TW336334B - Aperture for charged beam plotter and method of manufacturing thereof - Google Patents
Aperture for charged beam plotter and method of manufacturing thereofInfo
- Publication number
- TW336334B TW336334B TW086112734A TW86112734A TW336334B TW 336334 B TW336334 B TW 336334B TW 086112734 A TW086112734 A TW 086112734A TW 86112734 A TW86112734 A TW 86112734A TW 336334 B TW336334 B TW 336334B
- Authority
- TW
- Taiwan
- Prior art keywords
- aperture
- manufacturing
- charged beam
- plotter
- beam plotter
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
- H01J2237/0451—Diaphragms with fixed aperture
- H01J2237/0453—Diaphragms with fixed aperture multiple apertures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
- Y10T428/24331—Composite web or sheet including nonapertured component
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23451796A JP2904145B2 (ja) | 1996-09-04 | 1996-09-04 | 荷電ビーム描画装置用アパチャおよびその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW336334B true TW336334B (en) | 1998-07-11 |
Family
ID=16972271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086112734A TW336334B (en) | 1996-09-04 | 1997-09-04 | Aperture for charged beam plotter and method of manufacturing thereof |
Country Status (4)
Country | Link |
---|---|
US (1) | US6296925B1 (zh) |
JP (1) | JP2904145B2 (zh) |
KR (1) | KR100282541B1 (zh) |
TW (1) | TW336334B (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1196175C (zh) | 2000-05-25 | 2005-04-06 | 凸版印刷株式会社 | 转印掩模的制造方法 |
US6372391B1 (en) * | 2000-09-25 | 2002-04-16 | The University Of Houston | Template mask lithography utilizing structured beam |
US20040104454A1 (en) * | 2002-10-10 | 2004-06-03 | Rohm Co., Ltd. | Semiconductor device and method of producing the same |
JP2004207572A (ja) * | 2002-12-26 | 2004-07-22 | Toshiba Corp | ステンシルマスク及びマスク形成用基板並びにステンシルマスクの製造方法及びマスク形成用基板の製造方法 |
JP4582299B2 (ja) * | 2004-07-09 | 2010-11-17 | 凸版印刷株式会社 | ステンシルマスクの製造方法 |
JP4648134B2 (ja) * | 2005-09-02 | 2011-03-09 | 大日本印刷株式会社 | Soi基板、荷電粒子線露光用マスクブランクスおよび荷電粒子線露光用マスク |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4022927A (en) * | 1975-06-30 | 1977-05-10 | International Business Machines Corporation | Methods for forming thick self-supporting masks |
JP2606138B2 (ja) * | 1994-06-02 | 1997-04-30 | 日本電気株式会社 | 電子ビーム描画装置用アパチャ |
JP2792453B2 (ja) * | 1995-01-13 | 1998-09-03 | 日本電気株式会社 | アパーチャ及びその製造方法 |
JPH0934103A (ja) * | 1995-05-17 | 1997-02-07 | Nikon Corp | 荷電粒子線転写用マスク |
JP3193863B2 (ja) * | 1996-01-31 | 2001-07-30 | ホーヤ株式会社 | 転写マスクの製造方法 |
JPH10135103A (ja) * | 1996-10-25 | 1998-05-22 | Nikon Corp | 荷電粒子線転写用マスクまたはx線転写用マスクの製造方法 |
DE19710799A1 (de) * | 1997-03-17 | 1998-10-01 | Ibm | Membranmaske für Belichtungsverfahren mit kurzwelliger Strahlung |
US5942760A (en) * | 1997-11-03 | 1999-08-24 | Motorola Inc. | Method of forming a semiconductor device utilizing scalpel mask, and mask therefor |
-
1996
- 1996-09-04 JP JP23451796A patent/JP2904145B2/ja not_active Expired - Fee Related
-
1997
- 1997-09-04 KR KR1019970045810A patent/KR100282541B1/ko not_active IP Right Cessation
- 1997-09-04 US US08/923,177 patent/US6296925B1/en not_active Expired - Lifetime
- 1997-09-04 TW TW086112734A patent/TW336334B/zh active
Also Published As
Publication number | Publication date |
---|---|
JPH1078650A (ja) | 1998-03-24 |
KR100282541B1 (ko) | 2001-04-02 |
US6296925B1 (en) | 2001-10-02 |
JP2904145B2 (ja) | 1999-06-14 |
KR19980024346A (ko) | 1998-07-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent |