KR960008896B1 - Vacuum dryer and drying method using the apparatus - Google Patents

Vacuum dryer and drying method using the apparatus Download PDF

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Publication number
KR960008896B1
KR960008896B1 KR92023279A KR920023279A KR960008896B1 KR 960008896 B1 KR960008896 B1 KR 960008896B1 KR 92023279 A KR92023279 A KR 92023279A KR 920023279 A KR920023279 A KR 920023279A KR 960008896 B1 KR960008896 B1 KR 960008896B1
Authority
KR
South Korea
Prior art keywords
pure water
control terminal
robot arm
drying method
vacuum dryer
Prior art date
Application number
KR92023279A
Other languages
Korean (ko)
Other versions
KR940015445A (en
Inventor
Sang-Man Bae
Chol-Seung Lee
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Priority to KR92023279A priority Critical patent/KR960008896B1/en
Publication of KR940015445A publication Critical patent/KR940015445A/en
Application granted granted Critical
Publication of KR960008896B1 publication Critical patent/KR960008896B1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

The device dries the remaining pure water on a wafer surface completely and rapidly in the manufacturing of semiconductors and prevents photosensitive film damages. The device includes a developing solution nozzle(24), a pure water nozzle(25), a spinner(21), a process chamber(1), an input conveyer roller(2), the first robot arm(3), heating means(4,5), a hot gas control terminal(6), a vacuum control terminal(7), the second robot arm(8) and an output conveyer roller(9).
KR92023279A 1992-12-04 1992-12-04 Vacuum dryer and drying method using the apparatus KR960008896B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR92023279A KR960008896B1 (en) 1992-12-04 1992-12-04 Vacuum dryer and drying method using the apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR92023279A KR960008896B1 (en) 1992-12-04 1992-12-04 Vacuum dryer and drying method using the apparatus

Publications (2)

Publication Number Publication Date
KR940015445A KR940015445A (en) 1994-07-20
KR960008896B1 true KR960008896B1 (en) 1996-07-05

Family

ID=19344692

Family Applications (1)

Application Number Title Priority Date Filing Date
KR92023279A KR960008896B1 (en) 1992-12-04 1992-12-04 Vacuum dryer and drying method using the apparatus

Country Status (1)

Country Link
KR (1) KR960008896B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100848249B1 (en) * 2002-12-16 2008-07-24 동부일렉트로닉스 주식회사 Apparatus and method of develop in photolithography
KR100921289B1 (en) * 2006-03-22 2009-10-09 가부시끼가이샤 도시바 Liquid droplet spraying apparatus and method for manufacturing applied object

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100848249B1 (en) * 2002-12-16 2008-07-24 동부일렉트로닉스 주식회사 Apparatus and method of develop in photolithography
KR100921289B1 (en) * 2006-03-22 2009-10-09 가부시끼가이샤 도시바 Liquid droplet spraying apparatus and method for manufacturing applied object
US7921801B2 (en) 2006-03-22 2011-04-12 Kabushiki Kaisha Toshiba Droplet jetting applicator and method for manufacturing coated body

Also Published As

Publication number Publication date
KR940015445A (en) 1994-07-20

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