US5866937A
(en)
*
|
1990-04-12 |
1999-02-02 |
Actel Corporation |
Double half via antifuse
|
US5614756A
(en)
*
|
1990-04-12 |
1997-03-25 |
Actel Corporation |
Metal-to-metal antifuse with conductive
|
US5780323A
(en)
|
1990-04-12 |
1998-07-14 |
Actel Corporation |
Fabrication method for metal-to-metal antifuses incorporating a tungsten via plug
|
US5581111A
(en)
*
|
1993-07-07 |
1996-12-03 |
Actel Corporation |
Dielectric-polysilicon-dielectric antifuse for field programmable logic applications
|
US5485031A
(en)
|
1993-11-22 |
1996-01-16 |
Actel Corporation |
Antifuse structure suitable for VLSI application
|
JPH07326675A
(ja)
*
|
1994-01-06 |
1995-12-12 |
Texas Instr Inc <Ti> |
アンチフューズ製造方法およびアンチフューズ
|
US5493146A
(en)
*
|
1994-07-14 |
1996-02-20 |
Vlsi Technology, Inc. |
Anti-fuse structure for reducing contamination of the anti-fuse material
|
US5962815A
(en)
|
1995-01-18 |
1999-10-05 |
Prolinx Labs Corporation |
Antifuse interconnect between two conducting layers of a printed circuit board
|
US5759876A
(en)
*
|
1995-11-01 |
1998-06-02 |
United Technologies Corporation |
Method of making an antifuse structure using a metal cap layer
|
US5793094A
(en)
*
|
1995-12-28 |
1998-08-11 |
Vlsi Technology, Inc. |
Methods for fabricating anti-fuse structures
|
US5693556A
(en)
*
|
1995-12-29 |
1997-12-02 |
Cypress Semiconductor Corp. |
Method of making an antifuse metal post structure
|
US5602053A
(en)
*
|
1996-04-08 |
1997-02-11 |
Chartered Semidconductor Manufacturing Pte, Ltd. |
Method of making a dual damascene antifuse structure
|
US5723358A
(en)
*
|
1996-04-29 |
1998-03-03 |
Vlsi Technology, Inc. |
Method of manufacturing amorphous silicon antifuse structures
|
US5753540A
(en)
*
|
1996-08-20 |
1998-05-19 |
Vlsi Technology, Inc. |
Apparatus and method for programming antifuse structures
|
US5764563A
(en)
*
|
1996-09-30 |
1998-06-09 |
Vlsi Technology, Inc. |
Thin film load structure
|
KR100227843B1
(ko)
*
|
1997-01-22 |
1999-11-01 |
윤종용 |
반도체 소자의 콘택 배선 방법 및 이를 이용한 커패시터 제조방법
|
US5937281A
(en)
*
|
1997-08-05 |
1999-08-10 |
Powerchip Semiconductor, Corp. |
Method to form metal-to-metal antifuse for field programmable gate array applications using liquid phase deposition (LPD)
|
GB9722149D0
(en)
*
|
1997-10-22 |
1997-12-17 |
Philips Electronics Nv |
Semiconductior memory devices
|
US5933744A
(en)
*
|
1998-04-02 |
1999-08-03 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Alignment method for used in chemical mechanical polishing process
|
US6037233A
(en)
*
|
1998-04-27 |
2000-03-14 |
Lsi Logic Corporation |
Metal-encapsulated polysilicon gate and interconnect
|
US6469364B1
(en)
*
|
1998-08-31 |
2002-10-22 |
Arizona Board Of Regents |
Programmable interconnection system for electrical circuits
|
US6162686A
(en)
*
|
1998-09-18 |
2000-12-19 |
Taiwan Semiconductor Manufacturing Company |
Method for forming a fuse in integrated circuit application
|
JP3466929B2
(ja)
*
|
1998-10-05 |
2003-11-17 |
株式会社東芝 |
半導体装置
|
US7157314B2
(en)
|
1998-11-16 |
2007-01-02 |
Sandisk Corporation |
Vertically stacked field programmable nonvolatile memory and method of fabrication
|
US6351406B1
(en)
|
1998-11-16 |
2002-02-26 |
Matrix Semiconductor, Inc. |
Vertically stacked field programmable nonvolatile memory and method of fabrication
|
US6385074B1
(en)
|
1998-11-16 |
2002-05-07 |
Matrix Semiconductor, Inc. |
Integrated circuit structure including three-dimensional memory array
|
US6034882A
(en)
|
1998-11-16 |
2000-03-07 |
Matrix Semiconductor, Inc. |
Vertically stacked field programmable nonvolatile memory and method of fabrication
|
US6380003B1
(en)
|
1999-12-22 |
2002-04-30 |
International Business Machines Corporation |
Damascene anti-fuse with slot via
|
US6251710B1
(en)
*
|
2000-04-27 |
2001-06-26 |
International Business Machines Corporation |
Method of making a dual damascene anti-fuse with via before wire
|
US8575719B2
(en)
|
2000-04-28 |
2013-11-05 |
Sandisk 3D Llc |
Silicon nitride antifuse for use in diode-antifuse memory arrays
|
US6631085B2
(en)
|
2000-04-28 |
2003-10-07 |
Matrix Semiconductor, Inc. |
Three-dimensional memory array incorporating serial chain diode stack
|
US6420215B1
(en)
|
2000-04-28 |
2002-07-16 |
Matrix Semiconductor, Inc. |
Three-dimensional memory array and method of fabrication
|
AU2001262953A1
(en)
|
2000-04-28 |
2001-11-12 |
Matrix Semiconductor, Inc. |
Three-dimensional memory array and method of fabrication
|
US6888750B2
(en)
*
|
2000-04-28 |
2005-05-03 |
Matrix Semiconductor, Inc. |
Nonvolatile memory on SOI and compound semiconductor substrates and method of fabrication
|
US6765813B2
(en)
*
|
2000-08-14 |
2004-07-20 |
Matrix Semiconductor, Inc. |
Integrated systems using vertically-stacked three-dimensional memory cells
|
EP1312120A1
(en)
|
2000-08-14 |
2003-05-21 |
Matrix Semiconductor, Inc. |
Dense arrays and charge storage devices, and methods for making same
|
US6658438B1
(en)
*
|
2000-08-14 |
2003-12-02 |
Matrix Semiconductor, Inc. |
Method for deleting stored digital data from write-once memory device
|
US6515888B2
(en)
|
2000-08-14 |
2003-02-04 |
Matrix Semiconductor, Inc. |
Low cost three-dimensional memory array
|
US6711043B2
(en)
|
2000-08-14 |
2004-03-23 |
Matrix Semiconductor, Inc. |
Three-dimensional memory cache system
|
US6580124B1
(en)
|
2000-08-14 |
2003-06-17 |
Matrix Semiconductor Inc. |
Multigate semiconductor device with vertical channel current and method of fabrication
|
US6545891B1
(en)
|
2000-08-14 |
2003-04-08 |
Matrix Semiconductor, Inc. |
Modular memory device
|
US6424581B1
(en)
|
2000-08-14 |
2002-07-23 |
Matrix Semiconductor, Inc. |
Write-once memory array controller, system, and method
|
US6661730B1
(en)
|
2000-12-22 |
2003-12-09 |
Matrix Semiconductor, Inc. |
Partial selection of passive element memory cell sub-arrays for write operation
|
US7087975B2
(en)
*
|
2000-12-28 |
2006-08-08 |
Infineon Technologies Ag |
Area efficient stacking of antifuses in semiconductor device
|
US6545898B1
(en)
|
2001-03-21 |
2003-04-08 |
Silicon Valley Bank |
Method and apparatus for writing memory arrays using external source of high programming voltage
|
US6897514B2
(en)
*
|
2001-03-28 |
2005-05-24 |
Matrix Semiconductor, Inc. |
Two mask floating gate EEPROM and method of making
|
JP3511172B2
(ja)
*
|
2001-03-30 |
2004-03-29 |
富士通カンタムデバイス株式会社 |
高周波半導体装置
|
US6704235B2
(en)
|
2001-07-30 |
2004-03-09 |
Matrix Semiconductor, Inc. |
Anti-fuse memory cell with asymmetric breakdown voltage
