TW340876B - Method and apparatus for controlling the deposition amount of a plating metal as well as method and apparatus for measuring the amount of a metal vapor - Google Patents

Method and apparatus for controlling the deposition amount of a plating metal as well as method and apparatus for measuring the amount of a metal vapor

Info

Publication number
TW340876B
TW340876B TW086103499A TW86103499A TW340876B TW 340876 B TW340876 B TW 340876B TW 086103499 A TW086103499 A TW 086103499A TW 86103499 A TW86103499 A TW 86103499A TW 340876 B TW340876 B TW 340876B
Authority
TW
Taiwan
Prior art keywords
metal vapor
controlling
metal
vapor
amount
Prior art date
Application number
TW086103499A
Other languages
English (en)
Inventor
Hiroshi Tanaka
Yasushi Fukui
Minoru Saito
Original Assignee
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP9009488A external-priority patent/JPH09316640A/ja
Priority claimed from JP9009487A external-priority patent/JPH10204623A/ja
Priority claimed from JP9028762A external-priority patent/JPH10219448A/ja
Application filed by Nisshin Steel Co Ltd filed Critical Nisshin Steel Co Ltd
Application granted granted Critical
Publication of TW340876B publication Critical patent/TW340876B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/3103—Atomic absorption analysis

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Physical Vapour Deposition (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
TW086103499A 1996-03-27 1997-03-20 Method and apparatus for controlling the deposition amount of a plating metal as well as method and apparatus for measuring the amount of a metal vapor TW340876B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP9931496 1996-03-27
JP9009488A JPH09316640A (ja) 1996-03-27 1997-01-22 蒸着めっきの付着量制御方法及び制御装置
JP9009487A JPH10204623A (ja) 1997-01-22 1997-01-22 蒸着めっき用金属蒸気量の測定方法及び測定装置
JP9028762A JPH10219448A (ja) 1997-02-13 1997-02-13 蒸着めっき用金属蒸気量の測定方法及び測定装置

Publications (1)

Publication Number Publication Date
TW340876B true TW340876B (en) 1998-09-21

Family

ID=27455188

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086103499A TW340876B (en) 1996-03-27 1997-03-20 Method and apparatus for controlling the deposition amount of a plating metal as well as method and apparatus for measuring the amount of a metal vapor

Country Status (6)

Country Link
US (1) US6060109A (zh)
EP (1) EP0798553A1 (zh)
KR (1) KR100208811B1 (zh)
CN (1) CN1167165A (zh)
CA (1) CA2200667A1 (zh)
TW (1) TW340876B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4545902B2 (ja) * 2000-08-25 2010-09-15 キヤノン株式会社 成膜方法
TWI458843B (zh) 2011-10-06 2014-11-01 Ind Tech Res Inst 蒸鍍裝置與有機薄膜的形成方法
CN103808660B (zh) * 2014-03-12 2017-02-15 大连民族学院 一种紫外‑可见光谱分析用气体池

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4381894A (en) * 1980-11-06 1983-05-03 Inficon Leybold-Heraeus, Inc. Deposition monitor and control system
JPS59147240A (ja) * 1983-02-14 1984-08-23 Hitachi Condenser Co Ltd 蒸発量モニタ
JPS59147239A (ja) * 1983-02-14 1984-08-23 Hitachi Condenser Co Ltd 蒸発量モニタ
JPS60133308A (ja) * 1983-12-22 1985-07-16 Sumitomo Metal Ind Ltd メツキ被膜付着量測定方法
JPS60251273A (ja) * 1984-05-28 1985-12-11 Mitsubishi Heavy Ind Ltd 真空蒸発装置の蒸発量制御方法
JPS6173875A (ja) * 1984-09-17 1986-04-16 Mitsubishi Heavy Ind Ltd 流路幅調整板付き真空蒸着装置
US4713547A (en) * 1986-01-03 1987-12-15 Gte Products Corporation Method and apparatus for monitoring the flow of mercury in a system
FR2671630A1 (fr) * 1991-01-11 1992-07-17 Thomson Csf Dispositif de mesure et de controle de flux de particules.
JP2783375B2 (ja) * 1992-08-05 1998-08-06 株式会社日立製作所 原子吸光光度計
US5776254A (en) * 1994-12-28 1998-07-07 Mitsubishi Denki Kabushiki Kaisha Apparatus for forming thin film by chemical vapor deposition

Also Published As

Publication number Publication date
EP0798553A1 (en) 1997-10-01
KR19980069728A (ko) 1998-10-26
CA2200667A1 (en) 1997-09-27
US6060109A (en) 2000-05-09
KR100208811B1 (ko) 1999-07-15
CN1167165A (zh) 1997-12-10

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