TW369569B - Apparatus and method for making metal oxide sputtering targets (barrier powder envelope) - Google Patents
Apparatus and method for making metal oxide sputtering targets (barrier powder envelope)Info
- Publication number
- TW369569B TW369569B TW083111559A TW83111559A TW369569B TW 369569 B TW369569 B TW 369569B TW 083111559 A TW083111559 A TW 083111559A TW 83111559 A TW83111559 A TW 83111559A TW 369569 B TW369569 B TW 369569B
- Authority
- TW
- Taiwan
- Prior art keywords
- metal oxide
- sputtering targets
- making metal
- oxide sputtering
- barrier powder
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
- C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
- C04B35/645—Pressure sintering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S264/00—Plastic and nonmetallic article shaping or treating: processes
- Y10S264/36—Processes of making metal-ceramics
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Compositions Of Oxide Ceramics (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/295,594 US5656216A (en) | 1994-08-25 | 1994-08-25 | Method for making metal oxide sputtering targets (barrier powder envelope) |
Publications (1)
Publication Number | Publication Date |
---|---|
TW369569B true TW369569B (en) | 1999-09-11 |
Family
ID=23138385
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW083111559A TW369569B (en) | 1994-08-25 | 1994-12-12 | Apparatus and method for making metal oxide sputtering targets (barrier powder envelope) |
Country Status (4)
Country | Link |
---|---|
US (1) | US5656216A (zh) |
AU (1) | AU1187195A (zh) |
TW (1) | TW369569B (zh) |
WO (1) | WO1996006202A1 (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6183686B1 (en) * | 1998-08-04 | 2001-02-06 | Tosoh Smd, Inc. | Sputter target assembly having a metal-matrix-composite backing plate and methods of making same |
US6348113B1 (en) | 1998-11-25 | 2002-02-19 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
AT4240U1 (de) * | 2000-11-20 | 2001-04-25 | Plansee Ag | Verfahren zur herstellung einer verdampfungsquelle |
CN106467960B (zh) * | 2016-09-30 | 2019-02-01 | 东北大学 | 一种强磁场热压制备金属靶材的装置及方法 |
CN111151763A (zh) * | 2018-11-07 | 2020-05-15 | 宁波江丰电子材料股份有限公司 | 钨钛合金靶材的制备方法 |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US716343A (en) * | 1901-05-08 | 1902-12-16 | Fred M Locke | Machine for forming the interior of plastic materials. |
US2886849A (en) * | 1957-07-03 | 1959-05-19 | Brierley Kenneth | Powder-compressing machines |
GB1220592A (en) * | 1967-06-08 | 1971-01-27 | Atomic Energy Authority Uk | Improvements in or relating to powder-compacting dies |
GB1415522A (en) * | 1972-04-06 | 1975-11-26 | Lucas Industries Ltd | Method of manufacturing hot pressed cermaic material based on silicon nitride |
GB1415482A (en) * | 1973-03-12 | 1975-11-26 | Carborundum Co | Hot pressing method for graphite reactive repressing method for graphite reactive refractories |
DE2527184C3 (de) * | 1975-06-18 | 1981-07-02 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Vorrichtung zur Herstellung von Targets für Kathodenzerstäubung |
GB1497990A (en) * | 1975-11-10 | 1978-01-12 | Tokyo Shibaura Electric Co | Composite ceramic articles and a method of manufacturing the same |
US4094672A (en) * | 1975-12-22 | 1978-06-13 | Crucible Inc. | Method and container for hot isostatic compacting |
JPS5849166B2 (ja) * | 1979-09-14 | 1983-11-02 | 株式会社東芝 | 窒化珪素焼結体のホツトプレス成形方法 |
SU857075A1 (ru) * | 1979-11-06 | 1981-08-23 | Ростовский Ордена Трудового Красного Знамени Государственный Университет | Состав засыпки дл спекани сегнетопьезо-электрической керамики |
JPS5729407A (en) * | 1980-07-29 | 1982-02-17 | Ibigawa Electric Ind Co Ltd | Graphitic hot press mold |
US4382053A (en) * | 1980-08-01 | 1983-05-03 | United Kingdom Atomic Energy Authority | Hot pressing of ceramic materials |
JPS5879872A (ja) * | 1981-11-07 | 1983-05-13 | 住友電気工業株式会社 | 非酸化物セラミツクスのホツトプレス方法 |
WO1984001369A1 (en) * | 1982-09-30 | 1984-04-12 | Ford Werke Ag | Method of hot pressing reactive materials |
DE3300525A1 (de) * | 1983-01-10 | 1984-07-12 | Merck Patent Gmbh, 6100 Darmstadt | Targets fuer die kathodenzerstaeubung |
US4539175A (en) * | 1983-09-26 | 1985-09-03 | Metal Alloys Inc. | Method of object consolidation employing graphite particulate |
DE68924095T2 (de) * | 1988-05-16 | 1996-04-04 | Tosoh Corp | Verfahren zur Herstellung eines Sputtertargets zur Erzeugung einer elektrisch leitenden, durchsichtigen Schicht. |
DE3912711A1 (de) * | 1988-05-31 | 1989-12-14 | Norton Co | Verfahren und vorrichtung zum verringern schaedlicher einfluesse auf bauteile in heisser umgebung |
JPH0243356A (ja) * | 1988-08-04 | 1990-02-13 | Tosoh Corp | 透明導電膜用スパッタリングターゲットの製造方法 |
JPH03199373A (ja) * | 1989-12-28 | 1991-08-30 | Nippon Mining Co Ltd | Ito透明導電膜形成用スパッタリングターゲツト |
JPH03207858A (ja) * | 1990-01-08 | 1991-09-11 | Nippon Mining Co Ltd | Itoスパッタリングターゲットの製造方法 |
JP3184977B2 (ja) * | 1990-07-12 | 2001-07-09 | 同和鉱業株式会社 | Itoスパッタリングターゲット材の製造方法 |
JPH04154654A (ja) * | 1990-10-19 | 1992-05-27 | Sumitomo Metal Mining Co Ltd | Ito焼結体の製造方法 |
JPH04293769A (ja) * | 1991-03-20 | 1992-10-19 | Tosoh Corp | 低温成膜用itoスパッタリングタ−ゲット |
JPH04341504A (ja) * | 1991-05-20 | 1992-11-27 | Seiko Epson Corp | 焼結体 |
US5145811A (en) * | 1991-07-10 | 1992-09-08 | The Carborundum Company | Inorganic ceramic papers |
DE4124471C1 (en) * | 1991-07-24 | 1992-06-11 | Degussa Ag, 6000 Frankfurt, De | Target for cathodic sputtering - produced from partially reduced mixtures of indium oxide and tin oxide by hot pressing in inert protective gas |
US5433901A (en) * | 1993-02-11 | 1995-07-18 | Vesuvius Crucible Company | Method of manufacturing an ITO sintered body |
US5382405A (en) * | 1993-09-03 | 1995-01-17 | Inland Steel Company | Method of manufacturing a shaped article from a powdered precursor |
-
1994
- 1994-08-25 US US08/295,594 patent/US5656216A/en not_active Expired - Fee Related
- 1994-11-22 WO PCT/US1994/013593 patent/WO1996006202A1/en active Application Filing
- 1994-11-22 AU AU11871/95A patent/AU1187195A/en not_active Abandoned
- 1994-12-12 TW TW083111559A patent/TW369569B/zh active
Also Published As
Publication number | Publication date |
---|---|
US5656216A (en) | 1997-08-12 |
AU1187195A (en) | 1996-03-14 |
WO1996006202A1 (en) | 1996-02-29 |
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