KR20250123936A - 플라스마 처리 장치 및 플라스마 처리 방법 - Google Patents

플라스마 처리 장치 및 플라스마 처리 방법

Info

Publication number
KR20250123936A
KR20250123936A KR1020257025723A KR20257025723A KR20250123936A KR 20250123936 A KR20250123936 A KR 20250123936A KR 1020257025723 A KR1020257025723 A KR 1020257025723A KR 20257025723 A KR20257025723 A KR 20257025723A KR 20250123936 A KR20250123936 A KR 20250123936A
Authority
KR
South Korea
Prior art keywords
frequency power
antenna
frequency
filter
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257025723A
Other languages
English (en)
Korean (ko)
Inventor
류타 히구치
다케히사 사이토
도시키 나카지마
유지 기타무라
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20250123936A publication Critical patent/KR20250123936A/ko
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/32119—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020257025723A 2023-01-12 2023-12-25 플라스마 처리 장치 및 플라스마 처리 방법 Pending KR20250123936A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2023-002993 2023-01-12
JP2023002993 2023-01-12
PCT/JP2023/046507 WO2024150666A1 (ja) 2023-01-12 2023-12-25 プラズマ処理装置及びプラズマ処理方法

Publications (1)

Publication Number Publication Date
KR20250123936A true KR20250123936A (ko) 2025-08-18

Family

ID=91896897

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257025723A Pending KR20250123936A (ko) 2023-01-12 2023-12-25 플라스마 처리 장치 및 플라스마 처리 방법

Country Status (7)

Country Link
US (1) US20250343028A1 (https=)
EP (1) EP4651631A1 (https=)
JP (2) JP7675954B2 (https=)
KR (1) KR20250123936A (https=)
CN (1) CN120457773B (https=)
TW (1) TW202449837A (https=)
WO (1) WO2024150666A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026034454A1 (ja) * 2024-08-06 2026-02-12 パナソニックＩｐマネジメント株式会社 電波放射装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011119658A (ja) 2009-10-27 2011-06-16 Tokyo Electron Ltd プラズマ処理装置及びプラズマ処理方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008226857A (ja) * 2008-05-16 2008-09-25 Matsushita Electric Ind Co Ltd プラズマ処理方法及び装置
JP5479867B2 (ja) * 2009-01-14 2014-04-23 東京エレクトロン株式会社 誘導結合プラズマ処理装置
JP5606821B2 (ja) * 2010-08-04 2014-10-15 東京エレクトロン株式会社 プラズマ処理装置
US20140367043A1 (en) * 2013-06-17 2014-12-18 Applied Materials, Inc. Method for fast and repeatable plasma ignition and tuning in plasma chambers
KR101914902B1 (ko) * 2018-02-14 2019-01-14 성균관대학교산학협력단 플라즈마 발생장치 및 이를 포함하는 기판 처리 장치
JP7280552B2 (ja) * 2019-03-18 2023-05-24 コニカミノルタ株式会社 画像形成システムおよび異常紙情報表示方法
JP2020158814A (ja) * 2019-03-26 2020-10-01 東京エレクトロン株式会社 成膜装置および成膜方法
JP7503993B2 (ja) * 2020-10-08 2024-06-21 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法
JP7560214B2 (ja) * 2021-03-11 2024-10-02 東京エレクトロン株式会社 着火方法及びプラズマ処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011119658A (ja) 2009-10-27 2011-06-16 Tokyo Electron Ltd プラズマ処理装置及びプラズマ処理方法

Also Published As

Publication number Publication date
CN120457773B (zh) 2026-04-28
CN120457773A (zh) 2025-08-08
EP4651631A1 (en) 2025-11-19
JP7675954B2 (ja) 2025-05-13
WO2024150666A1 (ja) 2024-07-18
US20250343028A1 (en) 2025-11-06
JPWO2024150666A1 (https=) 2024-07-18
TW202449837A (zh) 2024-12-16
JP2025114638A (ja) 2025-08-05

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