TW203161B - - Google Patents

Download PDF

Info

Publication number
TW203161B
TW203161B TW081101860A TW81101860A TW203161B TW 203161 B TW203161 B TW 203161B TW 081101860 A TW081101860 A TW 081101860A TW 81101860 A TW81101860 A TW 81101860A TW 203161 B TW203161 B TW 203161B
Authority
TW
Taiwan
Prior art keywords
layer
edge
indicator
monitoring
substrate
Prior art date
Application number
TW081101860A
Other languages
English (en)
Chinese (zh)
Original Assignee
American Telephone & Telegraph
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone & Telegraph filed Critical American Telephone & Telegraph
Application granted granted Critical
Publication of TW203161B publication Critical patent/TW203161B/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H10P50/00—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0266—Marks, test patterns or identification means
    • H05K1/0269—Marks, test patterns or identification means for visual or optical inspection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/09654—Shape and layout details of conductors covering at least two types of conductors provided for in H05K2201/09218 - H05K2201/095
    • H05K2201/09781—Dummy conductors, i.e. not used for normal transport of current; Dummy electrodes of components
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/09654—Shape and layout details of conductors covering at least two types of conductors provided for in H05K2201/09218 - H05K2201/095
    • H05K2201/098—Special shape of the cross-section of conductors, e.g. very thick plated conductors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0384—Etch stop layer, i.e. a buried barrier layer for preventing etching of layers under the etch stop layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/16—Inspection; Monitoring; Aligning
    • H05K2203/163—Monitoring a manufacturing process

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
TW081101860A 1991-12-31 1992-03-11 TW203161B (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/816,416 US5259920A (en) 1991-12-31 1991-12-31 Manufacturing method, including etch-rate monitoring

Publications (1)

Publication Number Publication Date
TW203161B true TW203161B (enExample) 1993-04-01

Family

ID=25220536

Family Applications (1)

Application Number Title Priority Date Filing Date
TW081101860A TW203161B (enExample) 1991-12-31 1992-03-11

Country Status (5)

Country Link
US (1) US5259920A (enExample)
EP (1) EP0550176A1 (enExample)
JP (1) JPH0799789B2 (enExample)
KR (1) KR930014830A (enExample)
TW (1) TW203161B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19646841A1 (de) * 1996-11-13 1998-05-14 Eilenburger Elektrolyse & Umwelttechnik Gmbh Verfahren und Vorrichtung zur Direktbestimmung der Abtragsgeschwindigkeit von Metallen in Ätz- und Beizlösungen
US6419754B1 (en) * 1999-08-18 2002-07-16 Chartered Semiconductor Manufacturting Ltd. Endpoint detection and novel chemicals in copper stripping
US20020125215A1 (en) * 2001-03-07 2002-09-12 Davis Brian Michael Chemical milling of gas turbine engine blisks
US9107302B2 (en) * 2013-02-12 2015-08-11 Raytheon Company Dummy structure for visual aid in printed wiring board etch inspection

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2149344A (en) * 1935-03-22 1939-03-07 Du Pont Apparatus and process for the study of plating solutions
SU485889A1 (ru) * 1971-11-01 1975-09-30 Московский Полиграфический Институт Способ изготовлени клиньев-датчиков
GB2088782B (en) * 1980-12-05 1985-01-09 Burroughs Corp Etching depth monitor and control
US4367044A (en) * 1980-12-31 1983-01-04 International Business Machines Corp. Situ rate and depth monitor for silicon etching
US4436579A (en) * 1981-01-29 1984-03-13 Intel Corporation Method of forming multiplexed magnetic bubble detectors
DE3273475D1 (en) * 1982-10-14 1986-10-30 Ibm Deutschland Method to measure the thickness of eroded layers at subtractive work treatment processes
JPS5994038A (ja) * 1982-11-22 1984-05-30 Toshiba Corp 腐食速度測定方法
JPH0669031B2 (ja) * 1984-07-17 1994-08-31 日本電気株式会社 半導体装置
JPS62158883A (ja) * 1985-12-28 1987-07-14 Ibiden Co Ltd エツチングの管理方法
JPH0682727B2 (ja) * 1986-02-18 1994-10-19 ホ−ヤ株式会社 検査用基板とその製造方法
US4717446A (en) * 1986-09-18 1988-01-05 Motorola Inc. Method of detecting the endpoint of the etch of epitaxially grown silicon
US4708765A (en) * 1986-10-06 1987-11-24 The Johns Hopkins University Regulation of the exposure of active surfaces
KR890004566B1 (ko) * 1987-03-21 1989-11-15 삼성전자 주식회사 반도체 제조공정중의 패턴의 씨디변화를 모니타링하기 위한 테스트 패턴
SU1585383A1 (ru) * 1988-12-05 1990-08-15 Львовский политехнический институт им.Ленинского комсомола Устройство дл контрол глубины травлени металлической пленки
US4935108A (en) * 1989-04-28 1990-06-19 Hewlett-Packard Company Apparatus for troubleshooting photoimage plating problems in printed circuit board manufacturing

Also Published As

Publication number Publication date
KR930014830A (ko) 1993-07-23
JPH0799789B2 (ja) 1995-10-25
US5259920A (en) 1993-11-09
JPH0669630A (ja) 1994-03-11
EP0550176A1 (en) 1993-07-07

Similar Documents

Publication Publication Date Title
CN109580721B (zh) 一种铁磁金属材料电导率的脉冲涡流检测方法和检测装置
TW293148B (enExample)
EP0032028B1 (en) Method and apparatus for forming electrical interconnections
CN109612920B (zh) 一种金属构件大气腐蚀监测方法
TW203161B (enExample)
US3416078A (en) Method of determining resistivity of a thin layer
CN109612921B (zh) 一种腐蚀监测传感器及其制备方法
CN103363930B (zh) 一种测量钢板镀锌层厚度的方法
CN106548956A (zh) 一种蒸发沉积薄膜的厚度量测方法
JPH0320682B2 (enExample)
TW416116B (en) Process for mapping metal contaminant concentration on a silicon wafer surface
JP2945072B2 (ja) プリント回路基板の製造における電気化学的反応プロセスの試験装置及びプリント回路基板の電着方法
CN116430291A (zh) 一种开尔文探针测量电位与金属腐蚀电位校准装置及方法
CN108106585B (zh) 一种金属基材表面覆层的检测方法
JP2772361B2 (ja) 超純水の水質評価方法
JPH05188021A (ja) 薄膜熱物性値測定用プローブ
CN107526254A (zh) 一种高速在线生产热敏阳图ctp版材的综合性能的检测方法
CN114107912B (zh) 镀膜装置
KR100283136B1 (ko) 부식속도 측정용 박막 전기저항센서의 제조방법 및 그 센서, 이를 이용한 국부부식 민감성 측정방법
Brenner Magnetic Method for Measuring the Thickness of Non-magnetic Coatings on Iron and Steel
JPH05343492A (ja) 導電性パターンの検査モニター方法
Freitag A Rapid Anodic Porosity Test for Ni‐Fe Electrodeposits on Copper Wire
JPH0515068B2 (enExample)
JPH0355892Y2 (enExample)
CN114664684A (zh) 一种用于半导体器件生产中的金属层膜厚的测量方法

Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent