TW339844U - Device for analyzing traces of impurities in a gas sample by means of a diode laser - Google Patents

Device for analyzing traces of impurities in a gas sample by means of a diode laser

Info

Publication number
TW339844U
TW339844U TW087202153U TW87202153U TW339844U TW 339844 U TW339844 U TW 339844U TW 087202153 U TW087202153 U TW 087202153U TW 87202153 U TW87202153 U TW 87202153U TW 339844 U TW339844 U TW 339844U
Authority
TW
Taiwan
Prior art keywords
impurities
diode laser
gas sample
analyzing traces
traces
Prior art date
Application number
TW087202153U
Other languages
English (en)
Inventor
Catherine Ronge
Fabrice Bounaix
Patrick Mauvais
Frederic Stoeckel
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Publication of TW339844U publication Critical patent/TW339844U/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
TW087202153U 1995-04-21 1996-04-11 Device for analyzing traces of impurities in a gas sample by means of a diode laser TW339844U (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9504829A FR2733319B1 (fr) 1995-04-21 1995-04-21 Procede et dispositif d'analyse de traces d'impuretes dans un echantillon de gaz au moyen d'une diode laser

Publications (1)

Publication Number Publication Date
TW339844U true TW339844U (en) 1998-09-01

Family

ID=9478357

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087202153U TW339844U (en) 1995-04-21 1996-04-11 Device for analyzing traces of impurities in a gas sample by means of a diode laser

Country Status (7)

Country Link
US (1) US5705816A (zh)
EP (1) EP0738887A1 (zh)
JP (1) JPH0933430A (zh)
KR (1) KR0169072B1 (zh)
CN (1) CN1148173A (zh)
FR (1) FR2733319B1 (zh)
TW (1) TW339844U (zh)

