TW408160B - A methyl tin halide composition liquid at 24 DEG C and use thereof - Google Patents
A methyl tin halide composition liquid at 24 DEG C and use thereof Download PDFInfo
- Publication number
- TW408160B TW408160B TW085105456A TW85105456A TW408160B TW 408160 B TW408160 B TW 408160B TW 085105456 A TW085105456 A TW 085105456A TW 85105456 A TW85105456 A TW 85105456A TW 408160 B TW408160 B TW 408160B
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- Taiwan
- Prior art keywords
- tin
- patent application
- composition
- methyl
- item
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- 239000000203 mixture Substances 0.000 title claims abstract description 49
- 239000007788 liquid Substances 0.000 title claims abstract description 27
- -1 methyl tin halide Chemical class 0.000 title claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 33
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 13
- YMLFYGFCXGNERH-UHFFFAOYSA-K butyltin trichloride Chemical compound CCCC[Sn](Cl)(Cl)Cl YMLFYGFCXGNERH-UHFFFAOYSA-K 0.000 claims abstract description 3
- ZMHZSHHZIKJFIR-UHFFFAOYSA-N octyltin Chemical compound CCCCCCCC[Sn] ZMHZSHHZIKJFIR-UHFFFAOYSA-N 0.000 claims abstract 2
- YFRLQYJXUZRYDN-UHFFFAOYSA-K trichloro(methyl)stannane Chemical compound C[Sn](Cl)(Cl)Cl YFRLQYJXUZRYDN-UHFFFAOYSA-K 0.000 claims abstract 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 20
- 239000011248 coating agent Substances 0.000 claims description 16
- CSHCPECZJIEGJF-UHFFFAOYSA-N methyltin Chemical compound [Sn]C CSHCPECZJIEGJF-UHFFFAOYSA-N 0.000 claims description 14
- 238000002309 gasification Methods 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 9
- 238000011049 filling Methods 0.000 claims description 7
- NPAIMXWXWPJRES-UHFFFAOYSA-N butyltin(3+) Chemical compound CCCC[Sn+3] NPAIMXWXWPJRES-UHFFFAOYSA-N 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 239000002243 precursor Substances 0.000 abstract description 18
- 239000000543 intermediate Substances 0.000 abstract description 8
- PKKGKUDPKRTKLJ-UHFFFAOYSA-L dichloro(dimethyl)stannane Chemical compound C[Sn](C)(Cl)Cl PKKGKUDPKRTKLJ-UHFFFAOYSA-L 0.000 abstract 1
- 238000003786 synthesis reaction Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 30
