bottom (2) of the liquid container (1) to arbitrarily clean the openings (18) is arranged between the nozzles ，, and any cleaning opening (18) is connected with the liquid conveying cavity (12, 13, 14, 15) below. 9_ A device for processing a substrate (5) in a liquid container, having a nozzle system containing a plurality of nozzles (7) for introducing liquid, and the nozzles (7) are arranged and distributed on the bottom (2) of the container. In order to provide a nozzle (7) next to the side wall (3) of the liquid container (1), the nozzle (7) and / or the nozzle group are provided for different liquids, and the separate pipes are connected to different liquids. The provided nozzles (7) and / or nozzle groups introduce additional liquid into the liquid container (1). The additional liquid is a chemical agent, gas, ozone, and / or water, and the additional liquid system passes through at least one diffuser. Import. 10 · An apparatus for processing a substrate (5) in a liquid container (1), which has a nozzle system containing a plurality of nozzles (7) for introducing liquid, and the nozzles (7) are arranged and distributed on the bottom of the container (2) The above 'characterized that the spray nozzle is placed on the side wall' and is mainly located on the upper part of the liquid container (丨), and the spray nozzle is preset to spray the chemical between the individual processing steps I I -----I I ! ' 11 * C請先閱讀背面之注意事項再填寫本頁) 訂_ - --線· -14- A8BSC8DB 446575 六、申請專利範圍 劑。 11_根據申請專利範圍第1項所述之裝置，其特徵為，一撐 托基質(5)的基質承載裝置(6)。 12. 根據申請專利範圍第8項所述之裝置，其特徵為，一撐 托基質(5)的基質承載裝置(6)。 13. 根據申請專利範圍第9項所述之裝置，其特徵為，一撐 托基質(5)的基質承載裝置 14. 根據申請專利範圍第1〇項所述之裝置，其特徵為，一 撐托基質(5)的基質承載裝置⑹》 15. 根據申請專利範圍第u項所述之裝置，其特徵為，基 質承載裝置(6)具有三個撐托部位。 16. 根據申請專利範圍第丨丨項所述之裝置，其特徵為，基 質承載裝置(6)可以抬升及下降。 17·根據申請專利範圍第^項所述之裝置，其特徵為，至 少一撐托部位是一個刀形架，其在橫著架梁走向具有狭 缝以承載基質的邊緣部位。 18_根據申請專利範圍第u項所述之裝置，其特徵為，至 少一撐托部位相對於至少一其他的撐托部位沿著垂直方 向能夠移動。 19. 根據申請專利範園第丨丨項所述之裝置，其特徵為，基 質承載裝置(6)具有一撐托部位，並且在液體容器(1)至 少一邊壁(3)的内側的裏面或上面預設基質的導引件 (4)。 20. 根據申請專利範圍第19項所述之裝置，其特徵為，導 本紙張尺度適用中0困家株準（CNb:「A4規格咖χ挪公釐）-- -15- !!}裝 i • * (請先閱讀背面之注意事項再填寫本頁) 訂 .線 經濟部智慧財產局貝工消费合作社印製 ABaD 446575 六、申請專利範圍 引件由狹縫、架子、梢柱及/或粒結所構成。 21. 根據申請專利範圍第19項所述之裝置，其特徵為，液 體槽(1)的邊壁(3)的内侧表面具有不含導引件的區域。 22. 根據申請專利範圓第21項所述之裝置，其特徵為，内 侧表面不含導引件的區域相對於内侧表面含有導引件的 區域被偏移安置。 23. 根據申請專利範圍第21項所述之裝置，其特徵為，内 側表面不含導引件的區域設有注入開口，噴灑喷嘴，擴 散器’紫外線光源及/或超音波發射裝置❶ 24. 根據申請專利範圍第1項所述之裝置，其特徵為，一覆 蓋住液體容器(1)的裝置〇 25. 根據申請專利範圍第1項所述之裝置，其特徵為，至少 一基質停住框架，其套放在基質(5)的上邊緣區域。 26. 根據申請專利範圍第1項所述之裝置，其特徵為，一可 以放置在液體槽(1)上面的軍蓋。 27. 根據申請專利範圍第26項所述之裝置，其特徵為，軍 蓋具有至少一液雜注入開口 β 28. 根據申請專利範園第27項所述之裝置，其特徵為’經 由罩蓋注入的液體是為應用Marangoni原理作乾燥處理 所需者。 29. 根據申請專利範園第丨項所述之裝置，其特徵為’一加 溫及/或冷卻裝置，以加溫及/或冷卻在液體容器(1) 内的液體。 30. 根據申請專利範園第1項所述之裝置，其特徵為，一液 本紙張尺度適用中國國家標準（CNS)A4规格（210 X 297公« ) -16- (請先閲讀背面之注$項再填窝本頁) 訂 --線- 經濟部智慧財產局員工消t合作社印製 4465 75 m gi _ 六、 I?請專利範圍 體淨化再生設備。 31. 根據申請專利範圍第30項所述之裝置，其特徵為，一 隔離設備’以區隔開在排放氣内含有鹼性和酸性的蒸 氣。 32. 根據申請專利範圍第〗項所述之裝置，其特徵為，一紫 外線光源，其被安置在液體容器(1)的底部(2)及/或邊 壁(3)上面。 33. 根據申請專利範圍第丨項所述之裝置，其特徵為，至少 一超音波發射裝置。 34. 根據申請專利範圍第33項所述之裝置，其特徵為，超 音波發射裝置被安置在由液體容器(1)的底部(2)和邊壁 (3)所構成的角落。 35. 根據申請專利範園第1項所述之裝置.，其特徵為’一在 液體容器(1)内轉動基質(5)的裝置。 經濟部智慧財產局貝工消费合作社印製 適 度 尺 張 紙 本 準 裸 家 釐 公I 2 X 10 (2 格 規I I ----- I I! '11 * C Please read the notes on the back before filling this page) Order _---- Line · -14- A8BSC8DB 446575 VI. Patent Application Agent. 11_ The device according to item 1 of the scope of the patent application, characterized in that a substrate supporting device (6) supporting the substrate (5). 12. The device according to item 8 of the scope of patent application, characterized in that it comprises a substrate carrying device (6) supporting the substrate (5). 13. The device according to item 9 of the scope of patent application, characterized by a substrate supporting device supporting the substrate (5) 14. The device according to item 10 of the scope of patent application, characterized by a support The substrate supporting device of the supporting substrate (5) ⑹ "15. The device according to item u of the patent application scope, characterized in that the substrate supporting device (6) has three supporting portions. 16. The device according to item 丨 丨 of the scope of patent application, characterized in that the substrate bearing device (6) can be raised and lowered. 17. The device according to item ^ of the scope of the patent application, characterized in that at least one supporting portion is a knife-shaped frame which has a slit in the direction transverse to the frame beam to support the edge portion of the substrate. 18_ The device according to item u of the scope of patent application, characterized in that at least one supporting portion is movable in a vertical direction relative to at least one other supporting portion. 