TW268106B - - Google Patents

Info

Publication number
TW268106B
TW268106B TW082110734A TW82110734A TW268106B TW 268106 B TW268106 B TW 268106B TW 082110734 A TW082110734 A TW 082110734A TW 82110734 A TW82110734 A TW 82110734A TW 268106 B TW268106 B TW 268106B
Authority
TW
Taiwan
Prior art keywords
ch2os
pref
diazonaphthoquinone
lower alkyl
compsn
Prior art date
Application number
TW082110734A
Other languages
English (en)
Original Assignee
Morton Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morton Int Inc filed Critical Morton Int Inc
Application granted granted Critical
Publication of TW268106B publication Critical patent/TW268106B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/71—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of rings other than six-membered aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW082110734A 1993-03-05 1993-12-17 TW268106B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/026,923 US5308744A (en) 1993-03-05 1993-03-05 Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives

Publications (1)

Publication Number Publication Date
TW268106B true TW268106B (zh) 1996-01-11

Family

ID=21834576

Family Applications (1)

Application Number Title Priority Date Filing Date
TW082110734A TW268106B (zh) 1993-03-05 1993-12-17

Country Status (9)

Country Link
US (1) US5308744A (zh)
EP (1) EP0614120B1 (zh)
JP (2) JP2622231B2 (zh)
KR (1) KR940021519A (zh)
CN (1) CN1095060A (zh)
AT (1) ATE151895T1 (zh)
CA (1) CA2111632A1 (zh)
DE (1) DE69402592T2 (zh)
TW (1) TW268106B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5314782A (en) * 1993-03-05 1994-05-24 Morton International, Inc. Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
JP3512191B2 (ja) * 1994-09-12 2004-03-29 シーメンス アクチエンゲゼルシヤフト フォトリソグラフィパターン製造方法
EP1023360B1 (en) 1997-10-16 2011-03-09 Sun Chemical Corporation PHOTONEUTRALIZATION OF pH SENSITIVE AQUEOUS POLYMERIC DISPERSIONS AND METHODS FOR USING SAME
JP3285086B2 (ja) 1999-05-20 2002-05-27 日本電気株式会社 化学増幅型レジスト組成物
CN1318410C (zh) * 2002-06-28 2007-05-30 北京师范大学 重氮萘醌系光－热活性化合物及其合成方法
US7354692B2 (en) * 2005-05-09 2008-04-08 International Business Machines Corporation Photoresists for visible light imaging
KR101888287B1 (ko) 2014-01-27 2018-08-13 도쿄엘렉트론가부시키가이샤 패터닝된 필름의 임계 치수를 시프팅하기 위한 시스템 및 방법
WO2016025210A1 (en) * 2014-08-13 2016-02-18 Tokyo Electron Limited Critical dimension control in photo-sensitized chemically-amplified resist

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046121A (en) * 1949-07-23 1962-07-24 Azoplate Corp Process for the manufacture of printing plates and light-sensitive material suttablefor use therein
NL95407C (zh) * 1954-08-20
JPS5562444A (en) * 1978-11-02 1980-05-10 Konishiroku Photo Ind Co Ltd Photosensitive composition
DE3038605A1 (de) * 1980-10-13 1982-06-03 Hoechst Ag, 6000 Frankfurt Verfahren zur herstellung von reliefkopien
DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
EP0155231B2 (de) * 1984-03-07 1997-01-15 Ciba-Geigy Ag Verfahren zur Herstellung von Abbildungen
EP0239423B1 (en) * 1986-03-28 1996-03-20 Japan Synthetic Rubber Co., Ltd. Positive type radiation-sensitive resin composition
US4837121A (en) * 1987-11-23 1989-06-06 Olin Hunt Specialty Products Inc. Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin
JP2623309B2 (ja) * 1988-02-22 1997-06-25 ユーシービー ソシエテ アノニム レジストパターンを得る方法

Also Published As

Publication number Publication date
CN1095060A (zh) 1994-11-16
KR940021519A (ko) 1994-10-19
EP0614120B1 (en) 1997-04-16
CA2111632A1 (en) 1994-09-06
ATE151895T1 (de) 1997-05-15
JPH09120158A (ja) 1997-05-06
EP0614120A1 (en) 1994-09-07
DE69402592T2 (de) 1997-07-24
JPH06256292A (ja) 1994-09-13
JP2622231B2 (ja) 1997-06-18
DE69402592D1 (de) 1997-05-22
US5308744A (en) 1994-05-03

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