TW430877B - Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system - Google Patents
Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure systemInfo
- Publication number
- TW430877B TW430877B TW088116365A TW88116365A TW430877B TW 430877 B TW430877 B TW 430877B TW 088116365 A TW088116365 A TW 088116365A TW 88116365 A TW88116365 A TW 88116365A TW 430877 B TW430877 B TW 430877B
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure
- application
- exposure system
- development
- development device
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
Landscapes
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Networks & Wireless Communication (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
An exposure system, an exposure device, an application device, a development device, and a method of controlling the wafer treating environment in the exposure system used at a photolithography step in the process of manufacturing a microdevice, a mask, or the like. An application/development device (11) and an exposure device (12) are connected through an interface device (13). This interface device (13) has a blower (52) for exhausting the air in its transfer chamber (53) to under the floor (54) of a clean room (14). The air in a unit chamber (39) of the application/development device (11) and in each of chambers (78 and 65 to 67) in the exposure device (12) is exhausted to under the floor (54) through the transfer chamber (53). As a result, the pressure in the chambers (78 and 65 to 67) of the exposure device (12) is not raised to a level higher than that in the unit chamber (39), and hence various chemicals from the application/development device (11) do not enter the exposure device (12). Therefore, accurate exposure can be realized while avoiding the troublesome pressure adjustments of the devices (11 to 13) and not increasing the size of the devices (11 to 13).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP1999/005026 WO2001020650A1 (en) | 1999-09-14 | 1999-09-14 | Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system |
Publications (1)
Publication Number | Publication Date |
---|---|
TW430877B true TW430877B (en) | 2001-04-21 |
Family
ID=14236716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW088116365A TW430877B (en) | 1999-09-14 | 1999-09-23 | Exposure system, exposure device, application device, development device, and method of controlling wafer treating environment in the exposure system |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU5651399A (en) |
TW (1) | TW430877B (en) |
WO (1) | WO2001020650A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6585430B2 (en) | 2000-05-09 | 2003-07-01 | Tokyo Electron Limited | System and method for coating and developing |
CN113721429A (en) * | 2021-09-10 | 2021-11-30 | 大连理工大学 | Maskless photoetching system and corresponding photoetching method thereof |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1457832A1 (en) * | 2003-03-11 | 2004-09-15 | ASML Netherlands B.V. | Lithographic projection assembly, load lock and method for transferring objects |
SG115631A1 (en) | 2003-03-11 | 2005-10-28 | Asml Netherlands Bv | Lithographic projection assembly, load lock and method for transferring objects |
CN102854755A (en) * | 2003-07-09 | 2013-01-02 | 株式会社尼康 | Exposure apparatus |
JP4759272B2 (en) * | 2005-01-13 | 2011-08-31 | ルネサスエレクトロニクス株式会社 | Exposure equipment |
JP2006286709A (en) * | 2005-03-31 | 2006-10-19 | Toppan Printing Co Ltd | Exposure apparatus and method of forming photoresist pattern using the same |
JP5304647B2 (en) | 2007-06-28 | 2013-10-02 | 富士通セミコンダクター株式会社 | Heat treatment apparatus and semiconductor device manufacturing method |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6079358A (en) * | 1983-10-07 | 1985-05-07 | Nippon Kogaku Kk <Nikon> | Projecting optical device |
JPH0590133A (en) * | 1991-09-27 | 1993-04-09 | Matsushita Electric Ind Co Ltd | X-ray aligner |
-
1999
- 1999-09-14 WO PCT/JP1999/005026 patent/WO2001020650A1/en active Application Filing
- 1999-09-14 AU AU56513/99A patent/AU5651399A/en not_active Abandoned
- 1999-09-23 TW TW088116365A patent/TW430877B/en not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6585430B2 (en) | 2000-05-09 | 2003-07-01 | Tokyo Electron Limited | System and method for coating and developing |
CN113721429A (en) * | 2021-09-10 | 2021-11-30 | 大连理工大学 | Maskless photoetching system and corresponding photoetching method thereof |
Also Published As
Publication number | Publication date |
---|---|
AU5651399A (en) | 2001-04-17 |
WO2001020650A1 (en) | 2001-03-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MM4A | Annulment or lapse of patent due to non-payment of fees |