- 239000007787 solid Substances 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 239000007789 gas Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 150000003606 tin compounds Chemical class 0.000 description 8
- 230000008021 deposition Effects 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- ZVAPEFXSRDIMFP-SFHVURJKSA-N (2s)-2-(4-chlorophenyl)-3,3-dimethyl-n-(5-phenyl-1,3-thiazol-2-yl)butanamide Chemical compound O=C([C@@H](C(C)(C)C)C=1C=CC(Cl)=CC=1)NC(S1)=NC=C1C1=CC=CC=C1 ZVAPEFXSRDIMFP-SFHVURJKSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 238000004090 dissolution Methods 0.000 description 5
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 4
- REOJLIXKJWXUGB-UHFFFAOYSA-N mofebutazone Chemical group O=C1C(CCCC)C(=O)NN1C1=CC=CC=C1 REOJLIXKJWXUGB-UHFFFAOYSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(II) oxide Inorganic materials [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000008199 coating composition Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000032050 esterification Effects 0.000 description 3
- 238000005886 esterification reaction Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 239000012263 liquid product Substances 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- GGAUUQHSCNMCAU-ZXZARUISSA-N (2s,3r)-butane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C[C@H](C(O)=O)[C@H](C(O)=O)CC(O)=O GGAUUQHSCNMCAU-ZXZARUISSA-N 0.000 description 2
- XIYOPDCBBDCGOE-IWVLMIASSA-N (4s,4ar,5s,5ar,12ar)-4-(dimethylamino)-1,5,10,11,12a-pentahydroxy-6-methylidene-3,12-dioxo-4,4a,5,5a-tetrahydrotetracene-2-carboxamide Chemical compound C=C1C2=CC=CC(O)=C2C(O)=C2[C@@H]1[C@H](O)[C@H]1[C@H](N(C)C)C(=O)C(C(N)=O)=C(O)[C@@]1(O)C2=O XIYOPDCBBDCGOE-IWVLMIASSA-N 0.000 description 2
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 2
- RDUORFDQRFHYBF-UHFFFAOYSA-N 6-methoxy-1-methyl-2,3,4,9-tetrahydro-1h-pyrido[3,4-b]indole Chemical compound CC1NCCC2=C1NC1=CC=C(OC)C=C12 RDUORFDQRFHYBF-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 230000002079 cooperative effect Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000004880 explosion Methods 0.000 description 2
- 230000008014 freezing Effects 0.000 description 2
