TW202449837A - 電漿處理裝置及電漿處理方法 - Google Patents

電漿處理裝置及電漿處理方法 Download PDF

Info

Publication number
TW202449837A
TW202449837A TW113100369A TW113100369A TW202449837A TW 202449837 A TW202449837 A TW 202449837A TW 113100369 A TW113100369 A TW 113100369A TW 113100369 A TW113100369 A TW 113100369A TW 202449837 A TW202449837 A TW 202449837A
Authority
TW
Taiwan
Prior art keywords
frequency power
frequency
antenna
plasma processing
filter
Prior art date
Application number
TW113100369A
Other languages
English (en)
Chinese (zh)
Inventor
樋口龍太
齊藤武尚
中島俊希
北邨友志
Original Assignee
日商東京威力科創股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商東京威力科創股份有限公司 filed Critical 日商東京威力科創股份有限公司
Publication of TW202449837A publication Critical patent/TW202449837A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/32119—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
TW113100369A 2023-01-12 2024-01-04 電漿處理裝置及電漿處理方法 TW202449837A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2023002993 2023-01-12
JP2023-002993 2023-08-18
PCT/JP2023/046507 WO2024150666A1 (ja) 2023-01-12 2023-12-25 プラズマ処理装置及びプラズマ処理方法
WOPCT/JP2023/046507 2023-12-25

Publications (1)

Publication Number Publication Date
TW202449837A true TW202449837A (zh) 2024-12-16

Family

ID=91896897

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113100369A TW202449837A (zh) 2023-01-12 2024-01-04 電漿處理裝置及電漿處理方法

Country Status (7)

Country Link
US (1) US20250343028A1 (https=)
EP (1) EP4651631A1 (https=)
JP (2) JP7675954B2 (https=)
KR (1) KR20250123936A (https=)
CN (1) CN120457773B (https=)
TW (1) TW202449837A (https=)
WO (1) WO2024150666A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026034454A1 (ja) * 2024-08-06 2026-02-12 パナソニックＩｐマネジメント株式会社 電波放射装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008226857A (ja) * 2008-05-16 2008-09-25 Matsushita Electric Ind Co Ltd プラズマ処理方法及び装置
JP5479867B2 (ja) * 2009-01-14 2014-04-23 東京エレクトロン株式会社 誘導結合プラズマ処理装置
JP5851681B2 (ja) 2009-10-27 2016-02-03 東京エレクトロン株式会社 プラズマ処理装置
JP5606821B2 (ja) * 2010-08-04 2014-10-15 東京エレクトロン株式会社 プラズマ処理装置
US20140367043A1 (en) * 2013-06-17 2014-12-18 Applied Materials, Inc. Method for fast and repeatable plasma ignition and tuning in plasma chambers
KR101914902B1 (ko) * 2018-02-14 2019-01-14 성균관대학교산학협력단 플라즈마 발생장치 및 이를 포함하는 기판 처리 장치
JP7280552B2 (ja) * 2019-03-18 2023-05-24 コニカミノルタ株式会社 画像形成システムおよび異常紙情報表示方法
JP2020158814A (ja) * 2019-03-26 2020-10-01 東京エレクトロン株式会社 成膜装置および成膜方法
JP7503993B2 (ja) * 2020-10-08 2024-06-21 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法
JP7560214B2 (ja) * 2021-03-11 2024-10-02 東京エレクトロン株式会社 着火方法及びプラズマ処理装置

Also Published As

Publication number Publication date
CN120457773B (zh) 2026-04-28
KR20250123936A (ko) 2025-08-18
CN120457773A (zh) 2025-08-08
EP4651631A1 (en) 2025-11-19
JP7675954B2 (ja) 2025-05-13
WO2024150666A1 (ja) 2024-07-18
US20250343028A1 (en) 2025-11-06
JPWO2024150666A1 (https=) 2024-07-18
JP2025114638A (ja) 2025-08-05

Similar Documents

Publication Publication Date Title
US20240347320A1 (en) Plasma processing apparatus, power system, control method, and storage medium
TW202418342A (zh) 電漿處理系統及電漿處理方法
US20250149296A1 (en) Plasma processing apparatus and plasma processing method
JP2025114638A (ja) プラズマ処理装置及びプラズマ処理方法
JP7828799B2 (ja) プラズマ処理装置及びプラズマ処理方法
WO2023090256A1 (ja) プラズマ処理装置、電源システム、制御方法、プログラム、及び記憶媒体
TW202425050A (zh) 電漿處理裝置、rf系統及rf控制方法
TW202507791A (zh) 電漿處理裝置
TW202431328A (zh) 電漿處理裝置
KR20220163300A (ko) 플라즈마 처리 장치 및 플라즈마 처리 방법
JP2023129234A (ja) プラズマ処理装置
TW202448216A (zh) 電漿處理裝置及電漿處理方法
US20260088250A1 (en) Plasma processing apparatus
JP2024098586A (ja) プラズマ処理装置及び制御方法
TW202420383A (zh) 電漿處理裝置及電漿處理方法
TW202548842A (zh) 電漿處理裝置及清潔方法
WO2025169740A1 (ja) プラズマ処理装置、電源システム、制御方法、及びプログラム
TW202418335A (zh) 電漿處理裝置及電源系統
TW202533280A (zh) 電漿處理裝置及控制方法
TW202431327A (zh) 電漿處理裝置及電源系統
WO2026034233A1 (ja) プラズマ処理装置及び電源システム
JP2024119243A (ja) プラズマ処理装置、電源システム、及びプラズマ処理方法
TW202520333A (zh) 電漿處理裝置
WO2026042553A1 (ja) プラズマ処理装置及び電源システム
JP2026004103A (ja) プラズマ処理装置及びプラズマ処理方法