JPS6422375A - Treating device for resin film - Google Patents
Treating device for resin filmInfo
- Publication number
- JPS6422375A JPS6422375A JP62178904A JP17890487A JPS6422375A JP S6422375 A JPS6422375 A JP S6422375A JP 62178904 A JP62178904 A JP 62178904A JP 17890487 A JP17890487 A JP 17890487A JP S6422375 A JPS6422375 A JP S6422375A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- preheater
- resin film
- resin
- laid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To prevent a material to be treated from being adhered by resin infiltrated to the back by providing a relief part on the outer circumferential part of a preheater to subject to baking treatment on resin film applied onto said material. CONSTITUTION:A wafer 1 to be the material to be treated is revolved as it is held in a vacuum state, coating material such as liquid photosensitive polyimide resin 17, etc., is dropped onto the center of the wafer and diffused to form resin film 18. Then, the wafer 1 is supplied to the preheater 22A on a 1st step in an oven 21 of a baking equipment 20 and laid there. Accordingly, the wafer 1 is heated effectively and uniformly by heat conduction of a preheater 22 to undergo baking treatment. At this time, the projection part 19 of resin formed by infiltration on the back of the wafer 1 at the time of application is dried without bringing into contact with the preheater 22A since the relief part 25 is cut and laid on the outer circumference of the upper surface of the heater body 23.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62178904A JPS6422375A (en) | 1987-07-20 | 1987-07-20 | Treating device for resin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62178904A JPS6422375A (en) | 1987-07-20 | 1987-07-20 | Treating device for resin film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6422375A true JPS6422375A (en) | 1989-01-25 |
Family
ID=16056718
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62178904A Pending JPS6422375A (en) | 1987-07-20 | 1987-07-20 | Treating device for resin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6422375A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04300671A (en) * | 1991-03-29 | 1992-10-23 | Sharp Corp | Heat-treating mechanism of applicator |
JPH08252506A (en) * | 1996-03-08 | 1996-10-01 | Dainippon Screen Mfg Co Ltd | Substrate treating device for forming silica film |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50141879A (en) * | 1974-05-02 | 1975-11-14 | ||
JPS5573240A (en) * | 1978-11-28 | 1980-06-02 | Tokyo Shibaura Electric Co | Measuring device of pulse frequency or respiratory frequency |
-
1987
- 1987-07-20 JP JP62178904A patent/JPS6422375A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50141879A (en) * | 1974-05-02 | 1975-11-14 | ||
JPS5573240A (en) * | 1978-11-28 | 1980-06-02 | Tokyo Shibaura Electric Co | Measuring device of pulse frequency or respiratory frequency |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04300671A (en) * | 1991-03-29 | 1992-10-23 | Sharp Corp | Heat-treating mechanism of applicator |
JPH08252506A (en) * | 1996-03-08 | 1996-10-01 | Dainippon Screen Mfg Co Ltd | Substrate treating device for forming silica film |
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