- 238000007710 freezing Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 235000015170 shellfish Nutrition 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000003017 thermal stabilizer Substances 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- GSJBKPNSLRKRNR-UHFFFAOYSA-N $l^{2}-stannanylidenetin Chemical compound [Sn].[Sn] GSJBKPNSLRKRNR-UHFFFAOYSA-N 0.000 description 1
- RCBGIHMVOKCIJF-UHFFFAOYSA-N 2-(6-methylheptoxy)-2-oxoethanesulfonic acid Chemical compound C(CCCCC(C)C)OC(CS(=O)(=O)O)=O RCBGIHMVOKCIJF-UHFFFAOYSA-N 0.000 description 1
- BWDBEAQIHAEVLV-UHFFFAOYSA-N 6-methylheptan-1-ol Chemical compound CC(C)CCCCCO BWDBEAQIHAEVLV-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- 244000166124 Eucalyptus globulus Species 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 206010024769 Local reaction Diseases 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 241000282376 Panthera tigris Species 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- CTGFATLKKDGHHL-UHFFFAOYSA-N [Sn].C(CCC)[Sn] Chemical compound [Sn].C(CCC)[Sn] CTGFATLKKDGHHL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000002671 adjuvant Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- PWEVMPIIOJUPRI-UHFFFAOYSA-N dimethyltin Chemical compound C[Sn]C PWEVMPIIOJUPRI-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- ODOPKAJVFRHHGM-UHFFFAOYSA-N phenyltin Chemical compound [Sn]C1=CC=CC=C1 ODOPKAJVFRHHGM-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000006077 pvc stabilizer Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000013112 stability test Methods 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 238000010257 thawing Methods 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/22—Tin compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/22—Tin compounds
- C07F7/2208—Compounds having tin linked only to carbon, hydrogen and/or halogen
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Paints Or Removers (AREA)
Description
40^16q Α7 Β7 經濟部中央椟準局貝工消费合作社印裝 五、發明説明(1 ) 發明之赀景 本發明係關化學技術上分類爲有機錫南化物質之組合物 ,較明確έ之爲含甲基錄_化物的组合物及其製法與用途 〇 甲基錫自化物如三氣化單曱基錫與二氣化二甲基錫在24 °C時係固體物質。此性質單獨使其不合宜或不經濟供許多 實用。舉例,製造酯化反應觸媒或南化聚合物之安定劑中 須用曱基錫氣化物作化學中間物時必要先溶解於適當溶劑 内炼融或银成細粉。此等修改結果動軏加多費用且降低生 產效率》同樣情形欲用甲基錫南化物作塗層先質在玻璃或 其他底彦上製氧化錫塗層時最常經高溫轉化爲氧化錫,其 固體非液態性質要求其溶解在溶劑内或汽化。汽化作用並 未消除此項固體的連帶問題,尤其在送料甲基錫卣化物至 汽化設備時。蒸汽易析積固體不僅在待塗層的物件上,且 亦在鄰接裝置的壁上與塗層設備的排氣導管等上,結果需 要經常停工以清除固體。 引進溶劑如酒精或水轉化甲基錫氣化物成較易處理的液 態組合物,有稀釋有效物類之負面影響。 欲用甲基錫氣化物作化學中間物時此項稀釋增加輸送費 用,減少反應器容量效率且在用水作稀釋劑處加甚腐蝕。 