|
US6525953B1
(en)
|
2001-08-13 |
2003-02-25 |
Matrix Semiconductor, Inc. |
Vertically-stacked, field-programmable, nonvolatile memory and method of fabrication
|
US6841813B2
(en)
*
|
2001-08-13 |
2005-01-11 |
Matrix Semiconductor, Inc. |
TFT mask ROM and method for making same
|
US6593624B2
(en)
|
2001-09-25 |
2003-07-15 |
Matrix Semiconductor, Inc. |
Thin film transistors with vertically offset drain regions
|
US6580144B2
(en)
*
|
2001-09-28 |
2003-06-17 |
Hewlett-Packard Development Company, L.P. |
One time programmable fuse/anti-fuse combination based memory cell
|
US7067850B2
(en)
*
|
2001-10-16 |
2006-06-27 |
Midwest Research Institute |
Stacked switchable element and diode combination
|
US6624485B2
(en)
|
2001-11-05 |
2003-09-23 |
Matrix Semiconductor, Inc. |
Three-dimensional, mask-programmed read only memory
|
US6853049B2
(en)
*
|
2002-03-13 |
2005-02-08 |
Matrix Semiconductor, Inc. |
Silicide-silicon oxide-semiconductor antifuse device and method of making
|
US6917532B2
(en)
*
|
2002-06-21 |
2005-07-12 |
Hewlett-Packard Development Company, L.P. |
Memory storage device with segmented column line array
|
US6737675B2
(en)
|
2002-06-27 |
2004-05-18 |
Matrix Semiconductor, Inc. |
High density 3D rail stack arrays
|
KR100878496B1
(ko)
|
2002-12-30 |
2009-01-13 |
주식회사 하이닉스반도체 |
반도체 장치 및 그 제조방법
|
US7177183B2
(en)
|
2003-09-30 |
2007-02-13 |
Sandisk 3D Llc |
Multiple twin cell non-volatile memory array and logic block structure and method therefor
|
US7323761B2
(en)
*
|
2004-11-12 |
2008-01-29 |
International Business Machines Corporation |
Antifuse structure having an integrated heating element
|
US7420242B2
(en)
*
|
2005-08-31 |
2008-09-02 |
Macronix International Co., Ltd. |
Stacked bit line dual word line nonvolatile memory
|
US20070145594A1
(en)
*
|
2005-12-28 |
2007-06-28 |
Dongbu Electronics Co., Ltd. |
Semiconductor device and method for manufacturing the same
|
KR100950750B1
(ko)
|
2006-11-23 |
2010-04-05 |
주식회사 하이닉스반도체 |
반도체 소자의 퓨즈 박스
|
US7608538B2
(en)
*
|
2007-01-05 |
2009-10-27 |
International Business Machines Corporation |
Formation of vertical devices by electroplating
|
JP5248170B2
(ja)
*
|
2008-04-03 |
2013-07-31 |
ルネサスエレクトロニクス株式会社 |
半導体装置
|
US7642176B2
(en)
*
|
2008-04-21 |
2010-01-05 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Electrical fuse structure and method
|
US9741658B2
(en)
|
2009-10-30 |
2017-08-22 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Electrical fuse structure and method of formation
|
DE102010045073B4
(de)
|
2009-10-30 |
2021-04-22 |
Taiwan Semiconductor Mfg. Co., Ltd. |
Elektrische Sicherungsstruktur
|
US8686536B2
(en)
*
|
2009-10-30 |
2014-04-01 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Electrical fuse structure and method of formation
|
US9627395B2
(en)
|
2015-02-11 |
2017-04-18 |
Sandisk Technologies Llc |
Enhanced channel mobility three-dimensional memory structure and method of making thereof
|
US9478495B1
(en)
|
2015-10-26 |
2016-10-25 |
Sandisk Technologies Llc |
Three dimensional memory device containing aluminum source contact via structure and method of making thereof
|
CN115692372A
(zh)
*
|
2021-07-27 |
2023-02-03 |
中国电子科技集团公司第五十八研究所 |
一种反熔丝单元结构、制备方法及电极结构的制备方法
|