TW289124B - - Google Patents
Info
- Publication number
- TW289124B TW289124B TW083109830A TW83109830A TW289124B TW 289124 B TW289124 B TW 289124B TW 083109830 A TW083109830 A TW 083109830A TW 83109830 A TW83109830 A TW 83109830A TW 289124 B TW289124 B TW 289124B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/142,638 US5489369A (en) | 1993-10-25 | 1993-10-25 | Method and apparatus for thin film coating an article |
Publications (1)
Publication Number | Publication Date |
---|---|
TW289124B true TW289124B (zh) | 1996-10-21 |
Family
ID=22500689
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW083109830A TW289124B (zh) | 1993-10-25 | 1994-10-24 |
Country Status (7)
Country | Link |
---|---|
US (4) | US5489369A (zh) |
JP (1) | JP3532208B2 (zh) |
KR (1) | KR100348838B1 (zh) |
CN (1) | CN1125189C (zh) |
AU (1) | AU1084695A (zh) |
TW (1) | TW289124B (zh) |
WO (1) | WO1995012007A1 (zh) |
Families Citing this family (57)
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---|---|---|---|---|
US5962085A (en) * | 1991-02-25 | 1999-10-05 | Symetrix Corporation | Misted precursor deposition apparatus and method with improved mist and mist flow |
US5489369A (en) * | 1993-10-25 | 1996-02-06 | Viratec Thin Films, Inc. | Method and apparatus for thin film coating an article |
US5688328A (en) * | 1995-09-13 | 1997-11-18 | Chunghwa Picture Tubes, Ltd. | Apparatus for improved coating of a CRT display screen |
US5772861A (en) * | 1995-10-16 | 1998-06-30 | Viratec Thin Films, Inc. | System for evaluating thin film coatings |
GB9600210D0 (en) | 1996-01-05 | 1996-03-06 | Vanderstraeten E Bvba | Improved sputtering targets and method for the preparation thereof |
KR100318724B1 (ko) * | 1996-04-18 | 2002-04-22 | 니시무로 타이죠 | 음극선관의제조방법및그장치 |
JP3192642B2 (ja) * | 1998-10-02 | 2001-07-30 | 住友特殊金属株式会社 | 表面処理用支持部材、表面処理用ホルダー、並びに表面処理方法 |
US6365010B1 (en) | 1998-11-06 | 2002-04-02 | Scivac | Sputtering apparatus and process for high rate coatings |
GB9916558D0 (en) * | 1999-07-14 | 1999-09-15 | Dormer Tools Sheffield Ltd | Method and means for drill production |
KR20010087664A (ko) * | 2000-03-08 | 2001-09-21 | 손명호 | 전자파 차폐막 코팅방법 및 그 장치 |
EA003148B1 (ru) * | 2000-07-05 | 2003-02-27 | Владимир Яковлевич ШИРИПОВ | Вакуумный модуль (его варианты) и система модулей для нанесения покрытий на подложку |
US6587097B1 (en) | 2000-11-28 | 2003-07-01 | 3M Innovative Properties Co. | Display system |
US6623662B2 (en) | 2001-05-23 | 2003-09-23 | Chunghwa Picture Tubes, Ltd. | Carbon black coating for CRT display screen with uniform light absorption |
US6746530B2 (en) | 2001-08-02 | 2004-06-08 | Chunghwa Pictures Tubes, Ltd. | High contrast, moisture resistant antistatic/antireflective coating for CRT display screen |
US6521346B1 (en) | 2001-09-27 | 2003-02-18 | Chunghwa Picture Tubes, Ltd. | Antistatic/antireflective coating for video display screen with improved refractivity |
US6797108B2 (en) * | 2001-10-05 | 2004-09-28 | Applied Materials, Inc. | Apparatus and method for evenly flowing processing gas onto a semiconductor wafer |
US6620252B2 (en) * | 2001-10-29 | 2003-09-16 | Thomson Licensing S.A. | Metallization module for cathode-ray tube (CRT) applications |
US6764580B2 (en) * | 2001-11-15 | 2004-07-20 | Chungwa Picture Tubes, Ltd. | Application of multi-layer antistatic/antireflective coating to video display screen by sputtering |
US6656331B2 (en) * | 2002-04-30 | 2003-12-02 | Chunghwa Picture Tubes, Ltd. | Application of antistatic/antireflective coating to a video display screen |
WO2003100121A2 (de) * | 2002-05-24 | 2003-12-04 | Schott Ag | Mehrplatz-beschichtungsvorrichtung und verfahren zur plasmabeschichtung |
US7032287B1 (en) * | 2002-07-19 | 2006-04-25 | Nanometrics Incorporated | Edge grip chuck |
DE10362259B4 (de) * | 2003-11-04 | 2011-03-17 | Von Ardenne Anlagentechnik Gmbh | Längserstreckte Vakuumanlage zur ein- oder beidseitigen Beschichtung flacher Substrate |
DE10352144B8 (de) * | 2003-11-04 | 2008-11-13 | Von Ardenne Anlagentechnik Gmbh | Vakuumbeschichtungsanlage zum Beschichten von längserstreckten Substraten |
DE102004008598B4 (de) * | 2004-02-21 | 2006-12-28 | Applied Films Gmbh & Co. Kg | Verfahren für den Betrieb einer Inline-Beschichtungsanlage |
KR20050093230A (ko) * | 2004-03-18 | 2005-09-23 | 엘지.필립스 엘시디 주식회사 | 스퍼터링 장비 |
DE602005003234T2 (de) | 2004-07-12 | 2008-08-28 | Cardinal Cg Co., Eden Prairie | Wartungsarme beschichtungen |
US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
DE102005016405A1 (de) * | 2005-04-08 | 2006-10-12 | Von Ardenne Anlagentechnik Gmbh | Vorrichtung zur Vakuumbeschichtung von Substraten unterschiedlicher Größe |
KR101229153B1 (ko) | 2005-07-18 | 2013-02-01 | 블라디미르 쉬리포브 | 기판에 코팅을 피복하기 위한 진공 클러스터 |
WO2007067031A1 (en) * | 2005-12-07 | 2007-06-14 | Otb Group B.V. | System and method for coating products, and a product obtained with such a system and method |
US7989094B2 (en) | 2006-04-19 | 2011-08-02 | Cardinal Cg Company | Opposed functional coatings having comparable single surface reflectances |
US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
WO2009036284A1 (en) * | 2007-09-14 | 2009-03-19 | Cardinal Cg Company | Low-maintenance coatings, and methods for producing low-maintenance coatings |
WO2010023109A1 (en) * | 2008-08-25 | 2010-03-04 | Applied Materials Inc. | Coating chamber with a moveable shield |
US20100044213A1 (en) * | 2008-08-25 | 2010-02-25 | Applied Materials, Inc. | Coating chamber with a moveable shield |
US9751254B2 (en) * | 2008-10-09 | 2017-09-05 | Bobst Manchester Ltd | Apparatus for treating substrates |
DE102008053394A1 (de) * | 2008-10-27 | 2010-04-29 | Mtu Aero Engines Gmbh | Vorrichtung zum partiellen Abdecken einer Bauteilzone |
JP5192993B2 (ja) * | 2008-11-13 | 2013-05-08 | 昭和電工株式会社 | 磁性層の形成方法 |
CN101994097B (zh) * | 2009-08-25 | 2013-08-21 | 鸿富锦精密工业(深圳)有限公司 | 镀膜装置 |
TWI564427B (zh) * | 2009-12-18 | 2017-01-01 | 財團法人工業技術研究院 | 聚對二甲苯薄膜的形成方法 |
CN102330073B (zh) * | 2010-07-13 | 2014-07-16 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 薄膜加工设备的下极板及应用该下极板的等离子体加工设备 |
DE102010056157A1 (de) * | 2010-12-28 | 2012-06-28 | Oerlikon Trading Ag, Trübbach | Halterung für Bohrkopfbeschichtung |
EP2839052A4 (en) | 2012-04-19 | 2015-06-10 | Intevac Inc | DOUBLE MASK ARRANGEMENT FOR MANUFACTURING SOLAR CELL |
EP2852469B1 (en) | 2012-04-26 | 2019-04-24 | Intevac, Inc. | System architecture for vacuum processing |
US10062600B2 (en) | 2012-04-26 | 2018-08-28 | Intevac, Inc. | System and method for bi-facial processing of substrates |
KR102048847B1 (ko) * | 2012-11-15 | 2019-11-26 | 어플라이드 머티어리얼스, 인코포레이티드 | 엣지 제외부 쉴드를 유지보수하기 위한 방법 및 시스템 |
WO2014127847A1 (en) * | 2013-02-25 | 2014-08-28 | Applied Materials, Inc. | Apparatus with neighboring sputter cathodes and method of operation thereof |
CZ305643B6 (cs) * | 2013-12-03 | 2016-01-20 | Bodycote Ht S.R.O. | Způsob izolace části povrchu součástky při její povrchové úpravě plynným médiem |
US9543114B2 (en) | 2014-08-05 | 2017-01-10 | Intevac, Inc. | Implant masking and alignment system with rollers |
CN107709606A (zh) * | 2015-07-06 | 2018-02-16 | 应用材料公司 | 用于在溅射沉积处理期间支撑至少一个基板的载具、用于在至少一个基板上溅射沉积的设备和用于在至少一个基板上溅射沉积的方法 |
RU2653897C2 (ru) * | 2016-10-18 | 2018-05-15 | Публичное акционерное общество "Сатурн" (ПАО "Сатурн") | Устройство для напыления просветляющего покрытия фотопреобразователя |
EP3541762B1 (en) | 2016-11-17 | 2022-03-02 | Cardinal CG Company | Static-dissipative coating technology |
CN109913847A (zh) * | 2017-12-13 | 2019-06-21 | 湘潭宏大真空技术股份有限公司 | Low-e玻璃真空磁控溅射镀膜生产线 |
CN109913848A (zh) * | 2017-12-13 | 2019-06-21 | 湘潭宏大真空技术股份有限公司 | 双银low-e玻璃真空镀膜溅射生产线 |
CN110904425B (zh) * | 2018-09-17 | 2021-11-16 | 先进尼克斯有限公司 | 真空隔离的批处理系统 |
KR20230033053A (ko) * | 2021-08-26 | 2023-03-08 | 삼성디스플레이 주식회사 | 스퍼터링 장치 |
Family Cites Families (25)
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US2093699A (en) * | 1932-03-08 | 1937-09-21 | Farnsworth Television Inc | Cathode ray tube |
US3294670A (en) * | 1963-10-07 | 1966-12-27 | Western Electric Co | Apparatus for processing materials in a controlled atmosphere |
US3679451A (en) * | 1970-02-13 | 1972-07-25 | Marks Polarized Corp | Nonglare coating for surfaces of tv tubes and the like and such coated surfaces |
US3940511A (en) * | 1973-06-25 | 1976-02-24 | Rca Corporation | Method for preparing haze-resistant lithium-silicate glare-reducing coating |
US3945903A (en) * | 1974-08-28 | 1976-03-23 | Shatterproof Glass Corporation | Sputter-coating of glass sheets or other substrates |
US3945911A (en) * | 1974-08-28 | 1976-03-23 | Shatterproof Glass Corporation | Cathodes for sputter-coating glass sheets or other substrates |
FR2324755A1 (fr) * | 1975-09-19 | 1977-04-15 | Anvar | Dispositif de pulverisation cathodique de grande vitesse de depot |
US4274936A (en) * | 1979-04-30 | 1981-06-23 | Advanced Coating Technology, Inc. | Vacuum deposition system and method |
DE3306870A1 (de) * | 1983-02-26 | 1984-08-30 | Leybold-Heraeus GmbH, 5000 Köln | Vorrichtung zum herstellen von schichten mit rotationssymmetrischem dickenprofil durch katodenzerstaeubung |
EP0122092A3 (en) * | 1983-04-06 | 1985-07-10 | General Engineering Radcliffe Limited | Vacuum coating apparatus |
US4533449A (en) * | 1984-04-16 | 1985-08-06 | The Perkin-Elmer Corporation | Rapid surface figuring by selective deposition |
US4915057A (en) * | 1985-10-23 | 1990-04-10 | Gte Products Corporation | Apparatus and method for registration of shadow masked thin-film patterns |
NO872943L (no) * | 1986-07-21 | 1988-01-22 | Mitsui Toatsu Chemicals | Filter for katodestraaleroerskjerm. |
JP2590101B2 (ja) * | 1987-05-15 | 1997-03-12 | 株式会社日立製作所 | 陰極線管の製造方法および装置 |
JPH01146627A (ja) * | 1987-12-02 | 1989-06-08 | Toshiba Corp | ブラウン管用パレット |
US4851095A (en) * | 1988-02-08 | 1989-07-25 | Optical Coating Laboratory, Inc. | Magnetron sputtering apparatus and process |
US5209690A (en) * | 1988-09-08 | 1993-05-11 | U.S. Philips Corporation | Method of vapor depositing an interference filter layer on the inside of a display window, a display window, a projection cathode ray tube and a projection television apparatus |
US5122709A (en) * | 1989-03-20 | 1992-06-16 | Hitachi, Ltd. | Antistatic cathode ray tube with lobe like projections and high gloss and hardness |
US4982695A (en) * | 1989-04-20 | 1991-01-08 | North American Philips Corporation | Method and apparatus for controlling the thickness distribution of an interference filter |
JP2948842B2 (ja) * | 1989-11-24 | 1999-09-13 | 日本真空技術株式会社 | インライン型cvd装置 |
JPH03196451A (ja) * | 1989-12-26 | 1991-08-27 | Pioneer Electron Corp | 表示装置用フィルタおよびその製造方法 |
DE4036339C2 (de) * | 1990-11-15 | 1993-10-21 | Leybold Ag | Vorrichtung für den Transport von Substraten |
JPH05132770A (ja) * | 1991-11-11 | 1993-05-28 | Canon Inc | スパツタ装置 |
US5382126A (en) * | 1992-03-30 | 1995-01-17 | Leybold Ag | Multichamber coating apparatus |
US5489369A (en) * | 1993-10-25 | 1996-02-06 | Viratec Thin Films, Inc. | Method and apparatus for thin film coating an article |
-
1993
- 1993-10-25 US US08/142,638 patent/US5489369A/en not_active Expired - Fee Related
-
1994
- 1994-10-24 WO PCT/US1994/012380 patent/WO1995012007A1/en active Application Filing
- 1994-10-24 KR KR1019960702124A patent/KR100348838B1/ko not_active IP Right Cessation
- 1994-10-24 JP JP51285095A patent/JP3532208B2/ja not_active Expired - Fee Related
- 1994-10-24 AU AU10846/95A patent/AU1084695A/en not_active Abandoned
- 1994-10-24 TW TW083109830A patent/TW289124B/zh active
- 1994-10-24 CN CN94194626A patent/CN1125189C/zh not_active Expired - Fee Related
-
1995
- 1995-06-07 US US08/485,214 patent/US5688389A/en not_active Expired - Lifetime
- 1995-06-07 US US08/476,091 patent/US5620572A/en not_active Expired - Lifetime
-
1997
- 1997-11-13 US US08/970,177 patent/US6068738A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100348838B1 (ko) | 2003-01-06 |
US6068738A (en) | 2000-05-30 |
WO1995012007A1 (en) | 1995-05-04 |
US5489369A (en) | 1996-02-06 |
CN1139957A (zh) | 1997-01-08 |
JPH09504575A (ja) | 1997-05-06 |
US5688389A (en) | 1997-11-18 |
US5620572A (en) | 1997-04-15 |
JP3532208B2 (ja) | 2004-05-31 |
AU1084695A (en) | 1995-05-22 |
CN1125189C (zh) | 2003-10-22 |