用甲基錫氣化物在玻璃及其他底質上藉高溫化學蒸汽析 積 '嘴霧或浸清製造氧化錫塗層時引進溶劑轉化固趙甲基 錫氣化物成易處理的液態组合物結果有幾項重大缺陷。有 效物類經稀釋,須用大量材料結果降低污染的成本加多。 -4- _ -^— (請先閲讀背面之注意事項再填寫本頁) 訂 本紙張尺度適用中國國家標準(CNS) Α4規格(2ΙΟΧ297公釐) «08160 A7 A7 B7 經濟部中央樣準局員工消費合作社印褽 五、發明説明(2) 若用酒精等有機溶劑則火災與爆炸危險增加,必需更大安 全預防及特殊防火防爆炸鎮壓設備或添加氧氣稀釋氣體如 氮。加之引進過量溶劑包括水對錫氧化物塗層之品質能有 不利影響,最常見如模糊、失去電導性或者表面粗糙。當 起動連續瓶塗時溶劑稀釋的組合物干擾塗佈效率。由於必 要在塗覆通風櫥内克服溶劑之冷卻影響,需經長時間後方 能獲致滿意塗覆。導致起始生產之損耗。 有許多美國專利説明用有機錫氣化物作化學中間物以製 造熱安定劑供南化聚合物尤其聚氣乙烯;觸媒供尿烷,酯 化與縮合反應等及作先質供在玻璃與其他底質上供氧化錫 塗覆製備透明導電與紅外反射塗料,增進抗刮性及改善物 理性質。此項覆蓋玻璃使用於構築太陽能電池、汽車遮風 屏、玻璃冰箱門、”低-E"或IR反射玻璃、及電子用途等等 中。 美國專利4,144,362-一種用單烷基三鹵化錫塗覆玻璃的方 法。 討論利用有機錫及無機錫類作先質供在玻璃上製氧化錫 塗層。此案中發表單丁基三氣化錫之優越並申請專利。 美國專利4,130,673 - 一種用丁基三氣化錫作先質塗敷氧化 錫於玻璃上之方法。 此專利説明塗敷細碎或能蒸發的丁基三氣化錫於加熱玻 璃表面上利用單丁基三氣化錫澱積氧化錫塗層於玻璃上β 塗層的玻璃覆蓋天然蝶或合成聚合物以降低摩擦係數。 美國專利4,530,857 —玻璃容器熱端塗覆配方與用法β ;--------^— (請先閲讀背面之注意事項再填寫本頁) -訂 it 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 經濟部中央樣準局員工消費合作社印装 408160 A7 —__B7 _ 五、發明説明(3 ) 説明使用"摻雜劑"以防止熱玻璃上氧化錫塗層澱積的液 態有機錫先質内生成固體。須注意"摻什劑”常認作雜質, 對塗覆方法或成品的品質並無任何正面的贡獻。甲基三氣 化錫雖經敘述爲先質,但未提起此物質爲一固體,因此將 不受添加摻什劑之益》 美國專利2,5 66,3 46-導電劁品及其生產〇 説明利用一種錫化合物與一能離子化氟化物的水溶液製 造導電的玻璃物件。 美國專利4, 187,336 -非虹彩玻璃結構a 此專利指示特定成分與厚度之塗覆結構以製造無虹彩的 紅外反射玻璃(窗)。塗料之一或數項可係氧化錫。 差國專利4,254,017-含硫化物某的有嫵錫赫其拉醇响。 敘述有機錫化合物作PVC安定劑用,可自有機錫画化物 衍生’包括單甲基三氣化錫作中間物或始原料。 差.國專利I:7.31,46?~含氟有機錫化合物用以製作掺氟的氧 化錫塗料。 敘述含氟的有機錫化合物用以製造摻什的氧化錫塗料。 製造含氟的有機錫時可用一甲基三氣化錫及二甲基二氣化 錫作原料β jLg專利4,_5g4,206-化學蒸汽.澱積反射膜於浮動玻璃帶之 底面。 此專利敘述一種塗覆法,其中可用有機錫化合物作氧化 錫塗料之先質。 j|_p專利4,54?,400~紅外反射破璃片之製法。 -6 · 本紙法尺度適用中國國家;^準(GiS ) A4現格(210X297公慶1 --------— .^1. - -1 n - - ^^1 j !— _ I ! — 1 ^^1 {請先聞讀背面之注項再填寫本頁) A7 B7 408160 五、發明説明(4 ) 1 - - : —^1 —1^— - n --- . I- (请先閲讀背面之注意事項Hr填W本頁) 敘述使用一種金屬氧化物封層不生成氣化鈉結晶。封層 與其後塗層可係衍生自作先質的有機錫化合物之氧化錫。 美國專利5,004,490-塗覆氧化錫的玻璃底質之製法。 採用有機錫醇鹽作氧化錫先質以製一較厚氧化踢層。 美國專利4,293,594-在底質上製作導電透明塗廣之方法β 底質爲預定尺寸的玻璃管狀構件(例如螢光燈管)。導電 層爲自先質有機錫齒化合物衍生之氧化錫。 發明之目的 本發明之一目的在提供含穩定液態甲基氣化錫的新穎組 合物適用作化學中間物及在玻璃與其他底質上作氧化錫塗 層之先質。 一項目的在提供新穎含甲基踢组合物,用於玻璃瓶塗覆 線上,於線起始期間展現高效率。 另一目的在提供新穎液態氧化錫先質组合物含曱基錫氣 化物在化學蒸汽澱積過程中展現較快澱積速度及比其他有 機錫組合物更大效率,且可用已知技術回收並循環作液態 組合物。 經濟部中央標準局員工消費合作社印褽 本發明另一目的在提供新穎含甲基錫氣化物的組合物, 於周固溫度典型24Χ時爲易處理之液體。 發明之概述 本發明貢獻一種組合物特色,一種组合物液體於24*c時 主要包括一種甲基錫鹵化物,選自單甲基三氣化錫、二〒 基二氣化錫或其混合物及一種液體單烷基三氣化錫。 本發明組合物具固有的運用特微係易處理的中間物供製 -7- 本紙張尺度逋用中國國家標準(CNS ) A4規格(210X297公釐) 經濟部中央樣準局負工消f合作社印製 468160 A? _____B7 _ 五、發明説明(5 ) 造其他已知有機錫衍生物特別實用作聚合物有機物質之穩 定劑。 本發明组合物亦係在玻璃及其他底質上澱積氧化錫塗層 之易於處理的先質。 