JPS644244A - High temperature reaction treatment device - Google Patents

High temperature reaction treatment device

Info

Publication number
JPS644244A
JPS644244A JP15552487A JP15552487A JPS644244A JP S644244 A JPS644244 A JP S644244A JP 15552487 A JP15552487 A JP 15552487A JP 15552487 A JP15552487 A JP 15552487A JP S644244 A JPS644244 A JP S644244A
Authority
JP
Japan
Prior art keywords
substrate
treatment
high temperature
heat plate
reactive compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15552487A
Other languages
Japanese (ja)
Other versions
JPH0811178B2 (en
Inventor
Mitsunobu Koshiba
Yoichi Kamoshita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP62155524A priority Critical patent/JPH0811178B2/en
Publication of JPS644244A publication Critical patent/JPS644244A/en
Publication of JPH0811178B2 publication Critical patent/JPH0811178B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To enable a suitable service for a treatment with a silicon compound, by furnishing with a reactor which is able to be sealed tightly and in which multiple holes for introducing a reactive compound onto a substrate and both upper and lower hot plates for keeping the substrate at a high temperature are arranged. CONSTITUTION:A substrate 5 on which an irradiated resin layer has been formed by a radiation exposure treatment is set upon a lower heat plate 3 heated to a high temperature of a reactor 1. An upper heat plate 2 is put above that substrate as a lid, a reactive compound is introduced on to the substrate 5 through holes 6 bored through the upper heat plate 2 and the aforementioned irradiated resin layer is treated by a reaction. As a result of these procedure, an ultra fine processing with a resolution of 1.0mum or smaller can be precisely performed in a short time by combining a radiation exposure treatment, a treatment with a reactive compound composed of a silicon compound and a dry developing treatment.
JP62155524A 1987-06-24 1987-06-24 High temperature reaction processor Expired - Fee Related JPH0811178B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62155524A JPH0811178B2 (en) 1987-06-24 1987-06-24 High temperature reaction processor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62155524A JPH0811178B2 (en) 1987-06-24 1987-06-24 High temperature reaction processor

Publications (2)

Publication Number Publication Date
JPS644244A true JPS644244A (en) 1989-01-09
JPH0811178B2 JPH0811178B2 (en) 1996-02-07

Family

ID=15607949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62155524A Expired - Fee Related JPH0811178B2 (en) 1987-06-24 1987-06-24 High temperature reaction processor

Country Status (1)

Country Link
JP (1) JPH0811178B2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5935674A (en) * 1982-08-24 1984-02-27 Sumitomo Electric Ind Ltd Vapor deposition device
JPS6126775A (en) * 1984-07-16 1986-02-06 Canon Inc Formation of accumulated film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5935674A (en) * 1982-08-24 1984-02-27 Sumitomo Electric Ind Ltd Vapor deposition device
JPS6126775A (en) * 1984-07-16 1986-02-06 Canon Inc Formation of accumulated film

Also Published As

Publication number Publication date
JPH0811178B2 (en) 1996-02-07

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees