TW328142B - Thermal treatment process of positive photo-resist composition - Google Patents
Thermal treatment process of positive photo-resist compositionInfo
- Publication number
- TW328142B TW328142B TW086102416A TW86102416A TW328142B TW 328142 B TW328142 B TW 328142B TW 086102416 A TW086102416 A TW 086102416A TW 86102416 A TW86102416 A TW 86102416A TW 328142 B TW328142 B TW 328142B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- treatment process
- thermal treatment
- resist composition
- positive photo
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US1300896P | 1996-03-07 | 1996-03-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW328142B true TW328142B (en) | 1998-03-11 |
Family
ID=21757839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086102416A TW328142B (en) | 1996-03-07 | 1997-02-27 | Thermal treatment process of positive photo-resist composition |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0885409A2 (zh) |
JP (1) | JP2000507046A (zh) |
KR (1) | KR20000064553A (zh) |
CN (1) | CN1135437C (zh) |
TW (1) | TW328142B (zh) |
WO (1) | WO1997035231A2 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030079542A (ko) * | 2002-04-04 | 2003-10-10 | 동우 화인켐 주식회사 | 포토레지스트 조성물 |
CN102402137B (zh) * | 2010-09-15 | 2014-04-09 | 无锡华润上华半导体有限公司 | 孔的光刻方法 |
JP5875759B2 (ja) | 2010-10-14 | 2016-03-02 | 株式会社Screenセミコンダクターソリューションズ | 熱処理方法および熱処理装置 |
CN108690949B (zh) * | 2017-04-06 | 2020-05-22 | 昆山工研院新型平板显示技术中心有限公司 | 一种掩膜板及其制备方法以及蒸镀方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3305923C2 (de) * | 1983-02-21 | 1986-10-30 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum Vorbacken von mit Positiv-Fotolack auf der Basis von Naphtoquinondiazid und Phenolformaldehydharz beschichteten Substraten |
-
1997
- 1997-02-27 JP JP9533479A patent/JP2000507046A/ja not_active Withdrawn
- 1997-02-27 CN CNB971927715A patent/CN1135437C/zh not_active Expired - Fee Related
- 1997-02-27 TW TW086102416A patent/TW328142B/zh active
- 1997-02-27 KR KR1019980706953A patent/KR20000064553A/ko not_active Application Discontinuation
- 1997-02-27 WO PCT/US1997/003062 patent/WO1997035231A2/en not_active Application Discontinuation
- 1997-02-27 EP EP97914802A patent/EP0885409A2/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
WO1997035231A3 (en) | 1997-11-13 |
JP2000507046A (ja) | 2000-06-06 |
WO1997035231A2 (en) | 1997-09-25 |
EP0885409A2 (en) | 1998-12-23 |
CN1135437C (zh) | 2004-01-21 |
KR20000064553A (ko) | 2000-11-06 |
CN1218559A (zh) | 1999-06-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0105573A3 (en) | Improvements in process and apparatus for decorating the surfaces of electron irradiation cured coatings on radiation-sensitive substrates | |
DK0954446T3 (da) | Trykt polymerfilm og fremgangsmåde til fremstilling deraf | |
FI863753A (fi) | Optisk film. | |
EP0368543A3 (en) | Processing for coating electrical bus bars and the like | |
JPS5473578A (en) | Pattern exposure method of semiconductor substrate and pattern exposure apparatus | |
EP0202869A3 (en) | Apparatus and method for drying and curing coated substrates | |
EP0697377A3 (en) | Process for producing a glass substrate coated with a finely structured Nesa glass membrane | |
EP0388878A3 (en) | On-line fiber heat treatment | |
TW328142B (en) | Thermal treatment process of positive photo-resist composition | |
GB9501287D0 (en) | Surface treatment | |
AU555708B2 (en) | Improving adhesion of organopolysiloxanes to substrates | |
MY120583A (en) | Jet soldering method and apparatus. | |
ES2167505T3 (es) | Procedimiento y dispositivo para aplicar una decoracion sobre un objeto. | |
HK1039546A1 (zh) | 光致抗蝕劑塗層的製備 | |
JPS55134673A (en) | Surface treatment | |
JPS57136646A (en) | Positive type photoresist developing method | |
KR960008896B1 (en) | Vacuum dryer and drying method using the apparatus | |
JPS5472976A (en) | Pattern forming method | |
JPS6422375A (en) | Treating device for resin film | |
JPS6452159A (en) | Method for simultaneous exposure to solid surface | |
IT1256879B (it) | Procedimento per il rivestimento superficiale di un elemento protesicometallico con uno strato di idrossilapatite, ed elemento protesico cosi' rivestito. | |
JPS5795405A (en) | Bending method for surface-hardened synthetic resin sheet | |
JPS6444935A (en) | Pattern forming method | |
JPS56158895A (en) | Method for painting on metallic surface | |
JPS6447025A (en) | Etching |