本發明組合物之利用提供可用液態組合物之額外利益, 因爲组合物中曱基錫自化物的分子量較低提供每單位重量 較高百分比之錫。 本發明組合物爲易處理的液體,能經濟地輸送及運用β 本發明在製程特色上亦提供一種在底質上澱積氧化錫層 之進步方法,其中改善包括在此過程中利用本發明之组合 物特色。 本發明亦提供第二項組合物特色,用本發明方法產生的 製造物件。 文内及附錄申請專利範圍内使用,,主要包括"之辭並不排 除吸自大氣與爲防止沉澱、增進貯置穩定性、減低腐蚀性 、改善所澱積氧化錫的紅外反射等各種已知佐劑中之痕量 水份’其等可少量(最多約重量比1 〇 %)加入本發明組合物 而不悖離本發明範圍。 不過確實排除普通溶劑包括水與水性混合物之量,其量 顯著比正常溶解甲基錫氣化物所用重量超過1〇%。 本發明组合物雖視需要可用水或其他溶劑稀釋、"主要包 括”一辭計畫本發明之组合物特色爲實質上不含。 發明之説明 本發明組合物易於製作,僅將固態曱基錫自化物與所須 -8- 本紙張从適财關家辟(CNS ) Α规格(210X297公釐)"一~~~*---- n m n I n n n n· I n n - 1 n T U3 /V'" (諳先閲讀背面之注f項再填寫本頁) 408160 A7 B7 經濟部中央樣準局貝工消費合作社印製
MMTC MBTC 五、發明説明(6 ) 液態艘基錫自化物ί昆合即可,必要時溫熱完成溶液。 單甲基二氣化錫與二甲基二氣化錫二者均適用作塗料组 合物之先質以澱積氧化錫塗層於玻璃及其他底質上,並作 先質或中間物供製造觸媒與聚合物安定劑,係難以處理,、 包裝及在周固溫度典型24Ό時難以輸送的固體。 以下實例1至20説明固態單甲基三氣化錫與/或二甲基二 氣化锡與液態單虎基二氣化錫混合,產生含曱基錯氣化物 的组合物在24C時係液體。此等液態组合物更易處理輸送 及運用。此外如實例21所示已例證本發明產物展現較快澱 積速率,氧化錫塗料表現較低發射率兩種所期特性,與氧 化錫塗料在玻璃底質上澱積之標準非甲基錫、有機錫先質 對比。 、 2 4 C當用單丁基二氣化踢作液態组合物時可存在的單甲 基三氣化錫的最大量爲70重量%,單丁基三氣化踢内二甲 基二氣化錫本身之最多量爲10重量%,在單甲基三氣化锡 混合物内則係15重量%。在其他液態烷基錫鹵化物中可具 相同數量級,能如文内指示便利測定β 以下實例進一步例證發明人計畫其發明實務之最佳模式 〇 實例1至20 實例1至20内所用錫化合物皆係商品級,純度95%以上 。各錫化合物24°C時的物理特徵如下β 單甲基三氣化錫 單丁基三氣化錫 -9 - 本紙張尺度適用中國國家擦準(CNS ) A4規格(2丨〇><297公釐) 固體,熔點46°C 液體 -— I -1 ml I- I I - I >n I n n 1 I I— TV - i (請先閲讀背面之注意事項再填寫本頁) 408160 A7 _ B7
發明説明( 7 ) m2tc2 二甲基二氣化錫 固體,熔點10 8 Ό MOTC 單辛基三氣化錫 液體 MPTC 單苯基三氣化錫 液體 SNC12 氣化亞錫 固體,2 4 8 °C SnG Stannous Glycoxide 固體,>100〇C SnCl4 四氣化錫 液體 SnO 氧化亞錫 固體,>10(TC 實例1至2 0製備時將錫化合物按表j内所記重量%比率放 五 - 經濟部中央橾準局負工消費合作杜印袈 進小玻管,加蓋後搖約3分鐘。升溫如表j内註錄達成完全 溶液。 . 實例1與12表現在24*C至35 °C時完全溶解爲最佳。實例 2 ' 3、4、5、10及13表現在24 °C局部溶解而50。(:時完全 溶解亦屬可取β實例6、7、8、9及14説明即使二甲基二 氣化錫或單辛基三氣化錫濃度高,在! 〇 〇 I以下獲得液態 產物β 實例15與16證明本發明對烷基錫化合物之限度,由於單 甲基三氣化錫與芳基錫化合物單苯基三氣化錫之反應或再 分配而產生不合宜產物。 實例17至20進一步例證本發明限度,或者由於有機錫氣 化物液態混合物内測試的無機錫化合物之不溶性,或因四 氣化錫與有機錫氣化物組份的反應。 液態產物的溶解度經使其各受3次冷凍/融化循環實地證 明β元全ϋ知意|胃液態製品於冷;東/融化試驗後全部液態〇 局部溶解意謂大部分甲基氣化錫在溶液中而其餘分散於單 -10-本紙張尺度適用令國國家標準(CNS ) Α4規格(210 X 297公釐) 40S160 at B7 五、發明説明(8 ) 烷基三氣化錫内。 除加速冷凍/融化試驗外,於周圍溫度對較佳組合物 5 0/50重量%單曱基三氣化錫/單丁基三氯化錫進行24個月 的擱置穩定度試驗〇在封閉的玻璃容器内貯存後試樣未見 變化。 表1 實 例 錫化合物,重量% 溶解度 MMTC MBTC M2TC2 MOTC MPTC SnCl2 SnO SnG SnC“ 24〇C 50°C 75〇C 1 50 50 完全 2 70 30 * 局部 完全 3 60 40 局部 完全 4 37.5 50 12.5 局部 完全 5 45 40 15 局部 完全 完全 6 50 50 不溶 局部 完全 7 60 40 不溶 局部 完全 8 67 33 不溶 局部 完全 9 75 25 不溶 局部 完全 10 80 20 不溶 完全 11 90 10 局部 完全 12 50 50 局部 完全 (35〇C) 13 70 30 局部 完全 14 40 60 局部 局部 完全 15 60 40 不溶 反應 經濟部中央標準局I®:工消費合作社印製 -11 - (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用令國國家標準(CNS ) A4規格(210 X 297公釐) 40S160 A7 B7五、發明説明(9 ) 16 50 50 局部 反應 17 50 25 25 不溶 不溶 不溶 18 25 50 25 不溶 不溶 不溶 19 25 50 25 不溶 不溶 不溶 20 25 50 25 反應 - 實例2 1 經濟部中央標準局貝工消费合作杜印裝 較佳實例1的組合物、5 0重量%單曱基三氣化錫/ 5 0重量 %單丁基三氣化錫進一步添加5重量%三氟醋酸與5重量% 之甲基異丁基甲酮改良,認作CFMB。此物質於是作爲氧 化錫先質桉美國專利4,601,9 17所發表高溫化學蒸汽澱積 塗覆玻璃之程序評估。所用設備與過程亦在同一專利中敘 述。添加5重量%三氟醋酸與5重量。/。甲基異辛基曱酮改良 單丁基三氣化錫製備一對照組合物,標記C F B。用美國專 利4,6 0 1,9 1 7中發表之相同方法測定塗覆玻璃的澱積速率 及發射率,得如下結果。 澱積速率(每秒鐘埃) 發射率 CFMB 533 .39 CFB 46 1 .41 期盼CFMB之澱積率較高約15%,因其在一定塗覆時間 内產生較厚塗層。 發射率亦可望較低,部分由於塗層厚度,CFMB塗覆的 試樣1951埃’ CFB塗覆的試樣1837埃。CFMB與CFB塗 覆試樣之所塗玻璃外觀相同<»高溫化學蒸汽殿積法中較快 -12- |_^-------袭-- {請先聞讀背面之注意事項再填寫本頁) 、π 本紙張尺度適用中國國家梯準(CNS ) Μ現格(210Χ297公瘦} _16〇 A7 ____B7 五、發明説明(10 ) 澱積作用亦產生較快達成平衡情況而減緩啓動時的廢棄率 Ο 實例2 2 聚氣乙稀的熱安定劑能控"Organotin CompDunds” "有機錫化合物",(1960年10月羅勃殷漢、山打士羅森伯 與亨利吉爾曼著Chemical Reviews,美國化學會出版)所 述用本發明的混合甲基氣化錫/單烷基三氣化錫溶液製備。 用甲基三氣化錫/單丁基三氣化踢之50/50重量比混合物時 先以氫氧化銨中和生成甲基超錫酸與丁基輕錫酸之混合物 ,能經淨化、離析並乾燥。或者藉與化學計算當量的異辛 基疏基醋fe·酷之反應將混合幾基锡酸轉化爲單甲基錫三個 異辛基鲦基醋酸酯與單丁基錫三個異辛基疏醋酸酯的現合 物。安定劑加入聚氣乙烯典型爲〖。/0以預防熱處理期間降解 〇 實例23 實例2 2中淨化後離析乾燥的混合甲基經錫酸(酐)/ 丁基經 酸(酐)爲一有效酯化反應觸媒。在一酞酐/異辛醇的化學計 算混合物内用0.2%時在低溫迅速產生酞酸二辛酯。 HI n t^— I - I ^n· HI— In —τ^ ^1« , 03."p * 麵 {請先閎讀背面之注項再填寫本頁> 經濟部中央標準局貝工消費合作社印装 -13 - 本紙張尺度適用中國國家標準(CNS) A4说格(210X 297公釐〉
Claims (1)
- 第85105456號專利中請案 申請專利範圉修正本(89年1月)六、申請專利範圍 Α8 Β8 C8 D8 4〇S㈣ 一種於24C時為液體之甲基錫鹵化物組合物,其主要 由以下成份所構成:自20重量%至8〇重量%之一種甲 基錫#化物,其選自由單甲基三氣化錫 '二甲基二氣 化錫及其混合物所組成之群,以及自8〇重量%至2〇重 量%之一種烷基三氯化錫,其選自單丁基三氯化錫, 單辛基三氣化錫及其混合物所组成之群。 2 _根據申請專利範圍第丨項之組合物,其中該烷基三氣化 錫係單丁基三氣化錫。 3 '根據申請專利範圍第1項之組合物,其中該甲基錫鹵化 物係單甲基三氣化錫。 4 '根據申請專利範圍第1項之組合物,其中該甲基錫鹵化 物為單甲基三氯化錫,而該烷基三氣化錫係單丁基三 氣化錫。 5 . 種於基材上兩溫澱積氧化錫塗層之改良方法,其改 良處包括於該方法中使用一種根據申請專利範圍第1 項之組合物。 6,根據申請專利範圍第5項之方法,其中澱積的塗層含有 提供減少紅外發射率之組成份9 {請先閲讀背面之注意事項再填寫本頁) 經濟部中央梂率局貝工消費合作社印装額中 料準(CNS ) ( 210X297公釐)
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US08/459,958 US5725904A (en) | 1995-06-02 | 1995-06-02 | Liquid methyltin halide compositions |
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US5725904A (en) * | 1995-06-02 | 1998-03-10 | Elf Atochem North America, Inc. | Liquid methyltin halide compositions |
US6503561B1 (en) * | 1999-07-08 | 2003-01-07 | Air Products And Chemicals, Inc. | Liquid precursor mixtures for deposition of multicomponent metal containing materials |
