US5937281A - Method to form metal-to-metal antifuse for field programmable gate array applications using liquid phase deposition (LPD) - Google Patents
Method to form metal-to-metal antifuse for field programmable gate array applications using liquid phase deposition (LPD) Download PDFInfo
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- US5937281A US5937281A US08/906,552 US90655297A US5937281A US 5937281 A US5937281 A US 5937281A US 90655297 A US90655297 A US 90655297A US 5937281 A US5937281 A US 5937281A
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- 229910052751 metal Inorganic materials 0.000 title claims description 5
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 49
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 27
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- 229910052710 silicon Inorganic materials 0.000 claims abstract description 11
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- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 4
- 229920005591 polysilicon Polymers 0.000 claims description 4
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical group [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 3
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 229910021332 silicide Inorganic materials 0.000 claims 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 10
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- 229910004074 SiF6 Inorganic materials 0.000 description 1
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- QNZFKUWECYSYPS-UHFFFAOYSA-N lead zirconium Chemical compound [Zr].[Pb] QNZFKUWECYSYPS-UHFFFAOYSA-N 0.000 description 1
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- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/525—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections
- H01L23/5252—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections comprising anti-fuses, i.e. connections having their state changed from non-conductive to conductive
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/118—Masterslice integrated circuits
- H01L27/11803—Masterslice integrated circuits using field effect technology
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Definitions
- the present invention relates to a method of fabricating the field programmable gate arrays (FPGAs), and more particularly to the novel antifuse structure of high density and high speed FPGAs.
- FPGAs field programmable gate arrays
- Gate arrays are largely a matrix of integrated circuit structures, such as logic gates and their associated input and output structures which are isolated from one another. These logic gates are overlaid with vertical and horizontal wiring channels, which interconnect the logic gates and input and output structures in a pattern to perform a user-specified function.
- Field programmable gate arrays offer important improvement in turn around time and eliminate non-recurring engineering cost for application specific integrated circuit (ASIC) prototype compared to traditional mask-programmable gate arrays (MPGAs).
- ASIC application specific integrated circuit
- MPGA mask-programmable gate array
- interconnect elements There are three types of the interconnect elements currently in use.
- a MOSFET is either on or off depending on the state of an accompanying static random access memory (SRAM) cell.
- SRAM static random access memory
- EPROM or flash memory also controls the MOSFET; it can also serve as the interconnect element itself.
- An antifuse is made of an insulating layer sandwiched by two electrodes.
- the interconnect element is normally off until a programming voltage/current pulse breaks down the insulator and turns it into a low-value resistor.
- Numerous antifuse materials and structures have been employed in the past. For example, see U.S. Pat. No. 5,493,147 to Holzworth et al., U.S. Pat. No. 5,537,056 to McCollum, and U.S. Pat. No. 5,557,136 to Gorden et al. (the entire disclosures of which are herein incorporated by reference).
- Dielectric based antifuses with Si bottom electrodes and amorphous silicon ( ⁇ -Si) dielectric layer with TiW metal top electrodes are now used in FPGAs.
- FIG. 1 it illustrates a cross sectional view of the conventional antifuse structure.
- a field oxide layer 3 for isolation is formed on a silicon substrate 1.
- a layer of bottom electrode 5 which is typically made of doped silicon or TiW alloy is formed on the field oxide layer 3.
- a dielectric layer 7 such as 2000 Angstroms of CVD oxide is formed over bottom electrode and then masked and etched to define an antifuse via opening.
- a thin dielectric layer 9 such as ⁇ -Si or oxide/nitride/oxide (ONO) is deposited.
- a top electrode 11 is formed overlaying the dielectric layer to complete the formation of an antifuse structure of FPGAs.
- step coverage problem As the via sizes of the IC devices become smaller, there is always the concern of step coverage problem.
- the issue of poor step coverage of the dielectric layer creates weak points 13 that affects the reliability of the antifuses.
- the non-uniform thicknesses of the dielectric layer and top electrode in the concave area further degrade the performance of the field programmable gate arrays.
- the present invention provides a method of making an antifuse structure of the FPGA device by the assisting of liquid phase deposition (LPD) oxide, which is capable of providing better step coverage in the dielectric layer/ electrodes interfaces of the antifuse structure.
- LPD liquid phase deposition
- the liquid phase deposition is a newly developed technology, which can be used to grow silicon dioxide in an aqueous solution at low temperature. Having the features of selective deposition against photoresist and conformal growth, the silicon dioxide prepared by LPD can be utilized to simplify the antifuse process and improve the uniformity of the dielectric layer. Liquid phase deposition of silicon dioxide is described in the article entitled “A Selective SiO 2 Film-Formation Technology Using Liquid-Phase Deposition for Fully Planarized Multilevel Interconnects," J. Electrochem. Soc., Vol. 140, No. 8, August 1993, which is fully incorporated by reference.
- a field oxide layer for isolation is grown on the semiconductor silicon substrate by standard integrated circuit fabrication process. Then, a bottom electrode, a thin dielectric layer and a first top electrode layer are sequentially deposited on the surface of the field oxide layer.
- a photoresist layer is coated on the surface of the first top electrode layer. Then, the first top electrode layer is patterned to form a top electrode stud by the conventional lithography and etching techniques.
- the next step is the key point of the present invention.
- a layer of silicon dioxide (SiO 2 ) is deposited to a vertical thickness the same as the top electrode stud.
- the silicon dioxide prepared by LPD can be utilized to improve the overall profile of the antifuse structure.
- the photoresist pattern is removed.
- a second top electrode layer is deposited overlaying the LPD-SiO 2 layer and the top electrode stud.
- the top electrode that consists of the second top electrode layer and the top electrode stud is completed, and therefore, the novel antifuse structure of FPGAs with the assist of the LPD-SiO 2 layer according to the present is finally accomplished.
- FIG. 1 is a cross sectional representation of the antifuse structure according to the prior art.
- FIGS. 2 through 5 schematically illustrate the cross sectional view of the antifuse structure according to the present invention.
- FIG. 2 is a cross sectional representation of the antifuse structure after the bottom electrode, dielectric layer and top electrode are successively formed.
- FIG. 3 is a cross sectional representation of the antifuse structure after the top electrode pattern is defined.
- FIG. 4 is a cross sectional representation of the antifuse structure after the LPD oxide layer is deposited.
- FIG. 5 is a cross sectional representation of the antifuse structure after the final structure is completed.
- the invention disclosed herein is directed to a method of fabricating the antifuse structure of high density and high speed FPGAs.
- the drawing figures illustrate a partially completed integrated circuit device.
- numerous details are set forth in order to provide a thorough understanding of the present invention. It will be appreciated by one skilled in the art that variations of these specific details are possible while still achieving the results of the present invention. In other words well-known processing steps are not described in detail in order not to unnecessarily obscure the present invention.
- FIG. 2 there is shown a portion of a partially completed antifuse structure of the FPGAs.
- FIG. 2 only shows the antifuse portion of a FPGA which is fabricated on a semiconductor silicon substrate 21.
- a layer of field oxide 23 for isolation is grown on the semiconductor silicon substrate 21.
- a bottom electrode 25, a thin antifuse dielectric layer 27 and a first top electrode layer 29 are successively formed overlaying the field oxide layer 23.
- the field oxide growth technology is well known in the prior art and is therefore not described in details.
- U.S. Pat. No. 3,970,486 to E. Kooi discloses the local oxidation (LOCOS) technique which teaches a method to grow thermal oxide layer outside the nitride mask against oxidation on a silicon substrate.
- the thickness of the field oxide layer 23 is about 3000 to 6000 Angstroms.
- the bottom electrode 25 is typically made of a barrier metal such as titanium tungsten (TiW) deposited by sputtering, to a thickness about 1000 to 3000 Angstroms.
- TiW titanium tungsten
- Other conductive materials for example, metal, silicon, polysilicon or suicide may also be used.
- the antifuse dielectric layer 27 is usually made of amorphous silicon ( ⁇ -Si) by RF sputtering method with phosphorus doping or by low pressure chemical vapor deposition (LPCVD) technique under the following conditions: the temperature is about 250° C. to 580° C., the pressure is about 0.25 Torr, with SiH 4 reactant gas.
- LPCVD low pressure chemical vapor deposition
- Amorphous silicon formation by PECVD is described in A. C. Adams, "Plasma Deposition of Inorganic Films", Solid State Technology, April 1983, pp. 135-139, hereby incorporated entire disclosure by reference.
- the antifuse dielectric layer can also serve as the antifuse dielectric layer.
- Other dielectric materials for example, conventional ONO sandwich structure, newly developed tantalum oxide (Ta 2 O 5 ), barium strontium titanium (BST), or lead zirconium titanium (PZT) may also be used.
- the thickness of the antifuse dielectric layer is about 50 to 200 Angstroms, depending on the material used.
- the top electrode 29 is typically made of titanium tungsten (TiW) deposited by sputtering or polysilicon deposited by PECVD technique, to a thickness about 1000 to 3000 Angstroms.
- a photoresist layer 31 is coated on the surface of the top electrode. Then, the top electrode is patterned to form a top electrode stud 29A by the conventional lithography and etching techniques.
- the etching process can use anisotropically plasma-etching such as magnetic enhanced reactive ion etching (MERIE), electron cyclotron etching (ECR), or the conventional reactive ion etching (RIE) methods. In sub-micron VLSI device technology, it usually uses the MERIE method by a plasma-etcher such as a Lam Research Inc. Model Rainbow 4520 with reactant gases SF 6 and O 2 .
- the etching process can use wet etching in a mixture of solutions NH 4 OH, H 2 O, and H 2 O 2 , in a ratio of 1:12:5 for about 20 minutes at a temperature between about 30 to 50° C.
- this step is the key point of the present invention.
- a layer of silicon dioxide (SiO 2 ) 33 with a thickness of about 1000 to 4000 Angstroms is formed by liquid phase deposition, which is referred as the LPD-SiO 2 layer.
- the silicon dioxide prepared by LPD can be utilized to improve the overall profile of the antifuse structure.
- the photoresist pattern 31 is stripped by oxygen plasma or sulfuric acid.
- the LPD-SiO 2 layer 33 can be deposited by immersing the silicon substrate 21 into the supersaturated hydrofluoroslicic acid (H 2 SiF 6 ) solution with silica-gel.
- the chemical reaction is a reversible one which is shown in equation (1):
- the SiO 2 saturated hydrofluorosilicic acid solution may include hydrofluoric acid (HF) which is minimized in the equation (1).
- boric acid or aluminum shifts the equilibrium process (1) from left toward right and helps the SiO 2 to deposit.
- a second top electrode layer 35 is deposited overlaying the LPD-SiO 2 layer 33 and the top electrode stud 29A by the same method as described before, to a thickness about 1000 to 2000 Angstroms.
- the top electrode that consists of the second top electrode layer 35 and the top electrode stud 29A is completed, and therefore, the novel antifuse structure of FPGAs with the assist of the LPD-SiO 2 layer according to the present is finally accomplished.
- the novel antifuse structure of FPGAs of the present invention has uniform thicknesses of the dielectric layer and top electrode that can improve the yield and performance of the FPGAs as well as achieve high density and high speed field programmable gate array applications.