19. The device according to item 丨 丨 of the patent application park, characterized in that the substrate carrying device (6) has a supporting part and is located inside or on the inner side of at least one side wall (3) of the liquid container (1) or The substrate guide (4) is preset above. 20. The device according to item 19 of the scope of the patent application, characterized in that the paper size of this guide is applicable to the standard of Chinese families (CNb: "A4 size coffee χ Norwegian mm)--15- !!} i • * (Please read the notes on the back before filling out this page). AbaD 446575 printed by the Shellfish Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 6. The patent application scope of the guide is composed of slits, shelves, pins and / or Grain structure. 21. The device according to item 19 of the scope of patent application, characterized in that the inner surface of the side wall (3) of the liquid tank (1) has a region without a guide. 22. According to the application The device according to item 21 of the patent fan circle is characterized in that the area without the guide on the inner surface is offset from the area with the guide on the inner surface. 23. According to item 21 of the scope of patent application The device is characterized in that an injection opening, a spray nozzle, a diffuser 'ultraviolet light source and / or an ultrasonic emission device are provided in an area without a guide on the inner surface. 24. The device described in the first item of the scope of the patent application , Characterized in that, a liquid container is covered ( 1) Device 025. The device according to item 1 of the scope of the patent application, characterized in that at least one substrate stops the frame and is sleeved on the upper edge region of the substrate (5). The device according to item 1, characterized in that a military cover which can be placed on the liquid tank (1). 27. The device according to item 26 of the scope of patent application, characterized in that the military cover has at least one liquid Injection opening β 28. The device according to item 27 of the patent application park, characterized in that the liquid injected through the cover is required for applying the Marangoni principle for drying treatment. 29. According to the patent application park item 丨The device is characterized by 'a heating and / or cooling device for heating and / or cooling the liquid in the liquid container (1). 30. The device according to item 1 of the patent application park, It is characterized in that the size of a paper is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 male «) -16- (please read the note on the back before filling in this page) Order-Line-Ministry of Economy Printed by the Intellectual Property Bureau staff co-operative cooperative 4465 75 m gi _ VI, I Please request the scope of the patent to purify and regenerate the equipment. 31. The device according to item 30 of the scope of the patent application, characterized in that an isolation device is used to separate the alkaline and acidic vapors contained in the exhaust gas. 32. According to The device described in item No. of the scope of patent application is characterized in that an ultraviolet light source is arranged on the bottom (2) and / or the side wall (3) of the liquid container (1). The device according to item 丨 is characterized in that it has at least one ultrasonic transmitting device. 34. The device according to item 33 of the scope of the patent application, characterized in that the ultrasonic transmitting device is arranged in a corner formed by the bottom (2) and the side wall (3) of the liquid container (1). 35. The device according to item 1 of the patent application park, characterized by 'a device for rotating the substrate (5) in the liquid container (1). Appropriately printed on paper, quasi-naked, printed by the Shelley Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, I 2 X 10 (2 grid rule)
TW086104566A 1996-04-24 1997-04-10 Device for treating substrates in a fluid container TW446575B (en)

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DE19654903A1 (en) 1997-11-13
US5921257A (en) 1999-07-13
ATE259989T1 (en) 2004-03-15
JP3493030B2 (en) 2004-02-03
EP0895655A1 (en) 1999-02-10
KR100316823B1 (en) 2002-02-19
US5992431A (en) 1999-11-30
EP0895655B1 (en) 2004-02-18
ID16694A (en) 1997-10-30
DE19655219C2 (en) 2003-11-06
DE19654903C2 (en) 1998-09-24
MY132460A (en) 2007-10-31
KR20000010575A (en) 2000-02-15
WO1997040524A1 (en) 1997-10-30
JPH11510965A (en) 1999-09-21

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