US6238734B1 (en) * | 1999-07-08 | 2001-05-29 | Air Products And Chemicals, Inc. | Liquid precursor mixtures for deposition of multicomponent metal containing materials |
US20070194470A1 (en) * | 2006-02-17 | 2007-08-23 | Aviza Technology, Inc. | Direct liquid injector device |
US20080026147A1 (en) * | 2006-07-28 | 2008-01-31 | Gulbrandsen Chemicals, Inc. | Method and formulation for depositing a metal-containing coating on a substrate |
US20080152804A1 (en) * | 2006-07-28 | 2008-06-26 | Gulbrandsen Chemicals, Inc. | Method for depositing a metal-containing coating on a substrate |
US8097342B2 (en) | 2009-02-19 | 2012-01-17 | Guardian Industries Corp. | Coated article with sputter-deposited transparent conductive coating capable of surviving harsh environments, and method of making the same |
US20100209730A1 (en) * | 2009-02-19 | 2010-08-19 | Guardian Industries Corp., | Coated article with sputter-deposited transparent conductive coating for refrigeration/freezer units, and method of making the same |
US7947374B2 (en) | 2009-02-19 | 2011-05-24 | Guardian Industries Corp. | Coated article with sputter-deposited transparent conductive coating capable of surviving harsh environments, and method of making the same |
US8062706B2 (en) * | 2009-03-31 | 2011-11-22 | Ppg Industries Ohio, Inc. | Recovery of monobutyltin trichloride |
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US2566346A (en) * | 1948-09-08 | 1951-09-04 | Pittsburgh Plate Glass Co | Electroconductive products and production thereof |
GB1520124A (en) * | 1974-09-18 | 1978-08-02 | M & T Chemicals Inc | Process for applying stannic oxide coatings to glass |
IT1024841B (it) * | 1974-11-18 | 1978-07-20 | Olivetti Ing C S P A | Cartuccia per un nastro inchiostra to senza fine di macchine per ufficio soriventi |
US4130673A (en) * | 1975-07-02 | 1978-12-19 | M&T Chemicals Inc. | Process of applying tin oxide on glass using butyltin trichloride |
US4187336A (en) * | 1977-04-04 | 1980-02-05 | Gordon Roy G | Non-iridescent glass structures |
US4254017A (en) * | 1978-11-13 | 1981-03-03 | M&T Chemicals Inc. | Organotin mercaptoalkanol esters and alkoxides containing sulfide groups |
JPS5714594A (en) * | 1980-06-30 | 1982-01-25 | Adeka Argus Chem Co Ltd | Preparing process for mixture of dimethyltin dichloride with monomethyltin trichloride |