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
Description
H.sub.2 SiF.sub.6 +2H.sub.2 O←→6HF+SiO.sub.2 ↓(1)
H.sub.3 BO.sub.3 +4HF←→BF.sup.- +H.sub.3 O.sup.+ +2H.sub.2 O(2)
2Al+12HF←→6H.sub.3 AlF.sub.6 +3H.sub.2 (3)
Claims (11)
H.sub.2 SiF.sub.6 +2H.sub.2 O←→6HF+SiO.sub.2 ↓.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US08/906,552 US5937281A (en) | 1997-08-05 | 1997-08-05 | Method to form metal-to-metal antifuse for field programmable gate array applications using liquid phase deposition (LPD) |
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Application Number | Priority Date | Filing Date | Title |
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US08/906,552 US5937281A (en) | 1997-08-05 | 1997-08-05 | Method to form metal-to-metal antifuse for field programmable gate array applications using liquid phase deposition (LPD) |
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US5937281A true US5937281A (en) | 1999-08-10 |
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US08/906,552 Expired - Lifetime US5937281A (en) | 1997-08-05 | 1997-08-05 | Method to form metal-to-metal antifuse for field programmable gate array applications using liquid phase deposition (LPD) |
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Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002067263A2 (en) * | 2001-02-19 | 2002-08-29 | Infineon Technologies Ag | Contact system comprising a dielectric antifuse for an ic-memory element and method for producing one such contact system |
US20030173643A1 (en) * | 2002-03-13 | 2003-09-18 | Matrix Semiconductor, Inc. | Silicide-silicon oxide-semiconductor antifuse device and method of making |
US6680256B2 (en) * | 2001-05-10 | 2004-01-20 | Macronix International, Co., Ltd. | Process for planarization of flash memory cell |
US6689645B2 (en) | 2000-12-05 | 2004-02-10 | National Science Council | Method of surface treatment on the improvement of electrical properties for doped silicon oxides (SiO2) films |
US20060046354A1 (en) * | 2004-09-02 | 2006-03-02 | Dwayne Kreipl | Recessed gate dielectric antifuse |
US7825479B2 (en) | 2008-08-06 | 2010-11-02 | International Business Machines Corporation | Electrical antifuse having a multi-thickness dielectric layer |
US20120104545A1 (en) * | 2009-07-09 | 2012-05-03 | Murata Manufacturing Co., Ltd. | Anti-Fuse Element |
US20120112313A1 (en) * | 2009-07-22 | 2012-05-10 | Murata Manufacturing Co., Ltd. | Anti-Fuse Element |
US20200118927A1 (en) * | 2018-10-16 | 2020-04-16 | Globalfoundries Inc. | Anti-fuse with self aligned via patterning |
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US5472902A (en) * | 1994-03-21 | 1995-12-05 | United Microelectronics Corp. | Silicon-on-insulator isolation technology using liquid phase deposition |
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US5519248A (en) * | 1993-07-07 | 1996-05-21 | Actel Corporation | Circuits for ESD protection of metal-to-metal antifuses during processing |
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US5693556A (en) * | 1995-12-29 | 1997-12-02 | Cypress Semiconductor Corp. | Method of making an antifuse metal post structure |
US5714795A (en) * | 1994-11-11 | 1998-02-03 | Tadahiro Ohmi | Semiconductor device utilizing silicide reaction |
US5831325A (en) * | 1996-08-16 | 1998-11-03 | Zhang; Guobiao | Antifuse structures with improved manufacturability |
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1997
- 1997-08-05 US US08/906,552 patent/US5937281A/en not_active Expired - Lifetime
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Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6689645B2 (en) | 2000-12-05 | 2004-02-10 | National Science Council | Method of surface treatment on the improvement of electrical properties for doped silicon oxides (SiO2) films |
WO2002067263A3 (en) * | 2001-02-19 | 2002-12-12 | Infineon Technologies Ag | Contact system comprising a dielectric antifuse for an ic-memory element and method for producing one such contact system |
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US6680256B2 (en) * | 2001-05-10 | 2004-01-20 | Macronix International, Co., Ltd. | Process for planarization of flash memory cell |
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