JPH05190525A - Washing device - Google Patents

Abstract

PURPOSE:To provide a small type washing device, consisting of material-to-be- washed housing case in which transfer of a wafer is unnecessary, and the wafer can be washed in a small type device. CONSTITUTION:The title washing device consists of a wafer housing case 1, having the side wall formed in the shape surrounding the wafer and the opened bottom face and the upper face, and a washing vessel substrate 3 having a chemical solution vessel 2 provided with a chemical solution blowing out hole 2a on the part corresponding to the inside of the bottom part or a pure water blowing out hole 3a, which is closely contacted to the entire bottom part of the side wall of the above-mentioned wafer housing case 1. The chemical solution and the pure water are introduced from the bottom face to the inside of the wafer housing case 1, and they are exhausted toward the upper face of the case 1.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device including a storage case for a cleaning object and a cleaning tank substrate.

With the recent increase in the diameter of wafers used in the manufacture of semiconductor devices, the size of cleaning devices has increased, and it has been required to reduce the size of cleaning devices as much as possible. Under the circumstances as described above, it is desired to make the cleaning device as small as possible.

[0003]

2. Description of the Related Art A conventional wafer cleaning apparatus used in a semiconductor device manufacturing process will be described in detail with reference to FIG.

In the conventional cleaning apparatus, as shown in FIG. 3, a wafer cleaning case 21 containing a wafer 11 is dipped in a cleaning tank 23 filled with a cleaning solution, and a cleaning solution supply port provided at the bottom of the cleaning tank 23. The cleaning liquid is supplied from 23a, and the surplus used cleaning liquid is overflowed from the cleaning tank 23 so that the wafer 11
It is a cleaning device for cleaning.

Normally, the wafer 11 is stored in a wafer storage case for transportation, and therefore, when cleaning the wafer, the wafer 11 must be transferred from the wafer storage case to the wafer cleaning equipment case 21.

[0006]

In the conventional cleaning apparatus described above, the wafer is transferred from the wafer storage case to the wafer cleaning case, and the wafer cleaning case is immersed in the cleaning liquid filled in the cleaning tank. The size of the tank must be one size larger than the wafer cleaning case so that the wafer cleaning case can be easily taken in and out, and it takes man-hours to transfer the wafer from the wafer storage case to the wafer cleaning case. If the transfer fails and the wafer is damaged, there is a problem that the wafer cannot be repaired.

In view of the above situation, the present invention has an object to provide a cleaning device which does not require wafer transfer and can clean a wafer with a small device.

[0008]

A cleaning apparatus according to the present invention has a side wall having a shape surrounding a wafer and having a bottom and an upper surface opened, and a side wall of the side wall of the wafer storage case. It has a cleaning tank substrate that is in close contact with the entire bottom and has a chemical solution or pure water outlet in the portion corresponding to the inside of the bottom, and the chemical solution or pure water is discharged from this outlet from the bottom surface of the wafer storage case. It is configured to be introduced inside and discharged to the upper surface.

[0009]

In the present invention, the wafer storage case containing the wafer is placed on the surface of the cleaning tank substrate, and the cleaning tank can be formed by the four side walls of the wafer storage case and the cleaning tank substrate. Therefore, the chemical solution or the cleaning solution is blown out from the outlet provided on the cleaning tank substrate,
It becomes possible to clean the wafer.

Therefore, it is not necessary to transfer the wafer from the storage case to the cleaning case as in the conventional case, and there is no fear of damaging the wafer. Moreover, since the wafer is not transferred from the storage case to the cleaning case as in the conventional case, the cleaning device can be downsized.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to FIG. 1 and a second embodiment of the present invention will be described with reference to FIG.

FIG. 1 is a diagram showing a cleaning device of a first embodiment according to the present invention, and FIG. 2 is a diagram showing a cleaning device of a second embodiment according to the present invention. The cleaning apparatus according to the first embodiment of the present invention is used for chemical liquid treatment performed by a circulating chemical liquid.
This is a cleaning apparatus having a chemical bath 2 as shown in (a) and a cleaning bath substrate 3 as shown in FIG. 1 (b) used for a cleaning process performed with pure water.

When chemical treatment is performed by the cleaning apparatus according to the first embodiment of the present invention, first, as shown in FIG. 1 (a), the wafer storage case 1 is placed in the chemical bath 2 and the chemical bath 2 And the bottom surface of the side wall of the wafer storage case 1 are brought into close contact with each other.

Next, the chemical solution supply valve 6 is opened, and the pump 4 is driven to allow the chemical solution to pass through the filter 5 and pass through the switching valve 7 to pass through the chemical solution outlet 2a provided at the lower part of the chemical solution tank 2.
The wafer storage case 1 is filled with the chemical liquid to treat the wafer 11 with the chemical liquid, and the excess chemical liquid is overflowed to flow into the chemical liquid tank 2. Chemical tank 2
The chemical solution accumulated in (1) is circulated by the pump 4 and reused.

When exchanging the chemical liquid, the switching valve 7 is switched to stop the supply of the chemical liquid to the chemical liquid tank 2, and the used chemical liquid is discharged to the outside of the apparatus. Figure 1 (b) when the chemical treatment is completed
As shown in FIG. 3, the wafer storage case 1 is placed on the cleaning tank substrate 3, and the upper surface of the cleaning tank substrate 3 and the wafer storage case 1 are placed.
The bottom surface of the side wall of the wafer is brought into close contact, and pure water is supplied from the pure water outlet 3a of the cleaning tank substrate 3 into the wafer storage case 1 so that the wafer storage case 1 is filled with pure water.
Is washed and the excess pure water is overflowed and discharged to the outside of the apparatus.

When the cleaning with pure water is completed, the wafer storage case 1 is removed from the cleaning tank substrate 3 and the remaining pure water is discharged to the outside. When chemical treatment is performed by the cleaning apparatus according to the second embodiment of the present invention, first, the wafer storage case 1 is placed on the cleaning tank substrate 13 as shown in FIG. The bottom surface of the side wall of the wafer storage case 1 is closely attached.

Next, the switching valve 8 is switched so that the chemical solution supplied from the chemical solution supply pipe 9 is blown out from the cleaning tank substrate 13.
Wafers are supplied from 13a into the wafer storage case 1.
11 is treated with a chemical solution, and the excess chemical solution is overflowed and discharged to the outside of the device.

When the chemical solution treatment is completed, the switching valve 8 is switched to supply the pure water supplied from the pure water supply pipe 10 into the wafer storage case 1 from the outlet 13a of the cleaning tank substrate 13 and the wafer 11. After cleaning, the excess pure water overflows and is discharged to the outside of the apparatus.

As described above, in the space formed by the wafer storage case 1 and the chemical tank 2 or the wafer storage case 1 and the cleaning tank substrates 3 and 13 without transferring the wafer 11 from the wafer storage case to the wafer cleaning case, the chemical tank The chemical solution or pure water is blown out from the chemical solution outlet 2a provided in 2 or the pure water outlet 3a provided in the cleaning tank substrate 3 or the outlet 13a provided in the cleaning tank substrate 13 to perform the chemical treatment or the cleaning treatment of the wafer 11. Therefore, it is possible to perform the chemical solution treatment and the cleaning treatment without damaging the wafer 11 by the compact cleaning device.

[0020]

As is apparent from the above description, according to the present invention, there is an advantage that it is possible to form a cleaning device having an extremely simple structure, and it is not necessary to transfer wafers, which is extremely economical and economical. It is possible to provide a cleaning device that can be expected to improve reliability.

[Brief description of drawings]

FIG. 1 is a diagram showing a cleaning device according to a first embodiment of the present invention,

FIG. 2 is a diagram showing a cleaning apparatus according to a second embodiment of the present invention,

FIG. 3 is a diagram showing a conventional cleaning device,

[Explanation of symbols]

1 is a wafer storage case, 2 is a chemical solution tank, 2a is a chemical solution outlet, 3 and 13 are cleaning tank substrates, 3a is pure water outlet, 13a is an outlet, 4 is a pump, 5 is a filter, 6 is a chemical supply valve , 7 is a switching valve, 8 is a switching valve, 9 is a chemical supply pipe, 10 is a pure water supply pipe, 11 is a wafer,

Claims (3)

[Claims] 1. A wafer storage case (1) having a side wall having a shape surrounding a wafer, and having a shape in which a bottom surface and an upper surface are opened, and a wafer storage case (1) which is in close contact with the entire bottom portion of the side wall of the wafer storage case (1). , A cleaning tank substrate (2, 3, 13) provided with a chemical solution or pure water outlet (2a, 3a, 13a) in a portion corresponding to the inner side of the bottom, and the chemical solution or pure water from the outlet. A cleaning device, characterized in that water is introduced into the inside of the wafer storage case (1) from the bottom surface and discharged to the top surface. 2. The cleaning tank side wall is further provided around the cleaning tank substrate, and a pump for sending the chemical liquid or pure water accumulated in the cleaning tank side wall to the blowout port is set. Cleaning device. 3. A switching valve which is connected to the outlet and switches between chemical liquid / pure water delivered to the outlet.
The cleaning apparatus according to claim 1, further comprising (8).