US4293594A (en) * | 1980-08-22 | 1981-10-06 | Westinghouse Electric Corp. | Method for forming conductive, transparent coating on a substrate |
US4530857A (en) * | 1983-05-13 | 1985-07-23 | M&T Chemicals Inc. | Glass container hot end coating formulation and method of use |
US4731256A (en) * | 1984-04-10 | 1988-03-15 | M&T Chemicals Inc. | Liquid coating composition for producing high quality, high performance fluorine-doped tin oxide coatings |
US4584206A (en) * | 1984-07-30 | 1986-04-22 | Ppg Industries, Inc. | Chemical vapor deposition of a reflective film on the bottom surface of a float glass ribbon |
US4590096A (en) * | 1984-12-28 | 1986-05-20 | M&T Chemicals Inc. | Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass |
US4547400A (en) * | 1985-02-25 | 1985-10-15 | Ford Motor Company | Method of making infrared reflective glass sheet-I |
US4731462A (en) * | 1986-07-18 | 1988-03-15 | M&T Chemicals Inc. | Organotin compounds containing fluorine useful for forming fluorine-doped tin oxide coating |
US5004490A (en) * | 1987-08-10 | 1991-04-02 | Ford Motor Company | Method of making glass substrate coated with tin oxide |
US5090985A (en) * | 1989-10-17 | 1992-02-25 | Libbey-Owens-Ford Co. | Method for preparing vaporized reactants for chemical vapor deposition |
US5725904A (en) * | 1995-06-02 | 1998-03-10 | Elf Atochem North America, Inc. | Liquid methyltin halide compositions |
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KR100407420B1 (ko) | 2004-04-09 |
IN187865B (zh) | 2002-07-13 |
BR9602525A (pt) | 1998-10-27 |
DK0745605T3 (da) | 2003-08-18 |
CN1147024A (zh) | 1997-04-09 |
DE69627573D1 (de) | 2003-05-28 |
ZA964410B (en) | 1997-07-31 |
EP0745605A2 (en) | 1996-12-04 |
KR970001253A (ko) | 1997-01-21 |
PT745605E (pt) | 2003-09-30 |
DE69627573T2 (de) | 2003-11-27 |
US5853799A (en) | 1998-12-29 |
AR002179A1 (es) | 1998-01-07 |
EP0745605A3 (en) | 1999-03-17 |
JPH08333376A (ja) | 1996-12-17 |
US5725904A (en) | 1998-03-10 |
CZ161096A3 (en) | 1996-12-11 |
ATE238314T1 (de) | 2003-05-15 |
AU701688B2 (en) | 1999-02-04 |
EP0745605B1 (en) | 2003-04-23 |
CN1096504C (zh) | 2002-12-18 |
CO4560462A1 (es) | 1998-02-10 |
ES2191725T3 (es) | 2003-09-16 |
AU5221196A (en) | 1996-12-12 |
CA2175953A1 (en) | 1996-12-03 |
CZ292143B6 (cs) | 2003-08-13 |
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