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US5963336A (en) * 1995-10-10 1999-10-05 American Air Liquide Inc. Chamber effluent monitoring system and semiconductor processing system comprising absorption spectroscopy measurement system, and methods of use
US5742399A (en) * 1996-04-18 1998-04-21 American Air Liquide, Inc. Method for stabilizing the wavelength in a laser spectrometer system
US5818578A (en) * 1995-10-10 1998-10-06 American Air Liquide Inc. Polygonal planar multipass cell, system and apparatus including same, and method of use
US5949537A (en) 1996-04-18 1999-09-07 American Air Liquide Inc. In-line cell for absorption spectroscopy
FR2753794A1 (fr) * 1996-12-24 1998-03-27 Commissariat Energie Atomique Systeme de mesure spectrophotometrique par diodes a cavite resonnante
DE19717145C2 (de) * 1997-04-23 1999-06-02 Siemens Ag Verfahren zur selektiven Detektion von Gasen und Gassensor zu dessen Durchführung
FR2784747B1 (fr) * 1998-10-16 2000-12-08 Air Liquide Procede et dispositif de mesure de la quantite d'impuretes dans un echantillon de gaz a analyser
FR2785828B1 (fr) * 1998-11-17 2001-01-26 Air Liquide Installation de separation de gaz et utilisation d'une telle installation pour la production d'un gaz
JP2000206035A (ja) * 1999-01-19 2000-07-28 Anritsu Corp ガス検出装置
ATE417262T1 (de) * 1999-02-19 2008-12-15 Metron Instr Inc Messvorrichtung und verfahren zur bestimmung von teilchenkonzentrationen in einer flüssigkeit
US6407813B1 (en) 1999-02-19 2002-06-18 On-Line Instrumentation, Inc. Measurement systems and methods for determining component particle concentrations in a liquid
US6795183B2 (en) 1999-02-19 2004-09-21 Metron Instruments, Inc. Measurement systems and methods for determining component particle concentrations in a liquid
JP3645462B2 (ja) * 2000-01-17 2005-05-11 株式会社ルネサステクノロジ 回路基板の製造方法およびその装置
JP3343680B2 (ja) * 1999-07-12 2002-11-11 日本酸素株式会社 レーザー分光分析装置
US20020031737A1 (en) * 2000-03-10 2002-03-14 American Air Liquide, Inc. Method for continuously monitoring chemical species and temperature in hot process gases
FR2809816B1 (fr) * 2000-05-30 2003-04-18 Gaz De France Procede et dispositif de detection de fuites de gaz
US6442736B1 (en) 2000-10-03 2002-08-27 L'air Liquide Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'expolitation Des Procedes Georges Claude Semiconductor processing system and method for controlling moisture level therein
DE10202918C1 (de) * 2002-01-25 2003-10-16 Siemens Ag Gassensor
EP1386690B1 (de) * 2002-08-01 2008-05-28 Trumpf Werkzeugmaschinen GmbH + Co. KG Laserbearbeitungsmaschine
WO2004023114A1 (en) * 2002-09-06 2004-03-18 Tdw Delaware, Inc. Method and device for detecting gases by absorption spectroscopy
US7352463B2 (en) * 2002-09-06 2008-04-01 Tdw Delaware, Inc. Method and device for detecting gases by absorption spectroscopy
DE10318786B4 (de) * 2003-04-25 2006-03-09 Nattkemper, Andreas, Dr.-Ing. FTIR-Messzelle zur Analyse aggressiver Gase
JP4843274B2 (ja) * 2004-08-25 2011-12-21 東京エレクトロン株式会社 プラズマ成膜方法
US7679059B2 (en) * 2006-04-19 2010-03-16 Spectrasensors, Inc. Measuring water vapor in hydrocarbons
DE112007001812T5 (de) 2006-07-31 2009-06-04 Applied Materials, Inc., Santa Clara Verfahren und Vorrichtungen zur in-situ-Analyse von Gasen in Elektronikvorrichtungsfabrikationssystemen
US20080093555A1 (en) * 2006-09-29 2008-04-24 N.V. Organon Method to determine water content in a sample
WO2009121089A1 (de) * 2008-04-04 2009-10-08 Nanoident Technologies Ag Modulares absorptionsmesssystem
KR101387683B1 (ko) * 2008-06-20 2014-04-25 트룸프 베르크초이그마쉬넨 게엠베하 + 코. 카게 레이저 가공 장치
CN102200506B (zh) * 2010-03-26 2014-06-25 无锡沃浦光电传感科技有限公司 双模远距离红外气体传感器
CN102735625A (zh) * 2011-04-15 2012-10-17 朗松珂利(上海)仪器仪表有限公司 检测变压器sf6中微水含量的激光检测仪及检测方法
JP2013050403A (ja) * 2011-08-31 2013-03-14 Shimadzu Corp ガス分析装置
CN102323217A (zh) 2011-10-09 2012-01-18 重庆市电力公司电力科学研究院 Gis开关内气体含量全息检测装置及方法
CN104330190B (zh) * 2014-10-23 2017-04-12 中国航天科工集团第三研究院第八三五八研究所 基于光学分光系统的tdlas气体测温检测装置
CN105628637B (zh) * 2015-12-29 2018-12-04 山东罗纳德分析仪器有限公司 一种三参考通道的红外气体分析方法与装置
WO2017155936A1 (en) * 2016-03-07 2017-09-14 Ysi, Inc. Optical nitrate sensor for multiparameter water quality measurement
FR3055703B1 (fr) * 2016-09-05 2020-12-18 Elichens Procede d’analyse d’un gaz
EP3364169B1 (de) 2017-02-17 2019-05-15 Siemens Aktiengesellschaft Prozess-gasanalysator
US10586649B2 (en) 2017-03-13 2020-03-10 Abb Schweiz Ag Dissolved gas analysis devices, systems, and methods
US10585036B2 (en) * 2017-03-13 2020-03-10 Abb Schweiz Ag Dissolved gas analysis devices, systems, and methods
CN111837025A (zh) * 2018-03-12 2020-10-27 关东电化工业株式会社 气体分析方法及装置
CN109470359B (zh) * 2018-11-09 2020-12-15 成都天奥电子股份有限公司 提供差分光输出的铷光谱灯装置及光噪声差分抑制的方法
CN109813639B (zh) * 2019-01-07 2021-09-28 东南大学 一种基于红外光调制技术的颗粒物与气体浓度同步测量装置及其测量方法
CN112763434A (zh) * 2019-10-21 2021-05-07 合肥新标智能设备有限公司 一种酒精浓度测量仪
CN115598266A (zh) * 2022-12-12 2023-01-13 山东非金属材料研究所（Cn） 一种惰性气体分析方法

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US3805074A (en) * 1973-01-02 1974-04-16 Texas Instruments Inc Spectral scan air monitor
DE2635171C3 (de) * 1976-08-05 1980-06-19 6000 Frankfurt Gerät zur Bestimmung der Konzentration eines Bestandteils einer Gasprobe
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US5445964A (en) * 1994-05-11 1995-08-29 Lee; Peter S. Dynamic engine oil and fuel consumption measurements using tunable diode laser spectroscopy

Also Published As

Publication number Publication date
FR2733319A1 (fr) 1996-10-25
EP0738887A1 (fr) 1996-10-23
JPH0933430A (ja) 1997-02-07
KR0169072B1 (ko) 1999-03-30
CN1148173A (zh) 1997-04-23
KR960038387A (ko) 1996-11-21
FR2733319B1 (fr) 1997-05-23
US5705816A (en) 1998-01-06

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